ATE227358T1 - Mitteltemperatur-cvd-verfahren - Google Patents

Mitteltemperatur-cvd-verfahren

Info

Publication number
ATE227358T1
ATE227358T1 AT00913591T AT00913591T ATE227358T1 AT E227358 T1 ATE227358 T1 AT E227358T1 AT 00913591 T AT00913591 T AT 00913591T AT 00913591 T AT00913591 T AT 00913591T AT E227358 T1 ATE227358 T1 AT E227358T1
Authority
AT
Austria
Prior art keywords
carbonitride
reaction chamber
coating
cvd process
substrates
Prior art date
Application number
AT00913591T
Other languages
German (de)
English (en)
Inventor
Kenneth E Undercoffer
Original Assignee
Kennametal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22991551&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE227358(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Kennametal Inc filed Critical Kennametal Inc
Application granted granted Critical
Publication of ATE227358T1 publication Critical patent/ATE227358T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T407/00—Cutters, for shaping
    • Y10T407/27—Cutters, for shaping comprising tool of specific chemical composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Glass Compositions (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
AT00913591T 1999-03-02 2000-02-24 Mitteltemperatur-cvd-verfahren ATE227358T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/261,001 US6146697A (en) 1999-03-02 1999-03-02 MT CVD process
PCT/US2000/004682 WO2000052224A1 (en) 1999-03-02 2000-02-24 Mt cvd process

Publications (1)

Publication Number Publication Date
ATE227358T1 true ATE227358T1 (de) 2002-11-15

Family

ID=22991551

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00913591T ATE227358T1 (de) 1999-03-02 2000-02-24 Mitteltemperatur-cvd-verfahren

Country Status (11)

Country Link
US (1) US6146697A (enExample)
EP (1) EP1157143B1 (enExample)
JP (2) JP4728486B2 (enExample)
KR (1) KR100661977B1 (enExample)
CN (1) CN1342216A (enExample)
AT (1) ATE227358T1 (enExample)
CA (1) CA2360713A1 (enExample)
DE (2) DE60000725T2 (enExample)
ES (1) ES2184704T3 (enExample)
IL (1) IL144500A0 (enExample)
WO (1) WO2000052224A1 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6146697A (en) * 1999-03-02 2000-11-14 Kennametal Inc. MT CVD process
US6352014B1 (en) * 1999-12-15 2002-03-05 International Business Machines Corporation Method for making punches using multi-layer ceramic technology
US6533910B2 (en) * 2000-12-29 2003-03-18 Lam Research Corporation Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
JP2002289616A (ja) * 2001-03-28 2002-10-04 Mitsubishi Heavy Ind Ltd 成膜方法及び成膜装置
DE10122329B4 (de) * 2001-05-08 2004-06-03 Tinox Gmbh Wärmetauscher-Vorrichtung mit einer oberflächenbeschichteten Wand, die Medium 1 von Medium 2 trennt
KR20030052468A (ko) * 2001-12-21 2003-06-27 한국야금 주식회사 내마모성 공구용 박막 및 이를 이용하는 피복부재
AT503050B1 (de) * 2005-11-17 2007-09-15 Boehlerit Gmbh & Co Kg Metallcarbonitridschicht
PT1948842E (pt) * 2005-11-17 2011-10-11 Boehlerit Gmbh & Co Kg Camada de carbonitreto de titânio e processo de produção de uma camada de carbonitreto de titânio
KR100791112B1 (ko) * 2005-12-23 2008-01-04 한국야금 주식회사 절삭공구용 고경도 ｃｖｄ 다원소 복합막
JP4753249B2 (ja) * 2006-01-13 2011-08-24 株式会社神戸製鋼所 ガラス成形用金型
EP1897970B2 (en) * 2006-09-05 2016-06-15 Tungaloy Corporation Coated cutting tool and method for producing the same
US8734070B2 (en) 2010-10-20 2014-05-27 Kennametal Inc. Toolholder with externally-mounted dynamic absorber
US8524360B2 (en) 2011-08-29 2013-09-03 Kennametal Inc. Cutting insert with a titanium oxycarbonitride coating and method for making the same
JP6022228B2 (ja) 2011-09-14 2016-11-09 株式会社日立国際電気 半導体装置の製造方法、基板処理方法、基板処理装置およびプログラム
AT13091U1 (de) * 2012-02-27 2013-06-15 Ceratizit Austria Gmbh Verfahren zur Herstellung einer Hartstoffschicht auf einem Substrat, Hartstoffschicht sowie Zerspanwerkzeug
KR101456685B1 (ko) 2013-03-08 2014-11-12 부산대학교 산학협력단 금속 부품의 고경도 표면코팅 방법
JP7603004B2 (ja) 2018-09-28 2024-12-19 コーニング インコーポレイテッド 金属基板上に無機粒子を堆積させるための低温法及びこの低温法によって製造される物品
US11464102B2 (en) * 2018-10-06 2022-10-04 Fermi Research Alliance, Llc Methods and systems for treatment of superconducting materials to improve low field performance
US12305293B2 (en) * 2019-05-27 2025-05-20 Ab Sandvik Coromant Coated cutting tool
JP7425990B2 (ja) * 2020-03-19 2024-02-01 三菱マテリアル株式会社 表面被覆切削工具の製造方法
CN116162918B (zh) * 2023-04-26 2023-07-14 赣州澳克泰工具技术有限公司 一种高硬度高韧性的刀具涂层及制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3846162A (en) * 1968-10-21 1974-11-05 Texas Instruments Inc Metal carbonitride coatings
US4196233A (en) * 1974-02-07 1980-04-01 Ciba-Geigy Corporation Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides
US5436071A (en) * 1990-01-31 1995-07-25 Mitsubishi Materials Corporation Cermet cutting tool and process for producing the same
JP3109272B2 (ja) * 1992-08-04 2000-11-13 三菱マテリアル株式会社 耐欠損性および耐摩耗性にすぐれた表面被覆炭窒化チタン基サーメット製切削工具
JP2585470B2 (ja) * 1991-01-14 1997-02-26 日本碍子株式会社 ハニカム構造体押出用口金の製造方法
DE4239234A1 (de) * 1992-11-21 1994-06-09 Krupp Widia Gmbh Werkzeug und Verfahren zur Beschichtung eines Werkzeuggrundkörpers
US5681651A (en) * 1992-11-27 1997-10-28 Mitsubishi Materials Corporation Multilayer coated hard alloy cutting tool
SE514737C2 (sv) * 1994-03-22 2001-04-09 Sandvik Ab Belagt skärverktyg av hårdmetall
US5652045A (en) * 1994-10-20 1997-07-29 Mitsubishi Materials Corporation Coated tungsten carbide-based cemented carbide blade member
US5786069A (en) * 1995-09-01 1998-07-28 Sandvik Ab Coated turning insert
JPH09310179A (ja) * 1996-05-20 1997-12-02 Mitsubishi Materials Corp 減圧式縦型化学蒸着装置および化学蒸着方法
SE510778C2 (sv) * 1996-07-11 1999-06-21 Sandvik Ab Belagt skär för finfräsning av grått gjutjärn
US6146697A (en) * 1999-03-02 2000-11-14 Kennametal Inc. MT CVD process

Also Published As

Publication number Publication date
EP1157143B1 (en) 2002-11-06
DE1157143T1 (de) 2002-07-04
CA2360713A1 (en) 2000-09-08
DE60000725D1 (de) 2002-12-12
WO2000052224A1 (en) 2000-09-08
EP1157143A1 (en) 2001-11-28
DE60000725T2 (de) 2003-08-21
JP2011137238A (ja) 2011-07-14
CN1342216A (zh) 2002-03-27
US6146697A (en) 2000-11-14
JP2002538308A (ja) 2002-11-12
ES2184704T3 (es) 2003-04-16
IL144500A0 (en) 2002-05-23
KR100661977B1 (ko) 2006-12-27
KR20010105364A (ko) 2001-11-28
JP4728486B2 (ja) 2011-07-20

Similar Documents

Publication Publication Date Title
DE60000725D1 (de) Mitteltemperatur-cvd-verfahren
US7344755B2 (en) Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers
US7070833B2 (en) Method for chemical vapor deposition of silicon on to substrates for use in corrosive and vacuum environments
US3784402A (en) Chemical vapor deposition coatings on titanium
US5302422A (en) Deposition process of a ceramic coating on a metallic substrate
JP2002538308A5 (enExample)
CN101490307A (zh) 成膜方法、清洁方法和成膜装置
WO2005060632A3 (en) High-throughput ex-situ method for rare-earth-barium-copper-oxide (rebco) film growth
KR20020008395A (ko) 화학 증착 시스템 및 방법
US3846162A (en) Metal carbonitride coatings
TW200618066A (en) Deposition of ruthenium metal layers in a thermal chemical vapor deposition process
US3807008A (en) Chemical vapor deposition coatings on titanium
JP2009544837A (ja) 非酸化物セラミック被覆の蒸着方法
EP3132068B1 (en) Method for producing coated steel components
US5061514A (en) Chemical vapor deposition (CVD) process for plasma depositing silicon carbide films onto a substrate
KR20090025053A (ko) 화학기상증착 챔버의 시즈닝 방법
Izak et al. Enhanced spontaneous nucleation of diamond nuclei in hot and cold microwave plasma systems
Abisset et al. Gas and plasma nitriding pretreatments of steel substrates before CVD growth of hard refractory coatings
Weber et al. Deposition of TiN using tetrakis (dimethylamido)‐titanium in an electron‐cyclotron‐resonance plasma process
JPWO2005121398A1 (ja) ダイヤモンド薄膜のコーティング法及びダイヤモンド被覆超硬合金部材
US5851314A (en) Method for plasma carburization of metal workpieces
JPH04301084A (ja) 耐摩耗性部材およびその製造法
US20160024642A1 (en) Preheat chamber oxidation process
KR100777645B1 (ko) 다이아몬드상 카본 코팅 장치 및 그 제조방법
US20040175578A1 (en) Method for chemical vapor deposition of silicon on to substrates for use in corrosive and vacuum environments

Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification

Ref document number: 1157143

Country of ref document: EP

REN Ceased due to non-payment of the annual fee