JP4610707B2 - カバー層が設けられた感光性記録材料 - Google Patents

カバー層が設けられた感光性記録材料 Download PDF

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Publication number
JP4610707B2
JP4610707B2 JP2000278116A JP2000278116A JP4610707B2 JP 4610707 B2 JP4610707 B2 JP 4610707B2 JP 2000278116 A JP2000278116 A JP 2000278116A JP 2000278116 A JP2000278116 A JP 2000278116A JP 4610707 B2 JP4610707 B2 JP 4610707B2
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JP
Japan
Prior art keywords
cover layer
layer
recording material
water
weight
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Expired - Fee Related
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JP2000278116A
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English (en)
Japanese (ja)
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JP2001109159A5 (enExample
JP2001109159A (ja
Inventor
トマス・ライヒゼンリング
トルステン・リフカ
マリオ・ボクスホルン
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Agfa NV
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Agfa NV
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Publication of JP2001109159A5 publication Critical patent/JP2001109159A5/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

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  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP2000278116A 1999-09-14 2000-09-13 カバー層が設けられた感光性記録材料 Expired - Fee Related JP4610707B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19944073.5 1999-09-14
DE19944073A DE19944073A1 (de) 1999-09-14 1999-09-14 Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht

Publications (3)

Publication Number Publication Date
JP2001109159A JP2001109159A (ja) 2001-04-20
JP2001109159A5 JP2001109159A5 (enExample) 2007-10-11
JP4610707B2 true JP4610707B2 (ja) 2011-01-12

Family

ID=7922017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000278116A Expired - Fee Related JP4610707B2 (ja) 1999-09-14 2000-09-13 カバー層が設けられた感光性記録材料

Country Status (4)

Country Link
US (1) US6410205B1 (enExample)
EP (1) EP1085380B1 (enExample)
JP (1) JP4610707B2 (enExample)
DE (2) DE19944073A1 (enExample)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030008968A1 (en) * 2001-07-05 2003-01-09 Yoshiki Sugeta Method for reducing pattern dimension in photoresist layer
US7316891B2 (en) * 2002-03-06 2008-01-08 Agfa Graphics Nv Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
WO2005111727A1 (en) * 2004-05-19 2005-11-24 Agfa-Gevaert Method of making a photopolymer printing plate
EP1614541A3 (en) 2004-07-08 2006-06-07 Agfa-Gevaert Method of making a lithographic printing plate.
US7323730B2 (en) * 2004-07-21 2008-01-29 Commissariat A L'energie Atomique Optically-configurable nanotube or nanowire semiconductor device
JP4621451B2 (ja) * 2004-08-11 2011-01-26 富士フイルム株式会社 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
JP4411168B2 (ja) * 2004-09-24 2010-02-10 富士フイルム株式会社 感光性平版印刷版
US20060150847A1 (en) * 2004-10-12 2006-07-13 Presstek, Inc. Inkjet-imageable lithographic printing members and methods of preparing and imaging them
JP4694330B2 (ja) * 2005-09-26 2011-06-08 富士フイルム株式会社 感光性平版印刷版の製造方法
DE602005013399D1 (de) 2005-11-18 2009-04-30 Agfa Graphics Nv Verfahren zur Herstellung einer lithographischen Druckplatte
ES2321205T3 (es) 2005-11-18 2009-06-03 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.
ATE497192T1 (de) 2005-11-18 2011-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
ES2396931T3 (es) 2005-11-18 2013-03-01 Agfa Graphics N.V. Método de fabricación de una plancha de impresión litográfica
EP2772805A1 (en) 2005-11-18 2014-09-03 Agfa Graphics Nv Method of making a lithographic printing plate
EP1788429B1 (en) 2005-11-18 2009-03-18 Agfa Graphics N.V. Method of making a lithographic printing plate
ES2320561T3 (es) 2005-11-18 2009-05-25 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.
ES2322655T5 (es) 2005-11-18 2019-06-27 Agfa Nv Método para fabricar una plancha de impresión litográfica
DE602005014249D1 (de) 2005-11-21 2009-06-10 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
EP1788449A1 (en) 2005-11-21 2007-05-23 Agfa Graphics N.V. Method for making a lithographic printing plate
EP1788435B1 (en) 2005-11-21 2013-05-01 Agfa Graphics N.V. Method of making a lithographic printing plate
BRPI0811197B1 (pt) 2007-05-25 2019-04-02 Agfa Nv Precursor de placa de impressão litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressão
US20090202938A1 (en) * 2008-02-08 2009-08-13 Celin Savariar-Hauck Method of improving surface abrasion resistance of imageable elements
EP2186637B1 (en) 2008-10-23 2012-05-02 Agfa Graphics N.V. A lithographic printing plate
US8318405B2 (en) 2009-03-13 2012-11-27 Eastman Kodak Company Negative-working imageable elements with overcoat
US20120227626A1 (en) * 2009-11-09 2012-09-13 Cognis Ip Management Gmbh Preparations Of Solid Material
US8795950B2 (en) * 2010-06-30 2014-08-05 Jonghan Choi Method of improving print performance in flexographic printing plates
CN104334351B (zh) 2012-06-05 2016-08-17 爱克发印艺公司 平版印刷版前体
PL2755088T3 (pl) 2013-01-11 2016-12-30 Sposób wytwarzania litograficznej płyty drukowej
BR112015030811A2 (pt) 2013-06-14 2017-07-25 Agfa Graphics Nv precursor de placa de impressão litográfica
EP2883699B1 (en) 2013-12-11 2017-05-03 Agfa Graphics Nv A lithographic printing plate precursor and monomer
EP2916171B1 (en) 2014-03-03 2017-05-31 Agfa Graphics Nv A method for making a lithographic printing plate precursor
EP3392709A1 (en) 2017-04-21 2018-10-24 Agfa Nv A lithographic printing plate precursor
EP3431290B1 (en) 2017-07-20 2021-09-08 Agfa Nv A lithographic printing plate precursor
EP3474073B1 (en) 2017-10-17 2022-12-07 Agfa Offset Bv A method for making a printing plate
ES2881270T3 (es) 2017-12-08 2021-11-29 Agfa Nv Procedimiento de fabricación de una plancha de impresión litográfica
US11465403B2 (en) 2018-03-22 2022-10-11 Agfa Nv Lithographic printing plate precursor
US20210221160A1 (en) 2018-05-14 2021-07-22 Agfa Nv A lithographic printing plate precursor
EP3587112B1 (en) 2018-06-21 2024-04-03 Eco3 Bv A lithographic printing plate precursor
EP3587113B1 (en) 2018-06-21 2023-01-04 Agfa Offset Bv A lithographic printing plate precursor
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
EP3650938A1 (en) 2018-11-09 2020-05-13 Agfa Nv A lithographic printing plate precursor
WO2020120402A1 (en) 2018-12-10 2020-06-18 Agfa Nv On-press processing of a uv or violet-sensitized lithographic printing plate
EP3686011A1 (en) 2019-01-23 2020-07-29 Agfa Nv A lithographic printing plate precursor
EP3815900A1 (en) 2019-10-31 2021-05-05 Agfa Nv A lithographic printing plate precursor and method for making hydrophobic resin particles
EP3875271B1 (en) 2020-03-04 2025-10-15 Eco3 Bv A lithographic printing plate precursor
EP3892469B1 (en) 2020-04-10 2023-11-08 Eco3 Bv Lithographic printing plate precursor
EP3922462B1 (en) 2020-06-08 2023-03-01 Agfa Offset Bv Lithographic photopolymer printing plate precursor with improved daylight stability
EP4171958B1 (en) 2020-06-24 2025-08-13 Eco3 Bv Lithographic printing plate precursor, method for making a printing plate precursor and method for making a printing plate
EP3928983B1 (en) 2020-06-24 2023-09-27 Eco3 Bv A lithographic printing plate precursor
ES3013752T3 (en) 2020-06-24 2025-04-15 Eco3 Bv A lithographic printing plate precursor
ES3037727T3 (en) 2020-08-31 2025-10-06 Eco3 Bv A lithographic printing plate precursor, a method for making a lithographic printing plate precursor and a method for making a lithographic printing plate
CN116324620B (zh) 2020-10-09 2025-08-08 易客发有限公司 平版印刷版前体
WO2022128283A1 (en) 2020-12-16 2022-06-23 Agfa Offset Bv Lithographic printing press make-ready method
EP4035897A1 (en) 2021-01-28 2022-08-03 Agfa Offset Bv A lithographic printing plate precursor
EP4129682B1 (en) 2021-08-05 2025-10-01 Eco3 Bv A lithographic printing plate precursor
EP4223534A1 (en) 2022-02-07 2023-08-09 Agfa Offset Bv A lithographic printing plate precursor
EP4239411A1 (en) 2022-03-04 2023-09-06 Eco3 Bv Method and apparatus for processing a lithographic printing plate precursor
EP4382306A1 (en) 2022-12-08 2024-06-12 Eco3 Bv Lithographic printing press make-ready method
EP4461539A1 (en) 2023-05-10 2024-11-13 Eco3 Bv A negative-working lithographic printing plate precursor

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2036585A1 (de) * 1970-07-23 1972-02-03 Kalle AG, 6202 Wiesbaden Biebnch Photopolymensierbares Kopiermaterial
US4009115A (en) * 1974-02-14 1977-02-22 Amchem Products, Inc. Composition and method for cleaning aluminum at low temperatures
JPS6279440A (ja) * 1985-10-03 1987-04-11 Fuji Photo Film Co Ltd 光重合性感光材料
DE3715790A1 (de) * 1987-05-12 1988-11-24 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial
DE3736980A1 (de) * 1987-10-31 1989-05-18 Basf Ag Mehrschichtiges, flaechenfoermiges, lichtempfindliches aufzeichnungsmaterial
US5037482A (en) * 1990-02-16 1991-08-06 Macdermid, Incorporated Composition and method for improving adhesion of coatings to copper surfaces
JP3024655B2 (ja) * 1991-06-05 2000-03-21 東洋紡績株式会社 感光性樹脂印刷版用粘着防止層組成物
US5563023A (en) * 1994-11-02 1996-10-08 Minnesota Mining And Manufacturing Co. Photoimageable elements
US5597677A (en) * 1994-11-02 1997-01-28 Minnesota Mining And Manufacturing Company Photoimageable elements
JPH1039513A (ja) * 1996-07-19 1998-02-13 Toyobo Co Ltd 粘着防止層、それを用いた感光性樹脂積層体、その製造方法およびその包装体
JP2001022078A (ja) * 1999-07-02 2001-01-26 Fuji Photo Film Co Ltd 光重合型平版印刷版
JP3976110B2 (ja) * 1999-07-02 2007-09-12 富士フイルム株式会社 光重合型平版印刷版
JP4512538B2 (ja) * 2005-08-24 2010-07-28 富士フイルム株式会社 感光性平版印刷版

Also Published As

Publication number Publication date
DE19944073A1 (de) 2001-03-15
DE60040639D1 (de) 2008-12-11
US6410205B1 (en) 2002-06-25
EP1085380A1 (en) 2001-03-21
EP1085380B1 (en) 2008-10-29
JP2001109159A (ja) 2001-04-20

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