CN1322565C - 包括有薄氧化物内衬的半导体装置及其制法 - Google Patents

包括有薄氧化物内衬的半导体装置及其制法 Download PDF

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Publication number
CN1322565C
CN1322565C CNB028257502A CN02825750A CN1322565C CN 1322565 C CN1322565 C CN 1322565C CN B028257502 A CNB028257502 A CN B028257502A CN 02825750 A CN02825750 A CN 02825750A CN 1322565 C CN1322565 C CN 1322565C
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CN
China
Prior art keywords
substrate
oxide liner
source
etching
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CNB028257502A
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English (en)
Chinese (zh)
Other versions
CN1606801A (zh
Inventor
S·路宁
D·卡多诗
J·D·柴克
J·F·布勒
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Advanced Micro Devices Inc
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Advanced Micro Devices Inc
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Publication date
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Publication of CN1606801A publication Critical patent/CN1606801A/zh
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Publication of CN1322565C publication Critical patent/CN1322565C/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
    • H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
    • H01L21/2652—Through-implantation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0223—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate
    • H10D30/0227—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate having both lightly-doped source and drain extensions and source and drain regions self-aligned to the sides of the gate, e.g. lightly-doped drain [LDD] MOSFET or double-diffused drain [DDD] MOSFET

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Formation Of Insulating Films (AREA)
  • Electrodes Of Semiconductors (AREA)
CNB028257502A 2001-12-19 2002-12-19 包括有薄氧化物内衬的半导体装置及其制法 Expired - Fee Related CN1322565C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2103701A 2001-12-19 2001-12-19
US10/021,037 2001-12-19

Publications (2)

Publication Number Publication Date
CN1606801A CN1606801A (zh) 2005-04-13
CN1322565C true CN1322565C (zh) 2007-06-20

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Family Applications (1)

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CNB028257502A Expired - Fee Related CN1322565C (zh) 2001-12-19 2002-12-19 包括有薄氧化物内衬的半导体装置及其制法

Country Status (7)

Country Link
JP (1) JP2005517285A (enExample)
KR (1) KR20040068269A (enExample)
CN (1) CN1322565C (enExample)
AU (1) AU2002358269A1 (enExample)
DE (1) DE10297582T5 (enExample)
GB (1) GB2399222B (enExample)
WO (1) WO2003054951A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6583016B1 (en) * 2002-03-26 2003-06-24 Advanced Micro Devices, Inc. Doped spacer liner for improved transistor performance
JP2008124441A (ja) * 2006-10-19 2008-05-29 Tokyo Electron Ltd 半導体装置の製造方法
DE102011005641B4 (de) * 2011-03-16 2018-01-04 GLOBALFOUNDRIES Dresden Module One Ltd. Liability Company & Co. KG Verfahren zur Leistungssteigerung in Transistoren durch Reduzierung der Absenkung aktiver Gebiete und durch Entfernen von Abstandshaltern

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5714413A (en) * 1995-12-11 1998-02-03 Intel Corporation Method of making a transistor having a deposited dual-layer spacer structure
US6156598A (en) * 1999-12-13 2000-12-05 Chartered Semiconductor Manufacturing Ltd. Method for forming a lightly doped source and drain structure using an L-shaped spacer
US6277700B1 (en) * 2000-01-11 2001-08-21 Chartered Semiconductor Manufacturing Ltd. High selective nitride spacer etch with high ratio of spacer width to deposited nitride thickness
US6294480B1 (en) * 1999-11-19 2001-09-25 Chartered Semiconductor Manufacturing Ltd. Method for forming an L-shaped spacer with a disposable organic top coating

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4868617A (en) * 1988-04-25 1989-09-19 Elite Semiconductor & Sytems International, Inc. Gate controllable lightly doped drain mosfet devices
US6472281B2 (en) * 1998-02-03 2002-10-29 Matsushita Electronics Corporation Method for fabricating semiconductor device using a CVD insulator film
US6162692A (en) * 1998-06-26 2000-12-19 Advanced Micro Devices, Inc. Integration of a diffusion barrier layer and a counter dopant region to maintain the dopant level within the junctions of a transistor
US6251764B1 (en) * 1999-11-15 2001-06-26 Chartered Semiconductor Manufacturing Ltd. Method to form an L-shaped silicon nitride sidewall spacer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5714413A (en) * 1995-12-11 1998-02-03 Intel Corporation Method of making a transistor having a deposited dual-layer spacer structure
US6294480B1 (en) * 1999-11-19 2001-09-25 Chartered Semiconductor Manufacturing Ltd. Method for forming an L-shaped spacer with a disposable organic top coating
US6156598A (en) * 1999-12-13 2000-12-05 Chartered Semiconductor Manufacturing Ltd. Method for forming a lightly doped source and drain structure using an L-shaped spacer
US6277700B1 (en) * 2000-01-11 2001-08-21 Chartered Semiconductor Manufacturing Ltd. High selective nitride spacer etch with high ratio of spacer width to deposited nitride thickness

Also Published As

Publication number Publication date
GB2399222A (en) 2004-09-08
DE10297582T5 (de) 2004-11-11
KR20040068269A (ko) 2004-07-30
JP2005517285A (ja) 2005-06-09
GB0412884D0 (en) 2004-07-14
CN1606801A (zh) 2005-04-13
AU2002358269A1 (en) 2003-07-09
GB2399222B (en) 2005-07-20
WO2003054951A1 (en) 2003-07-03

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