DE102006048906A1 - Verfahren zur Stabilisierung und Funktionalisierung von porösen metallischen Schichten - Google Patents

Verfahren zur Stabilisierung und Funktionalisierung von porösen metallischen Schichten Download PDF

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Publication number
DE102006048906A1
DE102006048906A1 DE200610048906 DE102006048906A DE102006048906A1 DE 102006048906 A1 DE102006048906 A1 DE 102006048906A1 DE 200610048906 DE200610048906 DE 200610048906 DE 102006048906 A DE102006048906 A DE 102006048906A DE 102006048906 A1 DE102006048906 A1 DE 102006048906A1
Authority
DE
Germany
Prior art keywords
oxide
carbide
silicide
ceramic material
metallic matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE200610048906
Other languages
German (de)
English (en)
Inventor
Markus Widenmeyer
Oliver Wolst
Alexander Martin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Priority to DE200610048906 priority Critical patent/DE102006048906A1/de
Priority to CNA2007800388689A priority patent/CN101535526A/zh
Priority to EP07821232A priority patent/EP2104752A2/de
Priority to JP2009532777A priority patent/JP2010507018A/ja
Priority to PCT/EP2007/060865 priority patent/WO2008046785A2/de
Publication of DE102006048906A1 publication Critical patent/DE102006048906A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1241—Metallic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1254—Sol or sol-gel processing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/403—Cells and electrode assemblies
    • G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Thermal Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Electrochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Dispersion Chemistry (AREA)
  • Catalysts (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electrodes Of Semiconductors (AREA)
DE200610048906 2006-10-17 2006-10-17 Verfahren zur Stabilisierung und Funktionalisierung von porösen metallischen Schichten Withdrawn DE102006048906A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE200610048906 DE102006048906A1 (de) 2006-10-17 2006-10-17 Verfahren zur Stabilisierung und Funktionalisierung von porösen metallischen Schichten
CNA2007800388689A CN101535526A (zh) 2006-10-17 2007-10-12 用于使多孔金属层稳定和功能化的方法
EP07821232A EP2104752A2 (de) 2006-10-17 2007-10-12 Verfahren zur stabilisierung und funktionalisierung von porösen metallischen schichten
JP2009532777A JP2010507018A (ja) 2006-10-17 2007-10-12 多孔質の金属層を安定化しかつ機能化する方法
PCT/EP2007/060865 WO2008046785A2 (de) 2006-10-17 2007-10-12 Verfahren zur stabilisierung und funktionalisierung von porösen metallischen schichten

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE200610048906 DE102006048906A1 (de) 2006-10-17 2006-10-17 Verfahren zur Stabilisierung und Funktionalisierung von porösen metallischen Schichten

Publications (1)

Publication Number Publication Date
DE102006048906A1 true DE102006048906A1 (de) 2008-04-30

Family

ID=39183155

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200610048906 Withdrawn DE102006048906A1 (de) 2006-10-17 2006-10-17 Verfahren zur Stabilisierung und Funktionalisierung von porösen metallischen Schichten

Country Status (5)

Country Link
EP (1) EP2104752A2 (zh)
JP (1) JP2010507018A (zh)
CN (1) CN101535526A (zh)
DE (1) DE102006048906A1 (zh)
WO (1) WO2008046785A2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010038725A1 (de) 2010-07-30 2012-02-02 Robert Bosch Gmbh Vorrichtung und Verfahren zur Gasdetektion

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010001624A1 (de) 2010-02-05 2011-08-11 Robert Bosch GmbH, 70469 Verfahren zur Detektion von zwei oder mehr Gasspezies
US20140242374A1 (en) * 2013-02-22 2014-08-28 Infineon Technologies Ag Porous Metal Coating
CN103231185B (zh) * 2013-04-03 2014-12-10 株洲宏大高分子材料有限公司 一种HFSi焊销及其制备方法
CN108700544A (zh) * 2016-02-24 2018-10-23 田中贵金属工业株式会社 用于形成气体传感器电极的金属糊
CN106350058B (zh) * 2016-08-22 2019-01-22 上海朗研光电科技有限公司 基于纳米多孔金的荧光增强基底的制备方法
EP3296428B1 (en) * 2016-09-16 2019-05-15 ATOTECH Deutschland GmbH Method for depositing a metal or metal alloy on a surface
CN112028652B (zh) * 2020-09-10 2021-11-02 刘树峰 一种超硅粉胶泥复合材料及其制备方法
CN115772662A (zh) * 2022-11-24 2023-03-10 西北有色金属研究院 一种多孔钯膜的制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE792075A (fr) * 1971-11-30 1973-05-29 Union Carbide Corp Elements metalliques poreux a revetement ceramique et leur procede de realisation
JPH0752736B2 (ja) * 1985-10-02 1995-06-05 工業技術院長 化合物半導体装置の製造方法
GB8606045D0 (en) * 1986-03-12 1986-04-16 Emi Plc Thorn Gas sensitive device
JPS63128246A (ja) * 1986-11-19 1988-05-31 Seitai Kinou Riyou Kagakuhin Shinseizou Gijutsu Kenkyu Kumiai 電界効果トランジスタ型酸素ガスセンサ
US5186833A (en) * 1991-10-10 1993-02-16 Exxon Research And Engineering Company Composite metal-ceramic membranes and their fabrication
GB9226916D0 (en) * 1992-12-24 1993-02-17 Atomic Energy Authority Uk Process for making ceramic membrane filters
JP3883646B2 (ja) * 1997-02-14 2007-02-21 日本碍子株式会社 膜の形成方法と膜形成部品
ATE326558T1 (de) * 2001-08-30 2006-06-15 Aktina Ltd Verfahren zur herstellung poröser keramik-metall verbundwerkstoffe und dadurch erhaltene verbundwerkstoffe
JP4429145B2 (ja) * 2004-11-16 2010-03-10 キヤノン株式会社 半導体素子の製造方法
JP4555116B2 (ja) * 2005-02-18 2010-09-29 大日本印刷株式会社 積層体
DE102006000886B3 (de) * 2005-11-15 2007-05-31 Atech Innovations Gmbh Verfahren zur Herstellung eines keramikbeschichteten metallischen Trägersubstrates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010038725A1 (de) 2010-07-30 2012-02-02 Robert Bosch Gmbh Vorrichtung und Verfahren zur Gasdetektion

Also Published As

Publication number Publication date
CN101535526A (zh) 2009-09-16
WO2008046785A3 (de) 2009-05-07
WO2008046785A2 (de) 2008-04-24
EP2104752A2 (de) 2009-09-30
JP2010507018A (ja) 2010-03-04

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Effective date: 20131018