CN1342216A - 介质温度化学汽相沉积方法 - Google Patents

介质温度化学汽相沉积方法 Download PDF

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Publication number
CN1342216A
CN1342216A CN00804441A CN00804441A CN1342216A CN 1342216 A CN1342216 A CN 1342216A CN 00804441 A CN00804441 A CN 00804441A CN 00804441 A CN00804441 A CN 00804441A CN 1342216 A CN1342216 A CN 1342216A
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CN
China
Prior art keywords
matrix
applies
technology
described method
group
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN00804441A
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English (en)
Chinese (zh)
Inventor
K·E·安德考费尔
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Kennametal Inc
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Kennametal Inc
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Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22991551&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CN1342216(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Kennametal Inc filed Critical Kennametal Inc
Publication of CN1342216A publication Critical patent/CN1342216A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T407/00—Cutters, for shaping
    • Y10T407/27—Cutters, for shaping comprising tool of specific chemical composition

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Glass Compositions (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Physical Vapour Deposition (AREA)
CN00804441A 1999-03-02 2000-02-24 介质温度化学汽相沉积方法 Pending CN1342216A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/261,001 1999-03-02
US09/261,001 US6146697A (en) 1999-03-02 1999-03-02 MT CVD process

Publications (1)

Publication Number Publication Date
CN1342216A true CN1342216A (zh) 2002-03-27

Family

ID=22991551

Family Applications (1)

Application Number Title Priority Date Filing Date
CN00804441A Pending CN1342216A (zh) 1999-03-02 2000-02-24 介质温度化学汽相沉积方法

Country Status (11)

Country Link
US (1) US6146697A (enExample)
EP (1) EP1157143B1 (enExample)
JP (2) JP4728486B2 (enExample)
KR (1) KR100661977B1 (enExample)
CN (1) CN1342216A (enExample)
AT (1) ATE227358T1 (enExample)
CA (1) CA2360713A1 (enExample)
DE (2) DE1157143T1 (enExample)
ES (1) ES2184704T3 (enExample)
IL (1) IL144500A0 (enExample)
WO (1) WO2000052224A1 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6146697A (en) * 1999-03-02 2000-11-14 Kennametal Inc. MT CVD process
US6352014B1 (en) * 1999-12-15 2002-03-05 International Business Machines Corporation Method for making punches using multi-layer ceramic technology
US6533910B2 (en) * 2000-12-29 2003-03-18 Lam Research Corporation Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
JP2002289616A (ja) * 2001-03-28 2002-10-04 Mitsubishi Heavy Ind Ltd 成膜方法及び成膜装置
DE10122329B4 (de) * 2001-05-08 2004-06-03 Tinox Gmbh Wärmetauscher-Vorrichtung mit einer oberflächenbeschichteten Wand, die Medium 1 von Medium 2 trennt
KR20030052468A (ko) * 2001-12-21 2003-06-27 한국야금 주식회사 내마모성 공구용 박막 및 이를 이용하는 피복부재
AT503050B1 (de) * 2005-11-17 2007-09-15 Boehlerit Gmbh & Co Kg Metallcarbonitridschicht
PL1948842T3 (pl) * 2005-11-17 2011-12-30 Boehlerit Gmbh & Co Kg Warstwa węgloazotku tytanu i sposób wytwarzania warstwy węgloazotku tytanu
KR100791112B1 (ko) * 2005-12-23 2008-01-04 한국야금 주식회사 절삭공구용 고경도 ｃｖｄ 다원소 복합막
JP4753249B2 (ja) * 2006-01-13 2011-08-24 株式会社神戸製鋼所 ガラス成形用金型
EP1897970B2 (en) * 2006-09-05 2016-06-15 Tungaloy Corporation Coated cutting tool and method for producing the same
US8734070B2 (en) 2010-10-20 2014-05-27 Kennametal Inc. Toolholder with externally-mounted dynamic absorber
US8524360B2 (en) 2011-08-29 2013-09-03 Kennametal Inc. Cutting insert with a titanium oxycarbonitride coating and method for making the same
JP6022228B2 (ja) 2011-09-14 2016-11-09 株式会社日立国際電気 半導体装置の製造方法、基板処理方法、基板処理装置およびプログラム
AT13091U1 (de) * 2012-02-27 2013-06-15 Ceratizit Austria Gmbh Verfahren zur Herstellung einer Hartstoffschicht auf einem Substrat, Hartstoffschicht sowie Zerspanwerkzeug
KR101456685B1 (ko) 2013-03-08 2014-11-12 부산대학교 산학협력단 금속 부품의 고경도 표면코팅 방법
US11939670B2 (en) 2018-09-28 2024-03-26 Corning Incorporated Low temperature methods for depositing inorganic particles on a metal substrate and articles produced by the same
US11464102B2 (en) * 2018-10-06 2022-10-04 Fermi Research Alliance, Llc Methods and systems for treatment of superconducting materials to improve low field performance
JP7511584B2 (ja) * 2019-05-27 2024-07-05 エービー サンドビック コロマント 被覆切削工具
JP7425990B2 (ja) * 2020-03-19 2024-02-01 三菱マテリアル株式会社 表面被覆切削工具の製造方法
CN116162918B (zh) * 2023-04-26 2023-07-14 赣州澳克泰工具技术有限公司 一种高硬度高韧性的刀具涂层及制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3846162A (en) * 1968-10-21 1974-11-05 Texas Instruments Inc Metal carbonitride coatings
US4196233A (en) * 1974-02-07 1980-04-01 Ciba-Geigy Corporation Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides
US5436071A (en) * 1990-01-31 1995-07-25 Mitsubishi Materials Corporation Cermet cutting tool and process for producing the same
JP3109272B2 (ja) * 1992-08-04 2000-11-13 三菱マテリアル株式会社 耐欠損性および耐摩耗性にすぐれた表面被覆炭窒化チタン基サーメット製切削工具
JP2585470B2 (ja) * 1991-01-14 1997-02-26 日本碍子株式会社 ハニカム構造体押出用口金の製造方法
DE4239234A1 (de) * 1992-11-21 1994-06-09 Krupp Widia Gmbh Werkzeug und Verfahren zur Beschichtung eines Werkzeuggrundkörpers
US5681651A (en) * 1992-11-27 1997-10-28 Mitsubishi Materials Corporation Multilayer coated hard alloy cutting tool
SE514737C2 (sv) * 1994-03-22 2001-04-09 Sandvik Ab Belagt skärverktyg av hårdmetall
US5652045A (en) * 1994-10-20 1997-07-29 Mitsubishi Materials Corporation Coated tungsten carbide-based cemented carbide blade member
US5786069A (en) * 1995-09-01 1998-07-28 Sandvik Ab Coated turning insert
JPH09310179A (ja) * 1996-05-20 1997-12-02 Mitsubishi Materials Corp 減圧式縦型化学蒸着装置および化学蒸着方法
SE510778C2 (sv) * 1996-07-11 1999-06-21 Sandvik Ab Belagt skär för finfräsning av grått gjutjärn
US6146697A (en) * 1999-03-02 2000-11-14 Kennametal Inc. MT CVD process

Also Published As

Publication number Publication date
KR100661977B1 (ko) 2006-12-27
KR20010105364A (ko) 2001-11-28
IL144500A0 (en) 2002-05-23
DE60000725T2 (de) 2003-08-21
ATE227358T1 (de) 2002-11-15
CA2360713A1 (en) 2000-09-08
DE1157143T1 (de) 2002-07-04
ES2184704T3 (es) 2003-04-16
JP4728486B2 (ja) 2011-07-20
US6146697A (en) 2000-11-14
JP2011137238A (ja) 2011-07-14
EP1157143A1 (en) 2001-11-28
WO2000052224A1 (en) 2000-09-08
EP1157143B1 (en) 2002-11-06
DE60000725D1 (de) 2002-12-12
JP2002538308A (ja) 2002-11-12

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