CN1957478A - 人造无定形半导体及其在太阳能电池中的应用 - Google Patents

人造无定形半导体及其在太阳能电池中的应用 Download PDF

Info

Publication number
CN1957478A
CN1957478A CNA2005800139259A CN200580013925A CN1957478A CN 1957478 A CN1957478 A CN 1957478A CN A2005800139259 A CNA2005800139259 A CN A2005800139259A CN 200580013925 A CN200580013925 A CN 200580013925A CN 1957478 A CN1957478 A CN 1957478A
Authority
CN
China
Prior art keywords
semiconductor
layers
type
silicon
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2005800139259A
Other languages
English (en)
Chinese (zh)
Inventor
马丁·安德鲁·格林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NewSouth Innovations Pty Ltd
Original Assignee
NewSouth Innovations Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from AU2004902299A external-priority patent/AU2004902299A0/en
Application filed by NewSouth Innovations Pty Ltd filed Critical NewSouth Innovations Pty Ltd
Publication of CN1957478A publication Critical patent/CN1957478A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/14Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
    • H10F77/146Superlattices; Multiple quantum well structures
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/81Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
    • H10D62/812Single quantum well structures
    • H10D62/814Quantum box structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • H10F10/142Photovoltaic cells having only PN homojunction potential barriers comprising multiple PN homojunctions, e.g. tandem cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/121The active layers comprising only Group IV materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/121The active layers comprising only Group IV materials
    • H10F71/1215The active layers comprising only Group IV materials comprising at least two Group IV elements, e.g. SiGe
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/162Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers
    • H10F77/211Electrodes for devices having potential barriers for photovoltaic cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/544Solar cells from Group III-V materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Optics & Photonics (AREA)
  • Photovoltaic Devices (AREA)
CNA2005800139259A 2004-04-30 2005-04-29 人造无定形半导体及其在太阳能电池中的应用 Pending CN1957478A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AU2004902299A AU2004902299A0 (en) 2004-04-30 Artificial amorphous semiconductors and applications to solar cells
AU2004902299 2004-04-30

Publications (1)

Publication Number Publication Date
CN1957478A true CN1957478A (zh) 2007-05-02

Family

ID=35241940

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2005800139259A Pending CN1957478A (zh) 2004-04-30 2005-04-29 人造无定形半导体及其在太阳能电池中的应用

Country Status (5)

Country Link
US (1) US20080251116A1 (enExample)
EP (1) EP1751805A4 (enExample)
JP (1) JP2007535806A (enExample)
CN (1) CN1957478A (enExample)
WO (1) WO2005106966A1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102576744A (zh) * 2009-08-31 2012-07-11 罗伯特·博世有限公司 半导体层材料和异质结太阳能电池
CN102867883A (zh) * 2011-07-08 2013-01-09 茂迪股份有限公司 半导体基材表面结构与形成此表面结构的方法
CN102959722A (zh) * 2010-06-25 2013-03-06 韩国标准科学研究院 Inp强制掺杂的高浓度掺p量子点太阳能电池及制造方法
CN105723521A (zh) * 2013-11-19 2016-06-29 京瓷株式会社 光电转换层以及光电转换装置

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006125272A1 (en) * 2005-05-27 2006-11-30 Newsouth Innovations Pty Limited Resonant defect enhancement of current transport in semiconducting superlattices
US20100034232A1 (en) * 2005-11-21 2010-02-11 Centre National De La Recherche Scientifique-Cnrs Electrically pumped nd3+ doped solid laser
US20070137693A1 (en) * 2005-12-16 2007-06-21 Forrest Stephen R Intermediate-band photosensitive device with quantum dots having tunneling barrier embedded in inorganic matrix
US20070166916A1 (en) * 2006-01-14 2007-07-19 Sunvolt Nanosystems, Inc. Nanostructures-based optoelectronics device
TWI312190B (en) * 2006-05-23 2009-07-11 Art Talent Ind Limite Novel nano-crystal device for image sensing
WO2008046147A1 (en) * 2006-10-18 2008-04-24 Newsouth Innovations Pty Limited Up and down conversion using quantum dot arrays
US8373060B2 (en) * 2006-10-24 2013-02-12 Zetta Research and Development LLC—AQT Series Semiconductor grain microstructures for photovoltaic cells
US9577137B2 (en) * 2007-01-25 2017-02-21 Au Optronics Corporation Photovoltaic cells with multi-band gap and applications in a low temperature polycrystalline silicon thin film transistor panel
US20080179762A1 (en) * 2007-01-25 2008-07-31 Au Optronics Corporation Layered structure with laser-induced aggregation silicon nano-dots in a silicon-rich dielectric layer, and applications of the same
WO2008101232A1 (en) * 2007-02-16 2008-08-21 Mears Technologies, Inc. Multiple-wavelength opto- electronic device including a semiconductor atomic superlattice and associated fabrication methods
US7880161B2 (en) 2007-02-16 2011-02-01 Mears Technologies, Inc. Multiple-wavelength opto-electronic device including a superlattice
US20100095998A1 (en) * 2007-04-09 2010-04-22 The Regents Of The University Of California Low resistance tunnel junctions for high efficiency tanden solar cells
US20090050201A1 (en) * 2007-07-17 2009-02-26 The Research Foundation Of State University Of New York Solar cell
EP2105968A1 (en) * 2008-03-27 2009-09-30 Atomic Energy Council - Institute of Nuclear Energy Research Method for making a full-spectrum solar cell with an anti-reflection layer doped with silicon quantum dots
TWI462307B (zh) * 2008-09-02 2014-11-21 Au Optronics Corp 具備多重能隙的矽奈米晶體光電池及其在一低溫多晶矽薄膜電晶體面板內之應用
JP2010067801A (ja) * 2008-09-11 2010-03-25 Seiko Epson Corp 光電変換装置、電子機器、光電変換装置の製造方法および電子機器の製造方法
GB0820684D0 (en) 2008-11-12 2008-12-17 Silicon Cpv Plc Photovoltaic solar cells
JP5423952B2 (ja) 2009-03-04 2014-02-19 セイコーエプソン株式会社 光電変換装置および電子機器
EP3249699B1 (en) * 2009-03-18 2020-04-15 Evatec AG Method of inline manufacturing a solar cell panel
KR101072472B1 (ko) * 2009-07-03 2011-10-11 한국철강 주식회사 광기전력 장치의 제조 방법
US20110214726A1 (en) * 2010-03-02 2011-09-08 Alliance For Sustainable Energy, Llc Ultra- High Solar Conversion Efficiency for Solar Fuels and Solar Electricity via Multiple Exciton Generation in Quantum Dots Coupled with Solar Concentration
JP2011187646A (ja) * 2010-03-08 2011-09-22 Seiko Epson Corp 光学変換装置及び同装置を含む電子機器
JP5256268B2 (ja) * 2010-10-21 2013-08-07 シャープ株式会社 太陽電池
JP5509059B2 (ja) * 2010-12-22 2014-06-04 国立大学法人 東京大学 太陽電池
JP5568039B2 (ja) * 2011-03-15 2014-08-06 国立大学法人 東京大学 太陽電池
KR101189686B1 (ko) * 2011-03-22 2012-10-10 한국표준과학연구원 실리콘 양자점에 의한 광활성층 및 이의 제조방법
JP2014116327A (ja) * 2011-03-31 2014-06-26 Sanyo Electric Co Ltd 光電変換装置
JP5664416B2 (ja) * 2011-03-31 2015-02-04 富士通株式会社 シリコン量子ドット装置とその製造方法
US8778448B2 (en) * 2011-07-21 2014-07-15 International Business Machines Corporation Method of stabilizing hydrogenated amorphous silicon and amorphous hydrogenated silicon alloys
FR2979434B1 (fr) 2011-08-24 2013-09-27 Commissariat Energie Atomique Procede de realisation d'un reflecteur optique a nanocristaux de semi-conducteur
JP5732410B2 (ja) * 2012-01-05 2015-06-10 富士フイルム株式会社 量子ドット構造体の形成方法ならびに波長変換素子、光光変換装置および光電変換装置
JP6355085B2 (ja) * 2013-02-07 2018-07-11 シャープ株式会社 光電変換素子
JP6127626B2 (ja) * 2013-03-21 2017-05-17 富士通株式会社 量子ドットアレイデバイスの製造方法
JP6085805B2 (ja) * 2013-06-11 2017-03-01 富士通株式会社 光半導体装置の製造方法
JP5880629B2 (ja) * 2014-06-24 2016-03-09 セイコーエプソン株式会社 光電変換装置、電子機器、光電変換装置の製造方法および電子機器の製造方法
JP6474618B2 (ja) * 2015-01-06 2019-02-27 シャープ株式会社 光電変換素子
JP6603116B2 (ja) * 2015-11-27 2019-11-06 京セラ株式会社 光電変換装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6501091B1 (en) * 1998-04-01 2002-12-31 Massachusetts Institute Of Technology Quantum dot white and colored light emitting diodes
JPH11310776A (ja) * 1998-04-30 1999-11-09 Mitsubishi Materials Corp 発光材料及びその製造方法並びにこれを用いた発光素子
EP1134799A1 (en) * 2000-03-15 2001-09-19 STMicroelectronics S.r.l. Reduced thermal process for forming a nanocrystalline silicon layer within a thin oxide layer
JP3753605B2 (ja) * 2000-11-01 2006-03-08 シャープ株式会社 太陽電池およびその製造方法
DE10104193A1 (de) * 2001-01-31 2002-08-01 Max Planck Gesellschaft Verfahren zur Herstellung einer Halbleiterstruktur mit Siliziumclustern und/oder -nanokristallen und eine Halbleiterstruktur dieser Art
US6544870B2 (en) * 2001-04-18 2003-04-08 Kwangju Institute Of Science And Technology Silicon nitride film comprising amorphous silicon quantum dots embedded therein, its fabrication method and light-emitting device using the same
US7194174B2 (en) * 2001-10-19 2007-03-20 Ignis Technologies As Integrated photonic crystal structure and method of producing same
US20040126582A1 (en) * 2002-08-23 2004-07-01 Nano-Proprietary, Inc. Silicon nanoparticles embedded in polymer matrix
JP4263581B2 (ja) * 2002-10-30 2009-05-13 ハンヤン ハク ウォン カンパニー,リミテッド 金属薄膜または金属粉末を利用した金属酸化物量子点形成方法
US7022571B2 (en) * 2003-05-01 2006-04-04 United Microelectronics Corp. Quantum structure and forming method of the same
US7074630B2 (en) * 2003-05-20 2006-07-11 United Microelectronics Corp. Method of forming light emitter layer

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102576744A (zh) * 2009-08-31 2012-07-11 罗伯特·博世有限公司 半导体层材料和异质结太阳能电池
CN102576744B (zh) * 2009-08-31 2016-02-10 罗伯特·博世有限公司 半导体层材料和异质结太阳能电池
CN102959722A (zh) * 2010-06-25 2013-03-06 韩国标准科学研究院 Inp强制掺杂的高浓度掺p量子点太阳能电池及制造方法
CN102959722B (zh) * 2010-06-25 2015-10-07 韩国标准科学研究院 Inp强制掺杂的高浓度掺p量子点太阳能电池及制造方法
CN102867883A (zh) * 2011-07-08 2013-01-09 茂迪股份有限公司 半导体基材表面结构与形成此表面结构的方法
CN102867883B (zh) * 2011-07-08 2015-04-22 茂迪股份有限公司 半导体基材表面结构与形成此表面结构的方法
CN105723521A (zh) * 2013-11-19 2016-06-29 京瓷株式会社 光电转换层以及光电转换装置
CN105723521B (zh) * 2013-11-19 2018-01-23 京瓷株式会社 光电转换装置

Also Published As

Publication number Publication date
WO2005106966A1 (en) 2005-11-10
EP1751805A1 (en) 2007-02-14
US20080251116A1 (en) 2008-10-16
EP1751805A4 (en) 2007-07-04
JP2007535806A (ja) 2007-12-06

Similar Documents

Publication Publication Date Title
CN1957478A (zh) 人造无定形半导体及其在太阳能电池中的应用
US8906733B2 (en) Methods for forming nanostructures and photovoltaic cells implementing same
US12278296B1 (en) Method for manufacturing back-contact solar cell and back-contact solar cell
CN1049426A (zh) 光致电压器件及其制造方法
CN104103699A (zh) 太阳能电池
CN108352421A (zh) 具有通过载流子选择性触点互连的多个吸收体的太阳能电池
CN103477448A (zh) 基于石墨烯的多结柔性太阳能电池
CN103700713A (zh) 太阳能电池及其制造方法
US20130192663A1 (en) Single and multi-junction light and carrier collection management cells
Mukherjee et al. GaAs/AlGaAs nanowire array solar cell grown on Si with ultrahigh power-per-weight ratio
TW201128789A (en) New structure solar cell with superlattices
US20120264253A1 (en) Method of fabricating solar cell
US20130112236A1 (en) Photovoltaic microstructure and photovoltaic device implementing same
CN103283031A (zh) 包含n型掺杂剂源的光伏装置
US8785766B2 (en) Photoelectric conversion device and energy conversion layer for photoelectric conversion device
CN103563091B (zh) 具有改善的隧道结的串列太阳能电池
US20120167983A1 (en) Composite light converter for polycrystalline silicon solar cell and silicon solar cell using the converter
JP5038459B2 (ja) 3次元サブセルを有するマルチ接合光電池構造およびその方法
US20160172514A1 (en) Photovoltaic Microstructure and Photovoltaic Device Employing Nanowires with Single-Side Conductive Strips
WO2008046147A1 (en) Up and down conversion using quantum dot arrays
US20130112243A1 (en) Photovoltaic microstructure and photovoltaic device implementing same
CN103489939B (zh) 多结异质量子点阵列及其制备方法和多结异质量子点太阳能电池及其制备方法
Lu et al. Si nanocrystals-based multilayers for luminescent and photovoltaic device applications
CN102569435B (zh) 太阳能电池及其制造方法
CN104183668A (zh) 太阳能电池单元的制造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
AD01 Patent right deemed abandoned

Effective date of abandoning: 20070502

C20 Patent right or utility model deemed to be abandoned or is abandoned