DE102012215421B4 - Verfahren zur Herstellung von Kern/Schale-Nanopartikeln - Google Patents

Verfahren zur Herstellung von Kern/Schale-Nanopartikeln Download PDF

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Publication number
DE102012215421B4
DE102012215421B4 DE102012215421.3A DE102012215421A DE102012215421B4 DE 102012215421 B4 DE102012215421 B4 DE 102012215421B4 DE 102012215421 A DE102012215421 A DE 102012215421A DE 102012215421 B4 DE102012215421 B4 DE 102012215421B4
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shell
core
nanoparticles
reaction zone
tubular reactor
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German (de)
English (en)
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DE102012215421A1 (de
Inventor
Van Huong Schmidtke-Tran
Daniel Ness
Prof. Dr. Weller Horst
Steffen Jan Niehaus
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Centrum fuer Angewandte Nanotechnologie CAN GmbH
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Centrum fuer Angewandte Nanotechnologie CAN GmbH
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Priority to DE102012215421.3A priority Critical patent/DE102012215421B4/de
Application filed by Centrum fuer Angewandte Nanotechnologie CAN GmbH filed Critical Centrum fuer Angewandte Nanotechnologie CAN GmbH
Priority to PCT/EP2013/067898 priority patent/WO2014033213A2/de
Priority to CA2883045A priority patent/CA2883045A1/en
Priority to ES13753331T priority patent/ES2891648T3/es
Priority to JP2015529027A priority patent/JP6410107B2/ja
Priority to EP13753331.1A priority patent/EP2890485B1/de
Priority to KR1020157007860A priority patent/KR102141505B1/ko
Priority to US14/425,017 priority patent/US10147846B2/en
Priority to CN201380056181.3A priority patent/CN104736234B/zh
Publication of DE102012215421A1 publication Critical patent/DE102012215421A1/de
Priority to US16/192,230 priority patent/US20190165211A1/en
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Publication of DE102012215421B4 publication Critical patent/DE102012215421B4/de
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/822—Materials of the light-emitting regions
    • H10H20/823—Materials of the light-emitting regions comprising only Group II-VI materials, e.g. ZnO
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B01J19/2475—Membrane reactors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/88—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing selenium, tellurium or unspecified chalcogen elements
    • C09K11/881—Chalcogenides
    • C09K11/883—Chalcogenides with zinc or cadmium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/18—Solid state diffusion of only metal elements or silicon into metallic material surfaces using liquids, e.g. salt baths, liquid suspensions
    • C23C10/20—Solid state diffusion of only metal elements or silicon into metallic material surfaces using liquids, e.g. salt baths, liquid suspensions only one element being diffused
    • C23C10/24—Salt bath containing the element to be diffused
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01—Manufacture or treatment
    • H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/012—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group II-IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
    • B01J2219/00099—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor the reactor being immersed in the heat exchange medium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/773—Nanoparticle, i.e. structure having three dimensions of 100 nm or less
    • Y10S977/774—Exhibiting three-dimensional carrier confinement, e.g. quantum dots
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/89—Deposition of materials, e.g. coating, cvd, or ald
    • Y10S977/892—Liquid phase deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/949—Radiation emitter using nanostructure
    • Y10S977/95—Electromagnetic energy

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Luminescent Compositions (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Glanulating (AREA)
DE102012215421.3A 2012-08-30 2012-08-30 Verfahren zur Herstellung von Kern/Schale-Nanopartikeln Active DE102012215421B4 (de)

Priority Applications (10)

Application Number Priority Date Filing Date Title
DE102012215421.3A DE102012215421B4 (de) 2012-08-30 2012-08-30 Verfahren zur Herstellung von Kern/Schale-Nanopartikeln
CN201380056181.3A CN104736234B (zh) 2012-08-30 2013-08-29 核‑壳纳米颗粒的制备方法和核‑壳纳米颗粒
ES13753331T ES2891648T3 (es) 2012-08-30 2013-08-29 Procedimiento para la fabricación de nanopartículas de núcleo/recubrimiento y nanopartículas de núcleo/recubrimie
JP2015529027A JP6410107B2 (ja) 2012-08-30 2013-08-29 コア／シェルナノ粒子の製造プロセス及びコア／シェルナノ粒子
EP13753331.1A EP2890485B1 (de) 2012-08-30 2013-08-29 Verfahren zur herstellung von kern/schale-nanopartikeln und kern-schale-nanopartikel
KR1020157007860A KR102141505B1 (ko) 2012-08-30 2013-08-29 코어/쉘 나노입자의 제조방법 및 코어/쉘 나노입자
PCT/EP2013/067898 WO2014033213A2 (de) 2012-08-30 2013-08-29 Verfahren zur herstellung von kern/schale-nanopartikeln und kern-schale-nanopartikel
CA2883045A CA2883045A1 (en) 2012-08-30 2013-08-29 Method for producing core/shell nanoparticles and core/shell nanoparticles
US14/425,017 US10147846B2 (en) 2012-08-30 2013-08-29 Method for producing core/shell nanoparticles and core/shell nanoparticles
US16/192,230 US20190165211A1 (en) 2012-08-30 2018-11-15 Method for producing core/shell nanoparticles and core/shell nanoparticles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102012215421.3A DE102012215421B4 (de) 2012-08-30 2012-08-30 Verfahren zur Herstellung von Kern/Schale-Nanopartikeln

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DE102012215421A1 DE102012215421A1 (de) 2014-03-06
DE102012215421B4 true DE102012215421B4 (de) 2019-08-29

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US (2) US10147846B2 (enExample)
EP (1) EP2890485B1 (enExample)
JP (1) JP6410107B2 (enExample)
KR (1) KR102141505B1 (enExample)
CN (1) CN104736234B (enExample)
CA (1) CA2883045A1 (enExample)
DE (1) DE102012215421B4 (enExample)
ES (1) ES2891648T3 (enExample)
WO (1) WO2014033213A2 (enExample)

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CN114538369A (zh) * 2015-12-31 2022-05-27 陶氏环球技术有限责任公司 纳米结构材料的连续流动合成
CN106010499B (zh) * 2016-05-18 2020-06-12 浙江大学 核壳量子点的表面优化方法
DE102016117189A1 (de) 2016-09-13 2018-03-15 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement
CN108264900A (zh) * 2016-12-30 2018-07-10 Tcl集团股份有限公司 一种量子点复合材料、制备方法及半导体器件
CN108269933A (zh) * 2016-12-30 2018-07-10 Tcl集团股份有限公司 一种反置底发射qled器件及其制备方法
CN108267888A (zh) * 2016-12-30 2018-07-10 Tcl集团股份有限公司 一种量子点背光模组、显示装置和电子设备
CN108269928A (zh) * 2016-12-30 2018-07-10 Tcl集团股份有限公司 一种正置底发射qled器件及其制备方法
CN108264904A (zh) * 2016-12-30 2018-07-10 Tcl集团股份有限公司 一种发光材料、制备方法及半导体器件
CN108269929B (zh) * 2016-12-30 2022-06-24 Tcl科技集团股份有限公司 一种正置顶发射qled器件及其制备方法
CN108267806A (zh) * 2016-12-30 2018-07-10 Tcl集团股份有限公司 一种量子点彩色滤光片、液晶显示面板及液晶显示装置
CN108269923A (zh) * 2016-12-30 2018-07-10 Tcl集团股份有限公司 一种量子点探测器及其制备方法
CN108264894A (zh) * 2016-12-30 2018-07-10 Tcl集团股份有限公司 一种纳米发光材料、制备方法及半导体器件
CN108269891B (zh) * 2016-12-30 2021-05-18 Tcl科技集团股份有限公司 一种纳米复合材料、制备方法及半导体器件
CN108269934A (zh) * 2016-12-30 2018-07-10 Tcl集团股份有限公司 一种纳米材料、制备方法及半导体器件
CN108264901B (zh) * 2016-12-30 2022-08-05 Tcl科技集团股份有限公司 具有漏斗型能级结构的发光材料、制备方法及半导体器件
CN108269886B (zh) * 2016-12-30 2019-12-10 Tcl集团股份有限公司 一种量子点材料、制备方法及半导体器件
CN108269935A (zh) * 2016-12-30 2018-07-10 Tcl集团股份有限公司 一种量子点薄膜及其制备方法
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CN108281494A (zh) * 2016-12-30 2018-07-13 Tcl集团股份有限公司 一种量子点光伏器件及制备方法
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CN108269892B (zh) * 2016-12-30 2021-06-22 Tcl科技集团股份有限公司 具有量子阱能级结构的合金材料、制备方法及半导体器件
US10096743B1 (en) * 2017-05-26 2018-10-09 Unique Materials Co., Ltd. Gigantic quantum dots
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CN112011327A (zh) * 2019-05-28 2020-12-01 苏州星烁纳米科技有限公司 核壳结构量子点的制备方法及由其制备的产品
US10923348B2 (en) 2019-05-29 2021-02-16 International Business Machines Corporation Gate-all-around field effect transistor using template-assisted-slective-epitaxy
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CN114507526B (zh) * 2022-03-10 2023-07-28 河南大学 一种硒元素贯穿的核壳结构量子点及其制备方法
CN116314886A (zh) * 2023-03-11 2023-06-23 中自环保科技股份有限公司 一种核壳纳米催化剂的制备方法

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Publication number Publication date
EP2890485A2 (de) 2015-07-08
CN104736234B (zh) 2017-07-14
ES2891648T3 (es) 2022-01-28
US20150214433A1 (en) 2015-07-30
JP2015533630A (ja) 2015-11-26
KR102141505B1 (ko) 2020-08-05
JP6410107B2 (ja) 2018-10-24
KR20150079572A (ko) 2015-07-08
EP2890485B1 (de) 2021-06-02
US10147846B2 (en) 2018-12-04
CN104736234A (zh) 2015-06-24
WO2014033213A3 (de) 2014-05-08
WO2014033213A2 (de) 2014-03-06
DE102012215421A1 (de) 2014-03-06
US20190165211A1 (en) 2019-05-30
CA2883045A1 (en) 2014-03-06

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