DE69718003T2 - Wasserlösliche, sauerstoffundurchlässige polymerschichten - Google Patents

Wasserlösliche, sauerstoffundurchlässige polymerschichten

Info

Publication number
DE69718003T2
DE69718003T2 DE69718003T DE69718003T DE69718003T2 DE 69718003 T2 DE69718003 T2 DE 69718003T2 DE 69718003 T DE69718003 T DE 69718003T DE 69718003 T DE69718003 T DE 69718003T DE 69718003 T2 DE69718003 T2 DE 69718003T2
Authority
DE
Germany
Prior art keywords
opperable
soluble
oxygen
water
polymer layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69718003T
Other languages
English (en)
Other versions
DE69718003D1 (de
Inventor
Harald Baumann
Udo Dwars
M Savariar-Hauck
Peter Pappas
Hans-Joachim Timpe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Kodak Graphics Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphics Holding Inc filed Critical Kodak Graphics Holding Inc
Priority to DE69718003T priority Critical patent/DE69718003T2/de
Publication of DE69718003D1 publication Critical patent/DE69718003D1/de
Application granted granted Critical
Publication of DE69718003T2 publication Critical patent/DE69718003T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/02—Homopolymers or copolymers of unsaturated alcohols
    • C09D129/04—Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69718003T 1996-09-27 1997-09-29 Wasserlösliche, sauerstoffundurchlässige polymerschichten Expired - Lifetime DE69718003T2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE69718003T DE69718003T2 (de) 1996-09-27 1997-09-29 Wasserlösliche, sauerstoffundurchlässige polymerschichten

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19639897A DE19639897A1 (de) 1996-09-27 1996-09-27 Wasserlösliche und sauerstoffsperrende Polymerschichten und deren Verwendung für lichtempfindliche Materialien
PCT/US1997/017761 WO1998013394A1 (en) 1996-09-27 1997-09-29 Water soluble and oxygen-impermeable polymeric layers
DE69718003T DE69718003T2 (de) 1996-09-27 1997-09-29 Wasserlösliche, sauerstoffundurchlässige polymerschichten

Publications (2)

Publication Number Publication Date
DE69718003D1 DE69718003D1 (de) 2003-01-30
DE69718003T2 true DE69718003T2 (de) 2003-11-06

Family

ID=7807171

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19639897A Withdrawn DE19639897A1 (de) 1996-09-27 1996-09-27 Wasserlösliche und sauerstoffsperrende Polymerschichten und deren Verwendung für lichtempfindliche Materialien
DE69718003T Expired - Lifetime DE69718003T2 (de) 1996-09-27 1997-09-29 Wasserlösliche, sauerstoffundurchlässige polymerschichten

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19639897A Withdrawn DE19639897A1 (de) 1996-09-27 1996-09-27 Wasserlösliche und sauerstoffsperrende Polymerschichten und deren Verwendung für lichtempfindliche Materialien

Country Status (4)

Country Link
EP (1) EP0917544B1 (de)
DE (2) DE19639897A1 (de)
WO (1) WO1998013394A1 (de)
ZA (1) ZA978728B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7129021B2 (en) 1999-12-17 2006-10-31 Creo Srl Polymer system with switchable physical properties and its use in direct exposure printing plates
DE102004026609A1 (de) 2004-06-01 2006-01-12 Wacker Polymer Systems Gmbh & Co. Kg Aminofunktionelle Polyvinylacetale
JP4611234B2 (ja) * 2006-03-31 2011-01-12 富士フイルム株式会社 重合性ネガ型平版印刷版原版、平版印刷版原版の積層体および重合性ネガ型平版印刷版原版の製造方法
JP2008058406A (ja) 2006-08-29 2008-03-13 Fujifilm Corp 画像記録材料
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
DE102014210278A1 (de) 2014-05-30 2015-12-03 Henkel Ag & Co. Kgaa Hydrophile Beschichtung für Wärmetauscher
EP3304203B1 (de) * 2015-05-28 2020-01-01 Flint Group Germany GmbH Digital bebilderbare flexodruckplatte mit integraler barriereschicht
JP6831667B2 (ja) * 2016-10-14 2021-02-17 花王株式会社 濡れ剤
CN113845805A (zh) * 2021-10-18 2021-12-28 浙江鑫柔科技有限公司 一种光刻胶保护材料以及使用其形成金属网格的方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2748103A (en) * 1952-06-10 1956-05-29 Eastman Kodak Co Copolymers of vinyl esters with nu-allyl urethanes and hydrolysis products thereof
JPS6024815B2 (ja) * 1978-07-12 1985-06-14 積水化学工業株式会社 水溶性樹脂組成物
JPS5523163A (en) * 1978-08-09 1980-02-19 Agency Of Ind Science & Technol Polyvinyl alcohol type photosensitive resin and its preparation
JPS61211081A (ja) * 1985-03-15 1986-09-19 Kuraray Co Ltd 感熱記録用シ−ト
US5155167A (en) * 1988-04-15 1992-10-13 Air Products And Chemicals, Inc. Vinyl alcohol copolymers containing allylamine functionality
CA1330684C (en) * 1988-04-15 1994-07-12 Robert Krantz Pinschmidt Jr. Method for preparing poly(vinyl alcohol)- co-poly(vinylamine) via a two-phase process
DE4318438A1 (de) * 1993-06-03 1994-12-08 Agfa Gevaert Ag Fotografisches Aufzeichnungsmaterial
DE4321070A1 (de) * 1993-06-24 1995-01-05 Wacker Chemie Gmbh Redispergierbare Dispersionspulverzusammensetzung
DE4325015A1 (de) * 1993-07-26 1995-02-02 Agfa Gevaert Ag Farbfotografisches Silberhalogenidmaterial
US5519093A (en) * 1994-05-11 1996-05-21 Air Products And Chemicals, Inc. Synthesis of amine functional co-and terpolymers
JP3040935B2 (ja) * 1995-05-17 2000-05-15 富士写真フイルム株式会社 記録材料
US5534381A (en) * 1995-07-06 1996-07-09 Minnesota Mining And Manufacturing Company Acetal polymers useful in photosensitive compositions
DE19524851C2 (de) * 1995-07-07 1998-05-07 Sun Chemical Corp Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten
DE19525050C2 (de) * 1995-07-10 1999-11-11 Kodak Polychrome Graphics Llc Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten

Also Published As

Publication number Publication date
DE69718003D1 (de) 2003-01-30
DE19639897A1 (de) 1998-04-02
EP0917544B1 (de) 2002-12-18
WO1998013394A1 (en) 1998-04-02
EP0917544A1 (de) 1999-05-26
ZA978728B (en) 1998-03-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: EASTMAN KODAK COMPANY, ROCHESTER, N.Y., US