GB1055079A - Moisture resistant planographic plates - Google Patents

Moisture resistant planographic plates

Info

Publication number
GB1055079A
GB1055079A GB36643/64A GB3664364A GB1055079A GB 1055079 A GB1055079 A GB 1055079A GB 36643/64 A GB36643/64 A GB 36643/64A GB 3664364 A GB3664364 A GB 3664364A GB 1055079 A GB1055079 A GB 1055079A
Authority
GB
United Kingdom
Prior art keywords
moisture resistant
planographic plates
naphthol
planographic
plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB36643/64A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of GB1055079A publication Critical patent/GB1055079A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Diazodiphenylamine/formaldehyde condensation products are reacted with phenolic compounds at a pH below 7.5. The phenolic compound may be a hydroxy benzophene such as 2,214,41-tetrahydroxybenzophene or sodum 2,21 - dihydroxy - 4,41 - dimethoxy - 5 - sulphobenzophenone; 4,4 - bis - (41 - hydroxyphenyl)-pentanoic acid; resorcinol, diresorcinol; 1-naphthol - 3 - sulphonamide or a 2-naphthol-3,6-sulphonic disodium salt.
GB36643/64A 1963-09-06 1964-09-07 Moisture resistant planographic plates Expired GB1055079A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US307025A US3300309A (en) 1963-09-06 1963-09-06 Moisture-resistant planographic plates and methods of producing same

Publications (1)

Publication Number Publication Date
GB1055079A true GB1055079A (en) 1967-01-11

Family

ID=23187917

Family Applications (1)

Application Number Title Priority Date Filing Date
GB36643/64A Expired GB1055079A (en) 1963-09-06 1964-09-07 Moisture resistant planographic plates

Country Status (6)

Country Link
US (1) US3300309A (en)
BE (1) BE652748A (en)
DE (1) DE1447916B2 (en)
GB (1) GB1055079A (en)
NL (2) NL6410224A (en)
SE (1) SE313997B (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL156092B (en) * 1968-03-25 1978-03-15 Polychrome Corp PROCESS FOR THE MANUFACTURE OF A LITHOGRAPHIC PRINTING PLATE.
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US3891516A (en) * 1970-08-03 1975-06-24 Polychrome Corp Process of electrolyically anodizing a mechanically grained aluminum base and article made thereby
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
JPS5539825B2 (en) * 1972-05-12 1980-10-14
US3997349A (en) * 1974-06-17 1976-12-14 Minnesota Mining And Manufacturing Company Light-sensitive development-free driographic printing plate
US4230492A (en) * 1978-01-17 1980-10-28 The Richardson Company Aryl sulfonic acid based stabilizers for presensitized planographic plates
US4299907A (en) * 1978-08-10 1981-11-10 Polychrome Corporation Storage stable photosensitive diazo lithographic printing plates
US4414315A (en) * 1979-08-06 1983-11-08 Howard A. Fromson Process for making lithographic printing plate
US4401743A (en) * 1980-04-30 1983-08-30 Minnesota Mining And Manufacturing Company Aqueous developable photosensitive composition and printing plate
US4326020A (en) * 1980-09-10 1982-04-20 Polychrome Corporation Method of making positive acting diazo lithographic printing plate
US4499170A (en) * 1983-06-17 1985-02-12 Richardson Graphics Company Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
US5122442A (en) * 1989-07-28 1992-06-16 Hoechst Celanese Corporation Method for forming an image from a high speed screen printing composition on a screen mesh
US5232813A (en) * 1990-01-31 1993-08-03 Fuji Photo Film Co., Ltd. Ps plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer
CN1037552C (en) * 1991-03-21 1998-02-25 北京大学 Negative photosensitive printed board and its making method
US5942368A (en) * 1996-04-23 1999-08-24 Konica Corporation Pigment dispersion composition
JP3567402B2 (en) * 1996-06-12 2004-09-22 コニカミノルタホールディングス株式会社 Method for producing lithographic printing plate support, lithographic printing plate support obtained by the method, and photosensitive lithographic printing plate using the support
US20130172476A1 (en) 2010-07-02 2013-07-04 Dic Corporation Fluorine-based surfactant, and coating composition and resist composition each using the same
US9359547B2 (en) 2013-01-31 2016-06-07 Halliburton Energy Services, Inc. Wellbore servicing compositions and methods of making and using same
EP4083098A4 (en) 2019-12-25 2024-01-17 DIC Corporation Polymer and coating composition containing said polymer
US20230323002A1 (en) 2020-09-03 2023-10-12 Dic Corporation Polymer, coating composition, resist composition, and article
EP4265661A1 (en) 2020-12-17 2023-10-25 DIC Corporation Compound, leveling agent, coating composition, resist composition, and article
TW202311331A (en) 2021-05-18 2023-03-16 日商Ｄｉｃ股份有限公司 Silicone chain-containing polymer, coating composition, resist composition and article
TW202336058A (en) 2022-03-08 2023-09-16 日商Ｄｉｃ股份有限公司 Compound, production method for said compound, leveling agent, coating composition, resist composition, and article

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE857739C (en) * 1950-08-13 1952-12-01 Kalle & Co Ag Process for fixing printing forms which are produced with the aid of diazo compounds
NL254170A (en) * 1958-12-29
NL259610A (en) * 1959-12-30
BE624581A (en) * 1961-11-11
US3169864A (en) * 1962-05-15 1965-02-16 Minnesota Mining & Mfg Photosensitive materials comprising diazonium salts of bisphenol esters

Also Published As

Publication number Publication date
US3300309A (en) 1967-01-24
DE1447916A1 (en) 1968-11-14
NL128965C (en)
BE652748A (en) 1964-12-31
DE1447916B2 (en) 1976-11-04
NL6410224A (en) 1965-03-08
SE313997B (en) 1969-08-25

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