CN1243127A - 从醇-硅直接合成溶剂中除去溶解的硅酸酯 - Google Patents
从醇-硅直接合成溶剂中除去溶解的硅酸酯 Download PDFInfo
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- CN1243127A CN1243127A CN99107605A CN99107605A CN1243127A CN 1243127 A CN1243127 A CN 1243127A CN 99107605 A CN99107605 A CN 99107605A CN 99107605 A CN99107605 A CN 99107605A CN 1243127 A CN1243127 A CN 1243127A
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- carboxylic acid
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- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 title description 4
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 56
- 238000006243 chemical reaction Methods 0.000 claims abstract description 47
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- 230000001351 cycling effect Effects 0.000 description 1
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- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
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- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 238000011221 initial treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000009533 lab test Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen(.) Chemical compound [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- WFIZEGIEIOHZCP-UHFFFAOYSA-M potassium formate Chemical compound [K+].[O-]C=O WFIZEGIEIOHZCP-UHFFFAOYSA-M 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004451 qualitative analysis Methods 0.000 description 1
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- 235000009566 rice Nutrition 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000002910 solid waste Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- CTPKSRZFJSJGML-UHFFFAOYSA-N sulfiram Chemical compound CCN(CC)C(=S)SC(=S)N(CC)CC CTPKSRZFJSJGML-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- JZALLXAUNPOCEU-UHFFFAOYSA-N tetradecylbenzene Chemical compound CCCCCCCCCCCCCCC1=CC=CC=C1 JZALLXAUNPOCEU-UHFFFAOYSA-N 0.000 description 1
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- 238000007725 thermal activation Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/04—Esters of silicic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/025—Silicon compounds without C-silicon linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
Description
缩写 | 含义 | 缩写 | 含义 |
TMS | HSi(OCH3)3 | g | 克 |
TTMS | Si(OCH3)4 | kg | 千克 |
选择性 | HSi(OR)3/Si(OR)4 | L | 升 |
N550BL | NALKYLENE550BL | μm | 微米 |
TH 59 | THERMINOL59 | %Si/hr | 硅转化百分数/小时 |
sec | 秒 | rpm | 转/分钟 |
psig | 磅/吋2(表压) | m2/g | 米2/克 |
min | 分钟 | wt% | %重量 |
hr | 小时 | cm | 厘米 |
kPa | 千帕斯卡 |
基团 | 结构 | 29Si NMR位移(ppm) |
Q0 | Si(OR)4 | -78.3至-78.5 |
Q1 | O-Si(OR)3 | -85.6至-85.9 |
Q2 | O-Si(OR)2-O | -93.6至-93.9 |
Q3 | O-Si-O(OR)O | -102.0至-102.6 |
Q4 | Si(OSi)4 | -110 |
试样 | 溶剂中Si的wt% | Q0摩尔% | Q1摩尔% | Q2摩尔% | Q3摩尔% |
用过的TH 59实验数据 | 0.34 | 0 | 52.3 | 47.7 | 0 |
用过的TH 59工业数据 | 1.85 | 7.9 | 15.5 | 30.6 | 29.5 |
用过的N550 | 0.87 | 0 | 44.2 | 39.8 | 13.8 |
合成硅酸酯混合物 | 9.17 | 13.3 | 34.9 | 35.0 | 12.6 |
试样 | 酸 | 观察情况 |
用过的TH 59实验室数据 | HCOOH | 立即混浊。晶体在1小时内沉淀出。在24小时内完全沉淀。溶剂粘性较小 |
新鲜的TH 59对照组 | HCOOH | 无反应 |
新鲜的TH 59对照组 | CH3COOH | 无反应 |
用过的N550 | HCOOH | 立即混浊。1小时后观察到固体。在24小时内完全沉淀。溶剂粘性较小 |
新鲜的N550对照组 | HCOOH | 无反应 |
新鲜的N550对照组 | CH3COOH | 无反应 |
合成硅酸酯混合物 | CH3COOH | 长期放置发生胶凝作用。加热至70℃时立即沉淀 |
合成硅酸酯混合物 | HCOOH | 立即沉淀 |
用过的TH 59工业数据 | HCOOH | 立即沉淀 |
用过的TH 59工业数据 | CH3COOH | 长期放置发生胶凝作用 |
实施例 | 用过的TH 59,g | HCOOH,g | 〔HCOOH/Si〕,摩尔比 | 回收的ED固体,g |
3A | 50.08 | 10.03 | 5.95 | 2.13 |
3B | 50.06 | 8.08 | 4.79 | 2.28 |
3C | 50.00 | 5.78 | 3.43 | 2.27 |
3D | 50.11 | 3.15 | 1.87 | 2.33 |
实施例 | 温度,℃ | 回收的固体,g | 过滤速率,g/sec |
4A | 21 | 40.2 | 11.28 |
4B | 35 | 34.0 | 2.06 |
4C | 50 | 31.1 | 1.06 |
4D | 80 | 32.8 | 11.01 |
4E | 90 | 42.8 | 10.79 |
实施例 | HCOOH,g | 〔HCOOH/Si〕摩尔比 | 反应时间,小时 | 回收的固体,g | 过滤速率,g/sec |
5A | 3.11 | 0.92 | 1 | 6.86 | 0.20 |
5B | 3.11 | 0.92 | 2 | 7.02 | 未测量 |
5C | 6.23 | 1.85 | 2 | 7.85 | 未测量 |
5D | 3.11 | 0.92 | 3 | 7.39 | 未测量 |
5E | 6.24 | 1.85 | 1 | 7.80 | 0.56 |
5F | 6.23 | 1.85 | 3 | 7.91 | 0.52 |
5G | 3.11 | 0.92 | 5 | 7.40 | 0.41 |
5H | 9.22 | 2.74 | 1 | 7.92 | 0.88 |
5I | 9.24 | 2.74 | 2 | 7.93 | 0.64 |
5J | 9.20 | 2.73 | 3 | 7.96 | 0.72 |
实施例 | HCOOH,g/sec | 过滤速率,g/sec |
6A | 0.25 | 0.92 |
6B | 2.80 | 0.88 |
6C | 17.91 | 0.59 |
试样 | FTIR结果 |
新鲜的THERMINOL59 | 无Si-O-Si或C=O带 |
用过的THERMINOL59 | 在1096.5cm-1处有Si-O-Si带,无C=O带 |
7A | 无Si-O-Si带。在1731 cm-1处具有小的C=O带,并具有较低频的肩 |
7B | 无Si-O-Si或C=O带 |
7C | 无Si-O-Si或C=O带 |
助滤剂 | 滤液重量,g | 总时间,分钟 | 过滤速率,g/min |
无 | 192.0 | 15.5 | 22.31 |
GOOD-RITE7058 | 189.4 | 4.67 | 130.95 |
CARBOPOL980 | 189.5 | 9.67 | 43.64 |
MILLITHIX925 | 191.7 | 10.83 | 26.22 |
POLYOX 7×106道尔顿 | 191.8 | 9.50 | 34.53 |
PEMULENTR1 | 192.0 | 8.00 | 48.94 |
PEMULENTR2 | 192.0 | 8.50 | 48.92 |
PEMULEN1622 | 191.0 | 8.17 | 48.84 |
SOLKAFLOC | 192.0 | 4.67 | 121.43 |
元素 | 数值 |
Al,wt% | 0.08 |
Ba,ppm | <3 |
Ca,ppm | 600 |
Cr,ppm | 58.9 |
Cu,ppm | 34.8 |
Fe,wt% | 0.38 |
Mg,ppm | 8.8 |
Mn,ppm | 90.4 |
Ni,ppm | 15.5 |
P,ppm | 26.8 |
Pb,ppm | <10 |
Sn,ppm | <10 |
Ti,ppm | 299 |
V,ppm | 14.3 |
Zn,ppm | <5 |
Zr,ppm | 29 |
额定筛眼孔径μm | Wt%>额定尺寸 |
600 | 3.1 |
425 | 14.0 |
300 | 18.7 |
250 | 13.7 |
180 | 11.9 |
75 | 24.1 |
45 | 1.5 |
<45 | 11.6 |
特性 | 数值 |
Cu,wt% | 58.12 |
Al,ppm | 2580 |
As,ppm | <30 |
Ca,ppm | 1530 |
Fe,ppm | 610 |
P,wt% | 1.62 |
Pb,ppm | 290 |
Sb,ppm | 20 |
Sn,ppm | 80 |
Zn,ppm | 950 |
H2O,wt% | 6.0 |
Cl-,ppm | 310 |
SO4 2-,wt% | 1.72 |
试样 | Si转化(%) | 速率,(%Si/小时) | HSi(OCH3)3(kg) | Si(OCH3)4(kg) | 选择性* |
12A用新鲜的TH 59进行对照 | 85 | 6.72 | 3.53 | 0.148 | 23.94 |
12B过滤的,用过的TH 59 | 85 | 5.95 | 3.54 | 0.140 | 25.36 |
12C从实施例11得到的TH 59 | 85 | 6.25 | 3.51 | 0.152 | 23.17 |
12D从实施例10得到的TH 59 | 85 | 6.15 | 3.55 | 0.121 | 29.40 |
12E从实施例9得到的TH 59 | 85 | 6.44 | 3.60 | 0.112 | 32.07 |
Claims (24)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/054,027 | 1998-04-02 | ||
US09/054,027 US6090965A (en) | 1998-04-02 | 1998-04-02 | Removal of dissolved silicates from alcohol-silicon direct synthesis solvents |
US09/054027 | 1998-04-02 |
Publications (2)
Publication Number | Publication Date |
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CN1243127A true CN1243127A (zh) | 2000-02-02 |
CN1140530C CN1140530C (zh) | 2004-03-03 |
Family
ID=21988315
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CNB991076052A Expired - Fee Related CN1140530C (zh) | 1998-04-02 | 1999-04-02 | 从醇-硅直接合成溶剂中除去溶解的硅酸酯 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6090965A (zh) |
EP (1) | EP0947521B1 (zh) |
KR (1) | KR100625148B1 (zh) |
CN (1) | CN1140530C (zh) |
BR (1) | BR9915714A (zh) |
DE (1) | DE69905958T2 (zh) |
ES (1) | ES2195463T3 (zh) |
Cited By (2)
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---|---|---|---|---|
CN110817887A (zh) * | 2019-11-27 | 2020-02-21 | 鑫创新材料科技(徐州)有限公司 | 一种气凝胶的高效生产方法及其应用 |
CN113683635A (zh) * | 2021-09-02 | 2021-11-23 | 上海赛奥分离技术工程有限公司 | 陶瓷膜技术在四甲基二乙烯基二硅氧烷生产中的应用方法 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6166237A (en) * | 1999-08-13 | 2000-12-26 | Crompton Corporation | Removal of dissolved silicates from alcohol-silicon direct synthesis solvents |
DE19947591A1 (de) * | 1999-10-04 | 2001-04-12 | Basf Ag | Verfahren zur Isolierung von Trimethoxysilan aus einer TMS-Methanol-Mischung |
US7339068B2 (en) | 2001-01-31 | 2008-03-04 | Momentive Performance Materials Inc. | Nanosized copper catalyst precursors for the direct synthesis of trialkoxysilanes |
US7858818B2 (en) * | 2001-01-31 | 2010-12-28 | Momentive Performance Materials Inc. | Nanosized copper catalyst precursors for the direct synthesis of trialkoxysilanes |
DE10116007A1 (de) * | 2001-03-30 | 2002-10-02 | Degussa | Vorrichtung und Verfahren zur Herstellung von im Wesentlichen halogenfreien Trialkoxysilanen |
US6580000B1 (en) | 2002-06-06 | 2003-06-17 | Ak Research Company | Process for the manufacture of alkoxysilanes and alkoxy orthosilicates |
US7652164B2 (en) * | 2005-09-13 | 2010-01-26 | Momentive Performance Materials Inc. | Process for the direct synthesis of trialkoxysilane |
US7429672B2 (en) * | 2006-06-09 | 2008-09-30 | Momentive Performance Materials Inc. | Process for the direct synthesis of trialkoxysilane |
KR101422080B1 (ko) | 2011-09-06 | 2014-07-22 | 인스티튜트 오브 아이온-플라즈마엔드 레이저 테크놀러지스 | 트리알콕시실란의 제조방법 |
DE102017010575B3 (de) | 2017-11-15 | 2019-02-21 | Frank Rößner | Methode zur Charakterisierung von Silicamaterialien und Organo-Silicakompositmaterialien |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL65093C (zh) * | 1945-07-25 | |||
US2692838A (en) * | 1951-05-26 | 1954-10-26 | Bell Telephone Labor Inc | Process for producing a silica coating |
DE1793222A1 (de) * | 1968-08-17 | 1971-04-15 | Dynamit Nobel Ag | Verfahren zur Herstellung von Orthokieselsaeuretetraalkylestern |
US3641077A (en) * | 1970-09-01 | 1972-02-08 | Eugene G Rochow | Method for preparing alkoxy derivatives of silicon germanium tin thallium and arsenic |
US3803197A (en) * | 1971-05-04 | 1974-04-09 | Anderson Dev Co | Method of preparation of alkyl and 2-alkoxy-ethyl silicates |
BE789535A (fr) * | 1971-09-30 | 1973-01-15 | Tokyo Shibaura Electric Co | Procede de fabrication d'alkoxysilanes |
FR2318872A1 (fr) * | 1975-07-19 | 1977-02-18 | Dynamit Nobel Ag | Procede pou l'obtention d'esters alkyliques d'acide orthosilicique |
US4288604A (en) * | 1980-05-19 | 1981-09-08 | Stauffer Chemical Company | Method for the production of tetraalkyl silicates |
US4323690A (en) * | 1981-04-20 | 1982-04-06 | Carboline Company | Method of making silicate esters |
JPS62120390A (ja) * | 1985-11-20 | 1987-06-01 | Chisso Corp | テトラメトキシシランの製造方法 |
US4727173A (en) * | 1987-03-31 | 1988-02-23 | Union Carbide Corporation | Process for producing trialkoxysilanes from the reaction of silicon metal and alcohol |
US4761492A (en) * | 1987-09-28 | 1988-08-02 | Union Carbide Corporation | Process for recovering trimethoxysilane from a trimethoxysilane and methanol mixture |
US4762939A (en) * | 1987-09-30 | 1988-08-09 | Union Carbide Corporation | Process for trialkoxysilane/tetraalkoxysilane mixtures from silicon metal and alcohol |
US4778910A (en) * | 1987-12-14 | 1988-10-18 | Lopata Research & Development Corporation | Method of making alkylalkoxysilanes |
US4950779A (en) * | 1989-12-04 | 1990-08-21 | General Electric Company | Nonaqueous method for making silicone oligomers |
JP2848908B2 (ja) * | 1990-03-23 | 1999-01-20 | 多摩化学工業株式会社 | アルコキシシラン類の製造法 |
US4999446A (en) * | 1990-06-21 | 1991-03-12 | Union Carbide Chemicals And Plastics Company Inc. | Trimethoxysilane preparation via the methanol-silicon reaction with recycle |
US5084590A (en) * | 1991-06-24 | 1992-01-28 | Union Carbide Chemicals & Plastics Technology Corporation | Trimethoxysilane preparation via the methanol-silicon reaction using a continuous process and multiple reactors |
JP2773509B2 (ja) * | 1992-01-13 | 1998-07-09 | 東亞合成株式会社 | トリアルコキシシランの製造方法 |
US5166384A (en) * | 1992-04-07 | 1992-11-24 | Union Carbide Chemicals & Plastics Technology Corporation | Method for the removal of siloxane dissolved in the solvent employed in the preparation of trimethoxysilane via methanol-silicon metal reaction |
KR100229829B1 (ko) * | 1992-05-20 | 1999-11-15 | 미리암디. 메코너헤이 | 무기질 겔의 제조방법 |
US5378790A (en) * | 1992-09-16 | 1995-01-03 | E. I. Du Pont De Nemours & Co. | Single component inorganic/organic network materials and precursors thereof |
US5412016A (en) * | 1992-09-28 | 1995-05-02 | E. I. Du Pont De Nemours And Company | Process for making polymeric inorganic-organic compositions |
US5362897A (en) * | 1993-04-30 | 1994-11-08 | Toagosei Chemical Industry Co., Ltd. | Process for producing trialkoxysilanes |
DE4438032C2 (de) * | 1994-10-25 | 2001-09-27 | Degussa | Verfahren zur Herstellung von Hydrogenalkoxysilanen |
US5728858A (en) * | 1996-10-10 | 1998-03-17 | Osi Specialties, Inc. | Activation of copper-silicon slurries for the direct synthesis of trialkoxysilanes |
JP4276730B2 (ja) * | 1999-04-06 | 2009-06-10 | ゼネラル・エレクトリック・カンパニイ | アルコール−シリコン直接合成溶媒類から溶解したシリケート類の除去 |
US6166237A (en) * | 1999-08-13 | 2000-12-26 | Crompton Corporation | Removal of dissolved silicates from alcohol-silicon direct synthesis solvents |
-
1998
- 1998-04-02 US US09/054,027 patent/US6090965A/en not_active Expired - Fee Related
-
1999
- 1999-04-02 KR KR1019990011659A patent/KR100625148B1/ko not_active IP Right Cessation
- 1999-04-02 CN CNB991076052A patent/CN1140530C/zh not_active Expired - Fee Related
- 1999-04-05 BR BR9915714-4A patent/BR9915714A/pt not_active Application Discontinuation
- 1999-04-06 ES ES99106127T patent/ES2195463T3/es not_active Expired - Lifetime
- 1999-04-06 DE DE69905958T patent/DE69905958T2/de not_active Expired - Fee Related
- 1999-04-06 EP EP99106127A patent/EP0947521B1/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110817887A (zh) * | 2019-11-27 | 2020-02-21 | 鑫创新材料科技(徐州)有限公司 | 一种气凝胶的高效生产方法及其应用 |
CN113683635A (zh) * | 2021-09-02 | 2021-11-23 | 上海赛奥分离技术工程有限公司 | 陶瓷膜技术在四甲基二乙烯基二硅氧烷生产中的应用方法 |
CN113683635B (zh) * | 2021-09-02 | 2024-03-26 | 上海赛奥分离技术工程有限公司 | 陶瓷膜技术在四甲基二乙烯基二硅氧烷生产中的应用方法 |
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Publication number | Publication date |
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DE69905958T2 (de) | 2003-09-11 |
CN1140530C (zh) | 2004-03-03 |
ES2195463T3 (es) | 2003-12-01 |
EP0947521A2 (en) | 1999-10-06 |
DE69905958D1 (de) | 2003-04-24 |
US6090965A (en) | 2000-07-18 |
BR9915714A (pt) | 2001-09-18 |
KR19990082902A (ko) | 1999-11-25 |
EP0947521B1 (en) | 2003-03-19 |
KR100625148B1 (ko) | 2006-09-20 |
EP0947521A3 (en) | 2000-11-29 |
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