JP2022528738A - 新規ジアロイルカルバゾール化合物、及び増感剤としてのその使用 - Google Patents

新規ジアロイルカルバゾール化合物、及び増感剤としてのその使用 Download PDF

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JP2022528738A
JP2022528738A JP2021560178A JP2021560178A JP2022528738A JP 2022528738 A JP2022528738 A JP 2022528738A JP 2021560178 A JP2021560178 A JP 2021560178A JP 2021560178 A JP2021560178 A JP 2021560178A JP 2022528738 A JP2022528738 A JP 2022528738A
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JP2022528738A5 (https=
JPWO2020253283A5 (https=
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文超 ▲趙▼
家▲斉▼ 李
忠利 麻
辰▲竜▼ 王
永林 王
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艾▲堅▼蒙(安▲慶▼)科技▲発▼展有限公司
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024004390A1 (ja) * 2022-06-27 2024-01-04 富士フイルム株式会社 硬化性組成物、硬化物の製造方法、膜、光学素子、イメージセンサ、固体撮像素子、画像表示装置、及び、ラジカル重合開始剤
WO2025164316A1 (ja) * 2024-01-30 2025-08-07 富士フイルム株式会社 光硬化性組成物、画素の製造方法、膜、固体撮像素子、画像表示装置および光重合開始剤

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112111028A (zh) * 2019-06-21 2020-12-22 江苏英力科技发展有限公司 一种含有酰基咔唑衍生物和咔唑基肟酯的光引发剂组合物及其在光固化组合物中的应用
US11780809B1 (en) 2023-03-09 2023-10-10 King Faisal University Carbazole compounds as antibacterial agents
US11807607B1 (en) 2023-03-09 2023-11-07 King Faisal University Aminocarbazole compounds as antibacterial agents

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007219362A (ja) * 2006-02-20 2007-08-30 Toyo Ink Mfg Co Ltd 重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法。
JP2009519904A (ja) * 2005-12-01 2009-05-21 チバ ホールディング インコーポレーテッド オキシムエステル光開始剤
CN102924710A (zh) * 2012-10-23 2013-02-13 中国科学院长春应用化学研究所 主链含咔唑环结构的聚芳醚酮树脂及其制备方法
CN102924366A (zh) * 2012-10-23 2013-02-13 中国科学院长春应用化学研究所 含多官能团结构的咔唑酮中间体及其制备方法
JP2014500852A (ja) * 2010-10-05 2014-01-16 ビーエーエスエフ ソシエタス・ヨーロピア ベンゾカルバゾール化合物のオキシムエステル誘導体ならびに前記誘導体の光重合性の組成物における光開始剤としての使用
JP2015509074A (ja) * 2011-12-07 2015-03-26 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se オキシムエステル光開始剤
JP2015523324A (ja) * 2012-05-09 2015-08-13 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se オキシムエステル光開始剤
JP2015165297A (ja) * 2014-02-04 2015-09-17 新日鉄住金化学株式会社 遮光膜用感光性組成物、及びその硬化物

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0240745A3 (en) 1983-08-31 1987-11-19 Memorex Corporation Disk drive servo techniques
JP2000239309A (ja) * 1999-02-19 2000-09-05 Jsr Corp 光硬化性液状樹脂組成物及び光造形硬化物
JP3704047B2 (ja) 2001-02-16 2005-10-05 積水化成品工業株式会社 熱可塑性ポリエステル系樹脂の予備発泡粒子及びその製造方法
JP2002341531A (ja) * 2001-05-15 2002-11-27 Dainippon Printing Co Ltd 光硬化性樹脂組成物、カラーフィルター及び液晶パネル
US7189489B2 (en) 2001-06-11 2007-03-13 Ciba Specialty Chemicals Corporation Oxime ester photoiniators having a combined structure
WO2005080337A1 (ja) 2004-02-23 2005-09-01 Mitsubishi Chemical Corporation オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター
JP2005343847A (ja) * 2004-06-04 2005-12-15 Toyo Ink Mfg Co Ltd 感エネルギー線酸発生組成物
JP2005343347A (ja) 2004-06-04 2005-12-15 Yanmar Co Ltd トラクタ
JP2007112930A (ja) 2005-10-21 2007-05-10 Toyo Ink Mfg Co Ltd 光ラジカル重合性組成物
KR101477026B1 (ko) 2006-12-20 2014-12-29 미쓰비시 가가꾸 가부시키가이샤 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치
US20090292039A1 (en) 2006-12-27 2009-11-26 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
CN101508744B (zh) 2009-03-11 2011-04-06 常州强力电子新材料有限公司 咔唑肟酯类光引发剂
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
JP5821306B2 (ja) * 2011-06-10 2015-11-24 東洋インキScホールディングス株式会社 新規増感剤およびそれを用いた重合性組成物、およびそれを用いた重合物の製造方法
JP5713477B2 (ja) 2011-08-04 2015-05-07 エルジー・ケム・リミテッド 光活性化合物およびこれを含む感光性樹脂組成物
JP6469669B2 (ja) 2013-07-08 2019-02-13 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se オキシムエステル光開始剤
KR102560329B1 (ko) * 2016-08-01 2023-07-26 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 화상 표시 장치
CN107793502B (zh) 2016-09-07 2020-12-08 常州强力电子新材料股份有限公司 肟酯类光引发剂、其制备方法、光固化组合物及其应用
CN109503735A (zh) 2017-09-15 2019-03-22 常州强力先端电子材料有限公司 光引发剂、包含其的光固化组合物及其应用

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009519904A (ja) * 2005-12-01 2009-05-21 チバ ホールディング インコーポレーテッド オキシムエステル光開始剤
JP2007219362A (ja) * 2006-02-20 2007-08-30 Toyo Ink Mfg Co Ltd 重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法。
JP2014500852A (ja) * 2010-10-05 2014-01-16 ビーエーエスエフ ソシエタス・ヨーロピア ベンゾカルバゾール化合物のオキシムエステル誘導体ならびに前記誘導体の光重合性の組成物における光開始剤としての使用
JP2015509074A (ja) * 2011-12-07 2015-03-26 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se オキシムエステル光開始剤
JP2015523324A (ja) * 2012-05-09 2015-08-13 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se オキシムエステル光開始剤
CN102924710A (zh) * 2012-10-23 2013-02-13 中国科学院长春应用化学研究所 主链含咔唑环结构的聚芳醚酮树脂及其制备方法
CN102924366A (zh) * 2012-10-23 2013-02-13 中国科学院长春应用化学研究所 含多官能团结构的咔唑酮中间体及其制备方法
JP2015165297A (ja) * 2014-02-04 2015-09-17 新日鉄住金化学株式会社 遮光膜用感光性組成物、及びその硬化物

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
WANG, FEIFEI ET AL.: "Carbazole-based poly(aryl ether ketone) containing crosslinkable allyl groups on the side chains: sy", POLYMER INTERNATIOINAL, vol. 64(7), JPN6022042618, 2015, pages 858 - 866, ISSN: 0005335858 *
WANG, FEIFEI ET AL.: "Properties of poly(arylene ether ketone)s containing N-alkylcarbazole in main chains", YINGYONG HUAXUE, vol. 32(4), JPN6022042619, 2015, pages 379 - 385, ISSN: 0005335859 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024004390A1 (ja) * 2022-06-27 2024-01-04 富士フイルム株式会社 硬化性組成物、硬化物の製造方法、膜、光学素子、イメージセンサ、固体撮像素子、画像表示装置、及び、ラジカル重合開始剤
WO2025164316A1 (ja) * 2024-01-30 2025-08-07 富士フイルム株式会社 光硬化性組成物、画素の製造方法、膜、固体撮像素子、画像表示装置および光重合開始剤

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