CN1782866A - 吸收紫外线的支撑层及包含该支撑层的苯胺印刷元件 - Google Patents
吸收紫外线的支撑层及包含该支撑层的苯胺印刷元件 Download PDFInfo
- Publication number
- CN1782866A CN1782866A CNA2005101150863A CN200510115086A CN1782866A CN 1782866 A CN1782866 A CN 1782866A CN A2005101150863 A CNA2005101150863 A CN A2005101150863A CN 200510115086 A CN200510115086 A CN 200510115086A CN 1782866 A CN1782866 A CN 1782866A
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- CN
- China
- Prior art keywords
- photo
- curing material
- phosphine
- solid
- supporting layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Abstract
Description
Claims (23)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/415,811 US6413699B1 (en) | 1999-10-11 | 1999-10-11 | UV-absorbing support layers and flexographic printing elements comprising same |
US09/415,811 | 1999-10-11 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB008140510A Division CN1278186C (zh) | 1999-10-11 | 2000-09-18 | 吸收紫外线的支撑层及包含该支撑层的苯胺印刷元件 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1782866A true CN1782866A (zh) | 2006-06-07 |
CN100407049C CN100407049C (zh) | 2008-07-30 |
Family
ID=23647301
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005101150863A Expired - Lifetime CN100407049C (zh) | 1999-10-11 | 2000-09-18 | 吸收紫外线的支撑层及包含该支撑层的苯胺印刷元件 |
CNB008140510A Expired - Lifetime CN1278186C (zh) | 1999-10-11 | 2000-09-18 | 吸收紫外线的支撑层及包含该支撑层的苯胺印刷元件 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB008140510A Expired - Lifetime CN1278186C (zh) | 1999-10-11 | 2000-09-18 | 吸收紫外线的支撑层及包含该支撑层的苯胺印刷元件 |
Country Status (9)
Country | Link |
---|---|
US (2) | US6413699B1 (zh) |
EP (1) | EP1222497B1 (zh) |
JP (2) | JP3856697B2 (zh) |
CN (2) | CN100407049C (zh) |
AU (1) | AU7496500A (zh) |
CA (1) | CA2387424C (zh) |
DE (1) | DE60044817D1 (zh) |
ES (1) | ES2347757T3 (zh) |
WO (1) | WO2001027696A1 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103034070A (zh) * | 2011-10-04 | 2013-04-10 | 富士胶片株式会社 | 曝光装置及固化膜的形成方法 |
CN104136993A (zh) * | 2012-02-13 | 2014-11-05 | 麦克德米德印刷方案股份有限公司 | 整合式薄膜层压uv曝光系统及其使用方法 |
CN107924120A (zh) * | 2015-08-18 | 2018-04-17 | 麦德美图形解决方案有限责任公司 | 在柔性版印版中产生混合印刷网点的方法 |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
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US6413699B1 (en) * | 1999-10-11 | 2002-07-02 | Macdermid Graphic Arts, Inc. | UV-absorbing support layers and flexographic printing elements comprising same |
US20020119295A1 (en) * | 2000-12-22 | 2002-08-29 | Speer Drew V. | Radiation triggerable oxygen scavenging article with a radiation curable coating |
US20030129533A1 (en) * | 2001-12-14 | 2003-07-10 | Creo Products, Inc. | Photosensitive flexographic device with associated addressable mask |
US7728048B2 (en) * | 2002-12-20 | 2010-06-01 | L-1 Secure Credentialing, Inc. | Increasing thermal conductivity of host polymer used with laser engraving methods and compositions |
AU2003224516A1 (en) * | 2002-05-03 | 2003-11-17 | Dsm Ip Assets B.V. | Radiation curable resin composition and rapid prototyping process using the same |
US7036430B2 (en) * | 2002-12-26 | 2006-05-02 | Creo Il Ltd. | Method for producing a flexographic printing plate formed by inkjetted fluid |
CA2522551C (en) | 2003-04-16 | 2009-12-22 | Digimarc Corporation | Three dimensional data storage |
US20050170287A1 (en) * | 2004-01-30 | 2005-08-04 | Kanga Rustom S. | Photosensitive printing sleeves and method of forming the same |
US7682775B2 (en) * | 2004-03-05 | 2010-03-23 | E. I. Du Pont De Nemours And Company | Process for preparing a flexographic printing plate |
US7049047B2 (en) * | 2004-08-10 | 2006-05-23 | Eastman Kodak Company | Imageable element with masking layer comprising sulfated polymer |
US7029805B2 (en) * | 2004-09-07 | 2006-04-18 | Eastman Kodak Company | Imageable element with masking layer comprising betaine-containing co-polymers |
US7081331B2 (en) * | 2004-11-12 | 2006-07-25 | Ryan Vest | Method for thermally processing photosensitive printing sleeves |
US7923071B2 (en) * | 2005-02-15 | 2011-04-12 | Rpo Pty Limited | Photolithographic patterning of polymeric materials |
US8017795B2 (en) * | 2005-04-21 | 2011-09-13 | Ndsu Research Foundation | Radiation curable polymer films having improved laser ablation properties and radiation curable sensitizers therefor |
DE102005031057A1 (de) * | 2005-07-02 | 2007-01-04 | Punch Graphix Prepress Germany Gmbh | Verfahren zur Belichtung von Flexodruckplatten |
JP4717601B2 (ja) * | 2005-11-15 | 2011-07-06 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂支持構造体 |
US7625691B2 (en) * | 2005-11-30 | 2009-12-01 | Bryant Laurie A | Photopolymer printing form with reduced processing time |
JP5106332B2 (ja) * | 2008-09-18 | 2012-12-26 | 日東電工株式会社 | 光導波路装置の製造方法およびそれによって得られた光導波路装置 |
US8198013B2 (en) * | 2010-05-05 | 2012-06-12 | E. I. Du Pont De Nemours And Company | Method for preparing a printing form |
US8808968B2 (en) * | 2012-08-22 | 2014-08-19 | Jonghan Choi | Method of improving surface cure in digital flexographic printing plates |
US8962740B2 (en) | 2012-09-10 | 2015-02-24 | Kraft Foods Group Brands Llc | Oxygen scavenger system in a polyolefin matrix |
CN103288995B (zh) * | 2013-06-09 | 2015-07-15 | 浙江大学 | 多孔聚三苯基膦材料的制备方法 |
US10173412B2 (en) | 2015-05-20 | 2019-01-08 | Sasu Vianord Engineering | Apparatus and method for the photo-polymerization of flexographic printing sheets |
US10668711B2 (en) * | 2015-06-02 | 2020-06-02 | E I Du Pont De Nemours And Company | Printing form precursor, a process for making the precursor, and a method for preparing a printing form from the precursor |
US10108087B2 (en) | 2016-03-11 | 2018-10-23 | Macdermid Graphics Solutions Llc | Method of improving light stability of flexographic printing plates featuring flat top dots |
US10457082B2 (en) | 2017-05-09 | 2019-10-29 | Macdermid Graphics Solutions, Llc | Flexographic printing plate with improved storage stability |
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- 1999-10-11 US US09/415,811 patent/US6413699B1/en not_active Ceased
-
2000
- 2000-09-18 CN CN2005101150863A patent/CN100407049C/zh not_active Expired - Lifetime
- 2000-09-18 EP EP00963574A patent/EP1222497B1/en not_active Expired - Lifetime
- 2000-09-18 JP JP2001530647A patent/JP3856697B2/ja not_active Expired - Lifetime
- 2000-09-18 CN CNB008140510A patent/CN1278186C/zh not_active Expired - Lifetime
- 2000-09-18 ES ES00963574T patent/ES2347757T3/es not_active Expired - Lifetime
- 2000-09-18 AU AU74965/00A patent/AU7496500A/en not_active Abandoned
- 2000-09-18 WO PCT/US2000/025536 patent/WO2001027696A1/en active Application Filing
- 2000-09-18 CA CA2387424A patent/CA2387424C/en not_active Expired - Lifetime
- 2000-09-18 DE DE60044817T patent/DE60044817D1/de not_active Expired - Lifetime
-
2004
- 2004-01-06 US US10/752,484 patent/USRE39835E1/en not_active Expired - Lifetime
- 2004-05-10 JP JP2004139848A patent/JP4471157B2/ja not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103034070A (zh) * | 2011-10-04 | 2013-04-10 | 富士胶片株式会社 | 曝光装置及固化膜的形成方法 |
CN103034070B (zh) * | 2011-10-04 | 2016-03-23 | 富士胶片株式会社 | 曝光装置及固化膜的形成方法 |
CN104136993A (zh) * | 2012-02-13 | 2014-11-05 | 麦克德米德印刷方案股份有限公司 | 整合式薄膜层压uv曝光系统及其使用方法 |
CN107924120A (zh) * | 2015-08-18 | 2018-04-17 | 麦德美图形解决方案有限责任公司 | 在柔性版印版中产生混合印刷网点的方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1222497A4 (en) | 2006-12-27 |
CN100407049C (zh) | 2008-07-30 |
EP1222497A1 (en) | 2002-07-17 |
DE60044817D1 (de) | 2010-09-23 |
US20020058196A1 (en) | 2002-05-16 |
EP1222497B1 (en) | 2010-08-11 |
JP2004240458A (ja) | 2004-08-26 |
CN1278186C (zh) | 2006-10-04 |
US6413699B1 (en) | 2002-07-02 |
AU7496500A (en) | 2001-04-23 |
JP2003511742A (ja) | 2003-03-25 |
JP3856697B2 (ja) | 2006-12-13 |
CA2387424A1 (en) | 2001-04-19 |
CN1387636A (zh) | 2002-12-25 |
WO2001027696A1 (en) | 2001-04-19 |
JP4471157B2 (ja) | 2010-06-02 |
ES2347757T3 (es) | 2010-11-04 |
USRE39835E1 (en) | 2007-09-11 |
CA2387424C (en) | 2010-11-23 |
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