CN1276046C - 硅氧烷基粘合片材、将半导体芯片粘接到芯片连接元件上的方法,和半导体器件 - Google Patents

硅氧烷基粘合片材、将半导体芯片粘接到芯片连接元件上的方法,和半导体器件 Download PDF

Info

Publication number
CN1276046C
CN1276046C CNB038168367A CN03816836A CN1276046C CN 1276046 C CN1276046 C CN 1276046C CN B038168367 A CNB038168367 A CN B038168367A CN 03816836 A CN03816836 A CN 03816836A CN 1276046 C CN1276046 C CN 1276046C
Authority
CN
China
Prior art keywords
layer
composition
silicone
argillaceous
curable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB038168367A
Other languages
English (en)
Chinese (zh)
Other versions
CN1668715A (zh
Inventor
须藤学
潮嘉人
藤泽丰彦
峰胜利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Toray Specialty Materials KK
Original Assignee
Dow Corning Toray Silicone Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Toray Silicone Co Ltd filed Critical Dow Corning Toray Silicone Co Ltd
Publication of CN1668715A publication Critical patent/CN1668715A/zh
Application granted granted Critical
Publication of CN1276046C publication Critical patent/CN1276046C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7402Wafer tapes, e.g. grinding or dicing support tapes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J183/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
    • C09J183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • C09J5/06Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving heating of the applied adhesive
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/35Heat-activated
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W95/00Packaging processes not covered by the other groups of this subclass
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/10Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
    • C09J2301/12Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
    • C09J2301/124Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present on both sides of the carrier, e.g. double-sided adhesive tape
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2483/00Presence of polysiloxane
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7416Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/013Manufacture or treatment of die-attach connectors
    • H10W72/01331Manufacture or treatment of die-attach connectors using blanket deposition
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/073Connecting or disconnecting of die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/073Connecting or disconnecting of die-attach connectors
    • H10W72/07331Connecting techniques
    • H10W72/07337Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
    • H10W72/07338Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy hardening the adhesive by curing, e.g. thermosetting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07531Techniques
    • H10W72/07532Compression bonding, e.g. thermocompression bonding
    • H10W72/07533Ultrasonic bonding, e.g. thermosonic bonding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • H10W72/321Structures or relative sizes of die-attach connectors
    • H10W72/325Die-attach connectors having a filler embedded in a matrix
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • H10W72/351Materials of die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • H10W72/351Materials of die-attach connectors
    • H10W72/353Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
    • H10W72/354Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics comprising polymers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/552Materials of bond wires comprising metals or metalloids, e.g. silver
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/552Materials of bond wires comprising metals or metalloids, e.g. silver
    • H10W72/5522Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/552Materials of bond wires comprising metals or metalloids, e.g. silver
    • H10W72/5524Materials of bond wires comprising metals or metalloids, e.g. silver comprising aluminium [Al]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/732Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between stacked chips
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/734Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Die Bonding (AREA)
CNB038168367A 2002-07-15 2003-07-14 硅氧烷基粘合片材、将半导体芯片粘接到芯片连接元件上的方法,和半导体器件 Expired - Fee Related CN1276046C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP205869/2002 2002-07-15
JP2002205869 2002-07-15
PCT/JP2003/008936 WO2004007628A1 (en) 2002-07-15 2003-07-14 Silicone-based adhesive sheet, method of bonding a semiconductor chip to a chip attachment component, and a semiconductor device

Publications (2)

Publication Number Publication Date
CN1668715A CN1668715A (zh) 2005-09-14
CN1276046C true CN1276046C (zh) 2006-09-20

Family

ID=30112779

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB038168367A Expired - Fee Related CN1276046C (zh) 2002-07-15 2003-07-14 硅氧烷基粘合片材、将半导体芯片粘接到芯片连接元件上的方法,和半导体器件

Country Status (8)

Country Link
US (1) US7534659B2 (https=)
EP (1) EP1539898A1 (https=)
JP (1) JP2004043814A (https=)
KR (1) KR20050021485A (https=)
CN (1) CN1276046C (https=)
AU (1) AU2003249594A1 (https=)
TW (1) TWI293191B (https=)
WO (1) WO2004007628A1 (https=)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4536367B2 (ja) * 2003-12-24 2010-09-01 東レ・ダウコーニング株式会社 ダイシングダイボンディング用シート及びその製造方法
JP2006005159A (ja) * 2004-06-17 2006-01-05 Shin Etsu Chem Co Ltd ダイシング・ダイボンド用接着テープ
JP4676735B2 (ja) 2004-09-22 2011-04-27 東レ・ダウコーニング株式会社 光半導体装置の製造方法および光半導体装置
JP4664032B2 (ja) 2004-10-13 2011-04-06 東レ・ダウコーニング株式会社 シリルアルコキシメチルハライドの製造方法
JP4849814B2 (ja) 2005-03-29 2012-01-11 東レ・ダウコーニング株式会社 ホットメルト型シリコーン系接着剤
JP4828146B2 (ja) 2005-03-30 2011-11-30 東レ・ダウコーニング株式会社 熱伝導性シリコーンゴム組成物
JP4828145B2 (ja) 2005-03-30 2011-11-30 東レ・ダウコーニング株式会社 熱伝導性シリコーンゴム組成物
JP5004433B2 (ja) 2005-04-27 2012-08-22 東レ・ダウコーニング株式会社 硬化性シリコーン組成物およびその硬化物
JP4931366B2 (ja) 2005-04-27 2012-05-16 東レ・ダウコーニング株式会社 硬化性シリコーン組成物および電子部品
TWI409309B (zh) * 2005-10-04 2013-09-21 Dow Corning Taiwan Inc 供織物塗佈之液體聚矽氧橡膠組合物
DE102006009394B4 (de) * 2006-03-01 2025-07-31 Nissan Chemical Industries, Ltd. Mehrlagenschichtsystem mit einer Schicht als Trennschicht zum Trägern von dünnen Wafern bei der Halbleiterherstellung, Verwendung des Schichtsystems beim und Verfahren zum Abdünnen eines Wafers
US8911583B2 (en) 2006-03-01 2014-12-16 Thin Materials Ag Method for processing, in particular, thin rear sides of a wafer, wafer-carrier arrangement and method for producing said type of wafer-carrier arrangement
JP5285846B2 (ja) 2006-09-11 2013-09-11 東レ・ダウコーニング株式会社 硬化性シリコーン組成物および電子部品
WO2008056810A1 (en) * 2006-11-08 2008-05-15 Dow Corning Toray Co., Ltd. Three-dimentional molded article, manufacturing method thereof and use thereof
JP5284143B2 (ja) * 2009-03-02 2013-09-11 本田技研工業株式会社 燃料電池用接着剤及びこれを用いた膜電極構造体
JP2010284869A (ja) * 2009-06-11 2010-12-24 Shin-Etsu Chemical Co Ltd 接合部材
DE102013225109A1 (de) * 2013-12-06 2015-06-11 Robert Bosch Gmbh Verfahren zum Befestigen eines Mikrochips auf einem Substrat
DE102014219095A1 (de) * 2014-09-22 2016-03-24 Nissan Chemical Industries, Ltd. Wafer-Träger-Anordnung
CN104485304B (zh) * 2015-01-07 2018-03-20 海太半导体(无锡)有限公司 一种芯片黏着检测装置
JP2017050322A (ja) * 2015-08-31 2017-03-09 Jsr株式会社 基材の処理方法、半導体装置およびその製造方法
CN107346746B (zh) * 2016-05-05 2020-09-08 中芯国际集成电路制造(上海)有限公司 一种半导体器件及其制造方法和电子装置
WO2018027108A1 (en) * 2016-08-05 2018-02-08 Marsh Stephen Alan Micro pressure sensor
KR102318181B1 (ko) 2017-02-08 2021-10-27 엘켐 실리콘즈 유에스에이 코포레이션 열 관리가 개선된 이차 배터리 팩
GB2564188B (en) * 2017-04-24 2022-02-09 Fuji Polymer Ind Silicone sheet and mounting method using the same
TWI762649B (zh) * 2017-06-26 2022-05-01 日商杜邦東麗特殊材料股份有限公司 黏晶用固化性矽組合物
KR102873949B1 (ko) 2018-10-30 2025-10-22 다우 도레이 캄파니 리미티드 경화 반응성 실리콘 조성물 및 그 경화물 및 이들의 용도
TWI843786B (zh) 2018-12-27 2024-06-01 日商陶氏東麗股份有限公司 固化性聚矽氧組合物、其固化物及其製造方法
KR102912731B1 (ko) 2018-12-27 2026-01-16 다우 도레이 캄파니 리미티드 경화성 실리콘 조성물, 그의 경화물 및 그의 제조 방법
TWI844606B (zh) 2018-12-27 2024-06-11 日商陶氏東麗股份有限公司 具有熱熔性之固化性聚矽氧薄片之製造方法
WO2020203306A1 (ja) 2019-03-29 2020-10-08 ダウ・東レ株式会社 硬化性シリコーン組成物、その硬化物、およびその製造方法
KR102952088B1 (ko) 2019-03-29 2026-04-15 다우 도레이 캄파니 리미티드 경화성 실리콘 조성물, 그의 경화물 및 그의 제조 방법
CN113631659B (zh) 2019-03-29 2023-05-05 陶氏东丽株式会社 固化性有机硅组合物、其固化物及其制造方法
CN110350061B (zh) * 2019-07-10 2024-11-29 佛山市国星半导体技术有限公司 一种免用封装胶的led芯片、封装器件及封装方法
US12134697B2 (en) 2019-12-27 2024-11-05 Dow Toray Co., Ltd. Curable hot-melt silicone composition, cured material thereof, and laminate containing curable hot-melt silicone composition or cured material thereof

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3284406A (en) * 1963-12-18 1966-11-08 Dow Corning Organosiloxane encapsulating resins
US3457214A (en) * 1965-12-15 1969-07-22 Gen Electric Low temperature vulcanizing composition and article made therefrom
US3436366A (en) * 1965-12-17 1969-04-01 Gen Electric Silicone potting compositions comprising mixtures of organopolysiloxanes containing vinyl groups
BE759624A (fr) * 1969-12-01 1971-06-01 Dow Corning Caoutchouc de silicone resistant aux salissures et sa fabrication
US3989790A (en) * 1974-03-22 1976-11-02 Sws Silicones Corporation Method for preparing silicone rubber molds
US4163082A (en) * 1978-10-23 1979-07-31 Dow Corning Corporation U.V.-radiation method for decreasing surface tack of disposed organopolysiloxane greases and gels
US4297265A (en) * 1979-11-23 1981-10-27 Otto Fabric, Inc. Silicone rubber coating material having reduced surface tension
JPS5952910B2 (ja) * 1980-12-26 1984-12-21 東芝シリコ−ン株式会社 常温硬化性ポリオルガノシロキサン組成物
US4746699A (en) * 1983-07-07 1988-05-24 General Electric Company Curable silicone compositions
US4500584A (en) * 1983-07-07 1985-02-19 General Electric Company Transparent membrane structures
JPS6290369A (ja) * 1985-10-11 1987-04-24 ト−レ・シリコ−ン株式会社 シリコ−ン被覆布の接合方法
MX174519B (es) * 1989-05-08 1994-05-23 Atd Corp Laminado adhesivo sensible a la presion
US4940112A (en) * 1989-06-20 1990-07-10 Neill Justin T O High performance flame and smoke foam-barrier-foam-facing acoustical composite
US5449560A (en) * 1991-07-05 1995-09-12 Dow Corning S.A. Composition suitable for glass laminate interlayer and laminate made therefrom
JPH0584861A (ja) * 1991-09-30 1993-04-06 Japan Gore Tex Inc シリコーン樹脂を使用した複合材料
JPH05179211A (ja) * 1991-12-30 1993-07-20 Nitto Denko Corp ダイシング・ダイボンドフイルム
JP2994510B2 (ja) * 1992-02-10 1999-12-27 ローム株式会社 半導体装置およびその製法
EP0571649A1 (en) * 1992-05-26 1993-12-01 Nitto Denko Corporation Dicing-die bonding film and use thereof in a process for producing chips
US5357007A (en) * 1993-03-12 1994-10-18 General Electric Company Method for making a solventless silicone pressure sensitive adhesive composition and product
US5658629A (en) * 1994-03-03 1997-08-19 Morgan Adhesives Company Double-sided silicone coated liner
JP2896752B2 (ja) * 1995-03-30 1999-05-31 株式会社巴川製紙所 電子部品用接着テープ
JPH09183903A (ja) * 1995-12-28 1997-07-15 Toray Dow Corning Silicone Co Ltd 硬化性シリコーン組成物
JP3280224B2 (ja) * 1996-02-06 2002-04-30 東レ・ダウコーニング・シリコーン株式会社 熱伝導性シリコーンゲルシートおよびその製造方法
JP3413707B2 (ja) 1996-07-04 2003-06-09 信越化学工業株式会社 シート状接着剤
JP3420473B2 (ja) * 1997-04-30 2003-06-23 東レ・ダウコーニング・シリコーン株式会社 シリコーン系接着性シート、その製造方法、および半導体装置
JP3915940B2 (ja) * 1997-06-10 2007-05-16 日立化成工業株式会社 絶縁層用接着フィルム
US5993590A (en) * 1997-07-01 1999-11-30 Manni-Kit, Inc. Method for coating objects with silicone
US5932060A (en) * 1997-09-12 1999-08-03 General Electric Company Paper release laminates having improved release characteristics
US6369185B1 (en) * 1999-03-31 2002-04-09 Dow Corning Toray Silicone Co., Ltd. Curable organopolysiloxane composition, cured products formed therefrom and unified articles
JP2001019933A (ja) * 1999-07-09 2001-01-23 Dow Corning Toray Silicone Co Ltd シリコーン系接着性シート、およびその製造方法
JP2001139894A (ja) * 1999-11-15 2001-05-22 Dow Corning Toray Silicone Co Ltd シリコーン系接着性シート、および半導体装置
JP3850629B2 (ja) * 2000-05-19 2006-11-29 ユニ・チャーム株式会社 シリコーン系化合物の層を有する吸収性物品
US6319754B1 (en) * 2000-07-10 2001-11-20 Advanced Semiconductor Engineering, Inc. Wafer-dicing process
US6716533B2 (en) * 2001-08-27 2004-04-06 General Electric Company Paper release compositions having improved adhesion to paper and polymeric films
TWI250190B (en) * 2001-10-03 2006-03-01 Dow Corning Toray Silicone Adhesive sheet of cross-linked silicone, method of manufacturing thereof, and device
US6660396B1 (en) * 2002-06-03 2003-12-09 Truseal Usa, Inc. Molded encapsulated indicia system
JP3919001B2 (ja) * 2002-08-08 2007-05-23 信越化学工業株式会社 付加反応硬化型オルガノポリシロキサン組成物

Also Published As

Publication number Publication date
KR20050021485A (ko) 2005-03-07
TW200405492A (en) 2004-04-01
JP2004043814A (ja) 2004-02-12
US20060057779A1 (en) 2006-03-16
WO2004007628A1 (en) 2004-01-22
AU2003249594A1 (en) 2004-02-02
TWI293191B (en) 2008-02-01
CN1668715A (zh) 2005-09-14
US7534659B2 (en) 2009-05-19
EP1539898A1 (en) 2005-06-15

Similar Documents

Publication Publication Date Title
CN1276046C (zh) 硅氧烷基粘合片材、将半导体芯片粘接到芯片连接元件上的方法,和半导体器件
JP4849814B2 (ja) ホットメルト型シリコーン系接着剤
JP7820893B2 (ja) 硬化性ホットメルトシリコーン組成物、その硬化物、及び前記組成物又は硬化物を含む積層体
TWI851695B (zh) 固化性聚矽氧組成物、其固化物及其製造方法
JP3420473B2 (ja) シリコーン系接着性シート、その製造方法、および半導体装置
US5804631A (en) Curable organosiloxane compositions and semiconductor devices
KR101349619B1 (ko) 반도체 장치의 제조방법 및 이로부터 제조한 반도체 장치
EP1432774B1 (en) Adhesive sheet of cross-linked silicone, method of manufacturing thereof and device comprising the sheet
CN1898786A (zh) 半导体器件及其制造方法
TWI863898B (zh) 聚矽氧系接著片、含有其之積層體、半導體裝置之製造方法
CN1666326A (zh) 半导体封装件及其制备方法
KR20070094553A (ko) 열경화성 조성물 및 상기 조성물로부터 얻어지는 층을구비한 필름
JP7509755B2 (ja) 硬化性シリコーン組成物、その硬化物、およびその製造方法
TW202233779A (zh) 一體型切晶黏晶用片及半導體裝置之製造方法
JP3420510B2 (ja) シリコーン系接着性シート、その製造方法、および半導体装置
CN1280899C (zh) 半导体装置组装用屏蔽片及半导体装置组装方法
KR102952677B1 (ko) 경화성 실리콘 조성물, 그의 경화물 및 그의 제조 방법
CN120380086A (zh) 热熔性固化性有机硅组合物、使用该组合物的层叠体以及半导体装置的制造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20060920

Termination date: 20140714

EXPY Termination of patent right or utility model