CN1161835C - 半导体器件及其制造方法 - Google Patents
半导体器件及其制造方法 Download PDFInfo
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- CN1161835C CN1161835C CNB001055844A CN00105584A CN1161835C CN 1161835 C CN1161835 C CN 1161835C CN B001055844 A CNB001055844 A CN B001055844A CN 00105584 A CN00105584 A CN 00105584A CN 1161835 C CN1161835 C CN 1161835C
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Abstract
部分片状电极形成在一底板上,以对应于半导体片状器件的块状电极,使得与该块状电极重叠的连接部分在基本上相同的方向上延伸,并且超声振动被施加在这个方向上,以进行片状电极与块状电极之间的连接。
Description
技术领域
本发明涉及一种半导体器件,其中电连接是通过是具有块状电极的半导体片状器件与通过在弹性绝缘基片上形成片状器件电极而制成的底板相互正对,而使该电极相互叠加,并且把超声振动传送到该电极构成的,以及涉及用于制造这种半导体器件的方法。
背景技术
为了提高产生,需要使用于摄像机、笔记本个人电脑等的紧凑电子电路设备更小和更轻,并且获得更小的电子元件,或获得相同尺寸但是其中集成度更高的电子元件,有助于实现更加紧凑和重量轻的电子电路设备。
下面将描述用于制造根据本发明半导体器件的常规接合方法:
引用参考文献1-日本实用新型公告H2-3629
该参考文献1涉及用于把安装在引线框架上的半导体片状器件的电极与引线框架的引线用细金属丝相连的超声型接合设备。
本参考文献1提供一种用于把超声振动通过喇叭传送到位于引线框架传输通道上的线接合毛细管的接合设备,其特征在于所述喇叭相对于所述传输通道上的引线框架传送方向约形成45度的角度。
当该喇叭如上文所述放置时,该喇叭在相对于在平行和垂直于引线框架的纵向上的引线自由端约45度角的方向上延伸。在该角度上,超声振动在线接合时施加到引线自由端上,相应地,容易使在该引线自由端上的线接合强度一致,从而解决传统的问题。
引用的参考文献2-日本未审查专利申请公告H3-44051(公开)。
该参考文献2涉及接合技术。在组装半导体器件的情况下,作为一种线接合系统,在此是一种结合超声的热声(thermosonic)接合方法。其中引线框架的内部引线位于四个方向上,在超声波的方向上的内部引线的连接强度一般较大,而在与超声方向成直角的内部引线上,连接强度比前者更弱。如上文所述,所有内部引线的连接强度不均匀,缺少连接的稳定性。
参考文献2的目的是使连接强度一致化,并且提高线接合的合格率,这是通过把所有内部引线部分和引线框架的岛状部分设置于框架的对角线上,并且用超声波执行线接合而实现的。为此原因,上述参考文献2的构成如下:
引线框架的每个内部引线部分是沿着连接外部框架和内部框架的交叉点的对角线X上分布的。通过接头悬置引线的线Y与对角线X之间的角度是45度。通过经固定在超声波传输臂末端上的接合工具施加超声波,在送出连接线时可以执行线接合。在此时,单一方向的超声波被施加在与所有内部引线部分相同的方向上,使得难以产生内部引线部分之间的连接强度的不规则性。
因此可以获得的芯片与每个内部引线部分之间均匀和稳定的接合状态。
引用的参考文献3-日本未审查专利申请公告H4-335546(公开)。
该参考文献3涉及一种用于TAB(条带自动接合)的单点接合的方法和装置。该方法目的是在引线处获得稳定的接合强度,即使引线宽度较小也没有不规则性。为此原因,其构成如下:提供一种旋转机构,用于相对移动接合工具和引线中的一个或其两者,以通过超声波是该工具的振动方向在相对于引线纵向的一定角度上倾斜。该工具在相对与振动方向上倾斜预定的角度,以形成一个器件开口,并且其中放置有引线的载物带被传动。
引用的参考文献4-日本未审查专利申请公告H7-169875(公开)。
该参考文献4涉及一种球焊方法。该方法用于获得高度可靠连接,从而半导体元件和板被连接,并且其具有大的连接强度、高许可电流值和低连接电阻,通过把半导体元件与板经过形成在半导体元件上的凸块与形成在板上的线路之间执行固相扩散,而在短时间之内把该半导体元件倒装在该板上,并且具有高的安装密度。
对于其构成,在半导体器件中,其中半导体元件倒装在构成平面显示器的玻璃板上或者在构成热头的陶瓷板上,该半导体元件通过执行形成在半导体元件上的凸块和形成在该板上的线路之间的固相扩散而接合到该板上。
图10示出允许高密度封装的半导体器件的一个实例。在该图中,参考标号1表示半导体片状器件,并且如图11中所示,大量块状电极3形成在半导体元件的正面上的矩形框图案中(没有在图中示出)。
用于形成块状电极3的方法是从这样的一些方法中选择作为一种镀金属(例如金)的方法,一种熔化可熔合金颗粒的方法,以及一种熔化插入到毛细管中的金属以形成金属球的方法,当施加超声振动以进行连接时,该金属球在毛细管底端部加压,在此之后该金属10被脱离。
参考标号4表示一种由绝缘基片5上的导电图案6所形成的底板,如图12中所示。该导电图案6由光刻胶薄膜所覆盖(未在该图中示出),并且在该光刻胶薄膜上形成窗口,以使部分导电图案(在图中示出的矩形窗)暴露在对应于半导体片状器件1的块状电极3的位置,从而形成片状电极7。
半导体片状器件1和底板4放置在相互正对的位置,使得块状电极3和片状电极7相重叠并且电连接。
为了减轻当半导体器件8工作时由于发热而集中在电极连接部分上的应力,并且提高防潮性能,如果需要的话,树脂填充在半导体片状器件1与底板4之间。
用于制造上述半导体器件的方法在下文中描述。首先,底板4置于热台(在图中未示出)上,使得片状电极7面向上。
接着,利用底部具有加热器的压紧工具,该半导体片状器件1被真空拾取,使块状电极面向下,并且移动到底板4的上方。
块状电极3叠加在片状电极7上,并且半导体片状器件1的加热的上表面被该压紧工具所压紧,以便于把电极3和7压在一起,从而使半导体片状器件1与底板4之间电连接。
在上述参考文献4-日本未审查专利申请公报H7-169875中,描述了这种类型的半导体器件,其中球焊方法用于其上形成有金属块状电极的半导体片状器件和通过把铝制片状电极形成在陶瓷基片上而制成的底板,支承底板的载物台被加热到375℃,并且真空夹持半导体片状器件的头部被加热到300℃,该电极被重叠并且用每凸块50克力的负载作用0.15秒,从而使得半导体片状器件与底板之间具有良好的电连接和机械连接,获得2.7千克力的剪切强度和33mΩ的平均电阻。
在上述公开文献中表明当完成上述操作之后,在每个片状器件上形成具有75×55μm的平面尺寸的146个块状电极,如果结合负载为3千克或4千克,并且加热温度约为380至460℃,在半导体片状器件与该板之间获得1.2至5.0千克力的剪切强度。
上述现有技术公开了用陶瓷以及玻璃作为底板的材料,并且除了图10中所示的结构之外,还公开了把该技术应用于象液晶显示设备这样的平面显示器的能力,或者应用于热头的能力。
具有图10中所示结构的半导体器件,除了陶瓷或玻璃之外,还可以应用于具有象玻璃纤维环氧树脂基片这样的树脂基片的半导体器件,但是不能够使用公开于上述现有技术中的加热温度和加热时间。
也就是说,使用象陶瓷或玻璃这样阻热的硬基片,可以经受几百度的温度,使得可以忽略加上电极部分而由热量所造成的变形。但是,对于树脂基片,热的施加造成底板变热,使得叠加电极部分产生大量的凹陷,导致片状电极在块状电极的端部边缘周围流动,除了在凹陷弯曲表面之间的交叉方向上施加到片状电极上的负载的分布之外,这增加了接触表面,从而造成强度减弱,使得不可能获得足够的结合强度。
当叠加电极部分凹陷时,半导体片状器件的相对表面和底板相互接近,如果这些相对部分相互接触,这就进一步减弱施加到重叠电极部分上的压力。
为此原因,当使用树脂底板时,超声振动被施加到真空夹持和压紧半导体片状器件的头部上,使得基片的温度与公开于现有技术中的温度相比足够低,从而抑制基片的变形,当传送超声振动以连接该块状电极和片状电极时,块状电极和片状电极的重叠部分受到压力和加热。
通过完成上述操作,对于约具有10个电极的半导体器件,能够获得具有良好剪切强度和电阻的半导体基片。
为了实现具有大量电极的半导体器件,并且保持外径,需要使半导体片状器件侧边上的块状电极狭窄,并且使底板侧边上的导电图案的间隔狭窄。如果批量超声连接用于电极的数目大大超过10个的多电极的半导体片状器件,以及用于电极数目少于10个的一半导体片状器件,尽管在具有大量电极的半导体器件中,块状电极与片状电极之间的电阻变化较大,可以看出块状电极与片状电极之间每个电极的剪切强度与电极数目有很大的相关性。
发明内容
相应地,本发明的一个目的是解决与现有技术有关的上述问题,这是通过提供一种半导体器件实现的,其中超声振动被用于形成在半导体片状器件上的块状电极与形成在绝缘基片上的片状电极之间的电连接。该半导体器件具有在上述半导体片状器件上的块状电极,其至少分布在相互直角交叉的两条直线上,邻接形成在弹性底板上的片状电极的区域,并且包括与在不同于块状电极的分布方向上延伸的块状电极相重叠的一部分。
本发明还是一种用于制造具有半导体片状器件的半导体器件的方法,该半导体片状器件在正面上具有块状电极,其至少分布在相互垂直的两条直线上,并且具有在对应于绝缘基片上的块状电极的位置处形成有片状电极的弹性底板,该块状电极与片状电极相重叠,并且当从半导体片状器件上方施加压力以及超声振动时在半导体片状器件与底板之间保持平行,从而使得半导体片状器件与块状电极之间电连接。使用一个具有邻接块状电极的重叠部分的片状电极的相邻区域的底板,其中相邻区域包括形成在所述片状电极和所述块状电极之间的所述重叠区域,所述相邻区域在相对于该块状电极的分布方向以30度至60度的倾角相交的方向延伸,该方向不同于该块状电极的分布方向,并且通过半导体片状器件传送到块状电极与片状电极的重叠部分的超声振动的方向被设置为沿着片状电极的延伸方向。
在上述情况下,希望底板上的所有片状电极分布在与包括重叠于块状电极的部分的相邻区域的延伸方向相同的方向上分布。
邻接片状电极与块状电极相重叠的部分的区域的长度可以被设置为比该重叠部分更长。
在上述情况中,需要使与片状电极和块状电极的重叠区域相邻的区域延伸到不会由于压力的施加而变形的绝缘基片的区域上。
在用于制造根据本发明的半导体器件的方法中,底板被使用,其中使得包括片状电极与块状电极之间的重叠部分的相邻区域在相对于该块状电极的分布方向以30度至60度的倾角相交的方向延伸,该方向不同于该块状电极的分布方向,以及通过半导体片状器件施加到块状电极和片状电极的重叠部分上的超声振动的方向设置在片状电极的延伸方向上,并且可能把超声振动的振动方向设置到分布在至少两个直线上的至少两行块状电极的每一行的凸块与片状电极之间的交叉角的中间角上。
附图说明
图1为示出根据本发明的半导体器件的侧截面视图。
图2为用于图1的半导体中的半导体片状器件的平面视图。
图3为用于图1的半导体器件的底板的部分平面视图。
图4为示出用于制造图1的半导体器件的方法的侧截面视图。
图5为示出图4所示步骤之后的处理的侧截面视图。
图6为示出在图5的处理中的底板与超声振动的方向的部分平面视图。
图7为示出施加到重叠电极部分的超声振动的情况的部分截面视图。
图8为示出施加到重叠电极部分上的超声振动的情况的部分截面视图。
图9为示出电极分布与片状电极之间的角度的部分平面视图。
图10为示出半导体器件的一个实例的侧截面视图。
图11为用于图10的半导体中的半导体片状器件的截面视图。
图12为示出用于图10的半导体器件中的底板的一个实例的部分平面视图。
具体实施方式
下面将参照相关附图具体描述本发明的实施例。
将参照图1描述本发明的第一实施例。在该图中,参考标号9表示半导体片状器件,在其半导体基片10的正面上,大小为3.4×5.1(形状)×0.3(厚度)毫米,并且具有形成于其上的半导体元件(未在图中示出),分布有大量块状电极11。
如图2中所示,块状电极11形成在电极组A、B、C和D中方形或矩形半导体基片10的侧边周围的直线中,通过在覆盖半导体基片10的保护膜(未在该图中示出)的中间部分中形成窗口并且电镀一层阻挡膜(未在该图中示出)的方法,或者通过球焊方法,平行电极分布组A和C或B和D的延伸部分与相邻电极分布组垂直相交。
在该图中所示的实例中,每个电极分布组A、B、C和D的每一个的块状电极11分布在单个圆形分布中,以形成大量电极也可以把它们分布在曲折线上。
参考标号12表示一块底板,其是通过把导电图案14形成到弹性树脂基片13上而制成的,例如由玻璃纤维加强的环氧树脂所制成,同时片状电极15形成在导电图案14上在对应于半导体片状器件9的块状电极11的位置处。
这些片状电极15被提供以适合块状电极11的电极材料、形状和尺寸。例如,对于在一侧边为80μm并且高度为25μm的块状电极11,在用镀金形成的半导体片状器件9上,在其上厚度为12μm的铜膜被蚀刻以形成导电图案14,具有3-5μm的厚度的镍层形成在用作为片状电极15的位置上,它们被用金覆盖达到0.3μm的厚度,以在底板12上形成片状电极15。
当完成上述操作时,如图3中所示,片状电极15与由虚线所示的半导体片状器件9的块状电极11相对。包括与块状电极11(在图中的阴影区域)相重叠的部分的相邻区域与电极分布组A、B、C和D的分布方向相交在45度角上,并且在一个相同方向上延伸。
一种用于制造根据本发明的半导体器件的方法如下。首先,把如图3中所示的底板12置于如图4中所示的热台16上,定位并且加热。为了获得块状电极11与片状电极15之间的良好的超声连接,该底板12被加热。在玻璃纤维环氧树脂板的情况中,其在加热时出现软化,该加热温度被设为80℃。
接着,如图5中所示的真空夹持头17被用于真空夹持该半导体片状器件9,并且把其置于底板12上。真空夹持头17在平整的下端表面17a上具有真空口17b,并且连接到施加超声振动的喇叭,该喇叭水平和上下地运动,以把超声振动传送到底板12上的半导体片状器件9。
连接到上述真空夹持头17的喇叭如图6中所示分布,这是超声振动方向,基本上与片状电极15的延伸方向相一致。
接着,真空夹持头17在底板12上降低,块状电极11和片状电极15相重叠,并且把每个块状电极30克力的压力施加到半导体片状器件9保持0.3到3秒钟。由于底板12被加热并且软化,片状电极15被局部加压并形成凹陷弯曲。
当发生这种情况时,对应于所有块状电极11的片状电极在相同方向上延伸,这是超声振动的方向。
也就是说,由于施加到块状电极11上的超声振动被施加在片状电极15的延伸方向上,施加在与图7的图面垂直的方向上的超声振动没有施加到在宽度方向中的片状电极15上。
为此原因,在此没有造成片状电极15扭曲形变的外部作用力,其中相对于片状电极15的绝缘基片13的粘合长度较短。
如图8中所示,由于邻接该片状电极15的区域延伸到没有由施加到重叠部分的压力而形变的区域上,所以相对于该绝缘基片13的结合长度足够长,并且即使底板12被加热所软化使得电极重叠部分下陷,在该片状电极15的延伸方向上的,施加在与图平面平行的方向上的超声振动集中于电极重叠部分上,能够形成良好的电连接。
由于在根据本发明的半导体器件中的片状电极15被使得在相同方向上延伸,不但电极之间的结合强度可以变大,并且电阻变小,其振动可以变小,即使当块状电极的数目大大超过10个时,例如在100个电极的半导体片状器件的情况下,也有可能对于每个块状电极获得30克力或者更大的剪切强度,并且获得约50毫欧姆的低电阻连接。
在从底板12剪切半导体片状器件9并且观察在该重叠部分的连接状态时,确认块状电极11的部分保持在所有片状电极15上,从而表明牢固和均匀的机械连接。
在上述实例中,使得该片状电极15在相对于电极分布组A、B、C和D的分布方向成45度角的方向上延伸,如图9中所示,只要该倾角的范围在30度到60度的范围内,就可能获得抑制剪切强度降低和电阻增加的良好状态。
在这种情况下,需要使超声振动的方向在该倾斜方向的中间方向上,如果最大倾角在30度和60度之间,该超声振动的方向可以相对于电极分布组A、B、C和D成45度角。
尽管希望所有片状电极15的延伸方向都相同,但是对于像在片状器件的角上的片状电极,在此可以在重叠部分中获得足够的表面面积,可以使该延伸方向不同于其他块状电极。
可能通过把与片状电极15与块状电极11之间的重叠部分相邻的区域设置为比电极重叠部分更长,以使由于施加到片状电极15与相邻的绝缘基片13上的压力所造成的凹陷弯曲变长,并且最好延伸到不会出现由于压力的施加而造成形变的区域。
应当理解,本发明不受上述实施例所限制。例如,除了方形块状电极11之外,还可能使用矩形、菱形、或者平行多边形的块状电极,并且还可能改变片状电极15的延伸方向,以适合该倾角。
通过采用在上文中具体描述的结构,即使采用在加热时软化的树脂底板,本发明能够使具有多于10个电极的半导体片状器件有牢固电连接和机械连接。
Claims (6)
1.一种半导体器件包括:
一个在其正面上形成有大量块状电极的半导体片状器件;
由绝缘基片制成的底板,其具有形成在对应于所述块状电极的位置处的绝缘基片上的片状电极;
其中所述半导体片状器件和底板相互正对,使得所述块状电极和片状电极被重叠,并且受到压力和超声振动,从而把所述半导体片状器件电连接到所述底板,以及
其中在所述半导体片状器件上的所述块状电极分布于至少两条垂直相交的直线中,形成所述底板的绝缘基片是一种具有弹性的材料,并且相邻区域包括形成在所述片状电极和所述块状电极之间的重叠区域,所述相邻区域在相对于该块状电极的分布方向以30度至60度的倾角相交的方向延伸,该方向不同于该块状电极的分布方向。
2.根据权利要求1所述的半导体器件,其特征在于,包括了所有片状电极与块状电极之间的重叠部分的所述相邻区域的延伸方向是一个相同的方向。
3.根据权利要求1所述的半导体器件,其特征在于,与在一个片状电极与一个块状电极之间的重叠部分相邻的区域的长度被制得比所述重叠部分的长度更长。
4.根据权利要求3所述的半导体器件,其特征在于,与在一个片状电极和一个块状电极之间的重叠部分相邻的区域延伸到超出由压力的施加在所述绝缘基片中所造成的形变的区域。
5.一种用于制造具有半导体片状器件的半导体器件的方法,该半导体片状器件在正面上具有块状电极,其分布在至少两条相互垂直的直线上,并且具有在绝缘基片上对应于所述块状电极的位置处形成有片状电极的弹性底板,从而所述块状电极与所述片状电极相重叠,并且当从半导体片状器件上方施加压力以及超声振动时在半导体片状器件与底板之间保持平行,从而使得所述半导体片状器件与所述块状电极之间电连接,并且,使用一个具有相邻区域的底板,每个相邻区域包括形成在所述片状电极和所述块状电极之间的重叠区域,所述相邻区域相对于该块状电极的分布方向以30度至60度的倾角相交的方向延伸,其中该方向不同于块状电极的分布方向,并且通过半导体片状器件传送到块状电极与片状电极的重叠部分的超声振动的方向被设置为沿着所述片状电极的延伸方向。
6.根据权利要求5所述的用于制造半导体器件的方法,其特征在于,超声振动的方向被设置在沿着至少两条相交的直线的块状电极与片状电极的分布方向之间的相交角的中间角方向上。
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JP15174499A JP3498634B2 (ja) | 1999-05-31 | 1999-05-31 | 半導体装置の製造方法 |
JP151744/1999 | 1999-05-31 |
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CN1161835C true CN1161835C (zh) | 2004-08-11 |
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US (1) | US6670706B2 (zh) |
JP (1) | JP3498634B2 (zh) |
KR (1) | KR100368776B1 (zh) |
CN (1) | CN1161835C (zh) |
TW (1) | TW460997B (zh) |
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CN106960860A (zh) * | 2016-01-11 | 2017-07-18 | 三星显示有限公司 | 柔性显示装置 |
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2000
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- 2000-03-30 KR KR1020000016404A patent/KR100368776B1/ko not_active IP Right Cessation
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CN106960860A (zh) * | 2016-01-11 | 2017-07-18 | 三星显示有限公司 | 柔性显示装置 |
CN106960860B (zh) * | 2016-01-11 | 2022-03-04 | 三星显示有限公司 | 柔性显示装置 |
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Publication number | Publication date |
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TW460997B (en) | 2001-10-21 |
JP3498634B2 (ja) | 2004-02-16 |
KR100368776B1 (ko) | 2003-01-24 |
KR20010006920A (ko) | 2001-01-26 |
US20020089057A1 (en) | 2002-07-11 |
JP2000340611A (ja) | 2000-12-08 |
CN1275800A (zh) | 2000-12-06 |
US6670706B2 (en) | 2003-12-30 |
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