DE1917995B2 - Verfahren zur bildung eines isolierfilmes und danach hergestelltes halbleiterelement - Google Patents

Verfahren zur bildung eines isolierfilmes und danach hergestelltes halbleiterelement

Info

Publication number
DE1917995B2
DE1917995B2 DE19691917995 DE1917995A DE1917995B2 DE 1917995 B2 DE1917995 B2 DE 1917995B2 DE 19691917995 DE19691917995 DE 19691917995 DE 1917995 A DE1917995 A DE 1917995A DE 1917995 B2 DE1917995 B2 DE 1917995B2
Authority
DE
Germany
Prior art keywords
oxide
silicon
film
films
semiconductor element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19691917995
Other languages
German (de)
English (en)
Other versions
DE1917995A1 (de
Inventor
Myron Joel Bethlehem Pa. Rand (V.SLA.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Inc
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of DE1917995A1 publication Critical patent/DE1917995A1/de
Publication of DE1917995B2 publication Critical patent/DE1917995B2/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • H10P14/6927—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being a silicon oxynitride, e.g. SiON or SiON:H
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/308—Oxynitrides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
    • H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/113—Nitrides of boron or aluminum or gallium
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/114—Nitrides of silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
DE19691917995 1968-04-18 1969-04-09 Verfahren zur bildung eines isolierfilmes und danach hergestelltes halbleiterelement Pending DE1917995B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US72233668A 1968-04-18 1968-04-18

Publications (2)

Publication Number Publication Date
DE1917995A1 DE1917995A1 (de) 1969-10-30
DE1917995B2 true DE1917995B2 (de) 1972-04-13

Family

ID=24901429

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19691917995 Pending DE1917995B2 (de) 1968-04-18 1969-04-09 Verfahren zur bildung eines isolierfilmes und danach hergestelltes halbleiterelement

Country Status (6)

Country Link
US (1) US3558348A (OSRAM)
BE (1) BE727261A (OSRAM)
DE (1) DE1917995B2 (OSRAM)
FR (1) FR1600346A (OSRAM)
GB (1) GB1264163A (OSRAM)
NL (1) NL6901224A (OSRAM)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3765935A (en) * 1971-08-10 1973-10-16 Bell Telephone Labor Inc Radiation resistant coatings for semiconductor devices
US3886000A (en) * 1973-11-05 1975-05-27 Ibm Method for controlling dielectric isolation of a semiconductor device
JPS6022497B2 (ja) * 1974-10-26 1985-06-03 ソニー株式会社 半導体装置
NL171942C (nl) * 1976-02-13 1983-06-01 Hitachi Ltd Werkwijze voor het vervaardigen van een halfgeleiderinrichting, waarbij op een halfgeleiderlichaam een menglaag van nitriden van silicium en germanium wordt aangebracht.
JPS5245268A (en) * 1976-08-11 1977-04-09 Mitsubishi Electric Corp Process for production of semiconductor integfrated circuit
JPS5559729A (en) * 1978-10-27 1980-05-06 Fujitsu Ltd Forming method of semiconductor surface insulating film
US4668365A (en) * 1984-10-25 1987-05-26 Applied Materials, Inc. Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition
US4620986A (en) * 1984-11-09 1986-11-04 Intel Corporation MOS rear end processing
GB2267291B (en) * 1992-05-27 1995-02-01 Northern Telecom Ltd Plasma deposition process
DE69405438T2 (de) * 1993-03-24 1998-04-02 At & T Corp Verfahren zur Bildung dielektrischer Oxynitridschichten bei der Herstellung integrierter Schaltungen
US6806154B1 (en) 1998-10-08 2004-10-19 Integrated Device Technology, Inc. Method for forming a salicided MOSFET structure with tunable oxynitride spacer
EP2261956A3 (en) * 2001-09-17 2011-03-30 Advion BioSystems, Inc. Dielectric film
US20100178758A1 (en) * 2009-01-15 2010-07-15 Macronix International Co., Ltd. Methods for fabricating dielectric layer and non-volatile memory

Also Published As

Publication number Publication date
DE1917995A1 (de) 1969-10-30
GB1264163A (OSRAM) 1972-02-16
FR1600346A (OSRAM) 1970-07-20
NL6901224A (OSRAM) 1969-10-21
BE727261A (OSRAM) 1969-07-01
US3558348A (en) 1971-01-26

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