CN117836463A - 表面处理装置 - Google Patents

表面处理装置 Download PDF

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Publication number
CN117836463A
CN117836463A CN202280056826.2A CN202280056826A CN117836463A CN 117836463 A CN117836463 A CN 117836463A CN 202280056826 A CN202280056826 A CN 202280056826A CN 117836463 A CN117836463 A CN 117836463A
Authority
CN
China
Prior art keywords
surface treatment
storage unit
chamber
unit
treatment device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280056826.2A
Other languages
English (en)
Chinese (zh)
Inventor
深田和宏
栗原义明
难波武志
福山聪
小久保光典
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zhipu Machinery Co ltd
Original Assignee
Zhipu Machinery Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhipu Machinery Co ltd filed Critical Zhipu Machinery Co ltd
Publication of CN117836463A publication Critical patent/CN117836463A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CN202280056826.2A 2021-09-28 2022-09-20 表面处理装置 Pending CN117836463A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021-158047 2021-09-28
JP2021158047 2021-09-28
PCT/JP2022/034899 WO2023054044A1 (ja) 2021-09-28 2022-09-20 表面処理装置

Publications (1)

Publication Number Publication Date
CN117836463A true CN117836463A (zh) 2024-04-05

Family

ID=85782513

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280056826.2A Pending CN117836463A (zh) 2021-09-28 2022-09-20 表面处理装置

Country Status (6)

Country Link
US (1) US20240318303A1 (https=)
JP (1) JPWO2023054044A1 (https=)
KR (1) KR20240039073A (https=)
CN (1) CN117836463A (https=)
TW (1) TWI831391B (https=)
WO (1) WO2023054044A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60238134A (ja) * 1984-04-16 1985-11-27 Tokuda Seisakusho Ltd 真空処理装置
JPH02115562U (https=) * 1989-02-27 1990-09-17
WO2016017510A1 (ja) * 2014-07-31 2016-02-04 株式会社 アルバック 基板処理装置
CN107154370A (zh) * 2016-03-02 2017-09-12 株式会社日立国际电气 衬底处理装置、半导体器件的制造方法
CN108138315A (zh) * 2015-10-26 2018-06-08 格林策巴赫机械制造有限公司 真空涂布系统中涂布超长片型基材，特别是玻璃板，装置及方法
JP2021145091A (ja) * 2020-03-13 2021-09-24 キヤノントッキ株式会社 基板キャリア、成膜装置、及び成膜方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4500407A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Disk or wafer handling and coating system
US4534314A (en) * 1984-05-10 1985-08-13 Varian Associates, Inc. Load lock pumping mechanism
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
EP0716160B1 (en) * 1989-11-13 2000-01-26 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
JP2001043530A (ja) * 1999-07-28 2001-02-16 Anelva Corp 情報記録ディスク用保護膜作成方法及び情報記録ディスク用薄膜作成装置
KR101206959B1 (ko) * 2006-11-29 2012-11-30 도쿄엘렉트론가부시키가이샤 기판의 처리 장치
JP4681640B2 (ja) * 2008-09-30 2011-05-11 積水化学工業株式会社 表面処理方法
GB0819474D0 (en) * 2008-10-23 2008-12-03 P2I Ltd Plasma processing apparatus
US20110132755A1 (en) * 2009-12-04 2011-06-09 Kim Woosam In-line system for manufacturing solar cell
JP4761326B2 (ja) * 2010-01-15 2011-08-31 シャープ株式会社 薄膜形成装置システムおよび薄膜形成方法
JP5602005B2 (ja) * 2010-12-22 2014-10-08 キヤノンアネルバ株式会社 真空処理装置、及び、それを用いた処理方法
KR20140116120A (ko) * 2012-01-03 2014-10-01 어플라이드 머티어리얼스, 인코포레이티드 결정질 실리콘 태양 전지들을 패시베이팅하기 위한 진보된 플랫폼
JP5999190B2 (ja) * 2012-10-01 2016-09-28 日産自動車株式会社 インライン式コーティング装置、インライン式コーティング方法、およびセパレータ
JP6026263B2 (ja) * 2012-12-20 2016-11-16 キヤノンアネルバ株式会社 プラズマｃｖｄ装置、真空処理装置
JP2015098617A (ja) 2013-11-18 2015-05-28 株式会社島津製作所 成膜装置
WO2015087505A1 (ja) * 2013-12-12 2015-06-18 株式会社アルバック インライン式成膜装置の成膜準備方法及びインライン式成膜装置並びにキャリア
JP6231399B2 (ja) * 2014-02-17 2017-11-15 キヤノンアネルバ株式会社 処理装置
WO2016208094A1 (ja) * 2015-06-24 2016-12-29 キヤノンアネルバ株式会社 真空アーク成膜装置および成膜方法
JP2018148051A (ja) * 2017-03-06 2018-09-20 株式会社半導体エネルギー研究所 成膜装置、成膜方法、及び半導体装置の作製方法
EA034967B1 (ru) * 2018-05-04 2020-04-13 Общество С Ограниченной Ответственностью "Изовак Технологии" Технологическая линия для формирования тонкопленочных покрытий в вакууме (варианты)

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60238134A (ja) * 1984-04-16 1985-11-27 Tokuda Seisakusho Ltd 真空処理装置
JPH02115562U (https=) * 1989-02-27 1990-09-17
WO2016017510A1 (ja) * 2014-07-31 2016-02-04 株式会社 アルバック 基板処理装置
CN106661722A (zh) * 2014-07-31 2017-05-10 株式会社爱发科 基板处理装置
CN108138315A (zh) * 2015-10-26 2018-06-08 格林策巴赫机械制造有限公司 真空涂布系统中涂布超长片型基材，特别是玻璃板，装置及方法
CN107154370A (zh) * 2016-03-02 2017-09-12 株式会社日立国际电气 衬底处理装置、半导体器件的制造方法
JP2021145091A (ja) * 2020-03-13 2021-09-24 キヤノントッキ株式会社 基板キャリア、成膜装置、及び成膜方法

Also Published As

Publication number Publication date
TWI831391B (zh) 2024-02-01
TW202321488A (zh) 2023-06-01
JPWO2023054044A1 (https=) 2023-04-06
US20240318303A1 (en) 2024-09-26
KR20240039073A (ko) 2024-03-26
WO2023054044A1 (ja) 2023-04-06

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