KR101449792B1 - 부품의 고정밀 위치 설정 또는 조작을 위한 액추에이터, 반도체 리소그래피용 투영 노광 시스템 및, 액추에이터의 작동 방법 - Google Patents

부품의 고정밀 위치 설정 또는 조작을 위한 액추에이터, 반도체 리소그래피용 투영 노광 시스템 및, 액추에이터의 작동 방법 Download PDF

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Publication number
KR101449792B1
KR101449792B1 KR1020117003957A KR20117003957A KR101449792B1 KR 101449792 B1 KR101449792 B1 KR 101449792B1 KR 1020117003957 A KR1020117003957 A KR 1020117003957A KR 20117003957 A KR20117003957 A KR 20117003957A KR 101449792 B1 KR101449792 B1 KR 101449792B1
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South Korea
Prior art keywords
actuator
deforming
rotor
unit
housing
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Expired - Fee Related
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KR1020117003957A
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English (en)
Korean (ko)
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KR20110034674A (ko
Inventor
울리히 베버
슈테판 헴바허
아르민 ?프아흐
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칼 짜이스 에스엠테 게엠베하
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Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H21/00—Gearings comprising primarily only links or levers, with or without slides
    • F16H21/10—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane
    • F16H21/44—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying or interconverting oscillating or reciprocating motions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N1/00—Electrostatic generators or motors using a solid moving electrostatic charge carrier
    • H02N1/002—Electrostatic motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
    • H02N2/02—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
    • H02N2/021—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors using intermittent driving, e.g. step motors, piezoleg motors
    • H02N2/023—Inchworm motors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T74/00—Machine element or mechanism
    • Y10T74/18—Mechanical movements
    • Y10T74/18992—Reciprocating to reciprocating

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
KR1020117003957A 2008-07-22 2009-07-07 부품의 고정밀 위치 설정 또는 조작을 위한 액추에이터, 반도체 리소그래피용 투영 노광 시스템 및, 액추에이터의 작동 방법 Expired - Fee Related KR101449792B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102008034285A DE102008034285A1 (de) 2008-07-22 2008-07-22 Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie
DE102008034285.8 2008-07-22
PCT/EP2009/004892 WO2010009807A1 (de) 2008-07-22 2009-07-07 Aktuator und projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
KR20110034674A KR20110034674A (ko) 2011-04-05
KR101449792B1 true KR101449792B1 (ko) 2014-10-13

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KR1020117003957A Expired - Fee Related KR101449792B1 (ko) 2008-07-22 2009-07-07 부품의 고정밀 위치 설정 또는 조작을 위한 액추에이터, 반도체 리소그래피용 투영 노광 시스템 및, 액추에이터의 작동 방법

Country Status (6)

Country Link
US (3) US20110128521A1 (https=)
EP (1) EP2300877B1 (https=)
JP (1) JP5127985B2 (https=)
KR (1) KR101449792B1 (https=)
DE (1) DE102008034285A1 (https=)
WO (1) WO2010009807A1 (https=)

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KR20200126231A (ko) 2019-04-29 2020-11-06 한국전기연구원 열전소자를 이용한 sma 액추에이터

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DE102008034285A1 (de) 2008-07-22 2010-02-04 Carl Zeiss Smt Ag Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie
WO2012097868A1 (en) * 2011-01-18 2012-07-26 Piezomotor Uppsala Ab Operation of electromechanical actuator devices
DE102011088251B4 (de) * 2011-12-12 2013-08-22 Carl Zeiss Smt Gmbh Autarker Aktuator
DE102012211320A1 (de) 2012-06-29 2013-08-08 Carl Zeiss Smt Gmbh Aktuator mit Rotor und Projektionsbelichtungsanlage
ITVI20120173A1 (it) 2012-07-17 2014-01-18 Paolo Bonfiglio Motore ad attuatori lineari
CN104167953B (zh) * 2014-08-26 2016-06-15 哈尔滨工业大学 一种内驱动式被动箝位压电驱动器
CN105406756B (zh) * 2015-12-12 2017-10-20 西安交通大学 一种压电粗纤维和压电堆的尺蠖式作动器及作动方法
DE102016107461A1 (de) * 2016-04-22 2017-10-26 Eto Magnetic Gmbh Aktorvorrichtung und Verfahren zum Betrieb einer Aktorvorrichtung
DE102017111642A1 (de) * 2017-05-29 2017-08-10 Eto Magnetic Gmbh Kleingerätevorrichtung
GB201818045D0 (en) 2018-11-05 2018-12-19 Nhs Blood & Transplant Method for producing erythroid cells
DE102024122134B3 (de) * 2024-08-02 2025-10-09 Carl Zeiss Smt Gmbh Maskeninspektionsvorrichtung und Verfahren zum Justieren einer Maskeninspektionsvorrichtung
CN119826770B (zh) * 2025-01-15 2025-11-25 哈尔滨工业大学 基于力位融合视觉测量的大型绳网天线面形测量与调控方法及装置

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Also Published As

Publication number Publication date
WO2010009807A8 (de) 2010-04-22
DE102008034285A1 (de) 2010-02-04
EP2300877A1 (de) 2011-03-30
JP5127985B2 (ja) 2013-01-23
KR20110034674A (ko) 2011-04-05
US9766550B2 (en) 2017-09-19
EP2300877B1 (de) 2013-06-19
US20110128521A1 (en) 2011-06-02
JP2011528857A (ja) 2011-11-24
US20120147344A1 (en) 2012-06-14
US20150370176A1 (en) 2015-12-24
WO2010009807A1 (de) 2010-01-28

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