CN116368122A - 组合物、固化物、固化物的制造方法及添加剂 - Google Patents

组合物、固化物、固化物的制造方法及添加剂 Download PDF

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Publication number
CN116368122A
CN116368122A CN202180069197.2A CN202180069197A CN116368122A CN 116368122 A CN116368122 A CN 116368122A CN 202180069197 A CN202180069197 A CN 202180069197A CN 116368122 A CN116368122 A CN 116368122A
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unsubstituted
carbon atoms
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compound
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Chinese (zh)
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金原有希子
中屋敷哲千
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Adeka Corp
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Adeka Corp
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/06Ethers; Acetals; Ketals; Ortho-esters
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/96Esters of carbonic or haloformic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/13Phenols; Phenolates
    • C08K5/134Phenols containing ester groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/22Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/24Derivatives of hydrazine
    • C08K5/25Carboxylic acid hydrazides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • C08K5/3475Five-membered rings condensed with carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477Six-membered rings
    • C08K5/3492Triazines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN202180069197.2A 2020-10-21 2021-10-07 组合物、固化物、固化物的制造方法及添加剂 Pending CN116368122A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-176962 2020-10-21
JP2020176962 2020-10-21
PCT/JP2021/037246 WO2022085475A1 (ja) 2020-10-21 2021-10-07 組成物、硬化物、硬化物の製造方法及び添加剤

Publications (1)

Publication Number Publication Date
CN116368122A true CN116368122A (zh) 2023-06-30

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Family Applications (1)

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CN202180069197.2A Pending CN116368122A (zh) 2020-10-21 2021-10-07 组合物、固化物、固化物的制造方法及添加剂

Country Status (5)

Country Link
JP (1) JPWO2022085475A1 (enrdf_load_stackoverflow)
KR (1) KR20230091872A (enrdf_load_stackoverflow)
CN (1) CN116368122A (enrdf_load_stackoverflow)
TW (1) TW202222892A (enrdf_load_stackoverflow)
WO (1) WO2022085475A1 (enrdf_load_stackoverflow)

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US3888823A (en) * 1972-10-13 1975-06-10 Cincinnati Milacron Inc Methoxy carboxylic acid ester ultraviolet stabilizers for polymers
JP2002188077A (ja) * 2000-10-10 2002-07-05 Fuji Photo Film Co Ltd 紫外線吸収剤前駆体を含有する組成物、及び画像形成方法
US20030166812A1 (en) * 2000-03-21 2003-09-04 Masatoshi Taniguchi Flame retardant, flame-retardant resin composition, molded object, and electronic part
JP2004157231A (ja) * 2002-11-05 2004-06-03 Konica Minolta Holdings Inc ドライイメージング材料
JP2006058835A (ja) * 2004-08-23 2006-03-02 Miwon Commercial Co Ltd 平版印刷版用ポジ型感光性組成物およびそのための現像液組成物
CN101088046A (zh) * 2004-12-24 2007-12-12 三菱瓦斯化学株式会社 抗蚀剂用化合物及放射线敏感性组合物
CN101157838A (zh) * 2006-10-02 2008-04-09 信越化学工业株式会社 阻燃粘合剂组合物及使用其的粘合片、保护膜和挠性覆铜层压体
CN102325819A (zh) * 2009-02-21 2012-01-18 索尼化学&信息部件株式会社 保护膜形成用原料液、保护膜、带有保护膜的布线基板
CN104334684A (zh) * 2012-07-31 2015-02-04 株式会社艾迪科 潜伏性添加剂以及含有该添加剂的组合物
JP2015163671A (ja) * 2013-12-13 2015-09-10 株式会社Adeka ラジカル重合性組成物
JP2016038569A (ja) * 2014-08-05 2016-03-22 株式会社Adeka 感光性組成物
JP2016108268A (ja) * 2014-12-05 2016-06-20 新日鉄住金化学株式会社 ヒドロキシ樹脂、その製造方法、エポキシ樹脂組成物及びその硬化物
CN107614509A (zh) * 2015-05-28 2018-01-19 大塚化学株式会社 烯丙基苯氧基环磷腈化合物及其制造方法
WO2020054719A1 (ja) * 2018-09-14 2020-03-19 富士フイルム株式会社 近赤外線吸収性感光性組成物、硬化膜、光学フィルタ、パターン形成方法、積層体、固体撮像素子、画像表示装置及び赤外線センサ
JP2020070436A (ja) * 2018-10-25 2020-05-07 株式会社Adeka 組成物、ソルダーレジスト組成物、硬化物及び硬化物の製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0643630A (ja) * 1991-05-28 1994-02-18 Nippon Kayaku Co Ltd 酸分解性化合物及びそれを含有するポジ型感放射線性レジスト組成物
US5556973A (en) * 1994-07-27 1996-09-17 Ciba-Geigy Corporation Red-shifted tris-aryl-s-triazines and compositions stabilized therewith
JP2008111102A (ja) * 2006-10-02 2008-05-15 Shin Etsu Chem Co Ltd 難燃性接着剤組成物、ならびにそれを用いた接着剤シート、カバーレイフィルムおよびフレキシブル銅張積層板
JP2019191303A (ja) 2018-04-20 2019-10-31 積水化学工業株式会社 硬化性組成物、電子部品、電子部品の製造方法

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3888823A (en) * 1972-10-13 1975-06-10 Cincinnati Milacron Inc Methoxy carboxylic acid ester ultraviolet stabilizers for polymers
US20030166812A1 (en) * 2000-03-21 2003-09-04 Masatoshi Taniguchi Flame retardant, flame-retardant resin composition, molded object, and electronic part
JP2002188077A (ja) * 2000-10-10 2002-07-05 Fuji Photo Film Co Ltd 紫外線吸収剤前駆体を含有する組成物、及び画像形成方法
JP2004157231A (ja) * 2002-11-05 2004-06-03 Konica Minolta Holdings Inc ドライイメージング材料
JP2006058835A (ja) * 2004-08-23 2006-03-02 Miwon Commercial Co Ltd 平版印刷版用ポジ型感光性組成物およびそのための現像液組成物
CN101088046A (zh) * 2004-12-24 2007-12-12 三菱瓦斯化学株式会社 抗蚀剂用化合物及放射线敏感性组合物
CN101157838A (zh) * 2006-10-02 2008-04-09 信越化学工业株式会社 阻燃粘合剂组合物及使用其的粘合片、保护膜和挠性覆铜层压体
CN102325819A (zh) * 2009-02-21 2012-01-18 索尼化学&信息部件株式会社 保护膜形成用原料液、保护膜、带有保护膜的布线基板
CN104334684A (zh) * 2012-07-31 2015-02-04 株式会社艾迪科 潜伏性添加剂以及含有该添加剂的组合物
JP2015163671A (ja) * 2013-12-13 2015-09-10 株式会社Adeka ラジカル重合性組成物
JP2016038569A (ja) * 2014-08-05 2016-03-22 株式会社Adeka 感光性組成物
JP2016108268A (ja) * 2014-12-05 2016-06-20 新日鉄住金化学株式会社 ヒドロキシ樹脂、その製造方法、エポキシ樹脂組成物及びその硬化物
CN107614509A (zh) * 2015-05-28 2018-01-19 大塚化学株式会社 烯丙基苯氧基环磷腈化合物及其制造方法
WO2020054719A1 (ja) * 2018-09-14 2020-03-19 富士フイルム株式会社 近赤外線吸収性感光性組成物、硬化膜、光学フィルタ、パターン形成方法、積層体、固体撮像素子、画像表示装置及び赤外線センサ
JP2020070436A (ja) * 2018-10-25 2020-05-07 株式会社Adeka 組成物、ソルダーレジスト組成物、硬化物及び硬化物の製造方法

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Title
王善琦主编: "《或对苯并三唑的结构进行调整》", vol. 01, 31 January 1993, 北京航空航天大学出版社, pages: 221 *

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TW202222892A (zh) 2022-06-16
KR20230091872A (ko) 2023-06-23

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