DE19944073A1 - Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht - Google Patents
Strahlungsempfindliches Aufzeichnungsmaterial mit DeckschichtInfo
- Publication number
- DE19944073A1 DE19944073A1 DE19944073A DE19944073A DE19944073A1 DE 19944073 A1 DE19944073 A1 DE 19944073A1 DE 19944073 A DE19944073 A DE 19944073A DE 19944073 A DE19944073 A DE 19944073A DE 19944073 A1 DE19944073 A1 DE 19944073A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- recording material
- radiation
- additive
- sensitive recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
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- 150000004032 porphyrins Chemical class 0.000 description 1
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- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- INCIMLINXXICKS-UHFFFAOYSA-M pyronin Y Chemical compound [Cl-].C1=CC(=[N+](C)C)C=C2OC3=CC(N(C)C)=CC=C3C=C21 INCIMLINXXICKS-UHFFFAOYSA-M 0.000 description 1
- 150000003248 quinolines Chemical class 0.000 description 1
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- DUIOPKIIICUYRZ-UHFFFAOYSA-N semicarbazide Chemical compound NNC(N)=O DUIOPKIIICUYRZ-UHFFFAOYSA-N 0.000 description 1
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- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 description 1
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- 125000004149 thio group Chemical group *S* 0.000 description 1
- 150000003558 thiocarbamic acid derivatives Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Chemical group OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000005039 triarylmethyl group Chemical group 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 1
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- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19944073A DE19944073A1 (de) | 1999-09-14 | 1999-09-14 | Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht |
| DE60040639T DE60040639D1 (de) | 1999-09-14 | 2000-08-31 | Mit einer Deckschicht versehenes photoempfindliches Aufzeichnungsmaterial |
| EP00203031A EP1085380B1 (en) | 1999-09-14 | 2000-08-31 | Photosensitive recording material provided with a covering layer |
| US09/660,376 US6410205B1 (en) | 1999-09-14 | 2000-09-12 | Photosensitive recording material provided with a covering layer |
| JP2000278116A JP4610707B2 (ja) | 1999-09-14 | 2000-09-13 | カバー層が設けられた感光性記録材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19944073A DE19944073A1 (de) | 1999-09-14 | 1999-09-14 | Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE19944073A1 true DE19944073A1 (de) | 2001-03-15 |
Family
ID=7922017
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19944073A Withdrawn DE19944073A1 (de) | 1999-09-14 | 1999-09-14 | Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht |
| DE60040639T Expired - Lifetime DE60040639D1 (de) | 1999-09-14 | 2000-08-31 | Mit einer Deckschicht versehenes photoempfindliches Aufzeichnungsmaterial |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60040639T Expired - Lifetime DE60040639D1 (de) | 1999-09-14 | 2000-08-31 | Mit einer Deckschicht versehenes photoempfindliches Aufzeichnungsmaterial |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6410205B1 (enExample) |
| EP (1) | EP1085380B1 (enExample) |
| JP (1) | JP4610707B2 (enExample) |
| DE (2) | DE19944073A1 (enExample) |
Families Citing this family (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030008968A1 (en) * | 2001-07-05 | 2003-01-09 | Yoshiki Sugeta | Method for reducing pattern dimension in photoresist layer |
| US7316891B2 (en) * | 2002-03-06 | 2008-01-08 | Agfa Graphics Nv | Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution |
| WO2005111727A1 (en) * | 2004-05-19 | 2005-11-24 | Agfa-Gevaert | Method of making a photopolymer printing plate |
| EP1614541A3 (en) | 2004-07-08 | 2006-06-07 | Agfa-Gevaert | Method of making a lithographic printing plate. |
| US7323730B2 (en) * | 2004-07-21 | 2008-01-29 | Commissariat A L'energie Atomique | Optically-configurable nanotube or nanowire semiconductor device |
| JP4621451B2 (ja) * | 2004-08-11 | 2011-01-26 | 富士フイルム株式会社 | 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法 |
| JP4411168B2 (ja) * | 2004-09-24 | 2010-02-10 | 富士フイルム株式会社 | 感光性平版印刷版 |
| US20060150847A1 (en) * | 2004-10-12 | 2006-07-13 | Presstek, Inc. | Inkjet-imageable lithographic printing members and methods of preparing and imaging them |
| JP4694330B2 (ja) * | 2005-09-26 | 2011-06-08 | 富士フイルム株式会社 | 感光性平版印刷版の製造方法 |
| DE602005013399D1 (de) | 2005-11-18 | 2009-04-30 | Agfa Graphics Nv | Verfahren zur Herstellung einer lithographischen Druckplatte |
| ES2321205T3 (es) | 2005-11-18 | 2009-06-03 | Agfa Graphics N.V. | Metodo para fabricar una plancha de impresion litografica. |
| ATE497192T1 (de) | 2005-11-18 | 2011-02-15 | Agfa Graphics Nv | Verfahren zur herstellung einer lithografiedruckform |
| ES2396931T3 (es) | 2005-11-18 | 2013-03-01 | Agfa Graphics N.V. | Método de fabricación de una plancha de impresión litográfica |
| EP2772805A1 (en) | 2005-11-18 | 2014-09-03 | Agfa Graphics Nv | Method of making a lithographic printing plate |
| EP1788429B1 (en) | 2005-11-18 | 2009-03-18 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
| ES2320561T3 (es) | 2005-11-18 | 2009-05-25 | Agfa Graphics N.V. | Metodo para fabricar una plancha de impresion litografica. |
| ES2322655T5 (es) | 2005-11-18 | 2019-06-27 | Agfa Nv | Método para fabricar una plancha de impresión litográfica |
| DE602005014249D1 (de) | 2005-11-21 | 2009-06-10 | Agfa Graphics Nv | Verfahren zur Herstellung einer Lithografiedruckform |
| EP1788449A1 (en) | 2005-11-21 | 2007-05-23 | Agfa Graphics N.V. | Method for making a lithographic printing plate |
| EP1788435B1 (en) | 2005-11-21 | 2013-05-01 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
| BRPI0811197B1 (pt) | 2007-05-25 | 2019-04-02 | Agfa Nv | Precursor de placa de impressão litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressão |
| US20090202938A1 (en) * | 2008-02-08 | 2009-08-13 | Celin Savariar-Hauck | Method of improving surface abrasion resistance of imageable elements |
| EP2186637B1 (en) | 2008-10-23 | 2012-05-02 | Agfa Graphics N.V. | A lithographic printing plate |
| US8318405B2 (en) | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
| US20120227626A1 (en) * | 2009-11-09 | 2012-09-13 | Cognis Ip Management Gmbh | Preparations Of Solid Material |
| US8795950B2 (en) * | 2010-06-30 | 2014-08-05 | Jonghan Choi | Method of improving print performance in flexographic printing plates |
| CN104334351B (zh) | 2012-06-05 | 2016-08-17 | 爱克发印艺公司 | 平版印刷版前体 |
| PL2755088T3 (pl) | 2013-01-11 | 2016-12-30 | Sposób wytwarzania litograficznej płyty drukowej | |
| BR112015030811A2 (pt) | 2013-06-14 | 2017-07-25 | Agfa Graphics Nv | precursor de placa de impressão litográfica |
| EP2883699B1 (en) | 2013-12-11 | 2017-05-03 | Agfa Graphics Nv | A lithographic printing plate precursor and monomer |
| EP2916171B1 (en) | 2014-03-03 | 2017-05-31 | Agfa Graphics Nv | A method for making a lithographic printing plate precursor |
| EP3392709A1 (en) | 2017-04-21 | 2018-10-24 | Agfa Nv | A lithographic printing plate precursor |
| EP3431290B1 (en) | 2017-07-20 | 2021-09-08 | Agfa Nv | A lithographic printing plate precursor |
| EP3474073B1 (en) | 2017-10-17 | 2022-12-07 | Agfa Offset Bv | A method for making a printing plate |
| ES2881270T3 (es) | 2017-12-08 | 2021-11-29 | Agfa Nv | Procedimiento de fabricación de una plancha de impresión litográfica |
| US11465403B2 (en) | 2018-03-22 | 2022-10-11 | Agfa Nv | Lithographic printing plate precursor |
| US20210221160A1 (en) | 2018-05-14 | 2021-07-22 | Agfa Nv | A lithographic printing plate precursor |
| EP3587112B1 (en) | 2018-06-21 | 2024-04-03 | Eco3 Bv | A lithographic printing plate precursor |
| EP3587113B1 (en) | 2018-06-21 | 2023-01-04 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
| EP3650938A1 (en) | 2018-11-09 | 2020-05-13 | Agfa Nv | A lithographic printing plate precursor |
| WO2020120402A1 (en) | 2018-12-10 | 2020-06-18 | Agfa Nv | On-press processing of a uv or violet-sensitized lithographic printing plate |
| EP3686011A1 (en) | 2019-01-23 | 2020-07-29 | Agfa Nv | A lithographic printing plate precursor |
| EP3815900A1 (en) | 2019-10-31 | 2021-05-05 | Agfa Nv | A lithographic printing plate precursor and method for making hydrophobic resin particles |
| EP3875271B1 (en) | 2020-03-04 | 2025-10-15 | Eco3 Bv | A lithographic printing plate precursor |
| EP3892469B1 (en) | 2020-04-10 | 2023-11-08 | Eco3 Bv | Lithographic printing plate precursor |
| EP3922462B1 (en) | 2020-06-08 | 2023-03-01 | Agfa Offset Bv | Lithographic photopolymer printing plate precursor with improved daylight stability |
| EP4171958B1 (en) | 2020-06-24 | 2025-08-13 | Eco3 Bv | Lithographic printing plate precursor, method for making a printing plate precursor and method for making a printing plate |
| EP3928983B1 (en) | 2020-06-24 | 2023-09-27 | Eco3 Bv | A lithographic printing plate precursor |
| ES3013752T3 (en) | 2020-06-24 | 2025-04-15 | Eco3 Bv | A lithographic printing plate precursor |
| ES3037727T3 (en) | 2020-08-31 | 2025-10-06 | Eco3 Bv | A lithographic printing plate precursor, a method for making a lithographic printing plate precursor and a method for making a lithographic printing plate |
| CN116324620B (zh) | 2020-10-09 | 2025-08-08 | 易客发有限公司 | 平版印刷版前体 |
| WO2022128283A1 (en) | 2020-12-16 | 2022-06-23 | Agfa Offset Bv | Lithographic printing press make-ready method |
| EP4035897A1 (en) | 2021-01-28 | 2022-08-03 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP4129682B1 (en) | 2021-08-05 | 2025-10-01 | Eco3 Bv | A lithographic printing plate precursor |
| EP4223534A1 (en) | 2022-02-07 | 2023-08-09 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP4239411A1 (en) | 2022-03-04 | 2023-09-06 | Eco3 Bv | Method and apparatus for processing a lithographic printing plate precursor |
| EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
| EP4461539A1 (en) | 2023-05-10 | 2024-11-13 | Eco3 Bv | A negative-working lithographic printing plate precursor |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2036585A1 (de) * | 1970-07-23 | 1972-02-03 | Kalle AG, 6202 Wiesbaden Biebnch | Photopolymensierbares Kopiermaterial |
| US4009115A (en) * | 1974-02-14 | 1977-02-22 | Amchem Products, Inc. | Composition and method for cleaning aluminum at low temperatures |
| JPS6279440A (ja) * | 1985-10-03 | 1987-04-11 | Fuji Photo Film Co Ltd | 光重合性感光材料 |
| DE3715790A1 (de) * | 1987-05-12 | 1988-11-24 | Hoechst Ag | Strahlungsempfindliches aufzeichnungsmaterial |
| DE3736980A1 (de) * | 1987-10-31 | 1989-05-18 | Basf Ag | Mehrschichtiges, flaechenfoermiges, lichtempfindliches aufzeichnungsmaterial |
| US5037482A (en) * | 1990-02-16 | 1991-08-06 | Macdermid, Incorporated | Composition and method for improving adhesion of coatings to copper surfaces |
| JP3024655B2 (ja) * | 1991-06-05 | 2000-03-21 | 東洋紡績株式会社 | 感光性樹脂印刷版用粘着防止層組成物 |
| US5563023A (en) * | 1994-11-02 | 1996-10-08 | Minnesota Mining And Manufacturing Co. | Photoimageable elements |
| US5597677A (en) * | 1994-11-02 | 1997-01-28 | Minnesota Mining And Manufacturing Company | Photoimageable elements |
| JPH1039513A (ja) * | 1996-07-19 | 1998-02-13 | Toyobo Co Ltd | 粘着防止層、それを用いた感光性樹脂積層体、その製造方法およびその包装体 |
| JP2001022078A (ja) * | 1999-07-02 | 2001-01-26 | Fuji Photo Film Co Ltd | 光重合型平版印刷版 |
| JP3976110B2 (ja) * | 1999-07-02 | 2007-09-12 | 富士フイルム株式会社 | 光重合型平版印刷版 |
| JP4512538B2 (ja) * | 2005-08-24 | 2010-07-28 | 富士フイルム株式会社 | 感光性平版印刷版 |
-
1999
- 1999-09-14 DE DE19944073A patent/DE19944073A1/de not_active Withdrawn
-
2000
- 2000-08-31 EP EP00203031A patent/EP1085380B1/en not_active Expired - Lifetime
- 2000-08-31 DE DE60040639T patent/DE60040639D1/de not_active Expired - Lifetime
- 2000-09-12 US US09/660,376 patent/US6410205B1/en not_active Expired - Fee Related
- 2000-09-13 JP JP2000278116A patent/JP4610707B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE60040639D1 (de) | 2008-12-11 |
| US6410205B1 (en) | 2002-06-25 |
| EP1085380A1 (en) | 2001-03-21 |
| EP1085380B1 (en) | 2008-10-29 |
| JP2001109159A (ja) | 2001-04-20 |
| JP4610707B2 (ja) | 2011-01-12 |
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