CN1295564C - 含有感光速度促进剂的可水显影光成像厚膜组合物 - Google Patents

含有感光速度促进剂的可水显影光成像厚膜组合物 Download PDF

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Publication number
CN1295564C
CN1295564C CNB028202171A CN02820217A CN1295564C CN 1295564 C CN1295564 C CN 1295564C CN B028202171 A CNB028202171 A CN B028202171A CN 02820217 A CN02820217 A CN 02820217A CN 1295564 C CN1295564 C CN 1295564C
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CN
China
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weight
acid
composition
described composition
potpourri
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Expired - Fee Related
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CNB028202171A
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English (en)
Chinese (zh)
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CN1639639A (zh
Inventor
H·D·格利克斯曼
H·杨
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EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
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Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of CN1639639A publication Critical patent/CN1639639A/zh
Application granted granted Critical
Publication of CN1295564C publication Critical patent/CN1295564C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
CNB028202171A 2001-10-12 2002-10-07 含有感光速度促进剂的可水显影光成像厚膜组合物 Expired - Fee Related CN1295564C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32873301P 2001-10-12 2001-10-12
US60/328,733 2001-10-12

Publications (2)

Publication Number Publication Date
CN1639639A CN1639639A (zh) 2005-07-13
CN1295564C true CN1295564C (zh) 2007-01-17

Family

ID=23282184

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB028202171A Expired - Fee Related CN1295564C (zh) 2001-10-12 2002-10-07 含有感光速度促进剂的可水显影光成像厚膜组合物

Country Status (8)

Country Link
US (1) US6762009B2 (enExample)
EP (1) EP1435022B1 (enExample)
JP (1) JP4303110B2 (enExample)
KR (1) KR100571450B1 (enExample)
CN (1) CN1295564C (enExample)
DE (1) DE60229656D1 (enExample)
TW (1) TWI295747B (enExample)
WO (1) WO2003034150A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6994948B2 (en) * 2001-10-12 2006-02-07 E.I. Du Pont De Nemours And Company, Inc. Aqueous developable photoimageable thick film compositions
US7303854B2 (en) * 2003-02-14 2007-12-04 E.I. Du Pont De Nemours And Company Electrode-forming composition for field emission type of display device, and method using such a composition
JP4217886B2 (ja) * 2003-06-25 2009-02-04 Ｊｓｒ株式会社 感放射線性屈折率変化性組成物、パターン形成法および光学材料
US7618704B2 (en) 2003-09-29 2009-11-17 E.I. Du Pont De Nemours And Company Spin-printing of electronic and display components
DE102004027770B9 (de) * 2004-06-08 2013-07-11 Bundeskriminalamt Zv21 Verfahren zur Herstellung identischer latenter Partikel-Verteilungen auf Oberflächen
US20060027307A1 (en) * 2004-08-03 2006-02-09 Bidwell Larry A Method of application of a dielectric sheet and photosensitive dielectric composition(s) and tape(s) used therein
US7135267B2 (en) * 2004-08-06 2006-11-14 E. I. Du Pont De Nemours And Company Aqueous developable photoimageable compositions for use in photo-patterning methods
US8143326B2 (en) 2004-09-28 2012-03-27 E.I. Du Pont De Nemours And Company Spin-printing of electronic and display components
US8252385B2 (en) 2005-03-25 2012-08-28 E I Du Pont De Nemours And Company Spin-printing of electronic and display components
US7645564B2 (en) * 2006-03-03 2010-01-12 Haixin Yang Polymer solutions, aqueous developable thick film compositions, processes of making and electrodes formed thereof
US7887992B2 (en) * 2008-12-23 2011-02-15 E. I. Du Pont De Nemours And Company Photosensitive paste and process for production of pattern using the same
JP2011221463A (ja) * 2010-04-14 2011-11-04 Samsung Electronics Co Ltd 感光性樹脂組成物
KR101716722B1 (ko) * 2012-03-22 2017-03-15 도레이 카부시키가이샤 감광성 도전 페이스트 및 도전 패턴의 제조 방법
JP6406618B2 (ja) * 2015-03-25 2018-10-17 株式会社大阪ソーダ 反応性樹脂組成物とその用途
JP6604251B2 (ja) * 2016-03-30 2019-11-13 東レ株式会社 感光性樹脂組成物、導電性パターンの製造方法、基板、タッチパネルおよびディスプレイ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1050447A (zh) * 1989-08-21 1991-04-03 纳幕尔杜邦公司 可水溶液显影的光敏铜导体组合物
US5080999A (en) * 1985-06-10 1992-01-14 Fuji Photo Film Co., Ltd. Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide
US6004705A (en) * 1992-07-07 1999-12-21 Toray Industries, Inc. Photosensitive ceramics green sheet

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5134175A (en) * 1987-12-16 1992-07-28 Michael Lucey Curable composition for electrical and electronic components
US5180757A (en) * 1987-12-16 1993-01-19 Michael Lucey Photopolymerizable compositions used in electronics
US4925771A (en) * 1988-05-31 1990-05-15 E. I. Dupont De Nemours And Company Process of making photosensitive aqueous developable ceramic coating composition including freeze drying the ceramic solid particles
US4912019A (en) * 1988-05-31 1990-03-27 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable ceramic coating composition
US5049480A (en) * 1990-02-20 1991-09-17 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable silver conductor composition
JP3672105B2 (ja) 1991-09-09 2005-07-13 東レ株式会社 感光性導電ペースト
JP3218767B2 (ja) 1992-01-24 2001-10-15 東レ株式会社 感光性導電ペースト
JP3510761B2 (ja) * 1997-03-26 2004-03-29 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
JP3686749B2 (ja) * 1997-11-04 2005-08-24 太陽インキ製造株式会社 パターン状無機質焼成被膜及びプラズマディスプレイパネルの製造方法
JP3953625B2 (ja) * 1998-03-02 2007-08-08 太陽インキ製造株式会社 感光性組成物
JP4090103B2 (ja) * 1998-03-02 2008-05-28 太陽インキ製造株式会社 感光性組成物及びそれを用いて得られる焼成物パターン
JPH11246638A (ja) * 1998-03-02 1999-09-14 Taiyo Ink Mfg Ltd 感光性組成物及びそれを用いて得られる焼成物パターン
JP3394938B2 (ja) * 1999-03-25 2003-04-07 株式会社村田製作所 感光性導体ペースト
US6194124B1 (en) * 1999-08-12 2001-02-27 E. I. Du Pont De Nemours And Company Photosensitive ceramic compositions containing polycarbonate polymers

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5080999A (en) * 1985-06-10 1992-01-14 Fuji Photo Film Co., Ltd. Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide
CN1050447A (zh) * 1989-08-21 1991-04-03 纳幕尔杜邦公司 可水溶液显影的光敏铜导体组合物
US6004705A (en) * 1992-07-07 1999-12-21 Toray Industries, Inc. Photosensitive ceramics green sheet

Also Published As

Publication number Publication date
EP1435022B1 (en) 2008-10-29
EP1435022A1 (en) 2004-07-07
US20030138708A1 (en) 2003-07-24
JP2005506569A (ja) 2005-03-03
KR20050034591A (ko) 2005-04-14
WO2003034150A1 (en) 2003-04-24
KR100571450B1 (ko) 2006-04-17
JP4303110B2 (ja) 2009-07-29
DE60229656D1 (de) 2008-12-11
US6762009B2 (en) 2004-07-13
TWI295747B (en) 2008-04-11
CN1639639A (zh) 2005-07-13

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