WO2020203306A1 - 硬化性シリコーン組成物、その硬化物、およびその製造方法 - Google Patents
硬化性シリコーン組成物、その硬化物、およびその製造方法 Download PDFInfo
- Publication number
- WO2020203306A1 WO2020203306A1 PCT/JP2020/012029 JP2020012029W WO2020203306A1 WO 2020203306 A1 WO2020203306 A1 WO 2020203306A1 JP 2020012029 W JP2020012029 W JP 2020012029W WO 2020203306 A1 WO2020203306 A1 WO 2020203306A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- group
- curable silicone
- silicone composition
- cured product
- component
- Prior art date
Links
- 0 CC(C)(CC([S+]C)=C)C(CC1(C)NI=CC(C)(C(C)(C=*)NC)C1(C)C(*)(C(C)(C)*I)N)(*I)N Chemical compound CC(C)(CC([S+]C)=C)C(CC1(C)NI=CC(C)(C(C)(C=*)NC)C1(C)C(*)(C(C)(C)*I)N)(*I)N 0.000 description 2
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
- C08J3/243—Two or more independent types of crosslinking for one or more polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/22—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of indefinite length
- B29C43/24—Calendering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/22—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of indefinite length
- B29C43/28—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of indefinite length incorporating preformed parts or layers, e.g. compression moulding around inserts or for coating articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/22—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of indefinite length
- B29C43/30—Making multilayered or multicoloured articles
- B29C43/305—Making multilayered articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/0001—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor characterised by the choice of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/14—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
- B29C45/14336—Coating a portion of the article, e.g. the edge of the article
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/80—Siloxanes having aromatic substituents, e.g. phenyl side groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/14—Peroxides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
- C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
- C09J5/06—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving heating of the applied adhesive
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/10—Adhesives in the form of films or foils without carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/35—Heat-activated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2083/00—Use of polymers having silicon, with or without sulfur, nitrogen, oxygen, or carbon only, in the main chain, as moulding material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2007/00—Flat articles, e.g. films or sheets
- B29L2007/002—Panels; Plates; Sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/34—Electrical apparatus, e.g. sparking plugs or parts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2383/04—Polysiloxanes
- C08J2383/07—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/20—Applications use in electrical or conductive gadgets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
- C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/03—Polymer mixtures characterised by other features containing three or more polymers in a blend
- C08L2205/035—Polymer mixtures characterised by other features containing three or more polymers in a blend containing four or more polymers in a blend
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2400/00—Presence of inorganic and organic materials
- C09J2400/10—Presence of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2483/00—Presence of polysiloxane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/296—Organo-silicon compounds
Definitions
- the present invention can be obtained by a simple manufacturing method, has hot melt properties, and is curable in the form of granules, pellets, or sheets that firmly adhere to a poorly adherent substrate.
- silicone composition relates to a cured product made of the silicone composition, a method for molding the cured product, and a semiconductor device including the cured product.
- the curable silicone composition is used in a wide range of industrial fields because it cures to form a cured product having excellent heat resistance, cold resistance, electrical insulation, weather resistance, water repellency, and transparency.
- a cured product of such a curable silicone composition is generally less likely to discolor than other organic materials, and has a small decrease in physical properties, so that it is also suitable as a sealing agent for optical materials and semiconductor devices.
- a hot-melt curable silicone composition has been widely used as a sealing agent for optical materials and semiconductor devices from the viewpoint of handling workability.
- Patent Document 1 the applicant proposes a hot-meltable curable silicone composition for molding having a low coefficient of linear expansion of the obtained cured product.
- these compositions contain a large amount of functional inorganic filler, it may be difficult to adhere to a poorly adhesive base material such as gold or nickel, leaving room for improvement.
- Patent Document 3 reports that the adhesiveness at the time of low temperature curing is improved by adding a silatlan derivative to a silicone-based adhesive having no hot melt property. Further, in the examples of Patent Document 4, an adhesive composition in which a silane-based adhesive-imparting agent containing a silatlan derivative is added to a hot-melt silicone containing no functional inorganic filler is disclosed, but it is general. No description or suggestion has been made regarding the superiority of the silatlan derivative when comparing the silane compound and the silatlan derivative.
- An object of the present invention is that it has hot melt properties, and even if it contains a large amount of functional inorganic filler, it has excellent melting characteristics, excellent handling workability and curing characteristics, and strongly adheres to a difficult-to-adhere material and linearly expands.
- An object of the present invention is to provide a curable silicone composition capable of forming a cured product having a low coefficient.
- Another object of the present invention is to provide a method for efficiently producing such a curable silicone composition in any of granular, pellet-like, and sheet-like forms.
- the present invention provides a semiconductor device member made of a cured product of such a curable silicone composition, a semiconductor device having the cured product, and a method for molding the cured product.
- A Oganopolysiloxane resin fine particles containing at least 20 mol% or more of the siloxane unit represented by SiO 3/2
- B Adhesion imparted to one or more selected from the silatlan derivative and the carbasilatlan derivative.
- the content of the component (D) is at least 50% by volume or more with respect to the entire composition.
- a curable silicone composition characterized by being solid at 25 ° C. and having a hot melt property at a temperature of 200 ° C. or lower.
- the present invention has been reached by finding that the above problems can be solved.
- the curable silicone composition may be in the form of pellets or sheets.
- the curable silicone composition may be in the form of granules, pellets or sheets.
- the curable silicone composition may be in the form of a substantially flat curable silicone composition sheet having a thickness of 10 to 1000 ⁇ m.
- the above-mentioned curable silicone composition can be used for a peelable laminate having the following constitution. That is, a peelable laminate having the above-mentioned curable silicone composition sheet and a sheet-like base material having a peeling surface facing the curable silicone composition sheet on one or both sides of the curable silicone composition sheet. It may be in the form of a body. Such a curable silicone composition sheet may be used as a film-like or sheet-like silicone adhesive.
- the curable silicone composition of the present invention can be used in the form of a cured product, and can be used as a member for a semiconductor device.
- the curable granular silicone composition of the present invention and a cured product thereof can be used in a semiconductor device, and a power semiconductor device, an optical semiconductor device, and a flexible product formed of the cured product to form a sealing material, a light reflecting material, or the like.
- a semiconductor device mounted on a circuit board is provided.
- the curable granular silicone composition of the present invention has excellent gap fill property at the time of melting, and the cured product has excellent flexibility and toughness at room temperature to high temperature, so that the semiconductor device can be formed by so-called mold underfilling or wafer molding.
- a semiconductor device that is collectively sealed or a semiconductor element substrate after sealing in which a semiconductor element is sealed by the cured product on a flexible circuit substrate that is premised on use of deformation (bending or the like) is preferably provided.
- the method for molding the curable granular silicone composition of the present invention includes at least the following steps.
- the above-mentioned molding method includes transfer molding, compression molding, or injection molding, and the curable granular silicone composition of the present invention. Is suitably used as these molding materials.
- the curable granular silicone composition of the present invention is a coating step of overmolding and underfilling a semiconductor element such as a power semiconductor represented by a cured product at the same time, that is, a so-called mold underfill method or a semiconductor. It is an overmold molding that covers the surface of the semiconductor wafer substrate on which the element is mounted and fills the gaps between the semiconductor elements.
- the 8-inch wafer molding method may collectively seal relatively large wafers such as 12-inch wafers. It can be suitably used as a molding material.
- the curable granular silicone composition of the present invention can be suitably used for applications exposed to high temperatures such as sealing of power semiconductors. It can also be used for large area encapsulation of semiconductor substrates (including wafers).
- Step 1 Mix each raw material component of the curable silicone composition at a temperature of 50 ° C. or higher
- Step 2 Knead the mixture obtained in Step 1 while heating and melting
- Step 3 Obtained in Step 2.
- Step 4 Laminate the mixture after heating and melting between films having at least one peeling surface
- Step 4 Stretch the laminate obtained in Step 3 between rolls to mold a curable silicone sheet with a specific film thickness.
- the curable silicone composition of the present invention is a cured product having a hot melt property, excellent handling workability and curing properties, firmly adhering to a poorly adhesive substrate, and having a low coefficient of linear expansion. Can be formed. Further, such a curable silicone composition can be produced only by a simple mixing step, and can be efficiently produced. Further, the cured product of the present invention is useful as a member of a semiconductor device, and by using the molding method of the present invention, these cured products can be efficiently produced according to the intended use.
- the curable silicone composition of the present invention (A) Oganopolysiloxane resin fine particles (B) silatlan derivatives and carbs containing at least 20 mol% or more of siloxane units represented by RSiO 3/2 (in the formula, R is a monovalent hydrocarbon group).
- the content of the component (D) is at least 50% by volume or more with respect to the entire composition. It is characterized in that it is solid at 25 ° C. and has a hot melt property at a temperature of 200 ° C. or lower.
- “having hot melt property” means that the softening point is 50 ° C. or higher and the melt viscosity (preferably less than 1000 Pa ⁇ s) is obtained at 150 ° C. It means that it has the property of flowing. On the other hand, when the softening point is 200 ° C. or higher, it is defined as “having no hot melt property” because it is higher than the general operating temperature for molding applications.
- average particle size it means the primary average particle size of particles.
- the component (A) is the main ingredient of the present composition and is a component that imparts hot melt property to the present composition. Further, since it has a curing reactive group containing a carbon-carbon double bond, it is cured by a curing agent which is a component (C). Examples of the curing reaction include a hydrosilylation reaction and a radical reaction.
- the component (A) needs to be in the form of organopolysiloxane resin fine particles in order to have a hot melt property and the component (D) to be blended in at least 50% by volume with respect to the entire composition.
- the hydrosilylation-reactive group in the component (A) includes a vinyl group, an allyl group, a butenyl group, a pentenyl group, a hexenyl group, a heptenyl group, an octenyl group, a nonenyl group, a decenyl group, an undecenyl group, a dodecenyl group and the like. 2 to 20 alkenyl groups and silicon atom-bonded hydrogen atoms are exemplified.
- the alkenyl group is preferable as the hydrosilylation-reactive group.
- the alkenyl group may be linear or branched, preferably a vinyl group or a hexenyl group.
- the component (A) preferably has at least two hydrosilylation-reactive groups in one molecule.
- Examples of the group bonded to the silicon atom other than the hydrosilylation-reactive group in the component (A) include an alkyl group having 1 to 20 carbon atoms, a halogen-substituted alkyl group having 1 to 20 carbon atoms, and an aryl group having 6 to 20 carbon atoms.
- a halogen-substituted aryl group having 6 to 20 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, an alkoxy group, and a hydroxyl group are exemplified.
- alkyl groups such as methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group and dodecyl group; phenyl group and trill group.
- Aryl groups such as xylyl group, naphthyl group, anthracenyl group, phenanthryl group, pyrenyl group; aralkyl groups such as phenethyl group and phenylpropyl group; and some or all of the hydrogen atoms bonded to these groups are chlorine atoms.
- a group substituted with a halogen atom such as a bromine atom; an alkoxy group such as a methoxy group, an ethoxy group or a propoxy group is exemplified.
- a halogen atom such as a bromine atom
- an alkoxy group such as a methoxy group, an ethoxy group or a propoxy group
- phenyl groups and hydroxyl groups are preferable.
- the radically reactive group in the component (A) includes a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group and a dodecyl group.
- Alkenyl groups; acrylic-containing groups such as 3-acryloxypropyl group and 4-acryloxybutyl group; methacryl-containing groups such as 3-methacryloxypropyl group and 4-methacryloxybutyl group; and silicon atom-bonded hydrogen atoms are exemplified. Will be done.
- the radical reactive group an alkenyl group is preferable.
- the alkenyl group may be linear or branched, preferably a vinyl group or a hexenyl group.
- the component (A) preferably has at least two radical reactive groups in one molecule.
- Examples of the group bonded to the silicon atom other than the radical reactive group in the component (A) include a halogen-substituted alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, and a halogen-substituted aryl group having 6 to 20 carbon atoms.
- Groups, arylyl groups having 7 to 20 carbon atoms, alkoxy groups, and hydroxyl groups are exemplified, and groups similar to the above are exemplified.
- phenyl groups and hydroxyl groups are preferable.
- the component (A) preferably contains 10 mol% or more of all organic groups in the molecule as an aryl group, particularly a phenyl group.
- the component (A) preferably contains organopolysiloxane resin fine particles having a curing reactive functional group containing at least one carbon-carbon double bond.
- the organopolysiloxane resin fine particles may be hot-meltable as a whole molecule, or may contain organopolysiloxane resin fine particles having no hot-melt property as a whole molecule.
- the component (A) (A1) It has a softening point of 30 ° C. or higher, has a curing-reactive functional group containing at least one carbon-carbon double bond in the molecule, and has RSiO 3/2 (in the formula, R is monovalent hydrocarbon). It is preferable that the organic polysiloxane resin fine particles have a hot melt property and contain at least 20 mol% or more of the siloxane unit represented by the hydrogen group).
- these components will be described.
- (A1) component Since the component (A1) itself has a hot-melt property and has a curing-reactive functional group containing at least one carbon-carbon double bond in the molecule, it is cured by a curing agent (C) described later. To do.
- Such (A1) component is (A 1 ) Resin-like organopolysiloxane, (A 2 ) Organopolysiloxane crosslinked product obtained by cross-linking at least one type of organopolysiloxane.
- the component (A 1 ) is a resinous organopolysiloxane having a carbon-carbon double bond group (hydrosilylation-reactive group and / or radical-reactive group), and RSiO 3/2 (in the formula, R is monovalent carbonized). It is preferably a hot-melt resinous organopolysiloxane having a large amount of T units containing at least 20 mol% or more of the siloxane units represented by (hydrocarbon groups) of all siloxane units and having an aryl group.
- Such (A 1 ) component preferably includes a triorganosyloxy unit (M unit) (the organo group is only a methyl group, a methyl group and a vinyl group or a phenyl group), and a diorganosyloxy unit (D).
- M unit triorganosyloxy unit
- D diorganosyloxy unit
- organo groups are methyl groups only, methyl and vinyl or phenyl groups
- monoorganosyloxy units (T units) organo groups are methyl, vinyl, or phenyl groups) and siloxy.
- the component (A 1 ) has at least two carbon-carbon double-bonding groups (hydrosilylation-reactive group and / or radical-reactive group) in the molecule, and 10 mol of all organic groups in the molecule. % Or more is preferably an aryl group, particularly a phenyl group.
- the component (A1) the following (ViMe 2 SiO 1/2 ) 0.25 (PhSiO 3/2 ) 0.75 (HO 1/2 ) 0.02 (ViMe 2 SiO 1/2 ) 0.25 (PhSiO 3/2 ) 0.75 (ViMe 2 SiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (ViMe 2 SiO 1/2 ) 0.15 (PhSiO 3/2 ) 0.85 (HO 1/2 ) 0.01 (Me 2 SiO 2/2 ) 0.15 (MeViSiO 2/2 ) 0.10 (PhSiO 3/2 ) 0.75 (HO 1/2 ) 0.04 (MeViPhSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.05 (ViMe 2 SiO 1/2 ) 0.15 (PhSiO 3/2 ) 0.75 (SiO 4/2 ) 0.10 (HO 1/2 ) 0.02 (Ph 2 SiO 2
- the component (A1) exhibits hot-melt property, specifically, is non-fluid at 25 ° C., and preferably has a melt viscosity at 100 ° C. of 8000 Pa ⁇ s or less.
- Non-fluidity means that it does not flow in a no-load state.
- the softening point of a hot melt adhesive by the ring ball method specified in JIS K 6863-1994 "Hot melt adhesive softening point test method”. The state below the softening point measured by the test method is shown. That is, in order to be non-fluid at 25 ° C, the softening point needs to be higher than 25 ° C.
- the component (A1) preferably has a melt viscosity at 100 ° C. of 8000 Pa ⁇ s or less, 5000 Pa ⁇ s or less, or 10 to 3000 Pa ⁇ s.
- the melt viscosity at 100 ° C. is within the above range, the adhesion after hot melting and cooling to 25 ° C. is good.
- the particle size is not limited, but the average primary particle size is within the range of 1 to 5000 ⁇ m, within the range of 1 to 500 ⁇ m, within the range of 1 to 100 ⁇ m, and within the range of 1 to 20 ⁇ m. , Or preferably in the range of 1 to 10 ⁇ m.
- This average primary particle size can be determined, for example, by observing with an optical microscope or SEM.
- the shape of the component (A1) is not limited, and spherical, spindle-shaped, plate-shaped, needle-shaped, and indefinite shapes are exemplified, and since it melts uniformly, it is preferably spherical or true spherical. In particular, by making the component (A1) a spherical shape of 1 to 10 ⁇ m, the melting characteristics of the present formulation and the mechanical properties after curing can be satisfactorily improved.
- the method for producing the component (A1) is not limited, and a known method can be used. For example, a method of simply atomizing the component (A1), or a method of cross-linking at least two kinds of organopolysiloxanes and a step of atomizing the reaction product can be performed simultaneously or separately.
- a method of simply atomizing the component (A1), or a method of cross-linking at least two kinds of organopolysiloxanes and a step of atomizing the reaction product can be performed simultaneously or separately.
- a part of the (C) component described later for example, a hydrosilylation reaction catalyst or the like may be finely divided together with the (A1) component, which is preferable.
- a method for atomizing the obtained organopolysiloxane after cross-linking at least two types of organopolysiloxane for example, a method of pulverizing the organopolysiloxane using a pulverizer or a method of directly pulverizing the organopolysiloxane in the presence of a solvent. Examples thereof include a method of making fine particles.
- the crusher is not limited, and examples thereof include a roll mill, a ball mill, a jet mill, a turbo mill, and a planetary mill.
- examples of the method of directly atomizing the silicone in the presence of a solvent include spraying with a spray dryer or atomizing with a twin-screw kneader or a belt dryer.
- using spherical hot-meltable organopolysiloxane resin fine particles obtained by spraying with a spray dryer can be used to determine the melting characteristics of the granular formulation, the flexibility of the cured product, the blending amount of the component (B), and the like. It is particularly preferable from the viewpoint of efficiency during production and workability of handling the composition.
- a component (A1) having a spherical shape and an average primary particle diameter of 1 to 500 ⁇ m can be produced.
- the heating / drying temperature of the spray dryer needs to be appropriately set based on the heat resistance of the organopolysiloxane resin fine particles and the like.
- the organopolysiloxane resin fine particles thus obtained can be recovered by a cyclone, a bag filter or the like.
- a solvent may be used in the above step within a range that does not inhibit the curing reaction.
- Solvents are not limited, but aliphatic hydrocarbons such as n-hexane, cyclohexane and n-heptane; aromatic hydrocarbons such as toluene, xylene and mesitylene; ethers such as tetrahydrofuran and dipropyl ether; hexamethyldisiloxane and octa Silicones such as methyltrisiloxane and decamethyltetrasiloxane; esters such as ethyl acetate, butyl acetate and propylene glycol monomethyl ether; ketones such as acetone, methylethylketone and methylisobutylketone are exemplified.
- the component (B) is an adhesion-imparting agent that is a feature of the present invention, and is one or more kinds of components selected from a silatlan derivative and a carbasilatlan derivative. In this composition, the component can dramatically improve the curable adhesiveness to a specifically poorly adhesive substrate.
- the silatlan derivative is disclosed in Patent Document 3 (Japanese Patent Laid-Open No. 2001-019933) described above.
- R4 is a divalent organic group
- R5 is an alkyl group having 1 to 10 carbon atoms
- R6 is a substituted or unsubstituted monovalent hydrocarbon group
- x is 1, 2, or 3.
- R2 is this alkoxysilyl group-containing organic group and R3 is substituted or unsubstituted. It is a group selected from the group consisting of a monovalent hydrocarbon group, an alkoxy group having 1 to 10 carbon atoms, a glycidoxyalkyl group, an oxylanylalkyl group, an asyloxyalkyl group, and an alkenyl group.
- ⁇ Is a silatlan derivative.
- R 1 in the formula is the same or different hydrogen atom or alkyl group, and in particular, R 1 is preferably a hydrogen atom or a methyl group.
- R 2 in the above formula consists of a group consisting of a hydrogen atom, an alkyl group, and an alkoxysilyl group-containing organic group represented by the general formula: -R 4- Si (OR 5 ) x R 6 (3-x). The same or different groups of choice, except that at least one of R 2 is this alkoxysilyl group-containing organic group. Examples of the alkyl group of R 2 include a methyl group.
- alkoxysilyl group-containing organic groups of R 2 , R 4 in the formula is a divalent organic group, and an alkylene group or an alkyleneoxyalkylene group is exemplified, and in particular, an ethylene group, a propylene group, a butylene group, and a methyleneoxy group. It is preferably a propylene group or a methyleneoxypentylene group.
- R 5 in the formula is an alkyl group having 1 to 10 carbon atoms, preferably a methyl group or an ethyl group.
- R 6 in the formula is a substituted or unsubstituted monovalent hydrocarbon group, preferably a methyl group.
- x in the formula is 1, 2, or 3, preferably 3.
- Examples of such an alkoxysilyl group-containing organic group of R 2 include the following groups. -(CH2) 2Si (OCH3) 3- (CH2) 2Si (OCH3) 2CH3 -(CH2) 3Si (OC2H5) 3- (CH2) 3Si (OC2H5) (CH3) 2 -CH2O (CH2) 3Si (OCH3) 3 -CH2O (CH2) 3Si (OC2H5) 3 -CH2O (CH2) 3Si (OCH3) 2CH3 -CH2O (CH2) 3Si (OC2H5) 2CH3 -CH2OCH2Si (OCH3) 3-CH2OCH2Si (OCH3) (CH3) 2
- R 3 in the above formula is selected from the group consisting of a substituted or unsubstituted monovalent hydrocarbon group, an alkoxy group having 1 to 10 carbon atoms, a glycidoxyalkyl group, an oxylanylalkyl group, and an asyloxyalkyl group.
- Examples of the glycidoxyalkyl group of R 3 include a 3-glycidoxypropyl group, and examples of the oxylanylalkyl group of R 3 include a 4-oxylanylbutyl group and an 8-oxylanyloctyl group.
- Examples of the asyloxyalkyl group of R 3 include an acetoxypropyl group and a 3-methacryloxypropyl group.
- R 3 is preferably an alkyl group, an alkenyl group, or an alkoxy group, more preferably an alkyl group or an alkenyl group, and a group selected from a methyl group, a vinyl group, an allyl group, and a hexenyl group. Is particularly preferably exemplified.
- the carbacilatran derivative is prepared by reacting an alkoxysilane having an amino group-containing organic group with an alkoxysilane having an epoxy group-containing organic group by the method described in JP-A No. 10-195085, particularly by an alcohol exchange reaction.
- a carbacilatran derivative having a silicon atom-bonded alkoxy group or a silicon atom-bonded alkenyl group in one molecule represented by the following structure is preferably exemplified.
- Rc is a group selected from a methoxy group, an ethoxy group, a vinyl group, an allyl group and a hexenyl group.
- the amount of the component (B) used is not particularly limited, but is preferably in the range of 0.1 to 1.0% by mass of the entire composition from the viewpoint of improving the adhesiveness to the difficult-to-adhere substrate.
- the range of 0.2 to 1.0% by mass is more preferable.
- the component (B) may be in the range of 5 to 50 parts by mass with respect to the blending amount of the component (A) and 100 parts by mass of the component (A), and may be in the range of 5 to 40 parts by mass.
- the component (C) is a curing agent for curing the component (A), and is not limited as long as the component (A) can be cured.
- the component (C) is an organohydrogenpolysiloxane having at least two silicon atom-bonded hydrogen atoms in one molecule and a catalyst for a hydrosilylation reaction (A).
- the component (C) may be only an organopolysiloxane having at least two silicon atom-bonded hydrogen atoms in one molecule.
- a hydrosilylation reaction catalyst may be used in combination.
- the component (C) When the component (A) has an alkenyl group, the component (C) may be an organic peroxide, and an organopolysiloxane having at least two silicon atom-bonded hydrogen atoms in one molecule may be used in combination. Good. On the other hand, when the component (A) has a silicon atom-bonded hydrogen atom, the component (C) is an organopolysiloxane having at least two alkenyl groups in one molecule and a catalyst for the hydrosilylation reaction (A). When the component) has a silicon atom-bonded hydrogen atom and contains a hydrosilylation reaction catalyst, the component (C) may be only an organopolysiloxane having at least two alkenyl groups in one molecule. A catalyst for hydrosilylation reaction may be used in combination.
- organopolysiloxane in the component (C) examples include the alkenyl group-containing organopolysiloxane represented by the above (a 1 ) and / or the above (a 2 ), or the above (a 3 ) and / or the above (a 4 ).
- An example is an organopolysiloxane containing a silicon atom-bonded hydrogen atom represented by.
- organopolysiloxane When organopolysiloxane is used as the component (C), its content is not limited, but in order for the composition to cure, the number of silicon atom-bonded hydrogen atoms is 0 with respect to 1 mol of the alkenyl group in the composition.
- the amount is preferably in the range of .5 to 20 mol, or preferably in the range of 1.0 to 10 mol.
- Examples of the catalyst for the hydrosilylation reaction include a platinum-based catalyst, a rhodium-based catalyst, and a palladium-based catalyst, and a platinum-based catalyst is preferable because it can remarkably accelerate the curing of the present composition.
- Examples of the platinum-based catalyst include platinum fine powder, platinum chloride acid, an alcohol solution of platinum chloride acid, a platinum-alkenylsiloxane complex, a platinum-olefin complex, a platinum-carbonyl complex, and these platinum-based catalysts are made of silicone resin and polycarbonate.
- Examples of catalysts are dispersed or encapsulated in a thermoplastic resin such as a resin or an acrylic resin, and a platinum-alkenylsiloxane complex is particularly preferable.
- alkenylsiloxane examples include 1,3-divinyl-1,1,3,3-tetramethyldisiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane.
- alkenylsiloxanes examples include alkenylsiloxanes in which some of the methyl groups of these alkenylsiloxanes are substituted with ethyl groups, phenyl groups and the like, and alkenylsiloxanes in which the vinyl groups of these alkenylsiloxanes are substituted with allyl groups, hexenyl groups and the like.
- the platinum-alkenylsiloxane complex since it has good stability, it is preferably 1,3-divinyl-1,1,3,3-tetramethyldisiloxane.
- a fine particle platinum-containing hydrosilylation reaction catalyst dispersed or encapsulated with a thermoplastic resin may be used.
- a non-platinum metal catalyst such as iron, ruthenium, or iron / cobalt may be used.
- the amount of the catalyst for the hydrosilylation reaction to be added is an amount in which the metal atom is in the range of 0.01 to 500 ppm in mass unit, an amount in the range of 0.01 to 100 ppm, or an amount of the metal atom with respect to the component (A).
- the amount is preferably in the range of 0.01 to 50 ppm.
- organic peroxides examples include alkyl peroxides, diacyl peroxides, esters peroxide, and carbonates peroxide.
- alkyl peroxides examples include dicumyl peroxide, di-tert-butyl peroxide, di-tert-butyl cumyl peroxide, 2,5-dimethyl-2,5-di (tert-butylperoxy) hexane, and 2, , 5-Dimethyl-2,5-di (tert-butylperoxy) hexin-3, tert-butylcumyl, 1,3-bis (tert-butylperoxyisopropyl) benzene, 3,6,9-triethyl-3, 6,9-trimethyl-1,4,7-triperoxonan is exemplified.
- diacyl peroxides examples include benzoyl peroxide, lauroyl peroxide, and decanoyl peroxide.
- peroxide esters examples include 1,1,3,3-tetramethylbutylperoxyneodecanoate, ⁇ -cumylperoxyneodecanoate, tert-butylperoxyneodecanoate, and tert-butylperoxy.
- Neoheptanoate tert-butylperoxypivalate, tert-hexylperoxypivalate, 1,1,3,3-tetramethylbutylperoxy-2-ethylhexanoate, tert-amylperoxyl-2- Ethylhexanoate, tert-butylperoxy-2-ethylhexanoate, tert-butylperoxyisobutyrate, di-tert-butylperoxyhexahydroterephthalate, tert-amylperoxy-3,5,5- Examples thereof include trimethylhexanoate, tert-butylperoxy-3,5,5-trimethylhexanoate, tert-butylperoxyacetate, tert-butylperoxybenzoate and di-butylperoxytrimethyladipate.
- carbonate peroxides examples include di-3-methoxybutylperoxydicarbonate, di (2-ethylhexyl) peroxydicarbonate, diisopropylperoxycarbonate, tert-butylperoxyisopropylcarbonate, and di (4-tert-butylcyclohexyl).
- Peroxydicarbonate, disetylperoxydicarbonate, dimyristylperoxydicarbonate are exemplified.
- This organic peroxide preferably has a half-life of 10 hours and a temperature of 90 ° C. or higher, or 95 ° C. or higher.
- organic peroxides include dicumyl peroxide, di-t-butyl peroxide, di-t-hexyl peroxide, and t-butyl cumyl peroxide, 2,5-dimethyl-2,5-di ().
- the content of the organic peroxide is not limited, but is within the range of 0.05 to 10 parts by mass or the range of 0.10 to 5.0 parts by mass with respect to 100 parts by mass of the component (A). Is preferable.
- the component (D) of the present invention is an inorganic filler, and it is possible to provide a curable silicone composition that is cured to give a cured product having excellent hardness and toughness at room temperature to high temperature.
- the content of the component (B) is 50% by volume or more of the entire composition, preferably 60% by volume or more. More preferably, it is in the range of 70% by volume or more, particularly 80 to 95% by volume.
- component (D) was added to the mass of a particular surface treatment agent, in particular component (D). It is preferably treated with a surface treatment agent of 1 to 2.0% by mass, 0.1 to 1.0% by mass, and 0.2 to 0.8% by mass.
- a surface treatment agent of 1 to 2.0% by mass, 0.1 to 1.0% by mass, and 0.2 to 0.8% by mass.
- these surface treatment agents include, for example, methylhydrogenpolysiloxane, silicone resin, metal soap, silane coupling agent, perfluoroalkylsilane, and fluorine compounds such as perfluoroalkyl phosphate ester salt. Although it is good, it is particularly preferable that it is a silicone-based surface treatment agent described below.
- a silane-based surface treatment agent such as methyltrimethoxysilane or phenyltrimethoxysilane is selected as the surface treatment agent for the component (D)
- the hot meltability of the entire composition may be impaired, and (D) )
- the components cannot be stably blended up to the above-mentioned volume% content.
- an alkyltrialkoxysilane having a long-chain alkyl group such as an octyl group is selected as a surface treatment agent, the hot melt property of the composition and the compounding stability of the component (D) tend to be maintained.
- the strength of the cured product obtained by curing the composition of the above is deteriorated, which may cause cracks and molding defects.
- the silatrane derivative and the carbasilatlan derivative which are the components (B) have an alkoxy group like these silane compounds, but the melting characteristics of the composition even when mixed with the surface treatment agent described here. There is no effect of deteriorating the strength of the cured product, and there is an advantage that no adverse effect is caused even when used in combination with or mixed with the above-mentioned surface treatment agent.
- organosilicon compound which is a surface treatment agent a low molecular weight organosilicon compound such as silane, silazane, siloxane, or the like, and an organosilicon polymer or oligomer such as polysiloxane, polycarbosiloxane, or the like.
- organosilicon compound which is a surface treatment agent
- silane silazane, siloxane, or the like
- organosilicon polymer or oligomer such as polysiloxane, polycarbosiloxane, or the like.
- silane coupling agent is a so-called silane coupling agent.
- silane coupling agents include alkyltrialkoxysilanes (methyltrimethoxysilane, vinyltrimethoxysilane, hexyltrimethoxysilane, octyltrimethoxysilane, decyltrimethoxysilane or the like), organic functionals, etc.
- Group-containing trialkoxysilanes such as glycidoxypropyltrimethoxysilane, epoxycyclohexylethyltrimethoxysilane, methacryloxypropyltrimethoxysilane, aminopropyltrimethoxysilane, or the like).
- Preferred siloxanes and polysiloxanes include hexamethyldisiloxane, 1,3-dihexyl-tetramethyldisiloxane, single-terminated polydimethylsiloxane, trialkoxysilyl single-ended dimethylvinyl single-terminated. Examples thereof include polydimethylsiloxane, trialkoxysilyl single-ended organic functional group single-ended polydimethylsiloxane, trialkoxysilyl double-ended polydimethylsiloxane, organic functional group double-ended polydimethylsiloxane, or the like. .
- the number n of siloxane bonds is preferably in the range of 2 to 150.
- silazanes examples include hexamethyldisilazane, 1,3-dihexyl-tetramethyldisilazane, or the like.
- An example of a preferred polycarbosiloxane is a polymer having a Si—C—C—Si bond in the polymer backbone.
- Particularly suitable silicone-based surface treatment agents include, for example, silicone-based surface treatment agents having at least one polysiloxane structure and a hydrolyzable silyl group in the molecule. Most preferably, a silicone-based surface treatment agent having at least one polysiloxane structure and a hydrolyzable silyl group in the molecule is used.
- structural formula (2) R'3 SiO- (R'2 SiO) m -SiR' n (RO) 3-n Examples thereof include organopolysiloxanes having a linear alkoxysilyl terminal represented by.
- n is a number in the range 0 to 2
- m is a number in the range 2 to 200
- m may be a number in the range 2 to 150.
- Such component (D) is preferably at least one filler that does not have a softening point or does not soften below the softening point of component (A), improving the handling workability of the present composition.
- it may be a component that imparts mechanical properties or other properties to the cured product of the present composition.
- the component (D) include an inorganic filler, an organic filler, and a mixture thereof, and the inorganic filler is preferable.
- the inorganic filler include a reinforcing filler, a white pigment, a thermally conductive filler, a conductive filler, a phosphor, and a mixture of at least two of these, in order to achieve a filling amount of a high volume%.
- a reinforcing filler having an average particle diameter of 10.0 ⁇ m or more.
- the organic filler include silicone resin-based fillers, fluororesin-based fillers, and polybutadiene resin-based fillers.
- the shape of these fillers is not particularly limited, and may be spherical, spindle-shaped, flat-shaped, needle-shaped, amorphous, or the like.
- the component (D) is preferably an inorganic filler having an average particle size of 10.0 ⁇ m or more, and in particular, since the rate of change in hardness and storage elastic modulus from room temperature to high temperature is small, the average particle size is 10.0 ⁇ m or more. It is particularly preferable that it is a spherical inorganic filler. Further, by using an inorganic filler having a particle size larger than that of the component (A), the inorganic filler particles can form good packing at the time of melting, so that the average linear expansion coefficient can be greatly reduced. Such an inorganic filler can be blended or filled in a relatively large amount with respect to the component (A), and has a practical benefit of further improving the mechanical strength of the cured product.
- an inorganic filler or an organic filler having an average particle diameter of 5 ⁇ m or less may be blended. It is possible and preferable.
- this composition When this composition is used as a sealant, a protective agent, an adhesive, a light reflector, etc., it imparts mechanical strength to the cured product and improves the protective property or adhesiveness.
- a reinforcing filler As a component.
- the reinforcing filler include fumed silica, precipitated silica, molten silica, calcined silica, fumed titanium dioxide, quartz, calcium carbonate, diatomaceous earth, aluminum oxide, aluminum hydroxide, zinc oxide, and zinc carbonate. ..
- these reinforcing fillers are used as organoalkoxysilanes such as methyltrimethoxysilane; organohalosilanes such as trimethylchlorosilane; organosilazanes such as hexamethyldisilazane; ⁇ , ⁇ -silanol group-blocking dimethylsiloxane oligomers, ⁇ , ⁇ .
- the surface may be treated with a siloxane oligomer such as a silanol group-blocking methylphenylsiloxane oligomer or ⁇ , ⁇ -silanol group-blocking methylvinylsiloxane oligomer.
- a fibrous filler such as calcium metasilicate, potassium titanate, magnesium sulfate, sepiolite, zonolite, aluminum borate, rock wool, and glass fiber may be used.
- the component (D) is preferably spherical silica or aluminum oxide (alumina) having an average particle diameter of 10.0 ⁇ m or more. ..
- the component (D) may contain silicone fine particles that do not correspond to the component (A), and the stress relaxation characteristics and the like can be improved or adjusted as desired.
- the silicone fine particles include non-reactive silicone resin fine particles and silicone elastomer fine particles, and the silicone elastomer fine particles are preferably exemplified from the viewpoint of improving flexibility or stress relaxation characteristics.
- the silicone elastomer fine particles are crosslinked products of linear diorganopolysiloxane mainly composed of diorganosyloxy units (D units).
- Silicone elastomer fine particles can be prepared by a cross-linking reaction of diorganopolysiloxane by hydrosilylation reaction, condensation reaction of silanol group, etc.
- organohydrogenpolysiloxane having a silicon-bonded hydrogen atom at the side chain or the terminal side organohydrogenpolysiloxane having a silicon-bonded hydrogen atom at the side chain or the terminal side.
- a diorganopolysiloxane having an unsaturated hydrocarbon group such as an alkenyl group at the chain or the terminal can be preferably obtained by carrying out a cross-linking reaction under a hydrosilylation reaction catalyst.
- the silicone elastomer fine particles can take various shapes such as spherical, flat, and indefinite shapes, but are preferably spherical from the viewpoint of dispersibility, and more preferably true spherical.
- Examples of commercially available products of such (D) silicone elastomer fine particles include "Trefil E series” and “EP powder series” manufactured by Toray Dow Corning, and "KMP series” manufactured by Shin-Etsu Chemical Co., Ltd. ..
- the silicone elastomer fine particles may be surface-treated.
- a phosphor may be blended as the component (D) in order to convert the emission wavelength from the optical semiconductor element.
- the phosphor is not particularly limited, and is widely used for light emitting diodes (LEDs), such as oxide-based phosphors, oxynitride-based phosphors, nitride-based phosphors, sulfide-based phosphors, and acid sulfides. Examples thereof include yellow, red, green, and blue light emitting phosphors composed of physical phosphors and the like.
- oxide-based phosphor examples include yttrium, aluminum, and garnet-based YAG-based green to yellow-emitting phosphors containing cerium ions; terbium, aluminum, and garnet-based TAG-based yellow-emitting phosphors containing cerium ions; Examples thereof include silicate-based green to yellow luminescent phosphors containing europium ions.
- the oxynitride-based phosphor include silicon, aluminum, oxygen, and nitrogen-based sialone-based red to green luminescent phosphors containing europium ions.
- Examples of the nitride-based phosphor include calcium, strontium, aluminum, silicon, and nitrogen-based cousin-based red-emitting phosphors containing europium ions.
- Examples of the sulfide-based phosphor include a ZnS-based green color-developing phosphor containing copper ions and aluminum ions.
- the oxysulfide phosphor include europium ion Y 2 O 2 S based red phosphors may be exemplified. In this composition, two or more of these phosphors may be used in combination.
- the present composition may contain a thermally conductive filler or a conductive filler in order to impart thermal conductivity or electrical conductivity to the cured product.
- the thermally conductive filler or the conductive filler includes fine metal powders such as gold, silver, nickel, copper and aluminum; and fine powders such as ceramics, glass, quartz and organic resins on the surface of gold, silver, nickel, copper and the like. Fine powders deposited or plated with metal; metal compounds such as aluminum oxide, magnesium oxide, aluminum nitride, boron nitride, zinc oxide; graphite, and mixtures of two or more thereof are exemplified.
- a metal oxide powder or a metal nitride powder is preferable, and an aluminum oxide powder, a zinc oxide powder, or an aluminum nitride powder is particularly preferable.
- the content of the component (D) needs to satisfy the above range of volume%, but the content of the component (A) is within the range of 100 to 4000 parts by mass and 250 to 4000 parts by mass with respect to 100 parts by mass of the component. Or, it can be blended in the range of 500 to 4000 parts by mass.
- composition may contain hot-melt fine particles other than the component (A), a curing retarder and an adhesion-imparting agent as other optional components as long as the object of the present invention is not impaired.
- the hot-melt fine particles other than the component (A) one or more selected from various hot-melt synthetic resins, waxes, fatty acid metal salts and the like can be used.
- the wax component exhibits low kinematic viscosity at high temperature (150 ° C.) and forms a melt having excellent fluidity.
- the wax component in the melt composed of the present composition spreads rapidly over the entire composition at a high temperature, so that the melted composition is applied. It has the effect of lowering the viscosity of the base material surface and the entire composition, sharply reducing the surface friction of the base material and the molten composition, and significantly increasing the fluidity of the entire composition. Therefore, the viscosity and fluidity of the molten composition can be greatly improved by adding only a small amount with respect to the total amount of the other components.
- the wax component may be petroleum-based waxes such as paraffin as long as the above-mentioned drip point and kinematic viscosity at the time of melting are satisfied, but from the viewpoint of the technical effect of the present invention, a fatty acid metal salt or an erythritol derivative may be used. It is preferably a hot melt component composed of the fatty acid ester of, and is preferably a metal salt of a higher fatty acid such as stearic acid, palmitic acid, oleic acid, isononan acid, pentaerythritol tetrastearate, dipentaerythritol adipate stearic acid ester, and glycerintri.
- a fatty acid metal salt or an erythritol derivative may be used. It is preferably a hot melt component composed of the fatty acid ester of, and is preferably a metal salt of a higher fatty acid such as stearic acid, palmitic acid,
- -18-Hydroxystearate and pentaerythritol full stearate are particularly preferred.
- the type of the above-mentioned fatty acid metal salt is not particularly limited, but an alkali metal salt such as lithium, sodium and potassium; an alkaline earth metal salt such as magnesium, calcium and barium; or a zinc salt is preferable. Illustrated.
- a fatty acid metal salt or an erythritol derivative having a free fatty acid content of 5.0% or less, particularly preferably 4.0% or less, and 0.05 to 3.5% is particularly preferable.
- a component include at least one or more metal stearic acid salts. Specifically, calcium stearate (melting point 150 ° C.), zinc stearate (melting point 120 ° C.), magnesium stearate (melting point 130 ° C.), pentaerythritol tetrastearate (melting point 60-70 ° C.), pentaerythritol stearic acid stearate.
- a hot melt component having a melting point of 150 ° C. or lower which is selected from an acid ester (melting point 55-61 ° C.), pentaerythritol full stearate (melting point 62-67 ° C.) and the like.
- the amount of the wax component used is in the range of 0.01 to 5.0 parts by mass, 0.01 to 3.5 parts by mass, and 0.01 to 0.01 parts. It may be 3.0 parts by mass. If the amount of the wax component used exceeds the above upper limit, the adhesiveness and mechanical strength of the cured product obtained from the granular curable silicone composition of the present invention may be insufficient. Further, if the amount used is less than the above lower limit, sufficient fluidity at the time of heating and melting may not be realized.
- curing retarder examples include 2-methyl-3-butin-2-ol, 3,5-dimethyl-1-hexin-3-ol, 2-phenyl-3-butin-2-ol, and 1-ethynyl-1-.
- Alkyne alcohols such as cyclohexanol; enyne compounds such as 3-methyl-3-pentene-1-in, 3,5-dimethyl-3-hexene-1-in; tetramethyltetravinylcyclotetrasiloxane, tetramethyltetrahexenylcyclo
- An alkenyl group-containing low molecular weight siloxane such as tetrasiloxane
- alkynyloxysilanes such as methyl-tris (1,1-dimethylpropynyloxy) silane and vinyl-tris (1,1-dimethylpropynyloxy) silane are exemplified.
- the content of this curing retarder is not limited, but is
- the composition has heat resistance of iron oxide (bengala), cerium oxide, cerium dimethyl silanolate, fatty acid cerium salt, cerium hydroxide, zirconium compound and the like as other optional components as long as the object of the present invention is not impaired.
- Agent In addition, a dye, a pigment other than white, a flame retardant imparting agent, and the like may be contained.
- the cured product obtained by curing the above composition has an average coefficient of linear expansion of 20 ppm / ° C. or less, preferably 15 ppm / ° C. or less in the range of 25 ° C. to 200 ° C. Within this range, since the difference in the average coefficient of linear expansion from the substrate used is small, the residual stress in the obtained integrally molded product can be reduced, and the reliability of the device can be improved.
- the bending strength of cured product is preferably 15 MPa or more, or 20 MPa or more.
- the composition can take any form of granules, pellets, and sheets depending on the manufacturing process. When used as pellets, it can be efficiently produced by tableting and molding the granular composition.
- the "pellet” may also be referred to as a "tablet”.
- the shape of the pellet is not limited, but is usually spherical, elliptical, or cylindrical.
- the size of the pellet is not limited, but has, for example, an average particle diameter of 500 ⁇ m or more or a circle-equivalent diameter.
- This composition may be molded into a sheet and used.
- a sheet made of a curable granular silicone composition having an average thickness of 100 to 1000 ⁇ m has hot melt properties and heat curability at high temperatures. Therefore, especially when used for compression molding or the like, handling workability and melting It is advantageous in that it has excellent characteristics.
- Such a sheet-like composition is produced by integrating the curable granular composition obtained by the above method at a low temperature with a uniaxial or biaxial continuous kneader to obtain a predetermined thickness through two rolls or the like. Is also good.
- the present composition can be used in the form of a sheet, and in particular, a laminate having a structure including a sheet-like member made of the above-mentioned curable silicone composition between two film-like substrates provided with a release layer. Can be used as.
- Step 1 Mix the constituent components of the curable silicone composition
- Step 2 Knead the mixture obtained in Step 1 while heating
- Step 3 Mix the mixture obtained in Step 2 after heating and melting.
- Step 4 Laminating between films having at least one peeling surface
- Curable silicone comprising a step of stretching the laminate obtained in step 3 between rolls to form a curable silicone sheet having a specific film thickness. It can be achieved by a method for producing a sheet, and optionally, in step 4 and the like, a roll having a cooling or temperature control function may be used, and after step 4, a laminate containing the obtained curable silicone sheet may be used. It may have a step of cutting.
- the type of the film-like base material is not particularly limited, and a polyester film, a polyolefin film, a polycarbonate film, an acrylic film and the like can be appropriately used.
- the sheet-like substrate is preferably non-porous.
- the release layer has a structure necessary for easily removing a sheet-like member made of a curable silicone composition from a film-like substrate, and is sometimes called a release liner, a separator, a release layer, or a release coating layer.
- the release layer is a release layer having a release coating ability such as a silicone-based release agent, a fluorine-based release agent, an alkyd-based release agent, or a fluorosilicone-based release agent, and physically fine irregularities on the surface of the substrate.
- the base material itself which is difficult to adhere to the curing reactive silicone pressure-sensitive adhesive composition of the present invention or the adhesive layer made of the cured product thereof.
- the above-mentioned laminate can be used, for example, by applying a sheet-like member made of a curable silicone composition to an adherend and then peeling the uncured sheet-like member from a film-like base material. ..
- the sheet-like member made of the curable silicone composition has a thickness of 1 mm or less, and may be a film-like adhesive. That is, the laminate may contain a peelable film-like adhesive held by the base film, and is preferable. Since the film-like adhesive has a hot-melt property, it may be an adhesive used for temporarily fixing a semiconductor member or the like, and may be used as a die attach film.
- the sheet-like member made of the curable silicone composition may be integrally molded with the base material by compression molding or press molding as it is. At this time, molding is performed while leaving the film-like base material on one side, and molding is performed. It may be used as a release film to prevent adhesion to the mold at the time.
- non-fluidity means that it does not deform or flow in a no-load state, and preferably, when molded into pellets or tablets, it does not deform or flow in a state of 25 ° C. and no load. Is.
- Such non-fluidity can be evaluated, for example, by placing the molded composition on a hot plate at 25 ° C. and substantially not deforming or flowing even when no load or a constant load is applied. This is because when it is non-fluid at 25 ° C., the shape retention at the temperature is good and the surface adhesiveness is low.
- the softening point of this composition is preferably 100 ° C. or lower.
- the amount of deformation of the composition is measured, the amount of deformation in the height direction is 1 mm or more. It means the temperature that becomes.
- the viscosity of this composition tends to decrease sharply under high temperature and high pressure (that is, in the molding process), and it is preferable to use a value measured under the same high temperature and high pressure as a useful melt viscosity value. Therefore, it is preferable to measure the melt viscosity of this composition under high pressure using a high-grade flow tester (manufactured by Shimadzu Corporation) rather than measuring it with a rotational viscometer such as a rheometer.
- this composition preferably has a melt viscosity at 150 ° C. of 200 Pa ⁇ s or less, more preferably 150 or less. This is because the composition has good adhesion to the substrate after being hot-melted and then cooled to 25 ° C.
- the present composition can be produced as a granular composition by powder-mixing the components (A) to (D) and any other components at a temperature lower than the softening point of the component (A).
- the powder mixer used in this manufacturing method is not limited, and is not limited to a single-screw or bi-screw continuous mixer, a double-roll, a loss mixer, a hobert mixer, a dental mixer, a planetary mixer, a kneader mixer, a lab miller, a small crusher, and a Henschel mixer. Is exemplified, preferably a lab miller, a small crusher, and a Henschel mixer.
- the curable silicone sheet according to the present invention has a hot melt property and is characterized by comprising a curable silicone composition containing an organopolysiloxane resin, a curing agent and a functional filler, and the production method of the present invention is characterized. , The following steps 1 to 4 are included. Step 1: Mix the constituents of the curable silicone composition at a temperature of 50 ° C. or higher Step 2: Knead the mixture obtained in Step 1 while heating and melting Step 3: After heating and melting obtained in Step 2.
- Step 4 A step of laminating the mixture of the above in between films having at least one peeling surface
- Step 4 A step of stretching the laminate obtained in Step 3 between rolls to form a curable silicone sheet having a specific film thickness.
- “having hot meltability” means that the softening point is in the range of 50 ° C. to 200 ° C. and has the property of softening or flowing by heating.
- the mixture composed of the organopolysiloxane resin fine particles, the curing agent and the functional filler has the hot melt property regardless of the hot melt property of the organopolysiloxane resin fine particles which are the constituents thereof. You just have to have it.
- Step 1 The above step 1 is a step of mixing a curable granular silicone composition containing an organopolysiloxane resin (preferably in the state of fine particles), a curing agent, and a functional filler, which are constituents of the curable silicone composition.
- an organopolysiloxane resin preferably in the state of fine particles
- a curing agent preferably in the state of fine particles
- a functional filler which are constituents of the curable silicone composition.
- the mixture given in step 1 is a curable granular silicone composition, and the mixture as a whole has a hot melt property.
- the mixture is non-fluid at 25 ° C.
- non-fluidity means that it does not deform or flow in a no-load state, and preferably, when molded into pellets or tablets, it does not deform or flow in a state of 25 ° C. and no load. Is.
- Such non-fluidity can be evaluated, for example, by placing the molded composition on a hot plate at 25 ° C. and substantially not deforming or flowing even when no load or a constant load is applied. This is because when it is non-fluid at 25 ° C., the shape retention at the temperature is good and the surface adhesiveness is low.
- the softening point of the mixture given in step 1 is 200 ° C. or lower, preferably 150 ° C. or lower.
- a softening point is pressed on a hot plate with a load of 100 grams for 10 seconds from above and the load is removed, the amount of deformation of the composition is measured, the amount of deformation in the height direction is 1 mm or more. It means the temperature that becomes.
- the softening point of the mixture given in step 1 is 200 ° C. or lower, and by heating the entire mixture to a temperature equal to or higher than the softening point of the mixture in step 2 described later, the mixture is heated and melted to give a constant fluidity. be able to.
- a curable silicone sheet composed of a curable granular silicone composition and having hot melt property can be obtained.
- the step of mixing the organopolysiloxane resin, the curing agent and the functional filler, and any other components is not particularly limited, but the entire mixture, preferably less than the softening point of the organopolysiloxane resin fine particles. It can be produced by mixing powders at temperature.
- the powder mixer used in this manufacturing method is not limited, and is not limited to a single-screw or bi-screw continuous mixer, a double-roll, a loss mixer, a hobert mixer, a dental mixer, a planetary mixer, a kneader mixer, a lab miller, a small crusher, and a Henschel mixer. Is exemplified, preferably a lab miller, a small crusher, and a Henschel mixer.
- Step 2 is a step of kneading the mixture obtained in step 1 while heating and melting, and heats the mixture having heat meltability at a temperature equal to or higher than the softening point, preferably in a temperature range of 50 ° C. to 200 ° C.
- the entire composition is melted or softened, and the organopolysiloxane resin fine particles, the curing agent and the functional filler can be uniformly dispersed throughout.
- the mixture is pressure-molded into a sheet in step 4 through step 3
- a uniform thin-layer molded sheet can be formed by one pressurization, resulting in molding defects or sheet fonts. There is a real benefit in avoiding cracks.
- the temperature is less than the lower limit, softening may be insufficient, and it may be difficult to obtain a melted or softened mixture in which each component is uniformly dispersed throughout, even if mechanical force is used. Even if the mixture is pressure-molded into a sheet in step 4 through step 3, a uniform thin-layer molded sheet cannot be formed, which may cause breakage or cracking of the sheet.
- the temperature exceeds the upper limit, the curing agent may react at the time of mixing, and the whole may be significantly thickened or cured to lose the hot melt property and form a cured product, which is not preferable. Therefore, when a hydrosilylation catalyst is used as the component (C), it is preferable to use a fine particle platinum-containing hydrosilylation reaction catalyst dispersed or encapsulated in a thermoplastic resin.
- step 1 When the mixture obtained in step 1 has a low heat-melt viscosity and high fluidity, it can be laminated on a release film after being preliminarily molded in step 3 described later, and is preferable. If the melt viscosity of the mixture after heating and melting obtained in step 2 as measured by an elevated flow tester at 150 ° C. is in the range of 1 to 1,000 Pas, temporary molding can be performed in step 3.
- the mixture obtained in step 1 is melt-kneaded at a temperature equal to or higher than the softening point in step 2 to obtain a uniform composition. After obtaining the morphology, it may be laminated on the release film in step 3 without performing temporary molding.
- the mixing device in step 2 is not limited, and batch type heating of kneaders, Banbury mixers, Henshell mixers, planetary mixers, 2-roll mills, 3-roll mills, loss mixers, lab plast mills, etc. having heating / cooling functions.
- -A continuous heating and kneading device such as a single-screw extruder or a twin-screw extruder having a cooling function may be used, and is not particularly limited, but is selected according to the efficiency of processing time and the control ability of shear heat generation.
- a continuous heat kneading device such as a single-screw extruder or a twin-screw extruder, or a batch-type mixer such as a lab plast mill.
- a continuous heat kneading device such as a single-screw extruder or a twin-screw extruder is preferably used.
- Step 3 is a step of laminating the mixture after heating and melting obtained in Step 2 between films having at least one peeling surface, and is a preliminary step for pressure molding in Step 4.
- pressure molding by roll stretching can be performed on the film to obtain a sheet-shaped molded product, and the film is peeled off after molding. Only the film can be removed from the sheet-like molded product using the surface.
- the mixture after heating and melting obtained in step 2 is laminated between two films.
- both of the two films have a peeling surface
- step 3 the mixture obtained in step 2 is laminated between the peeling surfaces of each film. Is particularly preferable.
- the base material of the film used in step 3 is not particularly limited, and is not particularly limited.
- synthetic resin films and sheets are preferable, and examples of the synthetic resin include polyimide, polyethylene, polypropylene, polystyrene, polyvinyl chloride, polyvinylidene chloride, polycarbonate, polyethylene terephthalate, and nylon.
- a film made of a heat-resistant synthetic resin such as polyimide, polyetheretherketone, polyethylene naphthalate (PEN), liquid crystal polyarylate, polyamideimide, or polyethersulfone is suitable.
- a heat-resistant synthetic resin such as polyimide, polyetheretherketone, polyethylene naphthalate (PEN), liquid crystal polyarylate, polyamideimide, or polyethersulfone.
- transparent substrates specifically transparent materials such as polypropylene, polystyrene, polyvinylidene chloride, polycarbonate, polyethylene terephthalate, and PEN are suitable.
- the thickness of the film is not particularly limited, but is usually about 5 to 300 ⁇ m.
- the film preferably comprises at least one release layer, which is in contact with the mixture obtained in step 2.
- the release layer is sometimes called a release liner, a separator, a release layer or a release coating layer, and preferably removes a silicone-based release agent, a fluorine-based release agent, an alkyd-based release agent, a fluorosilicone-based release agent, or the like.
- the release layer having a coating ability, the base material itself which is hard to adhere to the hot meltable curable silicone sheet according to the present invention may be used, or the surface of the base material may be physically finely uneven.
- step 3 the mixture obtained in step 2 is laminated between two films.
- the step is not particularly limited, but the mixture obtained in step 2 is supplied by being discharged or applied onto the release layer of one film, and the release layer of the other film is formed on the mixture.
- a laminate is formed by laminating.
- each film is transported to the supply position of the mixture in step 2 via a rotary roll, and a laminating operation is performed between the films.
- the amount of the mixture obtained in step 2 in step 3 supplied between the films can be designed according to the production speed and scale. As an example, a supply amount of 1 to 10 kg / hour can be supplied between the films of the mixture obtained in step 2, but it goes without saying that the supply amount is not limited to this. However, in step 3, the amount of the mixture obtained in step 2 to be laminated between the films needs to be determined according to the average thickness of the curable silicone sheet designed in step 4, and is rolled in step 4. It needs to be thick enough to be processed.
- step 3 the mixture after heat-melting obtained in step 2 is discharged while being molded into a film using a die, and is discharged between the films. It is preferable to be laminated on.
- the entire laminate obtained in step 3 is cooled or temperature-controlled as a pre-step of step 4 or in step 4 after the above-mentioned temporary molding. It is preferable to include a step. This is because the pressure molding in the step 4 is effectively performed by cooling the heated melt to make it solid.
- the cooling step is not particularly limited, but the mixture supplied or laminated on the film by a cooling roll or the like is cooled in the range of -50 ° C. to room temperature by using a cooling means such as air cooling or a cooling solvent. Can be done with. The details of temperature control will be described in step 4.
- the semi-solid mixture may be supplied onto the film and laminated in step 3 without performing temporary molding.
- Step 4 is a step of stretching the laminate obtained in the above step 3 between the rolls to form a curable silicone sheet having a specific film thickness, and pressurizing and stretching the mixture obtained in step 2 from the film. This is a step of molding into a uniform curable silicone sheet.
- the rolling process in step 4 can be performed on the laminated body obtained in step 3 by using a known rolling method such as roll rolling.
- a curable silicone sheet having a desired thickness can be designed by adjusting the gap between the rolls.
- the average thickness between the rolls is in the range of 10 to 2000 ⁇ m.
- the gap between the rolls is adjusted in the range of 1.5 to 4.0 times the average thickness of the target organopolysiloxane cured film.
- a substantially flat curable silicone sheet having a thickness of 10 to 2000 ⁇ m can be obtained.
- a peelable laminate can be obtained.
- step 4 when the laminate obtained in step 3 is stretched between rolls, the roll further has a temperature control function, and the temperature of the entire laminate is controlled during roll rolling, and heating or cooling is performed as necessary. Is preferable. By controlling the temperature, the gap between the rolls can be kept stable, and the flatness and uniformity (uniformity of film thickness) of the obtained hot-meltable curable silicone sheet can be improved.
- the specific range of temperature control can be appropriately designed according to the heat resistance of the film, the thickness of the curable silicone sheet (design thickness), its reactivity, etc., but is generally within the range of 5 to 150 ° C. is there.
- step 4 a peelable laminate in which a hot-meltable curable silicone sheet is interposed between the release films can be obtained, and optionally, a step of cutting the laminate containing the curable silicone sheet is performed. May have. Further, the curable silicone sheet may have a step of winding by a winding device. This makes it possible to obtain a peelable laminate containing a hot-meltable curable silicone sheet of a desired size.
- the laminate obtained by the above steps is composed of organopolysiloxane resin fine particles, a curing agent and a functional filler, and has at least one curable silicone sheet having a thickness of 10 to 2000 ⁇ m and being substantially flat. It is a laminated body having a structure laminated between films having a peeling surface of. The film may both have a peeling surface, and is preferable.
- the curable silicone sheet obtained by the production method of the present invention is a curable silicone composition composed of organopolysiloxane resin fine particles, a curing agent and a functional filler, and has hot meltability as a heat-meltable pressure-sensitive adhesive material.
- the curable silicone sheet is excellent in moldability, gap fill property and adhesive strength, and can be used as a die attach film or a film adhesive. It can also be suitably used as a curable silicone sheet for compression molding or press molding.
- the curable silicone sheet obtained by the production method of the present invention is a film that is peeled off from a peelable film and then placed at a desired site such as a semiconductor to take advantage of the gap fill property for irregularities and gaps.
- An adhesive layer is formed on the adherends to temporarily fix, arrange, and bond the adherends, and further, the curable silicone sheet is heated to 150 ° C. or higher to form the adhesive layer between the adherends. It may be adhered by a cured product of a curable silicone sheet.
- the peelable film may be peeled off after the curable silicone sheet is heated to form a cured product, and the peeling timing may be selected according to the application and method of use of the curable silicone sheet.
- the curable silicone sheet Since the curable silicone sheet is hot-meltable, it can be softened or fluidized by heating the sheet before final curing. For example, even if the adherend surface of the adherend has irregularities, there are no gaps. And gaps can be filled to form an adhesive surface.
- the heating means of the curable silicone sheet for example, various constant temperature baths, hot plates, electromagnetic heating devices, heating rolls, and the like can be used. In order to perform bonding and heating more efficiently, for example, an electric press, a diaphragm type laminator, a roll laminator, or the like is preferably used.
- the present composition can be cured by a method consisting of at least the following steps (I) to (III).
- steps (I) to (III) A step of heating the composition to 100 ° C. or higher to melt it;
- (II) A step of injecting the curable silicone composition obtained in the step (I) into a mold, or a step of spreading the curable silicone composition obtained in the step (I) to the mold by mold clamping. ;
- This composition can be suitably used for a molding method including a coating step (so-called mold underfill method) in which an overmold and an underfill of a semiconductor element are performed at once. Further, the present composition is a coating that covers the surface of a semiconductor wafer substrate on which a single or a plurality of semiconductor elements are mounted and is overmolded so that the gaps between the semiconductor elements are filled with the cured product due to the above characteristics. It can be suitably used for a molding method including a step (so-called wafer molding).
- a transfer molding machine a compression molding machine, an injection molding machine, an auxiliary ram type molding machine, a slide type molding machine, a double ram type molding machine, a low pressure filling molding machine, or the like can be used.
- the composition of the present invention can be suitably used for the purpose of obtaining a cured product by transfer molding and compression molding.
- step (III) the curable silicone composition injected (applied) in step (II) is cured.
- the heating temperature is preferably 150 ° C. or higher, or 170 ° C. or higher.
- the type D durometer hardness of the cured product obtained by curing the present composition at 25 ° C. is 20 or more.
- the hardness of this type D durometer is determined by a type D durometer according to JIS K 6253-1997 "Hardness test method for vulcanized rubber and thermoplastic rubber".
- composition Since this composition has hot melt properties and is excellent in flowability at the time of melting (hot melt), handling workability, and curability, a sealing agent or underfilling agent for semiconductors; SiC, GaN, etc. Encapsulants and underfill agents for power semiconductors; Encapsulants and photoreflectors for opto-semiconductors such as light emitting diodes, photodiodes, phototransistors, laser diodes; Adhesives, potting agents, protective agents for electrical and electronic use , Suitable as a coating agent. Further, since this composition has a hot melt property, it is also suitable as a material for transfer molding, compression molding, or injection molding.
- the sheet-shaped composition can be used as a curable film adhesive or a stress buffer layer between two types of substrates having different coefficients of linear expansion.
- the application of the cured product of the present invention is not particularly limited, but the composition of the present invention has hot melt property and excellent moldability, and the cured product has excellent adhesive properties, high elastic modulus, and , Has a low coefficient of linear expansion. Therefore, the cured product obtained by curing the present composition can be suitably used as a member for a semiconductor device, and is suitable as a sealing material for a semiconductor element, an IC chip, or the like, or a light reflecting material for an optical semiconductor device. Can be used for.
- the semiconductor device including the member made of the cured product of the present invention is not particularly limited, but it is particularly preferable that the semiconductor device is mounted on a power semiconductor device or an optical semiconductor device.
- the hot-meltable curable silicone composition of the present invention and a method for producing the same will be described in detail with reference to Examples and Comparative Examples.
- Me, Ph, and Vi represent a methyl group, a phenyl group, and a vinyl group, respectively.
- the softening point and the melt viscosity of each of the curable silicone compositions of Examples and Comparative Examples were measured by the following methods. Further, the curable silicone composition was heated at 180 ° C. for 2 hours to prepare a cured product, and the adhesive strength of various substrates was measured by the following method. The results are shown in Table 1.
- melt viscosity The melt viscosity of the curable silicone composition at 180 ° C. was measured by a high-grade flow tester CFT-500EX (manufactured by Shimadzu Corporation) under a pressure of 100 kgf using a nozzle having a diameter of 0.5 mm.
- an organopolysiloxane resin containing a hydrosilylation reaction catalyst was prepared by the methods shown in Reference Examples 1 to 3, and the presence or absence of hot melt property was evaluated based on the presence or absence of softening point / melt viscosity.
- the organopolysiloxane resin fine particles were prepared by the methods shown in Reference Examples 4 to 6.
- 1,1,3,3-tetramethyl-1,3-divinyldisiloxane used for the platinum complex as a hydrosilylation reaction catalyst is described as "1,3-divinyltetramethyldisiloxane". ..
- the amount of silicon atom-bonded hydrogen atom in this component is 0.5 mol per 1 mol of vinyl group), and 1,3-divinyltetramethyldisiloxane of platinum 1,3-divinyltetramethyldisiloxane complex.
- a toluene solution of an organosiloxane crosslinked product (2) composed of siloxane and having a vinyl group that did not participate in the above reaction was prepared.
- this organosiloxane crosslinked product (2) was analyzed by FT-IR, no peak of a silicon atom-bonded hydrogen atom was observed.
- the softening point of the organosiloxane crosslinked product (2) was 75 ° C., and the melt viscosity at 100 ° C. was 700 Pa ⁇ s.
- Example 1 Molten silica (S6050P manufactured by Nippon Steel Materials Micron Co., Ltd.) with an average particle diameter of 17 ⁇ m is 1900.0 g and has a viscosity of 23 mPa ⁇ s.
- Me 2 ViSiO (Me 2 SiO) 29 Si (OMe) 3 9.5 g of dimethylpolysiloxane represented by (1) was put into a small crusher all at once, stirred at room temperature (150 ° C.) for 1 minute, surface-treated the molten silica, and the temperature of the crusher was returned to 25 ° C.
- Example 2 Molten silica (S6050P manufactured by Nippon Steel Materials Micron Co., Ltd.) with an average particle diameter of 17 ⁇ m is 1900.0 g and has a viscosity of 23 mPa ⁇ s.
- Me 2 ViSiO (Me 2 SiO) 29 Si (OMe) 3 9.5 g of dimethylpolysiloxane represented by (1) was put into a small crusher all at once, stirred at room temperature (150 ° C.) for 1 minute, surface-treated the molten silica, and the temperature of the crusher was returned to 25 ° C.
- Example 3 Molten silica (S6050P manufactured by Nippon Steel Materials Micron Co., Ltd.) with an average particle diameter of 17 ⁇ m is 1900.0 g and has a viscosity of 23 mPa ⁇ s.
- Me 2 ViSiO (Me 2 SiO) 29 Si (OMe) 3 9.5 g of dimethylpolysiloxane represented by (1) was put into a small crusher all at once, stirred at room temperature (150 ° C.) for 1 minute, surface-treated the molten silica, and the temperature of the crusher was returned to 25 ° C.
- Example 4 1700.0 g of fused silica (S610-5P manufactured by Nippon Steel Materials Micron Co., Ltd.) having an average particle diameter of 14.5 ⁇ m and a viscosity of 125 mPa ⁇ s.
- Me 3 SiO (Me 2 SiO) 110 Si (OMe) 3 9.5 g of dimethylpolysiloxane represented by (1) was put into a small crusher all at once, stirred at room temperature (150 ° C.) for 1 minute, surface-treated the molten silica, and the temperature of the crusher was returned to 25 ° C.
- Example 5 1700.0 g of fused silica (S610-5P manufactured by Nippon Steel Materials Micron Co., Ltd.) having an average particle diameter of 14.5 ⁇ m and a viscosity of 125 mPa ⁇ s.
- Me 3 SiO (Me 2 SiO) 110 Si (OMe) 3 9.5 g of dimethylpolysiloxane represented by (1) was put into a small crusher all at once, stirred at room temperature (150 ° C.) for 1 minute, surface-treated the molten silica, and the temperature of the crusher was returned to 25 ° C.
- hot-melt silicone fine particles (2) 74.1 g, formula: HMe 2 SiO (Ph 2 SiO) SiMe 2 H
- Diphenylsiloxane (content of silicon atom-bonded hydrogen atom 0.6% by mass) 11.1 g, viscosity 1,000 mPa ⁇ s, which is represented by dimethylhydrogensiloxy group-sealed diphenylsiloxane at both ends of the molecular chain having a viscosity of 5 mPa ⁇ s.
- Me 3 SiO (Me 2 SiO) 110 Si (OMe) 3 9.5 g of dimethylpolysiloxane represented by (1) was put into a small crusher all at once, stirred at room temperature (150 ° C.) for 1 minute, surface-treated the molten silica, and the temperature of the crusher was returned to 25 ° C.
- the curable silicone compositions of Examples 1 to 6 according to the present invention have good hot-melt properties, adhere firmly to any substrate, and have a practically sufficient coefficient of linear expansion (CTE). ) And bending strength. Therefore, it is expected that the cured product obtained by using these curable silicone compositions can be suitably used for encapsulating semiconductor devices in which gold, epoxy glass, or the like is often used.
- CTE coefficient of linear expansion
- Comparative Examples 1 to 4 which do not satisfy the compositional requirements of the present invention, aluminum showed good adhesive strength, but nickel, gold, and epoxy glass, which are relatively difficult-to-adhere base materials, showed good adhesive strength. On the other hand, it did not adhere firmly. Further, when a silane compound other than the silatlan derivative such as Comparative Examples 3 and 4 was used, the melt characteristics and the strength of the cured product deteriorated. It is considered that this is a result of the adhesive-imparting agent in Comparative Examples 3 and 4 having an adverse effect on the surface treatment of the functional filler.
- ⁇ Manufacturing example 1> While heating the granular curable silicone composition of Example 1 and the like to 80 ° C., it is heated, melted and kneaded using a twin-screw extruder, and is in the form of a semi-solid softened film. It is supplied onto a Biwa liner manufactured by Takaline Corporation so as to have a supply amount of 5 kg / hour, and is laminated between two releaseable films. Subsequently, the laminate was stretched between the rolls to form a laminate in which a hot-meltable curable silicone sheet having a thickness of 500 ⁇ m was laminated between two peelable films, and the temperature was adjusted to ⁇ 15 ° C. The whole is cooled by the set cooling roll. By separating the releaseable film in the laminate, a flat and homogeneous hot-melt curable silicone sheet can be obtained.
- ⁇ Manufacturing example 2> While heating the granular curable silicone composition of Example 1 or the like to 80 ° C., heat-melt knead using a twin-screw extruder, and using a T-type die (opening size: 800 ⁇ m ⁇ 100 mm, heating at 80 ° C.). While molding into a substantially sheet shape, it was supplied onto a peelable film (Biwaliner, manufactured by Takaline Corporation) so that the supply amount was 5 kg / hour, and the whole was cooled by a cooling roll set at -15 ° C. Later, it was laminated between two release films.
- a peelable film (Biwaliner, manufactured by Takaline Corporation)
- the laminate is stretched between the rolls to form a laminate in which a hot-melt curable silicone sheet having a thickness of 500 ⁇ m is laminated between two release films.
- a hot-melt curable silicone sheet having a thickness of 500 ⁇ m is laminated between two release films.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
(A)SiO3/2で表されるシロキサン単位を全シロキサン単位の少なくとも20モル%以上含有するオガノポリシロキサン樹脂微粒子
(B)シラトラン誘導体およびカルバシラトラン誘導体から選ばれる1種類以上の接着付与剤、
(C)硬化剤、および
(D)機能性無機フィラー、
を含有してなり、
(D)成分の含有量が、組成物全体に対して少なくとも50体積%以上であり、
25℃では固体で200℃以下の温度でホットメルト性を有することを特徴とする、硬化性シリコーン組成物。により上記課題を解決できる事を見出し、本発明に到達した。なお、上記の硬化性シリコーン組成物は、ペレット状またはシート状であってよい。
(I)前記のペレット状またはシート状の硬化性粒状シリコーン組成物を100℃以上に加熱して、溶融する工程;
(II)前記工程(I)で得られた硬化性シリコーン組成物を金型に注入する工程 又は 型締めにより金型に前記工程(I)で得られた硬化性シリコーン組成物を行き渡らせる工程; および
(III)前記工程(II)で注入した硬化性シリコーン組成物を硬化する工程
なお、上記の成型方法は、トランスファー成型、コンプレッション成型、あるいはインジェクション成型を含み、本発明の硬化性粒状シリコーン組成物はこれらの成型用材料として好適に用いられる。さらに、本発明の硬化性粒状シリコーン組成物は、硬化物により、パワー半導体に代表される様な半導体素子のオーバーモールド及びアンダーフィルを一度に行う被覆工程である、いわゆるモールドアンダーフィル方式や、半導体素子を搭載した半導体ウェハ基板の表面を覆い、かつ、半導体素子の間隙を充填するオーバーモールド成型であり、8インチは12インチなどの比較的大きなウェハを一括封止してもよいウェハモールディング方式の成型用材料として、好適に用いることができる。
工程1:上記の硬化性シリコーン組成物の各原料成分を50℃以上の温度で混合する工程
工程2:工程1で得た混合物を、加熱溶融しながら混練する工程
工程3:工程2で得た加熱溶融後の混合物を、少なくとも1の剥離面を備えたフィルム間に積層する工程
工程4:工程3で得た積層体をロール間で延伸し、特定の膜厚を有する硬化性シリコーンシートを成型する工程
本発明の硬化性シリコーン組成物は、
(A)RSiO3/2(式中、Rは一価炭化水素基)で表されるシロキサン単位を全シロキサン単位の少なくとも20モル%以上含有するオガノポリシロキサン樹脂微粒子
(B)シラトラン誘導体およびカルバシラトラン誘導体から選ばれる1種類以上の接着付与剤、
(C)硬化剤、および
(D)機能性無機フィラー、
を含有してなり、
(D)成分の含有量が、組成物全体に対して少なくとも50体積%以上であり、
25℃では固体で200℃以下の温度でホットメルト性を有することを特徴とする。なお、本発明において、特に記載がない場合、「ホットメルト性を有する」とは軟化点が50℃以上であり、150℃において溶融粘度(好適には、1000Pa・s未満の溶融粘度)を有し、流動する性質を有することをいう。一方で、軟化点が200℃以上の場合、成形用途などの一般的な使用温度以上なので、「ホットメルト性は有さない」と定義する。
(A1)軟化点が30℃以上であり、分子内に少なくとも1個の炭素-炭素二重結合を含む硬化反応性の官能基を有し、RSiO3/2(式中、Rは一価炭化水素基)で表されるシロキサン単位を全シロキサン単位の少なくとも20モル%以上含有するするホットメルト性のオルガノポリシロキサン樹脂微粒子であることが好ましい。以下、これらの成分について説明する。
(A1)成分は、それ自体がホットメルト性を有し、分子内に少なくとも1個の炭素-炭素二重結合を含む硬化反応性の官能基を有するため、後述する(C)硬化剤により硬化する。このような(A1)成分は、
(A1)樹脂状オルガノポリシロキサン、
(A2)少なくとも1種のオルガノポリシロキサンを架橋してなるオルガノポリシロキサン架橋物、
(A3)樹脂状オルガノシロキサンブロックと鎖状オルガノシロキサンブロックからなるブロックコポリマー、
またはこれらの少なくとも2種の混合物
からなるオルガノポリシロキサン樹脂微粒子が好ましい。
(ViMe2SiO1/2)0.25(PhSiO3/2)0.75(HO1/2)0.02
(ViMe2SiO1/2)0.25(PhSiO3/2)0.75
(ViMe2SiO1/2)0.20(PhSiO3/2)0.80
(ViMe2SiO1/2)0.15(PhSiO3/2)0.85(HO1/2)0.01
(Me2SiO2/2)0.15(MeViSiO2/2)0.10(PhSiO3/2)0.75(HO1/2)0.04
(MeViPhSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.05
(ViMe2SiO1/2)0.15(PhSiO3/2)0.75(SiO4/2)0.10(HO1/2)0.02
(Ph2SiO2/2)0.25(MeViSiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.04
(Me3SiO1/2)0.20(ViMePhSiO1/2)0.40(SiO4/2)0.40(HO1/2)0.08
。
(B)成分は本発明の特徴である接着付与剤であり、シラトラン誘導体およびカルバシラトラン誘導体から選ばれる1種類以上の成分である。当該成分は、本組成において、特異的に難接着性の基材に対する硬化接着性を劇的に改善することができる。
下記構造式(1):
{式(1)中、R1 は同じかまたは異なる水素原子もしくはアルキル基であり、R2 は水素原子、アルキル基、および一般式:-R4 -Si(OR5 )x R6(3-x)(式中、R4 は二価有機基であり、R5 は炭素原子数1~10のアルキル基であり、R6 は置換もしくは非置換の一価炭化水素基であり、xは1、2、または3である。)で表されるアルコキシシリル基含有有機基からなる群から選択される同じかまたは異なる基であり、但し、R2 の少なくとも1個はこのアルコキシシリル基含有有機基であり、R3 は置換もしくは非置換の一価炭化水素基、炭素原子数1~10のアルコキシ基、グリシドキシアルキル基、オキシラニルアルキル基、アシロキシアルキル基、およびアルケニル基からなる群から選択される基である。}で表されるシラトラン誘導体である。
-(CH2)2Si(OCH3)3-(CH2)2Si(OCH3)2CH3
-(CH2)3Si(OC2H5)3-(CH2)3Si(OC2H5)(CH3)2
-CH2O(CH2)3Si(OCH3)3
-CH2O(CH2)3Si(OC2H5)3
-CH2O(CH2)3Si(OCH3)2CH3
-CH2O(CH2)3Si(OC2H5)2CH3
-CH2OCH2Si(OCH3)3-CH2OCH2Si(OCH3)(CH3)2
で表される基からなる群から選択される基であり、R3は同じかまたは異なる水素原子もしくはアルキル基である。}
で表されるカルバシラトラン誘導体である。このようなカルバシラトラン誘導体として、以下の構造で表される1分子中にケイ素原子結合アルコキシ基またはケイ素原子結合アルケニル基を有するカルバシラトラン誘導体が好適に例示される。
(C)成分は、(A)成分を硬化するための硬化剤であり、(A)成分を硬化できるものであれば限定されない。(A)成分がアルケニル基を有する場合には、(C)成分は、一分子中に少なくとも2個のケイ素原子結合水素原子を有するオルガノハイドロジェンポリシロキサンとヒドロシリル化反応用触媒であり、(A)成分がアルケニル基を含有し、ヒドロシリル化反応用触媒を含有する場合には、(C)成分は、一分子中に少なくとも2個のケイ素原子結合水素原子を有するオルガノポリシロキサンのみでよいが、ヒドロシリル化反応用触媒を併用してもよい。また、(A)成分がアルケニル基を有する場合には、(C)成分は有機過酸化物でもよく、一分子中に少なくとも2個のケイ素原子結合水素原子を有するオルガノポリシロキサンを併用してもよい。一方、(A)成分がケイ素原子結合水素原子を有する場合には、(C)成分は、一分子中に少なくとも2個のアルケニル基を有するオルガノポリシロキサンとヒドロシリル化反応用触媒であり、(A)成分がケイ素原子結合水素原子を有し、ヒドロシリル化反応用触媒を含有する場合には、(C)成分は、一分子中に少なくとも2個のアルケニル基を有するオルガノポリシロキサンのみでよいが、ヒドロシリル化反応用触媒を併用してもよい
本発明の(D)成分は、無機フィラーであり、硬化して室温から高温で硬質性および強靭性に優れた硬化物を与える硬化性シリコーン組成物を提供することができる。本発明において、得られる硬化物について低い平均線膨張係数を実現する見地から、(B)成分の含有量が組成物全体の50体積%以上である事が必要であり、好ましくは60体積以上、さらに好ましくは70体積%以上、特に80~95体積%の範囲であることが好ましい。
構造式(1):
R´n(RO)3-nSiO-(R´2SiO)m-SiR´n(RO)3-n
または
構造式(2):
R´3SiO-(R´2SiO)m-SiR´n(RO)3-n
で表される直鎖状のアルコキシシリル末端を有するオルガノポリシロキサン類が例示できる。式中、Rは水素原子または炭素原子数1~3のアルキル基(=メチル基、エチル基またはプロピル基)であり、R´は各々独立に、炭素数1~20のアルキル基、炭素数1~20のハロゲン置換アルキル基、炭素数2~20のアルケニル基、炭素数6~20のアリール基、炭素数6~20のハロゲン置換アリール基、または炭素数7~20のアラルキル基であり、前記と同様の基が例示される。nは0~2の範囲の数であり、mは2~200の範囲の数であり、mは2~150の範囲の数でもよい。
上記組成物を硬化してなる硬化物は、25℃~200℃の範囲での平均線膨張係数が20ppm/℃以下であり、好ましくは15ppm/℃以下である。この範囲であれば、使用される基板との平均線膨張係数の差が低いので、得られる一体成型物内の残留応力を低くでき、デバイスの信頼性を改善することができる。
さらに、高硬度で高強度であることが要求される半導体の封止材として好適であることから、JIS K 6911-1995「熱硬化性プラスチック一般試験方法」に規定の方法により測定した硬化物の曲げ強度は15MPa以上、あるいは20MPa以上であることが好ましい。
本組成物はその製造工程により、粒状、ペレット状、シート状のいずれかの形態を取ることができる。ペレット状として使用する場合、粒状とした本組成物を打錠成型することで効率良く生産することが可能である。なお、「ペレット」は、「タブレット」とも言うことがある。ペレットの形状は限定されないが、通常、球状、楕円球状あるいは円柱状である。また、ペレットの大きさは限定されないが、例えば、500μm以上の平均粒子径または円相当径を有する。
本組成物はシート状にして使用することができ、特に、剥離層を備える2枚のフィルム状基材間に、上記の硬化性シリコーン組成物からなるシート状部材を含む構造を有する、積層体として使用可能である。
工程1:上記の硬化性シリコーン組成物の構成成分を混合する工程
工程2:工程1で得た混合物を、加熱溶融しながら混練する工程
工程3:工程2で得た加熱溶融後の混合物を、少なくとも1の剥離面を備えたフィルム間に積層する工程
工程4:工程3で得た積層体をロール間で延伸し、特定の膜厚を有する硬化性シリコーンシートを成型する工程
を備える硬化性シリコーンシートの製造方法により達成することができ、任意で工程4等において、冷却又は温度調節機能を有するロールを使用してもよく、工程4の後に、得られた硬化性シリコーンシートを含む積層体を裁断する工程を有していてもよい。
本組成物は、(A)成分~(D)成分、さらにその他任意の成分を、(A)成分の軟化点未満の温度で粉体混合することにより粒状の組成物として製造することができる。本製造方法で用いる粉体混合機は限定されず、一軸または二軸の連続混合機、二本ロール、ロスミキサー、ホバートミキサー、デンタルミキサー、プラネタリミキサー、ニーダーミキサー、ラボミルサー、小型粉砕機、ヘンシェルミキサーが例示され、好ましくは、ラボミルサー、小型粉砕機、ヘンシェルミキサーである。
本発明にかかる硬化性シリコーンシートは、ホットメルト性を有するものであり、オルガノポリシロキサン樹脂、硬化剤および機能性フィラーを含む硬化性シリコーン組成物からなることを特徴とし、本発明の製造方法は、以下の工程1~4を含むものである。
工程1:硬化性シリコーン組成物の構成成分を50℃以上の温度で混合する工程
工程2:工程1で得た混合物を、加熱溶融しながら混練する工程
工程3:工程2で得た加熱溶融後の混合物を、少なくとも1の剥離面を備えたフィルム間に積層する工程
工程4:工程3で得た積層体をロール間で延伸し、特定の膜厚を有する硬化性シリコーンシートを成型する工程
ここで、「ホットメルト性を有する」とは軟化点が50℃~200℃の範囲内であり、加熱により軟化ないし流動する性質を有することをいう。また、本発明にかかる硬化性シリコーンシートは、その構成成分であるオルガノポリシロキサン樹脂微粒子のホットメルト性に関わらず、オルガノポリシロキサン樹脂微粒子、硬化剤および機能性フィラーからなる混合物がホットメルト性を有すればよい。
上記の工程1は硬化性シリコーン組成物の構成成分である、オルガノポリシロキサン樹脂(好適には微粒子の状態)、硬化剤および機能性フィラーを含む硬化性粒状シリコーン組成物の混合工程である。これら各成分については、上記のとおりである。
工程2は、工程1で得た混合物を、加熱溶融しながら混練する工程であり、加熱溶融性を有する混合物をその軟化点以上の温度、好適には、50℃~200℃の温度範囲で加熱混練することで、組成物全体が溶融乃至軟化し、オルガノポリシロキサン樹脂微粒子、硬化剤および機能性フィラーを全体に均一分散することができる。当該混合物を、工程3を経て工程4において、当該混合物をシート状に加圧成型した場合、一回の加圧で均一な薄層状の成型シートを形成することができ、成型不良やシート字体の亀裂を回避できる実益がある。一方、温度が前記下限未満では、軟化が不十分となって、機械力を用いても各成分が全体に均一分散した溶融乃至軟化した混合物を得ることが困難となる場合があり、このような混合物を工程3を経て工程4において、当該混合物をシート状に加圧成型しても、均一な薄層状の成型シートを形成できず、シートの破損・亀裂の原因となる場合がある。逆に、温度が前記上限を超えると、硬化剤が混合時に反応して、全体が著しい増粘又は硬化してホットメルト性を失い、硬化物を形成してしまう場合があるため、好ましくない。このため、(C)成分にヒドロシリル化触媒を使用する場合は、熱可塑性樹脂で分散あるいはカプセル化した微粒子状の白金含有ヒドロシリル化反応触媒を使用することが好ましい。
工程3は、工程2で得た加熱溶融後の混合物を、少なくとも1の剥離面を備えたフィルム間に積層する工程であり、工程4において加圧成型するための予備工程である。工程2で得た混合物をフィルム間に挟み込んだ積層体を形成することで当該フィルム上からロール延伸による加圧成型を行って、シート状の成型物を得ることができ、かつ、成型後には剥離面を利用して当該シート状の成型物からフィルムのみを除去することができる。
工程4は、上記の工程3で得た積層体をロール間で延伸し、特定の膜厚を有する硬化性シリコーンシートを成型する工程であり、フィルム上から工程2で得た混合物を加圧延伸し、均一な硬化性シリコーンシートの形態に成型する工程である。
工程4において、工程3で得た積層体をロール間で延伸する場合、当該ロールがさらに、温度調節機能を備え、ロール圧延時に積層体全体の温度調節、必要に応じて加熱または冷却を行うことが好ましい。当該温度調節により、ロール間の間隙を安定して保ち、得られるホットメルト性の硬化性シリコーンシートの平坦性および均一性(膜厚の均一性)を改善できる実益がある。具体的な温度調節の範囲は、フィルムの耐熱性や硬化性シリコーンシートの厚さ(設計厚み)、その反応性等に応じて適宜設計可能であるが、概ね、5~150℃の範囲内である。
工程4により、剥離性フィルム間にホットメルト性の硬化性シリコーンシートが介装された剥離性積層体を得ることができるが、任意により、当該硬化性シリコーンシートを含む積層体を裁断する工程を有してよい。また、当該硬化性シリコーンシートは、巻取り装置により巻取る工程を有してもよい。これにより、所望のサイズのホットメルト性の硬化性シリコーンシートを含む剥離性積層体を得ることができる。
以上の工程により得られる積層体は、オルガノポリシロキサン樹脂微粒子、硬化剤および機能性フィラーからなり、実質的に平坦な、厚さ10~2000μmのホットメルト性を有する硬化性シリコーンシートが、少なくとも1の剥離面を備えたフィルム間に積層された構造を備える、積層体である。なお、当該フィルムは、共に剥離面を備えてもよく、かつ、好ましい。
本発明の製造方法により得られる硬化性シリコーンシートは、オルガノポリシロキサン樹脂微粒子、硬化剤および機能性フィラーからなる硬化性シリコーン組成物であり、ホットメルト性を有し、加熱溶融性の粘着材として使用することができる。特に、当該硬化性シリコーンシートは、成形性、ギャップフィル性及び粘着力に優れ、ダイアタッチフィルムやフィルム接着剤として使用することができる。また、コンプレッション成型用またはプレス成型用の硬化性シリコーンシートとしても好適に使用することができる。
本組成物は、次の工程(I)~(III)から少なくともなる方法により硬化することができる。
(I)本組成物を100℃以上に加熱して、溶融する工程;
(II)前記工程(I)で得られた硬化性シリコーン組成物を金型に注入する工程、又は型締めにより金型に前記工程(I)で得られた硬化性シリコーン組成物を行き渡らせる工程;および
(III)前記工程(II)で注入した硬化性シリコーン組成物を硬化する工程
本組成物は、ホットメルト性を有し、溶融(ホットメルト)時の流れ性、取扱い作業性および硬化性が優れているので、半導体用の封止剤やアンダーフィル剤;SiC、GaN等のパワー半導体用の封止剤やアンダーフィル剤;発光ダイオード、フォトダイオード、フォトトランジスタ、レーザーダイオード等の光半導体用の封止剤や光反射材;電気・電子用の接着剤、ポッティング剤、保護剤、コーティング剤として好適である。また、本組成物は、ホットメルト性を有するので、トランスファー成型、コンプレッション成型、あるいはインジェクション成型用の材料としても好適である。特に、成型時にモールドアンダーフィル法やウェハモールディング法を用いる半導体用の封止剤として用いることが好適である。さらに、本組成物をシート状にしたものは硬化性のフィルム接着剤や線膨張係数の違う2種類の基材の間の応力の緩衝層として使用する事ができる。
本発明の硬化物の用途は特に制限されるものではないが、本発明組成物がホットメルト性を有し、成形性に優れ、かつ、硬化物は、優れた接着特性、高い弾性率、及び、低い線膨張係数を有する。このため、本組成物を硬化してなる硬化物は、半導体装置用部材として好適に利用することができ、半導体素子やICチップ等の封止材、または、光半導体装置の光反射材として好適に用いることができる。
硬化性シリコーン組成物をφ14mm×22mmの円柱状のペレットに成型した。このペレットを25℃~100℃に設定したホットプレート上に置き、100グラム重の荷重で上から10秒間押し続け、荷重を取り除いた後、該ペレットの変形量を測定した。高さ方向の変形量が1mm以上となった温度を軟化点とした。
硬化性シリコーン組成物の180℃での溶融粘度は高化式フローテスターCFT-500EX(株式会社島津製作所製)により、100kgfの加圧下、直径0.5mmのノズルを用いて測定した。
硬化性シリコーン組成物を180℃で2時間加熱して硬化物を作製した。この硬化物の曲げ強度を、JIS K 6911―1995「熱硬化性プラスチック一般試験方法」に規定の方法により測定した。
実施例1の硬化性シリコーン組成物を上記の方法により硬化して、硬化物を作成した。当該硬化物を真空理工(株)製のTM9200により、20℃~200℃の温度範囲において、線膨張係数を測定した。
25mm×75mmの各種基材に、硬化性シリコーン組成物を約500mgづつ4ヶ所に設置した。次に、この組成物に厚さ1mmの10mm角のガラス製チップを被せ、180℃の温度条件で1kgの板により熱圧着させした状態で2時間加熱して硬化させた。その後、室温に冷却し、シェア強度測定装置(西進商事株式会社製のボンドテスターSS-100KP)によりダイシェア強度を測定した。
1Lのフラスコに、25℃において白色固体状で、平均単位式:
(PhSiO3/2)0.80(Me2ViSiO1/2)0.20
で表される樹脂状オルガノポリシロキサンの55質量%-トルエン溶液 270.5g、および白金の1,3-ジビニルテトラメチルジシロキサン錯体の1,3-ジビニルテトラメチルジシロキサン溶液(白金金属の含有量=約4000ppm) 0.034gを投入し、室温(25℃)で均一に攪拌して、白金金属として質量単位で10ppm含有する樹脂状オルガノポリシロキサン(1)のトルエン溶液を調製した。また、この樹脂状オルガノポリシロキサン(1)の軟化点は100℃であり、その150℃での回転粘度計により測定した粘度は30Pa・sであった。
1Lのフラスコに、25℃において白色固体状で、平均単位式:
(PhSiO3/2)0.80(Me2ViSiO1/2)0.20
で表される樹脂状オルガノポリシロキサンの55質量%-トルエン溶液 270.5g、式:
HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 21.3g(前記樹脂状オルガノポリシロキサン中のビニル基1モルに対して、本成分中のケイ素原子結合水素原子が0.5モルとなる量)、および白金の1,3-ジビニルテトラメチルジシロキサン錯体の1,3-ジビニルテトラメチルジシロキサン溶液(白金金属の含有量=約4000ppm) 0.034g(本液状混合物に対して白金金属が質量単位で10ppmとなる量)を投入し、室温で均一に攪拌した。その後、オイルバスにてフラスコ内の温度を100℃まで上げて、トルエン還流下、2時間攪拌して、上記樹脂状オルガノポリシロキサンに由来する樹脂状オルガノシロキサンと上記ジフェニルシロキサンに由来する鎖状オルガノシロキサンからなり、上記反応に関与しなかったビニル基を有するオルガノシロキサン架橋物(2)のトルエン溶液を調製した。なお、このオルガノシロキサン架橋物(2)を、FT-IRにて分析したところ、ケイ素原子結合水素原子のピークは観測されなかった。また、このオルガノシロキサン架橋物(2)の軟化点は75℃であり、その100℃での溶融粘度は700Pa・sであった。
参考例1で調製したオルガノシロキサン架橋物(1)のトルエン溶液を40℃のスプレードライによりトルエンを除去しながら微粒子化して、真球状のホットメルト性シリコーン微粒子(1)を調製した。この微粒子を光学顕微鏡で観測したところ、粒子径が5~10μmであり、平均粒子径は7.9μmであった。
参考例2で調製したオルガノシロキサン架橋物(2)のトルエン溶液を40℃のスプレードライによりトルエンを除去しながら微粒子化して、真球状のホットメルト性シリコーン微粒子(2)を調製した。この微粒子を光学顕微鏡で観測したところ、粒子径が5~10μmであり、平均粒子径は7.5μmであった。
平均粒子径17μmの溶融シリカ(新日鉄マテリアルズ マイクロン社製のS6050P)1900.0gおよび粘度23mPa・sである、式:
Me2ViSiO(Me2SiO)29Si(OMe)3
で表されるジメチルポリシロキサン 9.5gを小型粉砕機に一括投入し、室温(150℃)にて1分間攪拌を行い、溶融シリカに表面処理を施し粉砕機の温度を25℃に戻した。次いで、ホットメルト性シリコーン微粒子(1) 78.7g、
式:HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 9.1g、
平均単位式:
(PhSiO3/2)0.4(HMe2SiO1/2)0.6
で表される、一分子中に2個以上のケイ素原子結合水素原子を有する、粘度25mPa・sの分岐鎖状オルガノポリシロキサン(ケイ素原子結合水素原子の含有量=0.65質量%) 12.2g
{シリコーン微粒子(1)中のビニル基1.0モルに対して、上記ジフェニルシロキサン及び分岐状フェニルシロキサン中のケイ素原子結合水素原子が1.0モルとなる量}、
ビス(トリメトキシシリルプロポキシメチル)ビニルシラトラン 8.1g、
1-エチニル-1-シクロヘキサノール(本組成物に対して質量単位で300ppmとなる量)、を小型粉砕機に追加投入し、室温(25℃)で1分間攪拌を行い、均一な粒状の白色の硬化性シリコーン組成物を調製した。また、この組成物の軟化点等の測定結果を表1に示す。
平均粒子径17μmの溶融シリカ(新日鉄マテリアルズ マイクロン社製のS6050P)1900.0gおよび粘度23mPa・sである、式:
Me2ViSiO(Me2SiO)29Si(OMe)3
で表されるジメチルポリシロキサン 9.5gを小型粉砕機に一括投入し、室温(150℃)にて1分間攪拌を行い、溶融シリカに表面処理を施し粉砕機の温度を25℃に戻した。次いで、ホットメルト性シリコーン微粒子(1) 78.7g、
式:HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 9.1g、
粘度1,000mPa・sであり、
平均単位式:
(PhSiO3/2)0.4(HMe2SiO1/2)0.6
で表される、一分子中に2個以上のケイ素原子結合水素原子を有する、粘度25mPa・sの分岐鎖状オルガノポリシロキサン(ケイ素原子結合水素原子の含有量=0.65質量%) 12.2g
{シリコーン微粒子(1)中のビニル基1.0モルに対して、上記ジフェニルシロキサン及び分岐状フェニルシロキサン中のケイ素原子結合水素原子が1.0モルとなる量}、
ビス(トリメトキシシリルプロポキシメチル)アリルシラトラン 8.1g、
1-エチニル-1-シクロヘキサノール(本組成物に対して質量単位で300ppmとなる量)、を小型粉砕機に追加投入し、室温(25℃)で1分間攪拌を行い、均一な粒状の白色の硬化性シリコーン組成物を調製した。また、この組成物の軟化点等の測定結果を表1に示す。
平均粒子径17μmの溶融シリカ(新日鉄マテリアルズ マイクロン社製のS6050P)1900.0gおよび粘度23mPa・sである、式:
Me2ViSiO(Me2SiO)29Si(OMe)3
で表されるジメチルポリシロキサン 9.5gを小型粉砕機に一括投入し、室温(150℃)にて1分間攪拌を行い、溶融シリカに表面処理を施し粉砕機の温度を25℃に戻した。次いで、ホットメルト性シリコーン微粒子(1) 78.7g、
式:HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 9.1g、
粘度1,000mPa・sであり、
平均単位式:
(PhSiO3/2)0.4(HMe2SiO1/2)0.6
で表される、一分子中に2個以上のケイ素原子結合水素原子を有する、粘度25mPa・sの分岐鎖状オルガノポリシロキサン(ケイ素原子結合水素原子の含有量=0.65質量%) 12.2g
{シリコーン微粒子(1)中のビニル基1.0モルに対して、上記ジフェニルシロキサン及び分岐状フェニルシロキサン中のケイ素原子結合水素原子が1.0モルとなる量}、
以下の構造式で表されるカルバシラトラン誘導体 8.1g
1-エチニル-1-シクロヘキサノール(本組成物に対して質量単位で300ppmとなる量)、を小型粉砕機に追加投入し、室温(25℃)で1分間攪拌を行い、均一な粒状の白色の硬化性シリコーン組成物を調製した。また、この組成物の軟化点等の測定結果を表1に示す。
平均粒子径14.5μmの溶融シリカ(新日鉄マテリアルズ マイクロン社製のS610-5P)1700.0gおよび粘度125mPa・sである、式:
Me3SiO(Me2SiO)110Si(OMe)3
で表されるジメチルポリシロキサン 9.5gを小型粉砕機に一括投入し、室温(150℃)にて1分間攪拌を行い、溶融シリカに表面処理を施し粉砕機の温度を25℃に戻した。次いで、ホットメルト性シリコーン微粒子(1) 78.7g、
式:HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 9.1g、
粘度1,000mPa・sであり、
平均単位式:
(PhSiO3/2)0.4(HMe2SiO1/2)0.6
で表される、一分子中に2個以上のケイ素原子結合水素原子を有する、粘度25mPa・sの分岐鎖状オルガノポリシロキサン(ケイ素原子結合水素原子の含有量=0.65質量%) 12.2g
{シリコーン微粒子(1)中のビニル基1.0モルに対して、上記ジフェニルシロキサン及び分岐状フェニルシロキサン中のケイ素原子結合水素原子が1.0モルとなる量}、
ビス(トリメトキシシリルプロポキシメチル)ビニルシラトラン 8.0g、
1-エチニル-1-シクロヘキサノール(本組成物に対して質量単位で300ppmとなる量)、を小型粉砕機に追加投入し、室温(25℃)で1分間攪拌を行い、均一な粒状の白色の硬化性シリコーン組成物を調製した。また、この組成物の軟化点等の測定結果を表1に示す。
平均粒子径14.5μmの溶融シリカ(新日鉄マテリアルズ マイクロン社製のS610-5P)1700.0gおよび粘度125mPa・sである、式:
Me3SiO(Me2SiO)110Si(OMe)3
で表されるジメチルポリシロキサン 9.5gを小型粉砕機に一括投入し、室温(150℃)にて1分間攪拌を行い、溶融シリカに表面処理を施し粉砕機の温度を25℃に戻した。次いで、ホットメルト性シリコーン微粒子(1) 78.7g、
式:HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 9.1g、
粘度1,000mPa・sであり、
平均単位式:
(PhSiO3/2)0.4(HMe2SiO1/2)0.6
で表される、一分子中に2個以上のケイ素原子結合水素原子を有する、粘度25mPa・sの分岐鎖状オルガノポリシロキサン(ケイ素原子結合水素原子の含有量=0.65質量%) 12.2g
{シリコーン微粒子(1)中のビニル基1.0モルに対して、上記ジフェニルシロキサン及び分岐状フェニルシロキサン中のケイ素原子結合水素原子が1.0モルとなる量}、
ビス(トリメトキシシリルプロポキシメチル)アリルシラトラン 8.0g、
1-エチニル-1-シクロヘキサノール(本組成物に対して質量単位で300ppmとなる量)、を小型粉砕機に追加投入し、室温(25℃)で1分間攪拌を行い、均一な粒状の白色の硬化性シリコーン組成物を調製した。また、この組成物の軟化点等の測定結果を表1に示す。
平均粒子径17μmの溶融シリカ(新日鉄マテリアルズ マイクロン社製のSP-6050P)1900.0gおよび粘度23mPa・sである、式:
Me2ViSiO(Me2SiO)29Si(OMe)3
で表されるジメチルポリシロキサン 9.5g
を小型粉砕機に一括投入し、150℃にて1分間攪拌を5回行い、溶融シリカに表面処理を施し粉砕機の温度を25℃に戻した。
次いでホットメルト性シリコーン微粒子(2) 74.1g、式:
HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 11.1g、粘度1,000mPa・sであり、
平均式 Me2ViSiO(MePhSiO)17.5SiMe2Vi
で表される分子鎖両末端ジメチルビニルシロキシ基封鎖メチルフェニルポリシロキサン(ビニル基の含有量=2.1質量%) 14.8g
{シリコーン微粒子(2)と分子鎖両末端ジメチルビニルシロキシ基封鎖メチルフェニルポリシロキサン中のビニル基1モルに対して、上記ジフェニルシロキサン中のケイ素原子結合水素原子が1.0モルとなる量}、
ビス(トリメトキシシリルプロポキシメチル)ビニルシラトラン 8.1g、
1-エチニル-1-シクロヘキサノール(本組成物に対して質量単位で300ppmとなる量)、を小型粉砕機に追加投入し、室温(25℃)で1分間攪拌を行い、均一な白色の硬化性シリコーン組成物を調製した。また、この組成物の軟化点等の測定結果を表1に示す。
平均粒子径17μmの溶融シリカ(新日鉄マテリアルズ マイクロン社製のS6050P)1900.0gおよび粘度23mPa・sである、式:
Me2ViSiO(Me2SiO)29Si(OMe)3
で表されるジメチルポリシロキサン 9.5gを小型粉砕機に一括投入し、室温(150℃)にて1分間攪拌を行い、溶融シリカに表面処理を施し粉砕機の温度を25℃に戻した。次いで、ホットメルト性シリコーン微粒子(1) 78.7g、
式:HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 9.1g、
粘度1,000mPa・sであり、
平均単位式:
(PhSiO3/2)0.4(HMe2SiO1/2)0.6
で表される、一分子中に2個以上のケイ素原子結合水素原子を有する、粘度25mPa・sの分岐鎖状オルガノポリシロキサン(ケイ素原子結合水素原子の含有量=0.65質量%) 12.2g
{シリコーン微粒子(1)中のビニル基1.0モルに対して、上記ジフェニルシロキサン及び分岐状フェニルシロキサン中のケイ素原子結合水素原子が1.0モルとなる量}、
25℃における粘度が30mPa・sである分子鎖両末端シラノール基封鎖メチルビニルシロキサンオリゴマーと3-グリシドキシプロピルトリメトキシシランの縮合反応物
8.1g、
1-エチニル-1-シクロヘキサノール(本組成物に対して質量単位で300ppmとなる量)、を小型粉砕機に追加投入し、室温(25℃)で1分間攪拌を行い、均一な粒状の白色の硬化性シリコーン組成物を調製した。また、この組成物の軟化点等の測定結果を表1に示す。
平均粒子径17μmの溶融シリカ(新日鉄マテリアルズ マイクロン社製のS6050P)1900.0gおよび粘度23mPa・sである、式:
Me2ViSiO(Me2SiO)29Si(OMe)3
で表されるジメチルポリシロキサン 9.5gを小型粉砕機に一括投入し、室温(150℃)にて1分間攪拌を行い、溶融シリカに表面処理を施し粉砕機の温度を25℃に戻した。次いで、ホットメルト性シリコーン微粒子(1) 78.7g、
式:HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 9.1g、
平均単位式:
(PhSiO3/2)0.4(HMe2SiO1/2)0.6
で表される、一分子中に2個以上のケイ素原子結合水素原子を有する、粘度25mPa・sの分岐鎖状オルガノポリシロキサン(ケイ素原子結合水素原子の含有量=0.65質量%) 12.2g
{シリコーン微粒子(1)中のビニル基1.0モルに対して、上記ジフェニルシロキサン及び分岐状フェニルシロキサン中のケイ素原子結合水素原子が1.0モルとなる量}、
(Me2ViSiO1/2)0.2(MeEpSiO2/2)0.25(PhSiO3/2)0.55(HO1/2)0.005
で表されるエポキシ基含有ポリシロキサン 8.1g、
1-エチニル-1-シクロヘキサノール(本組成物に対して質量単位で300ppmとなる量)、を小型粉砕機に追加投入し、室温(25℃)で1分間攪拌を行い、均一な粒状の白色の硬化性シリコーン組成物を調製した。また、この組成物の軟化点等の測定結果を表1に示す。
平均粒子径17μmの溶融シリカ(新日鉄マテリアルズ マイクロン社製のS6050P)1900.0gおよび粘度23mPa・sである、式:
Me2ViSiO(Me2SiO)29Si(OMe)3
で表されるジメチルポリシロキサン 9.5gを小型粉砕機に一括投入し、室温(150℃)にて1分間攪拌を行い、溶融シリカに表面処理を施し粉砕機の温度を25℃に戻した。次いで、ホットメルト性シリコーン微粒子(1) 78.7g、
式:HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 9.1g、
平均単位式:
(PhSiO3/2)0.4(HMe2SiO1/2)0.6
で表される、一分子中に2個以上のケイ素原子結合水素原子を有する、粘度25mPa・sの分岐鎖状オルガノポリシロキサン(ケイ素原子結合水素原子の含有量=0.65質量%) 12.2g
{シリコーン微粒子(1)中のビニル基1.0モルに対して、上記ジフェニルシロキサン及び分岐状フェニルシロキサン中のケイ素原子結合水素原子が1.0モルとなる量}、
3-グリシドキシプロピルトリメトキシシラン 8.1g、
1-エチニル-1-シクロヘキサノール(本組成物に対して質量単位で300ppmとなる量)、を小型粉砕機に追加投入し、室温(25℃)で1分間攪拌を行い、均一な粒状の白色の硬化性シリコーン組成物を調製した。また、この組成物の軟化点等の測定結果を表1に示す。
平均粒子径14.5μmの溶融シリカ(新日鉄マテリアルズ マイクロン社製のS610-5P)1700.0gおよび粘度125mPa・sである、式:
Me3SiO(Me2SiO)110Si(OMe)3
で表されるジメチルポリシロキサン 9.5gを小型粉砕機に一括投入し、室温(150℃)にて1分間攪拌を行い、溶融シリカに表面処理を施し粉砕機の温度を25℃に戻した。次いで、ホットメルト性シリコーン微粒子(1) 78.7g、
式:HMe2SiO(Ph2SiO)SiMe2H
で表される、粘度5mPa・sの分子鎖両末端ジメチルハイドロジェンシロキシ基封鎖ジフェニルシロキサン(ケイ素原子結合水素原子の含有量=0.6質量%) 9.1g、
平均単位式:
(PhSiO3/2)0.4(HMe2SiO1/2)0.6
で表される、一分子中に2個以上のケイ素原子結合水素原子を有する、粘度25mPa・sの分岐鎖状オルガノポリシロキサン(ケイ素原子結合水素原子の含有量=0.65質量%) 12.2g
{シリコーン微粒子(1)中のビニル基1.0モルに対して、上記ジフェニルシロキサン及び分岐状フェニルシロキサン中のケイ素原子結合水素原子が1.0モルとなる量}、
N-フェニル-3-アミノプロピルトリメトキシシラン 8.1g、
1-エチニル-1-シクロヘキサノール(本組成物に対して質量単位で300ppmとなる量)、を小型粉砕機に追加投入し、室温(25℃)で1分間攪拌を行い、均一な粒状の白色の硬化性シリコーン組成物を調製した。また、この組成物の軟化点等の測定結果を表1に示す。
本発明にかかる実施例1~6の硬化性シリコーン組成物は良好なホットメルト性を有し、どの様な基材に対しても強固に接着し、かつ、実用上十分な線膨張係数(CTE)および曲げ強度を有していた。このため、これらの硬化性シリコーン組成物を用いて得られる硬化物は、金やエポキシガラスなどが使用されることが多い半導体デバイスの封止に好適に使用できることが期待される。
上記実施例1等の粒状にした硬化性シリコーン組成物を80℃に加熱しながら、二軸押出機を用いて加熱溶融混練し、半固体状の軟化物の形態で、剥離性フィルム(株式会社タカラインコーポレーション社製、ビワライナー)上に供給量5kg/時間となるように供給し、2枚の剥離性フィルム間に積層する。続いて、当該積層体を、ロール間で延伸することで、厚さ500μmのホットメルト性の硬化性シリコーンシートが2枚の剥離性フィルム間に積層された積層体を形成させ、-15℃に設定した冷却ロールにより全体を冷却する。当該積層体において、剥離性フィルムを分離することにより、平坦かつ均質なホットメルト性の硬化性シリコーンシートを得ることができる。
上記実施例1等の粒状にした硬化性シリコーン組成物を80℃に加熱しながら、二軸押出機を用いて加熱溶融混練し、T型ダイ(開口寸法:800μm×100mm、80℃加熱)により略シート状に成型しながら、剥離性フィルム(株式会社タカラインコーポレーション社製、ビワライナー)上に供給量5kg/時間となるように供給し、-15℃に設定した冷却ロールにより全体を冷却した後に、2枚の剥離性フィルム間に積層した。続いて、当該積層体を、ロール間で延伸することで、厚さ500μmのホットメルト性の硬化性シリコーンシートが2枚の剥離性フィルム間に積層された積層体を形成する。当該積層体において、剥離性フィルムを分離することにより、平坦かつ均質なホットメルト性の硬化性シリコーンシートを得ることができる。
Claims (22)
- (A)RSiO3/2(式中、Rは一価炭化水素基)表されるシロキサン単位を全シロキサン単位の少なくとも20モル%以上含有するオガノポリシロキサン樹脂微粒子
(B)シラトラン誘導体およびカルバシラトラン誘導体から選ばれる1種類以上の接着付与剤、
(C)硬化剤、および
(D)機能性無機フィラー、
を含有してなり、
(D)成分の含有量が、組成物全体に対して少なくとも50体積%以上であり、
25℃では固体で200℃以下の温度でホットメルト性を有することを特徴とする、硬化性シリコーン組成物。 - (A)成分の少なくとも一部または全部が、
(A1)軟化点が30℃以上であり、分子内に少なくとも1個の炭素-炭素二重結合を含む硬化反応性の官能基を有し、RSiO3/2(式中、Rは一価炭化水素基)で表されるシロキサン単位を全シロキサン単位の少なくとも20モル%以上含有するするホットメルト性のオルガノポリシロキサン樹脂微粒子である、請求項1に記載の硬化性シリコーン組成物。 - (D)成分の含有量が、組成物全体に対して少なくとも50体積%以上であり、かつ、
(B)成分の含有量が、組成物全体の0.1~1.0質量%の範囲内である、請求項1または請求項2に記載の硬化性シリコーン組成物。 - 硬化により、25℃~200℃の範囲での平均線膨張係数が20ppm/℃以下である硬化物を与えることを特徴とする、請求項1~3のいずれか1項に記載の硬化性シリコーン組成物。
- 硬化により、JIS K 6911-1995「熱硬化性プラスチック一般試験方法」に規定の方法により測定した硬化物の曲げ強度が15MPa以上の硬化物を与えることを特徴とする、請求項1~4のいずれか1項に記載の硬化性シリコーン組成物
- (A)成分の少なくとも一部または全部が、
(A1-1)軟化点が30℃以上であり、分子内に少なくとも1個の炭素-炭素二重結合を含む硬化反応性の官能基を有し、RSiO3/2(式中、Rは一価炭化水素基)で表されるシロキサン単位を全シロキサン単位の少なくとも20モル%以上含有し、かつ、ケイ素原子結合有機基の10モル%以上がアリール基であるホットメルト性のオルガノポリシロキサン樹脂微粒子である、請求項1~5のいずれか1項に記載の硬化性シリコーン組成物。 - (B)成分が、
下記構造式(1):
{式(1)中、R1 は同じかまたは異なる水素原子もしくはアルキル基であり、R2 は水素原子、アルキル基、および一般式:-R4 -Si(OR5 )x R6(3-x)(式中、R4 は二価有機基であり、R5 は炭素原子数1~10のアルキル基であり、R6 は置換もしくは非置換の一価炭化水素基であり、xは1、2、または3である。)で表されるアルコキシシリル基含有有機基からなる群から選択される同じかまたは異なる基であり、但し、R2 の少なくとも1個はこのアルコキシシリル基含有有機基であり、R3 は置換もしくは非置換の一価炭化水素基、炭素原子数1~10のアルコキシ基、グリシドキシアルキル基、オキシラニルアルキル基、アシロキシアルキル基、およびアルケニル基からなる群から選択される基である。}で表されるシラトラン誘導体、および、
下記構造式(2):
{式(2)中、R1はアルキル基、アルケニル基またはアルコキシ基であり、R2は同じかまたは異なる一般式:
で表される基からなる群から選択される基であり、R3は同じかまたは異なる水素原子もしくはアルキル基である。}
で表されるカルバシラトラン誘導体から選ばれる1種類以上である、、請求項1~6のいずれか1項に記載の硬化性シリコーン組成物。 - (A)成分が平均一次粒子径が1~10μmである真球状の樹脂微粒子である請求項1~7いずれか1項に記載の硬化性シリコーン組成物。
- (C)成分が、以下の(c1)または(c2)から選ばれる1種類以上の硬化剤
(c1)有機過酸化物
(c2)分子内に少なくとも2個のケイ素原子結合水素原子を有するオルガノハイドロジェンポリシロキサンおよびヒドロシリル化反応触媒
であり、本組成物の硬化に必要な量含有していることを特徴とする請求項1~8のいずれか1項に記載の硬化性シリコーン組成物。 - (D)成分が補強性フィラー、白色顔料、熱伝導性フィラー、導電性フィラー、蛍光体、またはこれらの少なくとも2種の混合物である、請求項1~9のいずれか1項に記載の硬化性シリコーン組成物。
- 粒状、ペレット状またはシート状である、請求項1~10のいずれか1項に記載の硬化性シリコーン組成物。
- 請求項1~10のいずれか1項に記載の硬化性シリコーン組成物からなる、実質的に平坦な、厚さ10~1000μmの硬化性シリコーン組成物シート。
- 請求項12の硬化性シリコーン組成物シートである、フィルム状接着剤。
- 請求項12の硬化性シリコーン組成物シート、および
当該硬化性シリコーン組成物シートの片面または両面に、当該硬化性シリコーン組成物シートと対向する剥離面を備えたシート状基材を有する、剥離性積層体。 - 請求項1~10のいずれか1項に記載の硬化性シリコーン組成物を硬化させてなる、硬化物。
- 請求項15に記載の硬化物の半導体装置用部材としての使用。
- 請求項15に記載の硬化物を有する半導体装置。
- 硬化性シリコーン組成物を構成する各成分のみを、50℃を超えない温度条件下で混合することにより粒状化することを特徴とする、請求項1~10のいずれか1項に記載の硬化性シリコーン組成物を粒状とする製造方法。
- 下記工程(I)~(III)から少なくともなる硬化物の成型方法。
(I)請求項11に記載のペレット状又はシート状の硬化性シリコーン組成物を100℃以上に加熱して、溶融する工程;
(II)前記工程(I)で得られた液状の硬化性シリコーン組成物を金型に注入する工程 又は 型締めにより金型に前記工程(I)で得られた硬化性シリコーン組成物を行き渡らせる工程;および
(III)前記工程(II)で注入した硬化性シリコーン組成物を硬化する工程 - 請求項1~10のいずれか1項に記載の硬化性シリコーン組成物を硬化させてなる硬化物により、半導体素子のオーバーモールド成型及びアンダーフィルを一度に行う被覆工程を含む、請求項19の硬化物の成型方法。
- 請求項1~10のいずれか1項に記載の硬化性シリコーン組成物を硬化させてなる硬化物により、単独又は複数の半導体素子を搭載した半導体ウエハ基板の表面を覆い、かつ、半導体素子の間隙が当該硬化物により充填されるようにオーバーモールド成型する被覆工程を含む、請求項20の硬化物の成型方法。
- 以下の工程を備えることを特徴とする、請求項13に記載の硬化性シリコーン組成物シートの製造方法。
工程1:請求項1~10のいずれか1項に記載の硬化性シリコーン組成物の各原料成分を50℃以上の温度で混合する工程
工程2:工程1で得た混合物を、加熱溶融しながら混練する工程
工程3:工程2で得た加熱溶融後の混合物を、少なくとも1の剥離面を備えたフィルム間に積層する工程
工程4:工程3で得た積層体をロール間で延伸し、特定の膜厚を有する硬化性シリコーンシートを成型する工程
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20784856.5A EP3950844A4 (en) | 2019-03-29 | 2020-03-18 | CURABLE SILICONE COMPOSITION, ASSOCIATED CURED ARTICLE AND METHOD FOR MAKING THIS COMPOSITION |
CN202080022993.6A CN113614174B (zh) | 2019-03-29 | 2020-03-18 | 固化性有机硅组合物、其固化物及其制造方法 |
JP2021511424A JP7509755B2 (ja) | 2019-03-29 | 2020-03-18 | 硬化性シリコーン組成物、その硬化物、およびその製造方法 |
KR1020217034128A KR20210148202A (ko) | 2019-03-29 | 2020-03-18 | 경화성 실리콘 조성물, 그의 경화물 및 그의 제조 방법 |
US17/442,665 US20220195270A1 (en) | 2019-03-29 | 2020-03-18 | Curable silicone composition, cured product of same, and method for producing same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019066556 | 2019-03-29 | ||
JP2019-066556 | 2019-03-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2020203306A1 true WO2020203306A1 (ja) | 2020-10-08 |
Family
ID=72668787
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2020/012029 WO2020203306A1 (ja) | 2019-03-29 | 2020-03-18 | 硬化性シリコーン組成物、その硬化物、およびその製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20220195270A1 (ja) |
EP (1) | EP3950844A4 (ja) |
JP (1) | JP7509755B2 (ja) |
KR (1) | KR20210148202A (ja) |
CN (1) | CN113614174B (ja) |
TW (1) | TWI837333B (ja) |
WO (1) | WO2020203306A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023033031A1 (ja) * | 2021-08-31 | 2023-03-09 | ダウ・東レ株式会社 | 顆粒状硬化性シリコーン組成物、その硬化物、およびその製造方法 |
WO2024135805A1 (ja) * | 2022-12-23 | 2024-06-27 | ダウ・東レ株式会社 | 硬化性シリコーン組成物、その硬化生成物、及び前記組成物の使用 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115948117A (zh) * | 2023-02-20 | 2023-04-11 | 江苏纳恩新材料有限公司 | 一种合成革用高耐磨有机硅涂层及其制备方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10195085A (ja) | 1996-11-18 | 1998-07-28 | Toray Dow Corning Silicone Co Ltd | カルバシラトラン誘導体、その製造方法、接着促進剤、および硬化性シリコーン組成物 |
JP2001019933A (ja) | 1999-07-09 | 2001-01-23 | Dow Corning Toray Silicone Co Ltd | シリコーン系接着性シート、およびその製造方法 |
JP2006274007A (ja) | 2005-03-29 | 2006-10-12 | Dow Corning Toray Co Ltd | ホットメルト型シリコーン系接着剤 |
WO2016103654A1 (ja) * | 2014-12-26 | 2016-06-30 | 東レ・ダウコーニング株式会社 | 硬化性オルガノポリシロキサン組成物、それからなる半導体用封止剤および半導体装置 |
WO2018030288A1 (ja) | 2016-08-08 | 2018-02-15 | 東レ・ダウコーニング株式会社 | 硬化性粒状シリコーン組成物、それからなる半導体用部材、およびその成型方法 |
WO2018235491A1 (ja) | 2017-06-19 | 2018-12-27 | 東レ・ダウコーニング株式会社 | 硬化性粒状シリコーン組成物、それからなる半導体用部材、およびその成型方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200716710A (en) * | 2005-09-30 | 2007-05-01 | Dow Corning Toray Co Ltd | Multi-component room-temperature curable silicone rubber composition |
JP6888925B2 (ja) | 2016-08-24 | 2021-06-18 | 三菱鉛筆株式会社 | 筆記具 |
-
2020
- 2020-03-18 US US17/442,665 patent/US20220195270A1/en active Pending
- 2020-03-18 KR KR1020217034128A patent/KR20210148202A/ko unknown
- 2020-03-18 CN CN202080022993.6A patent/CN113614174B/zh active Active
- 2020-03-18 JP JP2021511424A patent/JP7509755B2/ja active Active
- 2020-03-18 EP EP20784856.5A patent/EP3950844A4/en active Pending
- 2020-03-18 WO PCT/JP2020/012029 patent/WO2020203306A1/ja unknown
- 2020-03-27 TW TW109110538A patent/TWI837333B/zh active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10195085A (ja) | 1996-11-18 | 1998-07-28 | Toray Dow Corning Silicone Co Ltd | カルバシラトラン誘導体、その製造方法、接着促進剤、および硬化性シリコーン組成物 |
JP2001019933A (ja) | 1999-07-09 | 2001-01-23 | Dow Corning Toray Silicone Co Ltd | シリコーン系接着性シート、およびその製造方法 |
JP2006274007A (ja) | 2005-03-29 | 2006-10-12 | Dow Corning Toray Co Ltd | ホットメルト型シリコーン系接着剤 |
JP4849814B2 (ja) | 2005-03-29 | 2012-01-11 | 東レ・ダウコーニング株式会社 | ホットメルト型シリコーン系接着剤 |
WO2016103654A1 (ja) * | 2014-12-26 | 2016-06-30 | 東レ・ダウコーニング株式会社 | 硬化性オルガノポリシロキサン組成物、それからなる半導体用封止剤および半導体装置 |
WO2018030288A1 (ja) | 2016-08-08 | 2018-02-15 | 東レ・ダウコーニング株式会社 | 硬化性粒状シリコーン組成物、それからなる半導体用部材、およびその成型方法 |
WO2018235491A1 (ja) | 2017-06-19 | 2018-12-27 | 東レ・ダウコーニング株式会社 | 硬化性粒状シリコーン組成物、それからなる半導体用部材、およびその成型方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP3950844A4 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023033031A1 (ja) * | 2021-08-31 | 2023-03-09 | ダウ・東レ株式会社 | 顆粒状硬化性シリコーン組成物、その硬化物、およびその製造方法 |
WO2024135805A1 (ja) * | 2022-12-23 | 2024-06-27 | ダウ・東レ株式会社 | 硬化性シリコーン組成物、その硬化生成物、及び前記組成物の使用 |
Also Published As
Publication number | Publication date |
---|---|
TW202102607A (zh) | 2021-01-16 |
CN113614174A (zh) | 2021-11-05 |
JPWO2020203306A1 (ja) | 2020-10-08 |
EP3950844A4 (en) | 2022-12-21 |
US20220195270A1 (en) | 2022-06-23 |
EP3950844A1 (en) | 2022-02-09 |
CN113614174B (zh) | 2023-04-04 |
TWI837333B (zh) | 2024-04-01 |
JP7509755B2 (ja) | 2024-07-02 |
KR20210148202A (ko) | 2021-12-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6930816B2 (ja) | 硬化性粒状シリコーン組成物、それからなる半導体用部材、およびその成型方法 | |
TWI831733B (zh) | 固化性粒狀聚矽氧組合物、由其構成之半導體用構件及其成型方法 | |
TWI833869B (zh) | 固化性聚矽氧組成物、其固化物及其製造方法 | |
JP7509756B2 (ja) | 硬化性シリコーン組成物、その硬化物、およびその製造方法 | |
WO2020203304A1 (ja) | 硬化性シリコーン組成物、その硬化物、およびその製造方法 | |
TWI785054B (zh) | 固化性粒狀有機矽組合物、由其構成之半導體用構件及其成型方法 | |
WO2020203306A1 (ja) | 硬化性シリコーン組成物、その硬化物、およびその製造方法 | |
JPWO2020138410A1 (ja) | 硬化性シリコーン組成物、その硬化物、およびその製造方法 | |
JP7456938B2 (ja) | ホットメルト性を有する硬化性シリコーンシートの製造方法 | |
CN113631659B (zh) | 固化性有机硅组合物、其固化物及其制造方法 | |
JPWO2020138411A1 (ja) | トランスファー成型用硬化性シリコーン組成物、その硬化物、およびその製造方法 | |
WO2023032735A1 (ja) | 硬化性シリコーン組成物、その硬化物、およびその製造方法 | |
WO2023032734A1 (ja) | 硬化性シリコーン組成物、その硬化物、およびその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 20784856 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2021511424 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20217034128 Country of ref document: KR Kind code of ref document: A |
|
ENP | Entry into the national phase |
Ref document number: 2020784856 Country of ref document: EP Effective date: 20211029 |