KR20250044180A - 히터, 정착 장치, 화상 형성 장치 및 가열 장치 - Google Patents

히터, 정착 장치, 화상 형성 장치 및 가열 장치 Download PDF

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Publication number
KR20250044180A
KR20250044180A KR1020247038113A KR20247038113A KR20250044180A KR 20250044180 A KR20250044180 A KR 20250044180A KR 1020247038113 A KR1020247038113 A KR 1020247038113A KR 20247038113 A KR20247038113 A KR 20247038113A KR 20250044180 A KR20250044180 A KR 20250044180A
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KR
South Korea
Prior art keywords
heating
heater
cells
wiring
boundary line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247038113A
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English (en)
Korean (ko)
Inventor
유지 우메무라
유키오 후지타
마요 가메가이
겐타 고바야시
Original Assignee
가부시키가이샤 미스즈 코우쿄우
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 미스즈 코우쿄우 filed Critical 가부시키가이샤 미스즈 코우쿄우
Publication of KR20250044180A publication Critical patent/KR20250044180A/ko
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0095—Heating devices in the form of rollers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2039—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat with means for controlling the fixing temperature
    • G03G15/2042—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat with means for controlling the fixing temperature specially for the axial heat partition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2053—Structural details of heat elements, e.g. structure of roller or belt, eddy current, induction heating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2064—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat combined with pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0019—Circuit arrangements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/02—Details
    • H05B3/06—Heater elements structurally combined with coupling elements or holders
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/16—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being mounted on an insulating base
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/54—Heating elements having the shape of rods or tubes flexible
    • H05B3/56—Heating cables
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
    • H05B2203/004—Heaters using a particular layout for the resistive material or resistive elements using zigzag layout

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
  • Fixing For Electrophotography (AREA)
  • Control Of Resistance Heating (AREA)
KR1020247038113A 2022-07-22 2023-06-23 히터, 정착 장치, 화상 형성 장치 및 가열 장치 Pending KR20250044180A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022117504A JP7554490B2 (ja) 2022-07-22 2022-07-22 ヒータ、定着装置、画像形成装置及び加熱装置
JPJP-P-2022-117504 2022-07-22
PCT/JP2023/023329 WO2024018826A1 (ja) 2022-07-22 2023-06-23 ヒータ、定着装置、画像形成装置及び加熱装置

Publications (1)

Publication Number Publication Date
KR20250044180A true KR20250044180A (ko) 2025-03-31

Family

ID=89617631

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247038113A Pending KR20250044180A (ko) 2022-07-22 2023-06-23 히터, 정착 장치, 화상 형성 장치 및 가열 장치

Country Status (6)

Country Link
US (1) US20250377617A1 (https=)
JP (1) JP7554490B2 (https=)
KR (1) KR20250044180A (https=)
CN (1) CN119213866A (https=)
TW (1) TWI864881B (https=)
WO (1) WO2024018826A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121369807B (zh) * 2025-12-24 2026-04-24 重庆明月湖智能科技发展有限公司 一种智能电加热手套

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013073276A1 (ja) 2011-11-15 2013-05-23 株式会社美鈴工業 ヒータ並びにそれを備える定着装置及び乾燥装置
WO2017090692A1 (ja) 2015-11-27 2017-06-01 株式会社美鈴工業 ヒータ、定着装置、画像形成装置及び加熱装置
WO2019112058A1 (ja) 2017-12-08 2019-06-13 株式会社美鈴工業 ヒータ、定着装置、画像形成装置及び加熱装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142991A (ja) * 1996-11-11 1998-05-29 Bando Chem Ind Ltd 定着用加熱ローラ
JP2002141159A (ja) 2000-11-02 2002-05-17 Ibiden Co Ltd セラミックヒータ
JPWO2003102699A1 (ja) 2002-06-03 2005-09-29 富士ゼロックス株式会社 ヒートローラ
TWI281833B (en) * 2004-10-28 2007-05-21 Kyocera Corp Heater, wafer heating apparatus and method for manufacturing heater
JP5441655B2 (ja) 2009-12-10 2014-03-12 株式会社クラベ ステアリングホイール用ヒータ装置
JP6424010B2 (ja) * 2014-03-31 2018-11-14 株式会社美鈴工業 ヒータとそれを備える定着装置、画像形成装置及び加熱装置、並びにヒータの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013073276A1 (ja) 2011-11-15 2013-05-23 株式会社美鈴工業 ヒータ並びにそれを備える定着装置及び乾燥装置
WO2017090692A1 (ja) 2015-11-27 2017-06-01 株式会社美鈴工業 ヒータ、定着装置、画像形成装置及び加熱装置
WO2019112058A1 (ja) 2017-12-08 2019-06-13 株式会社美鈴工業 ヒータ、定着装置、画像形成装置及び加熱装置

Also Published As

Publication number Publication date
CN119213866A (zh) 2024-12-27
US20250377617A1 (en) 2025-12-11
WO2024018826A1 (ja) 2024-01-25
JP7554490B2 (ja) 2024-09-20
JP2024014572A (ja) 2024-02-01
TW202423171A (zh) 2024-06-01
TWI864881B (zh) 2024-12-01

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