CN1767009B - 垂直磁记录介质 - Google Patents
垂直磁记录介质 Download PDFInfo
- Publication number
- CN1767009B CN1767009B CN200510092480XA CN200510092480A CN1767009B CN 1767009 B CN1767009 B CN 1767009B CN 200510092480X A CN200510092480X A CN 200510092480XA CN 200510092480 A CN200510092480 A CN 200510092480A CN 1767009 B CN1767009 B CN 1767009B
- Authority
- CN
- China
- Prior art keywords
- magnetic recording
- layer
- recording medium
- grain boundary
- perpendicular magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 160
- 239000000956 alloy Substances 0.000 claims abstract description 21
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 21
- 229910019222 CoCrPt Inorganic materials 0.000 claims abstract description 15
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 15
- 239000013078 crystal Substances 0.000 claims description 56
- 239000000758 substrate Substances 0.000 claims description 21
- 230000001681 protective effect Effects 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 6
- 239000004615 ingredient Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000010410 layer Substances 0.000 claims 23
- 239000011241 protective layer Substances 0.000 claims 1
- 230000003993 interaction Effects 0.000 abstract description 23
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 230000005415 magnetization Effects 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 238000005094 computer simulation Methods 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000004364 calculation method Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000003917 TEM image Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 238000005477 sputtering target Methods 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000001050 lubricating effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- 241000849798 Nita Species 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 230000005381 magnetic domain Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910003321 CoFe Inorganic materials 0.000 description 1
- 229910019236 CoFeB Inorganic materials 0.000 description 1
- 229910015136 FeMn Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 102000011842 Serrate-Jagged Proteins Human genes 0.000 description 1
- 108010036039 Serrate-Jagged Proteins Proteins 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010038 TiAl Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000005347 demagnetization Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- -1 polytrimethylene Polymers 0.000 description 1
- 238000012113 quantitative test Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
- G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004-311733 | 2004-10-27 | ||
JP2004311733 | 2004-10-27 | ||
JP2004311733A JP2006127588A (ja) | 2004-10-27 | 2004-10-27 | 垂直磁気記録媒体 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1767009A CN1767009A (zh) | 2006-05-03 |
CN1767009B true CN1767009B (zh) | 2010-05-26 |
Family
ID=34940331
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200510092480XA Expired - Fee Related CN1767009B (zh) | 2004-10-27 | 2005-08-23 | 垂直磁记录介质 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7799447B2 (ko) |
EP (1) | EP1653451B1 (ko) |
JP (1) | JP2006127588A (ko) |
KR (1) | KR20060054100A (ko) |
CN (1) | CN1767009B (ko) |
DE (1) | DE602005010364D1 (ko) |
TW (1) | TW200617901A (ko) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005332474A (ja) * | 2004-05-19 | 2005-12-02 | Hitachi Global Storage Technologies Netherlands Bv | 熱アシスト磁気記録装置 |
US7203607B2 (en) * | 2004-11-12 | 2007-04-10 | Hitachi Global Storage Technologies | System and method for determining intergranular exchange in perpendicular recording media |
KR100738105B1 (ko) * | 2006-02-09 | 2007-07-12 | 삼성전자주식회사 | 확산 방지층이 삽입된 연자성 하지층을 포함하는 수직 자기기록 매체 |
KR100803217B1 (ko) * | 2006-10-04 | 2008-02-14 | 삼성전자주식회사 | 자기기록매체 및 그 제조방법 |
JP2008123603A (ja) * | 2006-11-10 | 2008-05-29 | Hitachi Global Storage Technologies Netherlands Bv | 垂直磁気記録媒体およびその製造方法 |
JP2009116930A (ja) * | 2007-11-02 | 2009-05-28 | Hitachi Global Storage Technologies Netherlands Bv | 垂直磁気記録媒体およびそれを用いた磁気記録再生装置 |
US8673463B2 (en) * | 2008-09-02 | 2014-03-18 | Seagate Technology Llc | Method to synthesize ordered magnetic alloys at low temperature |
JP5178451B2 (ja) * | 2008-10-21 | 2013-04-10 | 昭和電工株式会社 | 磁気記憶媒体製造方法 |
US8722214B2 (en) | 2008-12-22 | 2014-05-13 | Seagate Technology Llc | Hybrid grain boundary additives in granular media |
US8268462B2 (en) * | 2008-12-22 | 2012-09-18 | Seagate Technology Llc | Hybrid grain boundary additives |
JP5353328B2 (ja) * | 2009-03-12 | 2013-11-27 | ダイキン工業株式会社 | ヒートポンプ式給湯機 |
KR101094456B1 (ko) * | 2009-11-30 | 2011-12-15 | 고려대학교 산학협력단 | 수직 자기 기록 매체 및 그 제조 방법 |
MY149640A (en) * | 2009-12-11 | 2013-09-13 | Jx Nippon Mining & Metals Corp | Sputtering target comprising oxide phase dispersed in co or co alloy phase, magnetic thin film made of co or co alloy phase and oxide phase, and magnetic recording medium using the said thin film |
JP5177256B2 (ja) * | 2011-06-03 | 2013-04-03 | 富士電機株式会社 | 垂直磁気記録媒体およびその製造方法 |
US8614862B1 (en) * | 2012-12-21 | 2013-12-24 | HGST Netherlands B.V. | Perpendicular magnetic recording media having a cap layer above a granular layer |
JP6399515B2 (ja) * | 2014-11-26 | 2018-10-03 | 昭和電工株式会社 | 垂直磁気記録媒体及び磁気記録再生装置 |
US11605499B2 (en) * | 2017-08-18 | 2023-03-14 | 3M Innovative Properties Company | Magnetic film |
US10283701B1 (en) * | 2017-11-20 | 2019-05-07 | Samsung Electronics Co., Ltd. | Method and system for providing a boron-free magnetic layer in perpendicular magnetic junctions |
SG11202009585QA (en) * | 2018-03-28 | 2020-10-29 | Jx Nippon Mining & Metals Corp | Perpendicular magnetic recording medium |
US11948614B2 (en) | 2022-02-21 | 2024-04-02 | Seagate Technology Llc | Methods of manufacturing at least a portion of a magnetic layer of a magnetic recording disk, and related magnetic recording disks |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6153297A (en) * | 1995-03-08 | 2000-11-28 | Migaku Takahashi | Magnetic recording medium and method of manufacturing the same |
US6709768B2 (en) * | 2001-11-29 | 2004-03-23 | Hitachi Global Storage Technologies Japan, Ltd. | Magnetic recording medium and its manufacturing method and magnetic recording system using such a magnetic recording medium |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6057523A (ja) * | 1983-09-07 | 1985-04-03 | Seiko Epson Corp | 垂直磁気記録媒体 |
JP3786453B2 (ja) | 1994-07-11 | 2006-06-14 | 株式会社東芝 | 磁気記録媒体および磁気記録再生装置 |
US5652054A (en) | 1994-07-11 | 1997-07-29 | Kabushiki Kaisha Toshiba | Magnetic recording media having a magnetic thin film made of magnetic metals grains and nonmagnetic matrix |
JPH1079307A (ja) | 1996-09-03 | 1998-03-24 | Hitachi Ltd | 磁気記録媒体及び磁気記録再生装置 |
JP3141109B2 (ja) | 1999-04-19 | 2001-03-05 | 東北大学長 | 磁気記録媒体及び磁気記録媒体の製造方法 |
US6524730B1 (en) * | 1999-11-19 | 2003-02-25 | Seagate Technology, Llc | NiFe-containing soft magnetic layer design for multilayer media |
US7056606B2 (en) * | 2001-02-28 | 2006-06-06 | Showa Denko K.K. | Magnetic recording medium, method manufacture therefor, and apparatus for magnetic reproducing and reproducing recordings |
JP2002358615A (ja) | 2001-02-28 | 2002-12-13 | Showa Denko Kk | 磁気記録媒体、その製造方法、および磁気記録再生装置 |
JP4582978B2 (ja) | 2001-12-07 | 2010-11-17 | 富士電機デバイステクノロジー株式会社 | 垂直磁気記録媒体の製造方法 |
JP3773104B2 (ja) * | 2001-12-11 | 2006-05-10 | 富士電機デバイステクノロジー株式会社 | 磁気記録媒体およびその製造方法 |
JP2004063054A (ja) | 2002-07-31 | 2004-02-26 | Hitachi Maxell Ltd | 磁気記録媒体および磁気記録装置 |
US7429427B2 (en) * | 2004-12-06 | 2008-09-30 | Seagate Technology Llc | Granular magnetic recording media with improved grain segregation and corrosion resistance |
-
2004
- 2004-10-27 JP JP2004311733A patent/JP2006127588A/ja active Pending
-
2005
- 2005-07-27 TW TW094125428A patent/TW200617901A/zh unknown
- 2005-08-02 EP EP05107114A patent/EP1653451B1/en not_active Not-in-force
- 2005-08-02 DE DE602005010364T patent/DE602005010364D1/de active Active
- 2005-08-23 CN CN200510092480XA patent/CN1767009B/zh not_active Expired - Fee Related
- 2005-10-19 KR KR1020050098411A patent/KR20060054100A/ko not_active Application Discontinuation
- 2005-10-25 US US11/258,642 patent/US7799447B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6153297A (en) * | 1995-03-08 | 2000-11-28 | Migaku Takahashi | Magnetic recording medium and method of manufacturing the same |
US6709768B2 (en) * | 2001-11-29 | 2004-03-23 | Hitachi Global Storage Technologies Japan, Ltd. | Magnetic recording medium and its manufacturing method and magnetic recording system using such a magnetic recording medium |
Non-Patent Citations (1)
Title |
---|
US2004/0191576A1 2004.09.30 |
Also Published As
Publication number | Publication date |
---|---|
US7799447B2 (en) | 2010-09-21 |
JP2006127588A (ja) | 2006-05-18 |
US20060088733A1 (en) | 2006-04-27 |
TW200617901A (en) | 2006-06-01 |
KR20060054100A (ko) | 2006-05-22 |
DE602005010364D1 (de) | 2008-11-27 |
CN1767009A (zh) | 2006-05-03 |
EP1653451B1 (en) | 2008-10-15 |
EP1653451A1 (en) | 2006-05-03 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100526 Termination date: 20100823 |