DE112020002202T5 - Neuartige Diaroylcarbazolverbindung und Verwendung derselben als Sensibilisierungsmittel - Google Patents

Neuartige Diaroylcarbazolverbindung und Verwendung derselben als Sensibilisierungsmittel Download PDF

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Publication number
DE112020002202T5
DE112020002202T5 DE112020002202.1T DE112020002202T DE112020002202T5 DE 112020002202 T5 DE112020002202 T5 DE 112020002202T5 DE 112020002202 T DE112020002202 T DE 112020002202T DE 112020002202 T5 DE112020002202 T5 DE 112020002202T5
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alkyl
compound
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unsubstituted
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English (en)
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Wenchao ZHAO
Jiaqi LI
Zhongli MA
Chenlong Wang
Yonglin Wang
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Igm Anqing High Tech Development Co Ltd
Igm Anqing High Technology Development Co Ltd
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Igm Anqing High Tech Development Co Ltd
Igm Anqing High Technology Development Co Ltd
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    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
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    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds

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