JP5038459B2 - 3次元サブセルを有するマルチ接合光電池構造およびその方法 - Google Patents
3次元サブセルを有するマルチ接合光電池構造およびその方法 Download PDFInfo
- Publication number
- JP5038459B2 JP5038459B2 JP2010095287A JP2010095287A JP5038459B2 JP 5038459 B2 JP5038459 B2 JP 5038459B2 JP 2010095287 A JP2010095287 A JP 2010095287A JP 2010095287 A JP2010095287 A JP 2010095287A JP 5038459 B2 JP5038459 B2 JP 5038459B2
- Authority
- JP
- Japan
- Prior art keywords
- subcell
- layer
- junction
- tall
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 30
- 239000000758 substrate Substances 0.000 claims description 49
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 22
- 238000000151 deposition Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 description 27
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 24
- 239000010408 film Substances 0.000 description 11
- 238000009792 diffusion process Methods 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 9
- 238000005229 chemical vapour deposition Methods 0.000 description 9
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 8
- 238000012546 transfer Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000013459 approach Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000000605 extraction Methods 0.000 description 5
- 229910052732 germanium Inorganic materials 0.000 description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 5
- 229910052738 indium Inorganic materials 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000000927 vapour-phase epitaxy Methods 0.000 description 4
- 229910052785 arsenic Inorganic materials 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 238000001451 molecular beam epitaxy Methods 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 238000004871 chemical beam epitaxy Methods 0.000 description 2
- 238000005094 computer simulation Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000011410 subtraction method Methods 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 101100004031 Mus musculus Aven gene Proteins 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- QUZPNFFHZPRKJD-UHFFFAOYSA-N germane Chemical compound [GeH4] QUZPNFFHZPRKJD-UHFFFAOYSA-N 0.000 description 1
- 229910052986 germanium hydride Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/03529—Shape of the potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0368—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors
- H01L31/03682—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors including only elements of Group IV of the Periodic Table
- H01L31/03685—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors including only elements of Group IV of the Periodic Table including microcrystalline silicon, uc-Si
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0376—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
- H01L31/03762—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
- H01L31/0725—Multiple junction or tandem solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
- H01L31/076—Multiple junction or tandem solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/545—Microcrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Photovoltaic Devices (AREA)
Description
034 さらに他の側面によると、上記背高構造は、リブまたはピラーのうち少なくとも1つを含む。
堆積方法は、直接または間接の熱蒸着、スパッタ堆積、化学蒸着、スピンコーティング、およびインクジェットプリンティングを含むがこれらに限定されない。
エッチングは、湿式化学エッチングおよび乾式エッチング(例えば、反応性イオンエッチング)を含む。乾式エッチング技術は、スパッタリング技術と組み合わせてもよい。
Claims (12)
- 長さおよび幅のうちの少なくとも1つよりも大きい高さを有する背高構造を有するp-nまたはp-i-n接合を含む第1サブセルと、
上記第1サブセルに対して縦に並んで配置され、平坦p-nまたはp-i-n接合を含む第2サブセルとを備え、
上記第1サブセルの上記背高構造のピッチは10nmから10μmであり、
上記第1サブセルの上記背高構造の幅は10nmから10μmであり、
上記第1サブセルの上記背高構造の高さは10nmから10μmであり、
上記第1サブセルの背高構造を有するp-n接合は、当該p-n接合において3次元構造が形成されるp-タイプまたはn-タイプ層を有し、上記p-タイプまたはn-タイプ層の片方は、その上面に堆積され、
上記p-タイプまたはn-タイプ層の他方は平坦化されることを特徴とするマルチ接合光電池構造。 - 長さおよび幅のうちの少なくとも1つよりも大きい高さを有する背高構造を有するp-nまたはp-i-n接合を含む第1サブセルと、
上記第1サブセルに対して縦に並んで配置され、平坦p-nまたはp-i-n接合を含む第2サブセルとを備え、
上記第1サブセルの上記背高構造のピッチは10nmから10μmであり、
上記第1サブセルの上記背高構造の幅は10nmから10μmであり、
上記第1サブセルの上記背高構造の高さは10nmから10μmであり、
上記第1サブセルの背高構造を有するp-i-n接合は、当該p-i-n接合において3次元構造が形成されるp-タイプまたはn-タイプ層を有し、固有層がその上面に堆積され、上記p-タイプまたはn-タイプ層の片方は、上記固有層の上面に形成され、
上記固有層は平坦化されることを特徴とするマルチ接合光電池構造。 - 上記第1サブセルの背高構造は、当該背高構造と対応する3次元構造を有する基板または下層の上面に等角に堆積される上記p-nまたはp-i-n接合の各層を有する請求項1または2に記載のマルチ接合光電池構造。
- 上記第1サブセルおよび第2サブセルは、異なるバンドギャップエネルギーを有し、
上記背高構造は、上記第1サブセルと上記第2サブセルとの間の電流整合を改善する請求項1から3のうちのいずれかに1項に記載のマルチ接合光電池構造。 - 上記第1サブセルは、μc-Sサブセルとa-Siサブセルのうちの一方であり、
上記第2サブセルは、μc-Sサブセルとa-Siサブセルのうちの他方である請求項1から4のうちのいずれか1項に記載のマルチ接合光電池構造。 - 上記第1サブセルは、GaInNAsサブセルである請求項1から5のうちのいずれか1項に記載のマルチ接合光電池構造。
- 上記第1サブセルと上記第2サブセルとを分離するトンネル接合をさらに備える請求項1から6のうちのいずれか1項に記載のマルチ接合光電池構造。
- 上記第1サブセルに対して縦に並び、背高構造を有し、p-nまたはp-i-n接合、もしくは平坦p-nまたはp-i-n接合を含む少なくとも1つの追加サブセルをさらに備える請求項1から7のうちのいずれか1項に記載のマルチ接合光電池構造。
- 上記背高構造は、リブまたはピラーの少なくとも1つを含む請求項1から8のうちのいずれか1項に記載のマルチ接合光電池構造。
- マルチ接合光電池構造を形成する方法であって、
長さおよび幅のうちの少なくとも1つよりも大きい高さを有する背高構造を有するp-nまたはp-i-n接合を含む第1サブセルを形成する工程と、
上記第1サブセルと縦に並んで配置され、平坦p-nまたはp-i-n接合を含む第2サブセルを形成する工程とを含み、
上記第1サブセルの上記背高構造のピッチは10nmから10μmであり、
上記第1サブセルの上記背高構造の幅は10nmから10μmであり、
上記第1サブセルの上記背高構造の高さは10nmから10μmであり、
3次元構造を有するp-n接合を含む上記第1サブセルのp-タイプまたはn-タイプ層を形成する工程と、上記p-タイプまたはn-タイプ層の他方をその上に堆積する工程とを含み、
上記p-タイプまたはn-タイプ層の他方を平坦化することを特徴とする方法。 - マルチ接合光電池構造を形成する方法であって、
長さおよび幅のうちの少なくとも1つよりも大きい高さを有する背高構造を有するp-nまたはp-i-n接合を含む第1サブセルを形成する工程と、
上記第1サブセルと縦に並んで配置され、平坦p-nまたはp-i-n接合を含む第2サブセルを形成する工程とを含み、
上記第1サブセルの上記背高構造のピッチは10nmから10μmであり、
3次元構造を有するp-i-n接合を含む上記第1サブセルのp-タイプまたはn-タイプ層を形成する工程と、
その上に固有層を堆積する工程と、
上記固有層の上にp-タイプまたはn-タイプ層の他方を形成する工程とを含み、
上記p-タイプまたはn-タイプ層の他方を平坦化することを特徴とする方法。 - 上記背高構造に対応する3次元構造を有する基板または下層の上面に等角に上記p-nまたはp-i-n接合の各層を堆積することによって上記第1サブセルの上記背高構造を形成する工程を含む請求項10または11に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/430,308 US20100269895A1 (en) | 2009-04-27 | 2009-04-27 | Multijunction photovoltaic structure with three-dimensional subcell |
US12/430,308 | 2009-04-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010258449A JP2010258449A (ja) | 2010-11-11 |
JP5038459B2 true JP5038459B2 (ja) | 2012-10-03 |
Family
ID=42575246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010095287A Expired - Fee Related JP5038459B2 (ja) | 2009-04-27 | 2010-04-16 | 3次元サブセルを有するマルチ接合光電池構造およびその方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20100269895A1 (ja) |
EP (1) | EP2246905A3 (ja) |
JP (1) | JP5038459B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10026860B2 (en) | 2006-06-02 | 2018-07-17 | Solaero Technologies Corp. | Metamorphic layers in multijunction solar cells |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100206367A1 (en) * | 2009-02-18 | 2010-08-19 | Korea Institute Of Industrial Technology | Method for fabricating silicon nano wire, solar cell including silicon nano wire and method for fabricating solar cell |
ITMI20111559A1 (it) * | 2011-08-30 | 2013-03-01 | St Microelectronics Srl | Strato tco di contatto frontale di un pannello solare a film sottile con strato barriera di metallo refrattario e processo di fabbricazione |
US11538949B2 (en) | 2013-02-03 | 2022-12-27 | Mark R. Schroeder | Sensor comprising a photovoltaic device |
US10872988B1 (en) | 2013-02-03 | 2020-12-22 | Mark R. Schroeder | Photovoltaic device |
WO2016206050A1 (zh) * | 2015-06-25 | 2016-12-29 | 华为技术有限公司 | 一种光电探测器 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB813568A (en) | 1954-05-10 | 1959-05-21 | Roland Nicolas Payen | Improvements in aircraft |
US4272641A (en) * | 1979-04-19 | 1981-06-09 | Rca Corporation | Tandem junction amorphous silicon solar cells |
JPS6451671A (en) * | 1987-08-24 | 1989-02-27 | Canon Kk | Solar cell |
US5094697A (en) * | 1989-06-16 | 1992-03-10 | Canon Kabushiki Kaisha | Photovoltaic device and method for producing the same |
JP2692964B2 (ja) * | 1989-07-14 | 1997-12-17 | 三洋電機株式会社 | 太陽電池 |
JPH03151672A (ja) * | 1989-11-08 | 1991-06-27 | Sharp Corp | 非晶質シリコン太陽電池 |
JPH04296060A (ja) * | 1991-03-26 | 1992-10-20 | Hitachi Ltd | 太陽電池 |
JP3695950B2 (ja) * | 1998-07-31 | 2005-09-14 | 三洋電機株式会社 | 光電変換素子の製造方法 |
US7605327B2 (en) * | 2003-05-21 | 2009-10-20 | Nanosolar, Inc. | Photovoltaic devices fabricated from nanostructured template |
WO2008048233A2 (en) * | 2005-08-22 | 2008-04-24 | Q1 Nanosystems, Inc. | Nanostructure and photovoltaic cell implementing same |
TWI285436B (en) * | 2005-12-30 | 2007-08-11 | Ind Tech Res Inst | Solar cell with superlattice structure and fabricating method thereof |
US9105776B2 (en) * | 2006-05-15 | 2015-08-11 | Stion Corporation | Method and structure for thin film photovoltaic materials using semiconductor materials |
JP2007324324A (ja) * | 2006-05-31 | 2007-12-13 | Sumitomo Electric Ind Ltd | 太陽電池 |
JP2008028118A (ja) * | 2006-07-20 | 2008-02-07 | Honda Motor Co Ltd | 多接合型太陽電池の製造方法 |
US7629532B2 (en) * | 2006-12-29 | 2009-12-08 | Sundiode, Inc. | Solar cell having active region with nanostructures having energy wells |
US7977568B2 (en) * | 2007-01-11 | 2011-07-12 | General Electric Company | Multilayered film-nanowire composite, bifacial, and tandem solar cells |
CN101627479B (zh) * | 2007-01-30 | 2011-06-15 | 索拉斯特公司 | 光电池及其制造方法 |
-
2009
- 2009-04-27 US US12/430,308 patent/US20100269895A1/en not_active Abandoned
-
2010
- 2010-04-16 JP JP2010095287A patent/JP5038459B2/ja not_active Expired - Fee Related
- 2010-04-26 EP EP10161069.9A patent/EP2246905A3/en not_active Withdrawn
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10026860B2 (en) | 2006-06-02 | 2018-07-17 | Solaero Technologies Corp. | Metamorphic layers in multijunction solar cells |
US10553740B2 (en) | 2006-06-02 | 2020-02-04 | Solaero Technologies Corp. | Metamorphic layers in multijunction solar cells |
Also Published As
Publication number | Publication date |
---|---|
JP2010258449A (ja) | 2010-11-11 |
EP2246905A3 (en) | 2013-09-11 |
EP2246905A2 (en) | 2010-11-03 |
US20100269895A1 (en) | 2010-10-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10439091B2 (en) | Solar cell structures for improved current generation and collection | |
US9905714B2 (en) | High efficiency photovoltaic cells | |
US8435825B2 (en) | Methods for fabrication of nanowall solar cells and optoelectronic devices | |
TWI600173B (zh) | 在中間電池中具有低能隙吸收層之多接面太陽能電池及其製造方法 | |
US8895350B2 (en) | Methods for forming nanostructures and photovoltaic cells implementing same | |
JP5215284B2 (ja) | 多接合型化合物半導体太陽電池 | |
US9018517B2 (en) | Silicon heterojunction photovoltaic device with wide band gap emitter | |
JP2012004557A (ja) | 高効率InGaAsN太陽電池、およびその製造方法 | |
JP2008053730A (ja) | 単一コンフォーマル接合のナノワイヤ光起電力装置 | |
TW201327875A (zh) | 高效多接面太陽能電池 | |
US20090314337A1 (en) | Photovoltaic devices | |
JP5038459B2 (ja) | 3次元サブセルを有するマルチ接合光電池構造およびその方法 | |
Jia et al. | Silicon nanowire solar cells with radial pn heterojunction on crystalline silicon thin films: Light trapping properties | |
US10141461B2 (en) | Textured multi-junction solar cell and fabrication method | |
US20080163924A1 (en) | Multijunction solar cell | |
Yin et al. | 1064 nm InGaAsP multi-junction laser power converters | |
Makita et al. | Mechanical stacked GaAs//CuIn1− yGaySe2 three‐junction solar cells with 30% efficiency via an improved bonding interface and area current‐matching technique | |
Yang et al. | Investigation of room-temperature wafer bonded GaInP/GaAs/InGaAsP triple-junction solar cells | |
WO2020243998A1 (zh) | 一种多结叠层激光光伏电池 | |
US8940580B2 (en) | Textured multi-junction solar cell and fabrication method | |
Goodnick et al. | Solar cells | |
Mizuno et al. | A “smart stack” triple-junction cell consisting of InGaP/GaAs and crystalline Si | |
Salama | Quantum Dot Solar cells | |
RU190887U1 (ru) | Солнечный элемент на основе пластинчатых нанокристаллов (al,ga)as с поперечными гетеропереходами |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110706 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110712 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110906 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120605 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120705 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150713 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |