CN119213866A - 加热器、定影装置、图像形成装置以及加热装置 - Google Patents

加热器、定影装置、图像形成装置以及加热装置 Download PDF

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Publication number
CN119213866A
CN119213866A CN202380040163.XA CN202380040163A CN119213866A CN 119213866 A CN119213866 A CN 119213866A CN 202380040163 A CN202380040163 A CN 202380040163A CN 119213866 A CN119213866 A CN 119213866A
Authority
CN
China
Prior art keywords
heating
heater
wiring
units
resistance heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380040163.XA
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English (en)
Chinese (zh)
Inventor
梅村裕司
藤田恭士
龟谷真世
小林健太
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Misuzu Industry Co ltd
Original Assignee
Misuzu Industry Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Misuzu Industry Co ltd filed Critical Misuzu Industry Co ltd
Publication of CN119213866A publication Critical patent/CN119213866A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0095—Heating devices in the form of rollers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2039—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat with means for controlling the fixing temperature
    • G03G15/2042—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat with means for controlling the fixing temperature specially for the axial heat partition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2053—Structural details of heat elements, e.g. structure of roller or belt, eddy current, induction heating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2064—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat combined with pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0019—Circuit arrangements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/02—Details
    • H05B3/06—Heater elements structurally combined with coupling elements or holders
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/16—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being mounted on an insulating base
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/54—Heating elements having the shape of rods or tubes flexible
    • H05B3/56—Heating cables
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
    • H05B2203/004—Heaters using a particular layout for the resistive material or resistive elements using zigzag layout

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
  • Fixing For Electrophotography (AREA)
  • Control Of Resistance Heating (AREA)
CN202380040163.XA 2022-07-22 2023-06-23 加热器、定影装置、图像形成装置以及加热装置 Pending CN119213866A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022117504A JP7554490B2 (ja) 2022-07-22 2022-07-22 ヒータ、定着装置、画像形成装置及び加熱装置
JP2022-117504 2022-07-22
PCT/JP2023/023329 WO2024018826A1 (ja) 2022-07-22 2023-06-23 ヒータ、定着装置、画像形成装置及び加熱装置

Publications (1)

Publication Number Publication Date
CN119213866A true CN119213866A (zh) 2024-12-27

Family

ID=89617631

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380040163.XA Pending CN119213866A (zh) 2022-07-22 2023-06-23 加热器、定影装置、图像形成装置以及加热装置

Country Status (6)

Country Link
US (1) US20250377617A1 (https=)
JP (1) JP7554490B2 (https=)
KR (1) KR20250044180A (https=)
CN (1) CN119213866A (https=)
TW (1) TWI864881B (https=)
WO (1) WO2024018826A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121369807B (zh) * 2025-12-24 2026-04-24 重庆明月湖智能科技发展有限公司 一种智能电加热手套

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142991A (ja) * 1996-11-11 1998-05-29 Bando Chem Ind Ltd 定着用加熱ローラ
JP2002141159A (ja) 2000-11-02 2002-05-17 Ibiden Co Ltd セラミックヒータ
JPWO2003102699A1 (ja) 2002-06-03 2005-09-29 富士ゼロックス株式会社 ヒートローラ
TWI281833B (en) * 2004-10-28 2007-05-21 Kyocera Corp Heater, wafer heating apparatus and method for manufacturing heater
JP5441655B2 (ja) 2009-12-10 2014-03-12 株式会社クラベ ステアリングホイール用ヒータ装置
JP6228458B2 (ja) 2011-11-15 2017-11-08 株式会社美鈴工業 ヒータ並びにそれを備える定着装置及び乾燥装置
JP6424010B2 (ja) * 2014-03-31 2018-11-14 株式会社美鈴工業 ヒータとそれを備える定着装置、画像形成装置及び加熱装置、並びにヒータの製造方法
WO2017090692A1 (ja) 2015-11-27 2017-06-01 株式会社美鈴工業 ヒータ、定着装置、画像形成装置及び加熱装置
CN110573967B (zh) 2017-12-08 2020-10-27 株式会社美铃工业 加热器、定影装置、图像形成装置以及加热装置

Also Published As

Publication number Publication date
US20250377617A1 (en) 2025-12-11
WO2024018826A1 (ja) 2024-01-25
JP7554490B2 (ja) 2024-09-20
JP2024014572A (ja) 2024-02-01
TW202423171A (zh) 2024-06-01
TWI864881B (zh) 2024-12-01
KR20250044180A (ko) 2025-03-31

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