AU2003282345A1 - Photocurable composition containing maleide derivatives - Google Patents

Photocurable composition containing maleide derivatives

Info

Publication number
AU2003282345A1
AU2003282345A1 AU2003282345A AU2003282345A AU2003282345A1 AU 2003282345 A1 AU2003282345 A1 AU 2003282345A1 AU 2003282345 A AU2003282345 A AU 2003282345A AU 2003282345 A AU2003282345 A AU 2003282345A AU 2003282345 A1 AU2003282345 A1 AU 2003282345A1
Authority
AU
Australia
Prior art keywords
maleide
derivatives
composition containing
photocurable composition
photocurable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003282345A
Other languages
English (en)
Inventor
Peter T. Elliott
Richard L. Severance
Caroline M. Ylitalo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of AU2003282345A1 publication Critical patent/AU2003282345A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36—Amides or imides
    • C08F22/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04—Anhydrides, e.g. cyclic anhydrides
    • C08F222/06—Maleic anhydride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
AU2003282345A 2002-08-08 2003-06-17 Photocurable composition containing maleide derivatives Abandoned AU2003282345A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/214,619 2002-08-08
US10/214,619 US20040029044A1 (en) 2002-08-08 2002-08-08 Photocurable composition
PCT/US2003/019136 WO2004014970A1 (en) 2002-08-08 2003-06-17 Photocurable composition containing maleide derivatives

Publications (1)

Publication Number Publication Date
AU2003282345A1 true AU2003282345A1 (en) 2004-02-25

Family

ID=31494683

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003282345A Abandoned AU2003282345A1 (en) 2002-08-08 2003-06-17 Photocurable composition containing maleide derivatives

Country Status (8)

Country Link
US (1) US20040029044A1 (enExample)
JP (1) JP4272156B2 (enExample)
KR (1) KR101009124B1 (enExample)
CN (1) CN1307221C (enExample)
AU (1) AU2003282345A1 (enExample)
DE (1) DE10393025T5 (enExample)
GB (1) GB2406572B (enExample)
WO (1) WO2004014970A1 (enExample)

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US20080233307A1 (en) * 2007-02-09 2008-09-25 Chisso Corporation Photocurable inkjet ink
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US7547105B2 (en) * 2007-07-16 2009-06-16 3M Innovative Properties Company Prismatic retroreflective article with cross-linked image layer and method of making same
US20100055423A1 (en) * 2008-09-04 2010-03-04 Xerox Corporation Machine Readable Code Comprising Ultra-Violet Curable Gellant Inks
CA2745761A1 (en) * 2008-12-08 2010-07-08 3M Innovative Properties Company Prismatic retroreflective article bearing a graphic and method of making same
US8506095B2 (en) * 2008-12-08 2013-08-13 3M Innovative Properties Company Protective overlay bearing a graphic and retroreflective articles comprising the overlay
JP2010214636A (ja) * 2009-03-13 2010-09-30 E I Du Pont De Nemours & Co 光学的読み取り情報を備える印刷物
US20130025495A1 (en) * 2010-01-11 2013-01-31 Isp Investments Inc. Compositions comprising a reactive monomer and uses thereof
US8628679B2 (en) * 2010-01-20 2014-01-14 Phoenix Inks And Coatings, Llc High-definition demetalization process
JP5615600B2 (ja) * 2010-06-09 2014-10-29 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法及びインクジェット印画物
DK2588549T3 (en) * 2010-06-30 2015-01-12 Dsm Ip Assets Bv D1479-STABLE LIQUID BAP photoinitiator AND ITS USE IN radiation-FORMATIONS
ES2550469T3 (es) * 2010-12-20 2015-11-10 Agfa Graphics N.V. Método para fabricar una matriz de impresión flexográfica
WO2012084786A1 (en) 2010-12-20 2012-06-28 Agfa Graphics Nv A curable jettable fluid for making a flexographic printing master
JP5821225B2 (ja) * 2011-03-15 2015-11-24 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク組成物、及びインクジェット記録方法
JP5398760B2 (ja) * 2011-02-23 2014-01-29 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
WO2012172816A1 (ja) * 2011-06-17 2012-12-20 コニカミノルタホールディングス株式会社 光硬化性インクジェットインク
JP5857710B2 (ja) * 2011-12-14 2016-02-10 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク、およびそれを用いるインクジェット記録方法
JP5825089B2 (ja) * 2011-12-21 2015-12-02 コニカミノルタ株式会社 紫外線硬化型非水系インクジェットインク
WO2014123706A1 (en) * 2013-02-06 2014-08-14 Sun Chemical Corporation Digital printing inks
EP3417024B1 (en) 2016-02-19 2020-08-05 Avery Dennison Corporation Two stage methods for processing adhesives and related compositions
WO2018011674A1 (en) * 2016-07-11 2018-01-18 Soreq Nuclear Research Center Bismaleimide-based solution for inkjet ink for three dimensional printing
WO2018081268A1 (en) 2016-10-25 2018-05-03 Avery Dennison Corporation Block polymers with photoinitiator groups in backbone and their use in adhesive compositions
WO2018212116A1 (ja) * 2017-05-15 2018-11-22 三菱瓦斯化学株式会社 リソグラフィー用膜形成材料、リソグラフィー用膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法
GB2562747B (en) * 2017-05-23 2019-06-26 Henkel IP & Holding GmbH Low-viscosity photocurable adhesive compositions
WO2019126327A1 (en) 2017-12-19 2019-06-27 Avery Dennison Corporation Post-polymerization functionalization of pendant functional groups
EP3842863A4 (en) * 2018-08-20 2021-11-03 Mitsubishi Gas Chemical Company, Inc. FILM EDUCATION MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, LAYER FILM FOR LITHOGRAPHY AND PATTERN GENERATION PROCESS
JP6746106B2 (ja) * 2018-08-30 2020-08-26 三菱瓦斯化学株式会社 樹脂組成物、樹脂シート、多層プリント配線板、及び半導体装置
JP7212301B2 (ja) * 2018-08-30 2023-01-25 三菱瓦斯化学株式会社 樹脂組成物、樹脂シート、多層プリント配線板及び半導体装置
EP3632941B1 (en) * 2018-10-01 2023-08-23 Cubicure GmbH Resin composition
US11345772B2 (en) * 2019-09-06 2022-05-31 Canon Kabushiki Kaisha Curable composition
JP7676107B2 (ja) * 2019-11-19 2025-05-14 スリーエム イノベイティブ プロパティズ カンパニー 放射線硬化型インクジェットインク、装飾シート及び装飾シートの製造方法

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Also Published As

Publication number Publication date
JP4272156B2 (ja) 2009-06-03
CN1675270A (zh) 2005-09-28
DE10393025T5 (de) 2005-08-25
GB2406572B (en) 2005-12-14
KR20050095578A (ko) 2005-09-29
GB0500794D0 (en) 2005-02-23
JP2005535745A (ja) 2005-11-24
KR101009124B1 (ko) 2011-01-18
CN1307221C (zh) 2007-03-28
WO2004014970A1 (en) 2004-02-19
US20040029044A1 (en) 2004-02-12
GB2406572A (en) 2005-04-06

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase