TWI864881B - 加熱器、定影裝置、畫像形成裝置及加熱裝置 - Google Patents

加熱器、定影裝置、畫像形成裝置及加熱裝置 Download PDF

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Publication number
TWI864881B
TWI864881B TW112126208A TW112126208A TWI864881B TW I864881 B TWI864881 B TW I864881B TW 112126208 A TW112126208 A TW 112126208A TW 112126208 A TW112126208 A TW 112126208A TW I864881 B TWI864881 B TW I864881B
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TW
Taiwan
Prior art keywords
heater
heating
aforementioned
wiring
line
Prior art date
Application number
TW112126208A
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English (en)
Chinese (zh)
Other versions
TW202423171A (zh
Inventor
梅村裕司
藤田恭士
世
小林健太
Original Assignee
日商美鈴工業股份有限公司
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Application filed by 日商美鈴工業股份有限公司 filed Critical 日商美鈴工業股份有限公司
Publication of TW202423171A publication Critical patent/TW202423171A/zh
Application granted granted Critical
Publication of TWI864881B publication Critical patent/TWI864881B/zh

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0095—Heating devices in the form of rollers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2039—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat with means for controlling the fixing temperature
    • G03G15/2042—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat with means for controlling the fixing temperature specially for the axial heat partition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2053—Structural details of heat elements, e.g. structure of roller or belt, eddy current, induction heating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G03G15/2014—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat
    • G03G15/2064—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat using contact heat combined with pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0019—Circuit arrangements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/02—Details
    • H05B3/06—Heater elements structurally combined with coupling elements or holders
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/16—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being mounted on an insulating base
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/54—Heating elements having the shape of rods or tubes flexible
    • H05B3/56—Heating cables
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
    • H05B2203/004—Heaters using a particular layout for the resistive material or resistive elements using zigzag layout

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
  • Fixing For Electrophotography (AREA)
  • Control Of Resistance Heating (AREA)
TW112126208A 2022-07-22 2023-07-13 加熱器、定影裝置、畫像形成裝置及加熱裝置 TWI864881B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022117504A JP7554490B2 (ja) 2022-07-22 2022-07-22 ヒータ、定着装置、画像形成装置及び加熱装置
JP2022-117504 2022-07-22

Publications (2)

Publication Number Publication Date
TW202423171A TW202423171A (zh) 2024-06-01
TWI864881B true TWI864881B (zh) 2024-12-01

Family

ID=89617631

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112126208A TWI864881B (zh) 2022-07-22 2023-07-13 加熱器、定影裝置、畫像形成裝置及加熱裝置

Country Status (6)

Country Link
US (1) US20250377617A1 (https=)
JP (1) JP7554490B2 (https=)
KR (1) KR20250044180A (https=)
CN (1) CN119213866A (https=)
TW (1) TWI864881B (https=)
WO (1) WO2024018826A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121369807B (zh) * 2025-12-24 2026-04-24 重庆明月湖智能科技发展有限公司 一种智能电加热手套

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200618663A (en) * 2004-10-28 2006-06-01 Kyocera Corp Heater, wafer heating apparatus and method for manufacturing heater
TW201538027A (zh) * 2014-03-31 2015-10-01 Misuzu Industry Co Ltd 加熱器及具備其之定著裝置、畫像形成裝置及加熱裝置、以及加熱器之製造方法
CN107535017A (zh) * 2015-11-27 2018-01-02 株式会社美铃工业 加热器、定影装置、图像形成装置以及加热装置
US20210176825A1 (en) * 2017-12-08 2021-06-10 Misuzu Industry Co., Ltd. Heater, fixing device, image-forming device, and heating device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142991A (ja) * 1996-11-11 1998-05-29 Bando Chem Ind Ltd 定着用加熱ローラ
JP2002141159A (ja) 2000-11-02 2002-05-17 Ibiden Co Ltd セラミックヒータ
JPWO2003102699A1 (ja) 2002-06-03 2005-09-29 富士ゼロックス株式会社 ヒートローラ
JP5441655B2 (ja) 2009-12-10 2014-03-12 株式会社クラベ ステアリングホイール用ヒータ装置
JP6228458B2 (ja) 2011-11-15 2017-11-08 株式会社美鈴工業 ヒータ並びにそれを備える定着装置及び乾燥装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200618663A (en) * 2004-10-28 2006-06-01 Kyocera Corp Heater, wafer heating apparatus and method for manufacturing heater
TW201538027A (zh) * 2014-03-31 2015-10-01 Misuzu Industry Co Ltd 加熱器及具備其之定著裝置、畫像形成裝置及加熱裝置、以及加熱器之製造方法
CN107535017A (zh) * 2015-11-27 2018-01-02 株式会社美铃工业 加热器、定影装置、图像形成装置以及加热装置
US20210176825A1 (en) * 2017-12-08 2021-06-10 Misuzu Industry Co., Ltd. Heater, fixing device, image-forming device, and heating device

Also Published As

Publication number Publication date
CN119213866A (zh) 2024-12-27
US20250377617A1 (en) 2025-12-11
WO2024018826A1 (ja) 2024-01-25
JP7554490B2 (ja) 2024-09-20
JP2024014572A (ja) 2024-02-01
TW202423171A (zh) 2024-06-01
KR20250044180A (ko) 2025-03-31

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