DE102008034285A1 - Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie - Google Patents

Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie Download PDF

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Publication number
DE102008034285A1
DE102008034285A1 DE102008034285A DE102008034285A DE102008034285A1 DE 102008034285 A1 DE102008034285 A1 DE 102008034285A1 DE 102008034285 A DE102008034285 A DE 102008034285A DE 102008034285 A DE102008034285 A DE 102008034285A DE 102008034285 A1 DE102008034285 A1 DE 102008034285A1
Authority
DE
Germany
Prior art keywords
actuator
deformation unit
deformation
runner
deformator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102008034285A
Other languages
German (de)
English (en)
Inventor
Ulrich Weber
Stefan Dr. Hembacher
Armin Dr. Schöppach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102008034285A priority Critical patent/DE102008034285A1/de
Priority to EP09776995.4A priority patent/EP2300877B1/de
Priority to KR1020117003957A priority patent/KR101449792B1/ko
Priority to PCT/EP2009/004892 priority patent/WO2010009807A1/de
Priority to JP2011519055A priority patent/JP5127985B2/ja
Publication of DE102008034285A1 publication Critical patent/DE102008034285A1/de
Priority to US13/009,438 priority patent/US20110128521A1/en
Priority to US13/402,115 priority patent/US20120147344A1/en
Priority to US14/840,394 priority patent/US9766550B2/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H21/00—Gearings comprising primarily only links or levers, with or without slides
    • F16H21/10—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane
    • F16H21/44—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying or interconverting oscillating or reciprocating motions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N1/00—Electrostatic generators or motors using a solid moving electrostatic charge carrier
    • H02N1/002—Electrostatic motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
    • H02N2/02—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
    • H02N2/021—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors using intermittent driving, e.g. step motors, piezoleg motors
    • H02N2/023—Inchworm motors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T74/00—Machine element or mechanism
    • Y10T74/18—Mechanical movements
    • Y10T74/18992—Reciprocating to reciprocating

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
DE102008034285A 2008-07-22 2008-07-22 Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie Ceased DE102008034285A1 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
DE102008034285A DE102008034285A1 (de) 2008-07-22 2008-07-22 Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie
EP09776995.4A EP2300877B1 (de) 2008-07-22 2009-07-07 Aktuator und projektionsbelichtungsanlage
KR1020117003957A KR101449792B1 (ko) 2008-07-22 2009-07-07 부품의 고정밀 위치 설정 또는 조작을 위한 액추에이터, 반도체 리소그래피용 투영 노광 시스템 및, 액추에이터의 작동 방법
PCT/EP2009/004892 WO2010009807A1 (de) 2008-07-22 2009-07-07 Aktuator und projektionsbelichtungsanlage
JP2011519055A JP5127985B2 (ja) 2008-07-22 2009-07-07 アクチュエータおよび投影露光システム
US13/009,438 US20110128521A1 (en) 2008-07-22 2011-01-19 Actuators and microlithography projection exposure systems and methods using the same
US13/402,115 US20120147344A1 (en) 2008-07-22 2012-02-22 Actuators and microlithography projection exposure systems and methods using the same
US14/840,394 US9766550B2 (en) 2008-07-22 2015-08-31 Actuators and microlithography projection exposure systems and methods using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102008034285A DE102008034285A1 (de) 2008-07-22 2008-07-22 Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie

Publications (1)

Publication Number Publication Date
DE102008034285A1 true DE102008034285A1 (de) 2010-02-04

Family

ID=41066389

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102008034285A Ceased DE102008034285A1 (de) 2008-07-22 2008-07-22 Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie

Country Status (6)

Country Link
US (3) US20110128521A1 (https=)
EP (1) EP2300877B1 (https=)
JP (1) JP5127985B2 (https=)
KR (1) KR101449792B1 (https=)
DE (1) DE102008034285A1 (https=)
WO (1) WO2010009807A1 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011088251A1 (de) * 2011-12-12 2013-06-13 Carl Zeiss Smt Gmbh Autarker Aktuator
DE102012211320A1 (de) 2012-06-29 2013-08-08 Carl Zeiss Smt Gmbh Aktuator mit Rotor und Projektionsbelichtungsanlage
CN119826770A (zh) * 2025-01-15 2025-04-15 哈尔滨工业大学 基于力位融合视觉测量的大型绳网天线面形测量与调控方法及装置
DE102024122134B3 (de) * 2024-08-02 2025-10-09 Carl Zeiss Smt Gmbh Maskeninspektionsvorrichtung und Verfahren zum Justieren einer Maskeninspektionsvorrichtung

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008034285A1 (de) 2008-07-22 2010-02-04 Carl Zeiss Smt Ag Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie
WO2012097868A1 (en) * 2011-01-18 2012-07-26 Piezomotor Uppsala Ab Operation of electromechanical actuator devices
ITVI20120173A1 (it) 2012-07-17 2014-01-18 Paolo Bonfiglio Motore ad attuatori lineari
CN104167953B (zh) * 2014-08-26 2016-06-15 哈尔滨工业大学 一种内驱动式被动箝位压电驱动器
CN105406756B (zh) * 2015-12-12 2017-10-20 西安交通大学 一种压电粗纤维和压电堆的尺蠖式作动器及作动方法
DE102016107461A1 (de) * 2016-04-22 2017-10-26 Eto Magnetic Gmbh Aktorvorrichtung und Verfahren zum Betrieb einer Aktorvorrichtung
DE102017111642A1 (de) * 2017-05-29 2017-08-10 Eto Magnetic Gmbh Kleingerätevorrichtung
GB201818045D0 (en) 2018-11-05 2018-12-19 Nhs Blood & Transplant Method for producing erythroid cells
KR20200126231A (ko) 2019-04-29 2020-11-06 한국전기연구원 열전소자를 이용한 sma 액추에이터

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JP2007215269A (ja) * 2006-02-07 2007-08-23 Toshiba Corp アクチュエータおよび撮像装置

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JP2000147232A (ja) * 1998-11-06 2000-05-26 Canon Inc 回折光学装置及びそれを用いた投影露光装置
DE10022526A1 (de) 2000-05-09 2001-11-22 Beiersdorf Ag Einrastverschluß für Verpackungen
DE10225266A1 (de) * 2001-12-19 2003-07-03 Zeiss Carl Smt Ag Abbildungseinrichtung in einer Projektionsbelichtungsanlage
DE10301818A1 (de) * 2003-01-20 2004-07-29 Carl Zeiss Smt Ag Piezo-Linearantrieb mit einer Gruppe von Piezostapelaktuatoren
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011088251A1 (de) * 2011-12-12 2013-06-13 Carl Zeiss Smt Gmbh Autarker Aktuator
DE102011088251B4 (de) * 2011-12-12 2013-08-22 Carl Zeiss Smt Gmbh Autarker Aktuator
DE102012211320A1 (de) 2012-06-29 2013-08-08 Carl Zeiss Smt Gmbh Aktuator mit Rotor und Projektionsbelichtungsanlage
DE102024122134B3 (de) * 2024-08-02 2025-10-09 Carl Zeiss Smt Gmbh Maskeninspektionsvorrichtung und Verfahren zum Justieren einer Maskeninspektionsvorrichtung
CN119826770A (zh) * 2025-01-15 2025-04-15 哈尔滨工业大学 基于力位融合视觉测量的大型绳网天线面形测量与调控方法及装置

Also Published As

Publication number Publication date
WO2010009807A8 (de) 2010-04-22
KR101449792B1 (ko) 2014-10-13
EP2300877A1 (de) 2011-03-30
JP5127985B2 (ja) 2013-01-23
KR20110034674A (ko) 2011-04-05
US9766550B2 (en) 2017-09-19
EP2300877B1 (de) 2013-06-19
US20110128521A1 (en) 2011-06-02
JP2011528857A (ja) 2011-11-24
US20120147344A1 (en) 2012-06-14
US20150370176A1 (en) 2015-12-24
WO2010009807A1 (de) 2010-01-28

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