DE1447916B2 - Verfahren zur herstellung einer feuchtigkeitsfesten, lichtempfindlichen flachdruckplatte - Google Patents
Verfahren zur herstellung einer feuchtigkeitsfesten, lichtempfindlichen flachdruckplatteInfo
- Publication number
- DE1447916B2 DE1447916B2 DE1964P0034990 DEP0034990A DE1447916B2 DE 1447916 B2 DE1447916 B2 DE 1447916B2 DE 1964P0034990 DE1964P0034990 DE 1964P0034990 DE P0034990 A DEP0034990 A DE P0034990A DE 1447916 B2 DE1447916 B2 DE 1447916B2
- Authority
- DE
- Germany
- Prior art keywords
- plate
- moisture
- light
- solution
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000000034 method Methods 0.000 title claims description 4
- 238000000576 coating method Methods 0.000 claims description 21
- 239000011248 coating agent Substances 0.000 claims description 15
- 239000007859 condensation product Substances 0.000 claims description 12
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 claims description 6
- -1 alkyl carboxylic acid Chemical class 0.000 claims description 5
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 claims description 4
- ZRDSGWXWQNSQAN-UHFFFAOYSA-N 6-diazo-n-phenylcyclohexa-2,4-dien-1-amine Chemical compound [N-]=[N+]=C1C=CC=CC1NC1=CC=CC=C1 ZRDSGWXWQNSQAN-UHFFFAOYSA-N 0.000 claims description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 claims description 4
- VZLUGGCFYPMLMI-UHFFFAOYSA-N 5-(3,5-dihydroxyphenyl)benzene-1,3-diol Chemical compound OC1=CC(O)=CC(C=2C=C(O)C=C(O)C=2)=C1 VZLUGGCFYPMLMI-UHFFFAOYSA-N 0.000 claims description 3
- 229940124530 sulfonamide Drugs 0.000 claims description 3
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims description 2
- VNEBWJSWMVTSHK-UHFFFAOYSA-L disodium;3-hydroxynaphthalene-2,7-disulfonate Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C=C2C=C(S([O-])(=O)=O)C(O)=CC2=C1 VNEBWJSWMVTSHK-UHFFFAOYSA-L 0.000 claims 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 claims 1
- 239000010410 layer Substances 0.000 description 21
- 239000000243 solution Substances 0.000 description 18
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 13
- 229910052782 aluminium Inorganic materials 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 150000008049 diazo compounds Chemical class 0.000 description 12
- 239000002904 solvent Substances 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 7
- 229930182490 saponin Natural products 0.000 description 7
- 150000007949 saponins Chemical class 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 229930040373 Paraformaldehyde Natural products 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 229920002866 paraformaldehyde Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 206010037867 Rash macular Diseases 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- WXUAZZARGUDIHU-UHFFFAOYSA-N 2-(ethylamino)-5-sulfobenzoic acid Chemical compound CCNC1=CC=C(S(O)(=O)=O)C=C1C(O)=O WXUAZZARGUDIHU-UHFFFAOYSA-N 0.000 description 1
- DSUJMWDPQHSGBC-UHFFFAOYSA-N 5,5-bis(4-hydroxyphenyl)hexanoic acid Chemical compound C=1C=C(O)C=CC=1C(CCCC(O)=O)(C)C1=CC=C(O)C=C1 DSUJMWDPQHSGBC-UHFFFAOYSA-N 0.000 description 1
- 244000171897 Acacia nilotica subsp nilotica Species 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VKOUCJUTMGHNOR-UHFFFAOYSA-N Diphenolic acid Chemical compound C=1C=C(O)C=CC=1C(CCC(O)=O)(C)C1=CC=C(O)C=C1 VKOUCJUTMGHNOR-UHFFFAOYSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- 229920001273 Polyhydroxy acid Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- YFOPBSRIHLUUGK-UHFFFAOYSA-I [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].Cl.[K+].[Zr+4] Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].Cl.[K+].[Zr+4] YFOPBSRIHLUUGK-UHFFFAOYSA-I 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000005840 aryl radicals Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- NHZIBLPDGIARQC-UHFFFAOYSA-M sodium;4-hydroxy-5-(2-hydroxy-4-methoxybenzoyl)-2-methoxybenzenesulfonate Chemical compound [Na+].OC1=CC(OC)=CC=C1C(=O)C1=CC(S([O-])(=O)=O)=C(OC)C=C1O NHZIBLPDGIARQC-UHFFFAOYSA-M 0.000 description 1
- DAJSVUQLFFJUSX-UHFFFAOYSA-M sodium;dodecane-1-sulfonate Chemical compound [Na+].CCCCCCCCCCCCS([O-])(=O)=O DAJSVUQLFFJUSX-UHFFFAOYSA-M 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 150000004684 trihydrates Chemical class 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US307025A US3300309A (en) | 1963-09-06 | 1963-09-06 | Moisture-resistant planographic plates and methods of producing same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE1447916A1 DE1447916A1 (de) | 1968-11-14 |
| DE1447916B2 true DE1447916B2 (de) | 1976-11-04 |
Family
ID=23187917
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE1964P0034990 Granted DE1447916B2 (de) | 1963-09-06 | 1964-09-02 | Verfahren zur herstellung einer feuchtigkeitsfesten, lichtempfindlichen flachdruckplatte |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3300309A (en, 2012) |
| BE (1) | BE652748A (en, 2012) |
| DE (1) | DE1447916B2 (en, 2012) |
| GB (1) | GB1055079A (en, 2012) |
| NL (2) | NL6410224A (en, 2012) |
| SE (1) | SE313997B (en, 2012) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL156092B (nl) * | 1968-03-25 | 1978-03-15 | Polychrome Corp | Werkwijze voor de vervaardiging van een lithografische drukplaat. |
| US3867147A (en) * | 1969-05-20 | 1975-02-18 | Hoechst Co American | Light-sensitive diazo compounds and reproduction material employing the same |
| US3891516A (en) * | 1970-08-03 | 1975-06-24 | Polychrome Corp | Process of electrolyically anodizing a mechanically grained aluminum base and article made thereby |
| US3790382A (en) * | 1971-04-16 | 1974-02-05 | Minnesota Mining & Mfg | Fluorinated polyamide-diazo resin coating composition |
| JPS5539825B2 (en, 2012) * | 1972-05-12 | 1980-10-14 | ||
| US3997349A (en) * | 1974-06-17 | 1976-12-14 | Minnesota Mining And Manufacturing Company | Light-sensitive development-free driographic printing plate |
| US4230492A (en) * | 1978-01-17 | 1980-10-28 | The Richardson Company | Aryl sulfonic acid based stabilizers for presensitized planographic plates |
| US4299907A (en) * | 1978-08-10 | 1981-11-10 | Polychrome Corporation | Storage stable photosensitive diazo lithographic printing plates |
| US4414315A (en) * | 1979-08-06 | 1983-11-08 | Howard A. Fromson | Process for making lithographic printing plate |
| US4401743A (en) * | 1980-04-30 | 1983-08-30 | Minnesota Mining And Manufacturing Company | Aqueous developable photosensitive composition and printing plate |
| US4326020A (en) * | 1980-09-10 | 1982-04-20 | Polychrome Corporation | Method of making positive acting diazo lithographic printing plate |
| US4499170A (en) * | 1983-06-17 | 1985-02-12 | Richardson Graphics Company | Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative |
| US5066568A (en) * | 1985-08-05 | 1991-11-19 | Hoehst Celanese Corporation | Method of developing negative working photographic elements |
| US4980271A (en) * | 1985-08-05 | 1990-12-25 | Hoechst Celanese Corporation | Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate |
| US5122442A (en) * | 1989-07-28 | 1992-06-16 | Hoechst Celanese Corporation | Method for forming an image from a high speed screen printing composition on a screen mesh |
| US5232813A (en) * | 1990-01-31 | 1993-08-03 | Fuji Photo Film Co., Ltd. | Ps plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer |
| CN1037552C (zh) * | 1991-03-21 | 1998-02-25 | 北京大学 | 一种负性感光印刷版及其制法 |
| US5942368A (en) * | 1996-04-23 | 1999-08-24 | Konica Corporation | Pigment dispersion composition |
| JP3567402B2 (ja) * | 1996-06-12 | 2004-09-22 | コニカミノルタホールディングス株式会社 | 平版印刷版用支持体の製造方法、その製造方法で得られる平版印刷版用支持体及びその支持体を用いた感光性平版印刷版 |
| EP2589636A4 (en) | 2010-07-02 | 2015-03-18 | Dainippon Ink & Chemicals | FLUOROSA TENSID AND COATING COMPOSITION AND PAINT COMPOSITION THEREWITH |
| US9359547B2 (en) * | 2013-01-31 | 2016-06-07 | Halliburton Energy Services, Inc. | Wellbore servicing compositions and methods of making and using same |
| WO2021131726A1 (ja) | 2019-12-25 | 2021-07-01 | Dic株式会社 | 重合体及び当該重合体を含むコーティング組成物 |
| WO2022050062A1 (ja) | 2020-09-03 | 2022-03-10 | Dic株式会社 | 重合体、コーティング組成物、レジスト組成物及び物品 |
| US20240061329A1 (en) | 2020-12-17 | 2024-02-22 | Dic Corporation | Compound, leveling agent, coating composition, resist composition, and article |
| TW202311331A (zh) | 2021-05-18 | 2023-03-16 | 日商Ｄｉｃ股份有限公司 | 含矽酮鏈的聚合物、塗敷組成物、抗蝕劑組成物及物品 |
| TW202336058A (zh) | 2022-03-08 | 2023-09-16 | 日商Ｄｉｃ股份有限公司 | 化合物、該化合物的製造方法、調平劑、塗敷組成物、抗蝕劑組成物、硬化物及物品 |
| KR20250043342A (ko) | 2022-07-29 | 2025-03-28 | 디아이씨 가부시끼가이샤 | 실리콘 함유 공중합체, 레벨링제, 코팅 조성물, 레지스트 조성물, 컬러 필터 및 실리콘 함유 공중합체의 제조 방법 |
| JP7582563B2 (ja) | 2022-07-29 | 2024-11-13 | Dic株式会社 | レベリング剤、コーティング組成物、レジスト組成物、カラーフィルター及びレベリング剤の製造方法 |
| TW202419491A (zh) | 2022-11-10 | 2024-05-16 | 日商Ｄｉｃ股份有限公司 | 抗蝕劑組成物及其硬化物 |
| TW202419466A (zh) | 2022-11-14 | 2024-05-16 | 日商Ｄｉｃ股份有限公司 | 隨機共聚物及其製造方法、包含該共聚物的塗敷組成物、抗蝕劑組成物以及物品 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE857739C (de) * | 1950-08-13 | 1952-12-01 | Kalle & Co Ag | Verfahren zum Fixieren von Druckformen, die mit Hilfe von Diazoverbindungen hergestellt sind |
| DE1183919B (de) * | 1958-12-29 | 1964-12-23 | Polychrome Corp | Verfahren zur Herstellung einer vorsensibilisierten Flachdruckplatte mit metallischer Grundschicht unter Verwendung einer Haftschicht |
| NL259610A (en, 2012) * | 1959-12-30 | |||
| BE624581A (en, 2012) * | 1961-11-11 | |||
| US3169864A (en) * | 1962-05-15 | 1965-02-16 | Minnesota Mining & Mfg | Photosensitive materials comprising diazonium salts of bisphenol esters |
-
0
- NL NL128965D patent/NL128965C/xx active
-
1963
- 1963-09-06 US US307025A patent/US3300309A/en not_active Expired - Lifetime
-
1964
- 1964-08-31 SE SE10425/64A patent/SE313997B/xx unknown
- 1964-09-02 DE DE1964P0034990 patent/DE1447916B2/de active Granted
- 1964-09-02 NL NL6410224A patent/NL6410224A/xx unknown
- 1964-09-07 BE BE652748D patent/BE652748A/xx unknown
- 1964-09-07 GB GB36643/64A patent/GB1055079A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3300309A (en) | 1967-01-24 |
| DE1447916A1 (de) | 1968-11-14 |
| BE652748A (en, 2012) | 1964-12-31 |
| SE313997B (en, 2012) | 1969-08-25 |
| NL128965C (en, 2012) | |
| NL6410224A (en, 2012) | 1965-03-08 |
| GB1055079A (en) | 1967-01-11 |
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