JP7554490B2 - ヒータ、定着装置、画像形成装置及び加熱装置 - Google Patents

ヒータ、定着装置、画像形成装置及び加熱装置 Download PDF

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Publication number
JP7554490B2
JP7554490B2 JP2022117504A JP2022117504A JP7554490B2 JP 7554490 B2 JP7554490 B2 JP 7554490B2 JP 2022117504 A JP2022117504 A JP 2022117504A JP 2022117504 A JP2022117504 A JP 2022117504A JP 7554490 B2 JP7554490 B2 JP 7554490B2
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Japan
Prior art keywords
heater
cells
heat generating
wiring
heating
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Active
Application number
JP2022117504A
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English (en)
Japanese (ja)
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JP2024014572A5 (https=
JP2024014572A (ja
Inventor
裕司 梅村
恭士 藤田
真世 亀谷
健太 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Misuzu Industry Co., Ltd.
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Misuzu Industry Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2022117504A priority Critical patent/JP7554490B2/ja
Application filed by Misuzu Industry Co., Ltd. filed Critical Misuzu Industry Co., Ltd.
Priority to KR1020247038113A priority patent/KR20250044180A/ko
Priority to US18/874,348 priority patent/US20250377617A1/en
Priority to CN202380040163.XA priority patent/CN119213866A/zh
Priority to PCT/JP2023/023329 priority patent/WO2024018826A1/ja
Priority to TW112126208A priority patent/TWI864881B/zh
Publication of JP2024014572A publication Critical patent/JP2024014572A/ja
Publication of JP2024014572A5 publication Critical patent/JP2024014572A5/ja
Application granted granted Critical
Publication of JP7554490B2 publication Critical patent/JP7554490B2/ja
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0095—Heating devices in the form of rollers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2039—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat with means for controlling the fixing temperature
    • G03G15/2042—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat with means for controlling the fixing temperature specially for the axial heat partition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2053—Structural details of heat elements, e.g. structure of roller or belt, eddy current, induction heating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2064—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat combined with pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0019—Circuit arrangements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/02—Details
    • H05B3/06—Heater elements structurally combined with coupling elements or holders
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/16—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being mounted on an insulating base
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/54—Heating elements having the shape of rods or tubes flexible
    • H05B3/56—Heating cables
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
    • H05B2203/004—Heaters using a particular layout for the resistive material or resistive elements using zigzag layout

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
  • Fixing For Electrophotography (AREA)
  • Control Of Resistance Heating (AREA)
JP2022117504A 2022-07-22 2022-07-22 ヒータ、定着装置、画像形成装置及び加熱装置 Active JP7554490B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2022117504A JP7554490B2 (ja) 2022-07-22 2022-07-22 ヒータ、定着装置、画像形成装置及び加熱装置
US18/874,348 US20250377617A1 (en) 2022-07-22 2023-06-23 Heater, fixing device, image formation device, and heating device
CN202380040163.XA CN119213866A (zh) 2022-07-22 2023-06-23 加热器、定影装置、图像形成装置以及加热装置
PCT/JP2023/023329 WO2024018826A1 (ja) 2022-07-22 2023-06-23 ヒータ、定着装置、画像形成装置及び加熱装置
KR1020247038113A KR20250044180A (ko) 2022-07-22 2023-06-23 히터, 정착 장치, 화상 형성 장치 및 가열 장치
TW112126208A TWI864881B (zh) 2022-07-22 2023-07-13 加熱器、定影裝置、畫像形成裝置及加熱裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022117504A JP7554490B2 (ja) 2022-07-22 2022-07-22 ヒータ、定着装置、画像形成装置及び加熱装置

Publications (3)

Publication Number Publication Date
JP2024014572A JP2024014572A (ja) 2024-02-01
JP2024014572A5 JP2024014572A5 (https=) 2024-04-26
JP7554490B2 true JP7554490B2 (ja) 2024-09-20

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JP2022117504A Active JP7554490B2 (ja) 2022-07-22 2022-07-22 ヒータ、定着装置、画像形成装置及び加熱装置

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Country Link
US (1) US20250377617A1 (https=)
JP (1) JP7554490B2 (https=)
KR (1) KR20250044180A (https=)
CN (1) CN119213866A (https=)
TW (1) TWI864881B (https=)
WO (1) WO2024018826A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121369807B (zh) * 2025-12-24 2026-04-24 重庆明月湖智能科技发展有限公司 一种智能电加热手套

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002141159A (ja) 2000-11-02 2002-05-17 Ibiden Co Ltd セラミックヒータ
WO2003102699A1 (en) 2002-06-03 2003-12-11 Fuji Xerox Co., Ltd. Heat roller
JP2011121477A (ja) 2009-12-10 2011-06-23 Kurabe Industrial Co Ltd ステアリングホイール用ヒータ装置
WO2017090692A1 (ja) 2015-11-27 2017-06-01 株式会社美鈴工業 ヒータ、定着装置、画像形成装置及び加熱装置
WO2019112058A1 (ja) 2017-12-08 2019-06-13 株式会社美鈴工業 ヒータ、定着装置、画像形成装置及び加熱装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142991A (ja) * 1996-11-11 1998-05-29 Bando Chem Ind Ltd 定着用加熱ローラ
TWI281833B (en) * 2004-10-28 2007-05-21 Kyocera Corp Heater, wafer heating apparatus and method for manufacturing heater
JP6228458B2 (ja) 2011-11-15 2017-11-08 株式会社美鈴工業 ヒータ並びにそれを備える定着装置及び乾燥装置
JP6424010B2 (ja) * 2014-03-31 2018-11-14 株式会社美鈴工業 ヒータとそれを備える定着装置、画像形成装置及び加熱装置、並びにヒータの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002141159A (ja) 2000-11-02 2002-05-17 Ibiden Co Ltd セラミックヒータ
WO2003102699A1 (en) 2002-06-03 2003-12-11 Fuji Xerox Co., Ltd. Heat roller
JP2011121477A (ja) 2009-12-10 2011-06-23 Kurabe Industrial Co Ltd ステアリングホイール用ヒータ装置
WO2017090692A1 (ja) 2015-11-27 2017-06-01 株式会社美鈴工業 ヒータ、定着装置、画像形成装置及び加熱装置
WO2019112058A1 (ja) 2017-12-08 2019-06-13 株式会社美鈴工業 ヒータ、定着装置、画像形成装置及び加熱装置

Also Published As

Publication number Publication date
CN119213866A (zh) 2024-12-27
US20250377617A1 (en) 2025-12-11
WO2024018826A1 (ja) 2024-01-25
JP2024014572A (ja) 2024-02-01
TW202423171A (zh) 2024-06-01
TWI864881B (zh) 2024-12-01
KR20250044180A (ko) 2025-03-31

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