CN1643451A - 感光性树脂组合物及其用途 - Google Patents
感光性树脂组合物及其用途 Download PDFInfo
- Publication number
- CN1643451A CN1643451A CN 03805765 CN03805765A CN1643451A CN 1643451 A CN1643451 A CN 1643451A CN 03805765 CN03805765 CN 03805765 CN 03805765 A CN03805765 A CN 03805765A CN 1643451 A CN1643451 A CN 1643451A
- Authority
- CN
- China
- Prior art keywords
- formula
- methyl
- integer
- photosensitive
- layered product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/02—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of acids, salts or anhydrides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
组成 | 实施例1 | 实施例2 | 实施例3 | 实施例4 | 实施例5 | 实施例6 | 实施例7 | 比较例1 | 比较例2 | 比较例3 | 比较例4 |
P-1 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 |
M-1 | 15 | 15 | 15 | 10 | 50 | 50 | 15 | 15 | 15 | ||
M-2 | 15 | 10 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | |
M-3 | 15 | 15 | 10 | 15 | 15 | 15 | 15 | 15 | |||
M-4 | 5 | 15 | |||||||||
M-5 | 5 | 15 | |||||||||
M-6 | 5 | 15 | |||||||||
M-7 | 15 | ||||||||||
M-8 | 15 | ||||||||||
M-9 | 15 | ||||||||||
I-1 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 |
I-2 | 0.14 | 0.14 | 0.14 | 0.14 | 0.14 | 0.14 | 0.14 | 0.14 | 0.14 | 0.14 | 0.14 |
D-1 | 0.05 | 0.05 | 0.05 | 0.05 | 0.05 | 0.05 | 0.05 | 0.05 | 0.05 | 0.05 | |
D-2 | 0.05 | ||||||||||
D-3 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 |
评价 | |||||||||||
感度(级) | 13 | 13 | 13 | 13 | 12 | 13 | 13 | 9 | 13 | 13 | 12 |
析像清晰度(μm) | 45 | 45 | 40 | 45 | 45 | 40 | 45 | 45 | 65 | 65 | 45 |
剥离性 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | × | ○ | × |
耐镀敷性 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | × | ○ | △ |
着色性 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | △ | × | △ |
Claims (6)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002067116 | 2002-03-12 | ||
JP67116/2002 | 2002-03-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1643451A true CN1643451A (zh) | 2005-07-20 |
CN1310088C CN1310088C (zh) | 2007-04-11 |
Family
ID=27800273
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB038057654A Expired - Lifetime CN1310088C (zh) | 2002-03-12 | 2003-03-10 | 感光性树脂组合物及其用途 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3883540B2 (zh) |
CN (1) | CN1310088C (zh) |
AU (1) | AU2003213432A1 (zh) |
WO (1) | WO2003077035A1 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101401036B (zh) * | 2006-03-14 | 2011-12-07 | 旭化成电子材料株式会社 | 感光性树脂层压体 |
CN102754032A (zh) * | 2010-03-19 | 2012-10-24 | 日立化成工业株式会社 | 感光性树脂组合物以及使用其的感光性元件、抗蚀图形的形成方法和印刷线路板的制造方法 |
CN106918993A (zh) * | 2015-10-26 | 2017-07-04 | 旭化成株式会社 | 感光性树脂组合物、感光性树脂层叠体以及保护图案形成方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100434948C (zh) * | 2004-11-16 | 2008-11-19 | 奇美实业股份有限公司 | 彩色滤光片用感光性树脂组成物 |
CN103282829B (zh) * | 2010-12-24 | 2016-08-17 | 旭化成株式会社 | 感光性树脂组合物 |
JP6512532B2 (ja) * | 2015-06-05 | 2019-05-15 | 日油株式会社 | ウレタン(メタ)アクリレートおよびドライフィルムレジスト用感光性樹脂組成物 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4539286A (en) * | 1983-06-06 | 1985-09-03 | Dynachem Corporation | Flexible, fast processing, photopolymerizable composition |
JP2548016B2 (ja) * | 1986-09-09 | 1996-10-30 | 旭化成工業株式会社 | 光重合性積層体 |
JP3267703B2 (ja) * | 1992-11-19 | 2002-03-25 | 旭化成株式会社 | 新規な光重合性樹脂積層体 |
JP2000214583A (ja) * | 1999-01-22 | 2000-08-04 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパタ―ンの製造法及びプリント配線板の製造法 |
AU2824900A (en) * | 1999-03-03 | 2000-09-21 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed circuit board |
JP2001142201A (ja) * | 1999-11-17 | 2001-05-25 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント及びカラーフィルターの製造法 |
JP4475730B2 (ja) * | 2000-04-06 | 2010-06-09 | ニチゴー・モートン株式会社 | 感光性樹脂組成物およびそれを用いてなる感光性フィルム |
JP4716347B2 (ja) * | 2001-04-05 | 2011-07-06 | 旭化成イーマテリアルズ株式会社 | ドライフィルムレジスト |
-
2003
- 2003-03-10 WO PCT/JP2003/002800 patent/WO2003077035A1/ja active Application Filing
- 2003-03-10 JP JP2003575188A patent/JP3883540B2/ja not_active Expired - Lifetime
- 2003-03-10 CN CNB038057654A patent/CN1310088C/zh not_active Expired - Lifetime
- 2003-03-10 AU AU2003213432A patent/AU2003213432A1/en not_active Abandoned
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101401036B (zh) * | 2006-03-14 | 2011-12-07 | 旭化成电子材料株式会社 | 感光性树脂层压体 |
CN102754032A (zh) * | 2010-03-19 | 2012-10-24 | 日立化成工业株式会社 | 感光性树脂组合物以及使用其的感光性元件、抗蚀图形的形成方法和印刷线路板的制造方法 |
CN102754032B (zh) * | 2010-03-19 | 2015-07-15 | 日立化成株式会社 | 感光性树脂组合物以及使用其的感光性元件、抗蚀图形的形成方法和印刷线路板的制造方法 |
CN106918993A (zh) * | 2015-10-26 | 2017-07-04 | 旭化成株式会社 | 感光性树脂组合物、感光性树脂层叠体以及保护图案形成方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1310088C (zh) | 2007-04-11 |
AU2003213432A1 (en) | 2003-09-22 |
JP3883540B2 (ja) | 2007-02-21 |
JPWO2003077035A1 (ja) | 2005-07-07 |
WO2003077035A1 (fr) | 2003-09-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: ASAHI KASEI ELECTRONICS MATERIALS CO., LTD. Free format text: FORMER OWNER: ASAHI KASEI ELECTRONICS COMPONENTS CO., LTD. Effective date: 20091016 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20091016 Address after: Tokyo, Japan Patentee after: Asahi Kasei E-materials Corp. Address before: Tokyo, Japan Patentee before: ASAHI KASEI EMD Corp. |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20160504 Address after: Tokyo, Japan Patentee after: ASAHI KASEI Kabushiki Kaisha Address before: Tokyo, Japan Patentee before: Asahi Kasei E-materials Corp. |
|
CX01 | Expiry of patent term |
Granted publication date: 20070411 |
|
CX01 | Expiry of patent term |