CN1957478A - 人造无定形半导体及其在太阳能电池中的应用 - Google Patents
人造无定形半导体及其在太阳能电池中的应用 Download PDFInfo
- Publication number
- CN1957478A CN1957478A CNA2005800139259A CN200580013925A CN1957478A CN 1957478 A CN1957478 A CN 1957478A CN A2005800139259 A CNA2005800139259 A CN A2005800139259A CN 200580013925 A CN200580013925 A CN 200580013925A CN 1957478 A CN1957478 A CN 1957478A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
- H10F77/146—Superlattices; Multiple quantum well structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
- H10D62/812—Single quantum well structures
- H10D62/814—Quantum box structures
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/142—Photovoltaic cells having only PN homojunction potential barriers comprising multiple PN homojunctions, e.g. tandem cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
- H10F71/1215—The active layers comprising only Group IV materials comprising at least two Group IV elements, e.g. SiGe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/162—Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Optics & Photonics (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU2004902299A AU2004902299A0 (en) | 2004-04-30 | Artificial amorphous semiconductors and applications to solar cells | |
| AU2004902299 | 2004-04-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1957478A true CN1957478A (zh) | 2007-05-02 |
Family
ID=35241940
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2005800139259A Pending CN1957478A (zh) | 2004-04-30 | 2005-04-29 | 人造无定形半导体及其在太阳能电池中的应用 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20080251116A1 (enExample) |
| EP (1) | EP1751805A4 (enExample) |
| JP (1) | JP2007535806A (enExample) |
| CN (1) | CN1957478A (enExample) |
| WO (1) | WO2005106966A1 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102576744A (zh) * | 2009-08-31 | 2012-07-11 | 罗伯特·博世有限公司 | 半导体层材料和异质结太阳能电池 |
| CN102867883A (zh) * | 2011-07-08 | 2013-01-09 | 茂迪股份有限公司 | 半导体基材表面结构与形成此表面结构的方法 |
| CN102959722A (zh) * | 2010-06-25 | 2013-03-06 | 韩国标准科学研究院 | Inp强制掺杂的高浓度掺p量子点太阳能电池及制造方法 |
| CN105723521A (zh) * | 2013-11-19 | 2016-06-29 | 京瓷株式会社 | 光电转换层以及光电转换装置 |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006125272A1 (en) * | 2005-05-27 | 2006-11-30 | Newsouth Innovations Pty Limited | Resonant defect enhancement of current transport in semiconducting superlattices |
| US20100034232A1 (en) * | 2005-11-21 | 2010-02-11 | Centre National De La Recherche Scientifique-Cnrs | Electrically pumped nd3+ doped solid laser |
| US20070137693A1 (en) * | 2005-12-16 | 2007-06-21 | Forrest Stephen R | Intermediate-band photosensitive device with quantum dots having tunneling barrier embedded in inorganic matrix |
| US20070166916A1 (en) * | 2006-01-14 | 2007-07-19 | Sunvolt Nanosystems, Inc. | Nanostructures-based optoelectronics device |
| TWI312190B (en) * | 2006-05-23 | 2009-07-11 | Art Talent Ind Limite | Novel nano-crystal device for image sensing |
| WO2008046147A1 (en) * | 2006-10-18 | 2008-04-24 | Newsouth Innovations Pty Limited | Up and down conversion using quantum dot arrays |
| US8373060B2 (en) * | 2006-10-24 | 2013-02-12 | Zetta Research and Development LLC—AQT Series | Semiconductor grain microstructures for photovoltaic cells |
| US9577137B2 (en) * | 2007-01-25 | 2017-02-21 | Au Optronics Corporation | Photovoltaic cells with multi-band gap and applications in a low temperature polycrystalline silicon thin film transistor panel |
| US20080179762A1 (en) * | 2007-01-25 | 2008-07-31 | Au Optronics Corporation | Layered structure with laser-induced aggregation silicon nano-dots in a silicon-rich dielectric layer, and applications of the same |
| WO2008101232A1 (en) * | 2007-02-16 | 2008-08-21 | Mears Technologies, Inc. | Multiple-wavelength opto- electronic device including a semiconductor atomic superlattice and associated fabrication methods |
| US7880161B2 (en) | 2007-02-16 | 2011-02-01 | Mears Technologies, Inc. | Multiple-wavelength opto-electronic device including a superlattice |
| US20100095998A1 (en) * | 2007-04-09 | 2010-04-22 | The Regents Of The University Of California | Low resistance tunnel junctions for high efficiency tanden solar cells |
| US20090050201A1 (en) * | 2007-07-17 | 2009-02-26 | The Research Foundation Of State University Of New York | Solar cell |
| EP2105968A1 (en) * | 2008-03-27 | 2009-09-30 | Atomic Energy Council - Institute of Nuclear Energy Research | Method for making a full-spectrum solar cell with an anti-reflection layer doped with silicon quantum dots |
| TWI462307B (zh) * | 2008-09-02 | 2014-11-21 | Au Optronics Corp | 具備多重能隙的矽奈米晶體光電池及其在一低溫多晶矽薄膜電晶體面板內之應用 |
| JP2010067801A (ja) * | 2008-09-11 | 2010-03-25 | Seiko Epson Corp | 光電変換装置、電子機器、光電変換装置の製造方法および電子機器の製造方法 |
| GB0820684D0 (en) | 2008-11-12 | 2008-12-17 | Silicon Cpv Plc | Photovoltaic solar cells |
| JP5423952B2 (ja) | 2009-03-04 | 2014-02-19 | セイコーエプソン株式会社 | 光電変換装置および電子機器 |
| EP3249699B1 (en) * | 2009-03-18 | 2020-04-15 | Evatec AG | Method of inline manufacturing a solar cell panel |
| KR101072472B1 (ko) * | 2009-07-03 | 2011-10-11 | 한국철강 주식회사 | 광기전력 장치의 제조 방법 |
| US20110214726A1 (en) * | 2010-03-02 | 2011-09-08 | Alliance For Sustainable Energy, Llc | Ultra- High Solar Conversion Efficiency for Solar Fuels and Solar Electricity via Multiple Exciton Generation in Quantum Dots Coupled with Solar Concentration |
| JP2011187646A (ja) * | 2010-03-08 | 2011-09-22 | Seiko Epson Corp | 光学変換装置及び同装置を含む電子機器 |
| JP5256268B2 (ja) * | 2010-10-21 | 2013-08-07 | シャープ株式会社 | 太陽電池 |
| JP5509059B2 (ja) * | 2010-12-22 | 2014-06-04 | 国立大学法人 東京大学 | 太陽電池 |
| JP5568039B2 (ja) * | 2011-03-15 | 2014-08-06 | 国立大学法人 東京大学 | 太陽電池 |
| KR101189686B1 (ko) * | 2011-03-22 | 2012-10-10 | 한국표준과학연구원 | 실리콘 양자점에 의한 광활성층 및 이의 제조방법 |
| JP2014116327A (ja) * | 2011-03-31 | 2014-06-26 | Sanyo Electric Co Ltd | 光電変換装置 |
| JP5664416B2 (ja) * | 2011-03-31 | 2015-02-04 | 富士通株式会社 | シリコン量子ドット装置とその製造方法 |
| US8778448B2 (en) * | 2011-07-21 | 2014-07-15 | International Business Machines Corporation | Method of stabilizing hydrogenated amorphous silicon and amorphous hydrogenated silicon alloys |
| FR2979434B1 (fr) | 2011-08-24 | 2013-09-27 | Commissariat Energie Atomique | Procede de realisation d'un reflecteur optique a nanocristaux de semi-conducteur |
| JP5732410B2 (ja) * | 2012-01-05 | 2015-06-10 | 富士フイルム株式会社 | 量子ドット構造体の形成方法ならびに波長変換素子、光光変換装置および光電変換装置 |
| JP6355085B2 (ja) * | 2013-02-07 | 2018-07-11 | シャープ株式会社 | 光電変換素子 |
| JP6127626B2 (ja) * | 2013-03-21 | 2017-05-17 | 富士通株式会社 | 量子ドットアレイデバイスの製造方法 |
| JP6085805B2 (ja) * | 2013-06-11 | 2017-03-01 | 富士通株式会社 | 光半導体装置の製造方法 |
| JP5880629B2 (ja) * | 2014-06-24 | 2016-03-09 | セイコーエプソン株式会社 | 光電変換装置、電子機器、光電変換装置の製造方法および電子機器の製造方法 |
| JP6474618B2 (ja) * | 2015-01-06 | 2019-02-27 | シャープ株式会社 | 光電変換素子 |
| JP6603116B2 (ja) * | 2015-11-27 | 2019-11-06 | 京セラ株式会社 | 光電変換装置 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6501091B1 (en) * | 1998-04-01 | 2002-12-31 | Massachusetts Institute Of Technology | Quantum dot white and colored light emitting diodes |
| JPH11310776A (ja) * | 1998-04-30 | 1999-11-09 | Mitsubishi Materials Corp | 発光材料及びその製造方法並びにこれを用いた発光素子 |
| EP1134799A1 (en) * | 2000-03-15 | 2001-09-19 | STMicroelectronics S.r.l. | Reduced thermal process for forming a nanocrystalline silicon layer within a thin oxide layer |
| JP3753605B2 (ja) * | 2000-11-01 | 2006-03-08 | シャープ株式会社 | 太陽電池およびその製造方法 |
| DE10104193A1 (de) * | 2001-01-31 | 2002-08-01 | Max Planck Gesellschaft | Verfahren zur Herstellung einer Halbleiterstruktur mit Siliziumclustern und/oder -nanokristallen und eine Halbleiterstruktur dieser Art |
| US6544870B2 (en) * | 2001-04-18 | 2003-04-08 | Kwangju Institute Of Science And Technology | Silicon nitride film comprising amorphous silicon quantum dots embedded therein, its fabrication method and light-emitting device using the same |
| US7194174B2 (en) * | 2001-10-19 | 2007-03-20 | Ignis Technologies As | Integrated photonic crystal structure and method of producing same |
| US20040126582A1 (en) * | 2002-08-23 | 2004-07-01 | Nano-Proprietary, Inc. | Silicon nanoparticles embedded in polymer matrix |
| JP4263581B2 (ja) * | 2002-10-30 | 2009-05-13 | ハンヤン ハク ウォン カンパニー,リミテッド | 金属薄膜または金属粉末を利用した金属酸化物量子点形成方法 |
| US7022571B2 (en) * | 2003-05-01 | 2006-04-04 | United Microelectronics Corp. | Quantum structure and forming method of the same |
| US7074630B2 (en) * | 2003-05-20 | 2006-07-11 | United Microelectronics Corp. | Method of forming light emitter layer |
-
2005
- 2005-04-29 US US11/579,105 patent/US20080251116A1/en not_active Abandoned
- 2005-04-29 EP EP05735944A patent/EP1751805A4/en not_active Ceased
- 2005-04-29 JP JP2007509832A patent/JP2007535806A/ja active Pending
- 2005-04-29 CN CNA2005800139259A patent/CN1957478A/zh active Pending
- 2005-04-29 WO PCT/AU2005/000614 patent/WO2005106966A1/en not_active Ceased
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102576744A (zh) * | 2009-08-31 | 2012-07-11 | 罗伯特·博世有限公司 | 半导体层材料和异质结太阳能电池 |
| CN102576744B (zh) * | 2009-08-31 | 2016-02-10 | 罗伯特·博世有限公司 | 半导体层材料和异质结太阳能电池 |
| CN102959722A (zh) * | 2010-06-25 | 2013-03-06 | 韩国标准科学研究院 | Inp强制掺杂的高浓度掺p量子点太阳能电池及制造方法 |
| CN102959722B (zh) * | 2010-06-25 | 2015-10-07 | 韩国标准科学研究院 | Inp强制掺杂的高浓度掺p量子点太阳能电池及制造方法 |
| CN102867883A (zh) * | 2011-07-08 | 2013-01-09 | 茂迪股份有限公司 | 半导体基材表面结构与形成此表面结构的方法 |
| CN102867883B (zh) * | 2011-07-08 | 2015-04-22 | 茂迪股份有限公司 | 半导体基材表面结构与形成此表面结构的方法 |
| CN105723521A (zh) * | 2013-11-19 | 2016-06-29 | 京瓷株式会社 | 光电转换层以及光电转换装置 |
| CN105723521B (zh) * | 2013-11-19 | 2018-01-23 | 京瓷株式会社 | 光电转换装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2005106966A1 (en) | 2005-11-10 |
| EP1751805A1 (en) | 2007-02-14 |
| US20080251116A1 (en) | 2008-10-16 |
| EP1751805A4 (en) | 2007-07-04 |
| JP2007535806A (ja) | 2007-12-06 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| AD01 | Patent right deemed abandoned |
Effective date of abandoning: 20070502 |
|
| C20 | Patent right or utility model deemed to be abandoned or is abandoned |