CN1307221C - 含有马来酰亚胺衍生物的可光固化组合物 - Google Patents

含有马来酰亚胺衍生物的可光固化组合物 Download PDF

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Publication number
CN1307221C
CN1307221C CNB038189046A CN03818904A CN1307221C CN 1307221 C CN1307221 C CN 1307221C CN B038189046 A CNB038189046 A CN B038189046A CN 03818904 A CN03818904 A CN 03818904A CN 1307221 C CN1307221 C CN 1307221C
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CN
China
Prior art keywords
curable composition
photo curable
base material
maleimide
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB038189046A
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English (en)
Chinese (zh)
Other versions
CN1675270A (zh
Inventor
R·L·赛弗伦斯
C·M·依利塔罗
P·T·埃利奥特
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN1675270A publication Critical patent/CN1675270A/zh
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Publication of CN1307221C publication Critical patent/CN1307221C/zh
Anticipated expiration legal-status Critical
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36—Amides or imides
    • C08F22/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04—Anhydrides, e.g. cyclic anhydrides
    • C08F222/06—Maleic anhydride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
CNB038189046A 2002-08-08 2003-06-17 含有马来酰亚胺衍生物的可光固化组合物 Expired - Fee Related CN1307221C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/214,619 2002-08-08
US10/214,619 US20040029044A1 (en) 2002-08-08 2002-08-08 Photocurable composition

Publications (2)

Publication Number Publication Date
CN1675270A CN1675270A (zh) 2005-09-28
CN1307221C true CN1307221C (zh) 2007-03-28

Family

ID=31494683

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB038189046A Expired - Fee Related CN1307221C (zh) 2002-08-08 2003-06-17 含有马来酰亚胺衍生物的可光固化组合物

Country Status (8)

Country Link
US (1) US20040029044A1 (enExample)
JP (1) JP4272156B2 (enExample)
KR (1) KR101009124B1 (enExample)
CN (1) CN1307221C (enExample)
AU (1) AU2003282345A1 (enExample)
DE (1) DE10393025T5 (enExample)
GB (1) GB2406572B (enExample)
WO (1) WO2004014970A1 (enExample)

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US20100055423A1 (en) * 2008-09-04 2010-03-04 Xerox Corporation Machine Readable Code Comprising Ultra-Violet Curable Gellant Inks
CA2745761A1 (en) * 2008-12-08 2010-07-08 3M Innovative Properties Company Prismatic retroreflective article bearing a graphic and method of making same
US8506095B2 (en) * 2008-12-08 2013-08-13 3M Innovative Properties Company Protective overlay bearing a graphic and retroreflective articles comprising the overlay
JP2010214636A (ja) * 2009-03-13 2010-09-30 E I Du Pont De Nemours & Co 光学的読み取り情報を備える印刷物
US20130025495A1 (en) * 2010-01-11 2013-01-31 Isp Investments Inc. Compositions comprising a reactive monomer and uses thereof
US8628679B2 (en) * 2010-01-20 2014-01-14 Phoenix Inks And Coatings, Llc High-definition demetalization process
JP5615600B2 (ja) * 2010-06-09 2014-10-29 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法及びインクジェット印画物
DK2588549T3 (en) * 2010-06-30 2015-01-12 Dsm Ip Assets Bv D1479-STABLE LIQUID BAP photoinitiator AND ITS USE IN radiation-FORMATIONS
ES2550469T3 (es) * 2010-12-20 2015-11-10 Agfa Graphics N.V. Método para fabricar una matriz de impresión flexográfica
WO2012084786A1 (en) 2010-12-20 2012-06-28 Agfa Graphics Nv A curable jettable fluid for making a flexographic printing master
JP5821225B2 (ja) * 2011-03-15 2015-11-24 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク組成物、及びインクジェット記録方法
JP5398760B2 (ja) * 2011-02-23 2014-01-29 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
WO2012172816A1 (ja) * 2011-06-17 2012-12-20 コニカミノルタホールディングス株式会社 光硬化性インクジェットインク
JP5857710B2 (ja) * 2011-12-14 2016-02-10 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク、およびそれを用いるインクジェット記録方法
JP5825089B2 (ja) * 2011-12-21 2015-12-02 コニカミノルタ株式会社 紫外線硬化型非水系インクジェットインク
WO2014123706A1 (en) * 2013-02-06 2014-08-14 Sun Chemical Corporation Digital printing inks
EP3417024B1 (en) 2016-02-19 2020-08-05 Avery Dennison Corporation Two stage methods for processing adhesives and related compositions
WO2018011674A1 (en) * 2016-07-11 2018-01-18 Soreq Nuclear Research Center Bismaleimide-based solution for inkjet ink for three dimensional printing
WO2018081268A1 (en) 2016-10-25 2018-05-03 Avery Dennison Corporation Block polymers with photoinitiator groups in backbone and their use in adhesive compositions
GB2562747B (en) * 2017-05-23 2019-06-26 Henkel IP & Holding GmbH Low-viscosity photocurable adhesive compositions
WO2019126327A1 (en) 2017-12-19 2019-06-27 Avery Dennison Corporation Post-polymerization functionalization of pendant functional groups
EP3842863A4 (en) * 2018-08-20 2021-11-03 Mitsubishi Gas Chemical Company, Inc. FILM EDUCATION MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, LAYER FILM FOR LITHOGRAPHY AND PATTERN GENERATION PROCESS
JP6746106B2 (ja) * 2018-08-30 2020-08-26 三菱瓦斯化学株式会社 樹脂組成物、樹脂シート、多層プリント配線板、及び半導体装置
JP7212301B2 (ja) * 2018-08-30 2023-01-25 三菱瓦斯化学株式会社 樹脂組成物、樹脂シート、多層プリント配線板及び半導体装置
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Cited By (1)

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Publication number Priority date Publication date Assignee Title
TWI761512B (zh) * 2017-05-15 2022-04-21 日商三菱瓦斯化學股份有限公司 微影用膜形成材料、微影用膜形成用組成物、微影用下層膜及圖型形成方法

Also Published As

Publication number Publication date
JP4272156B2 (ja) 2009-06-03
AU2003282345A1 (en) 2004-02-25
CN1675270A (zh) 2005-09-28
DE10393025T5 (de) 2005-08-25
GB2406572B (en) 2005-12-14
KR20050095578A (ko) 2005-09-29
GB0500794D0 (en) 2005-02-23
JP2005535745A (ja) 2005-11-24
KR101009124B1 (ko) 2011-01-18
WO2004014970A1 (en) 2004-02-19
US20040029044A1 (en) 2004-02-12
GB2406572A (en) 2005-04-06

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