CN113818053B - 含三价铬的电镀槽液和沉积铬的方法 - Google Patents

含三价铬的电镀槽液和沉积铬的方法 Download PDF

Info

Publication number
CN113818053B
CN113818053B CN202111217662.0A CN202111217662A CN113818053B CN 113818053 B CN113818053 B CN 113818053B CN 202111217662 A CN202111217662 A CN 202111217662A CN 113818053 B CN113818053 B CN 113818053B
Authority
CN
China
Prior art keywords
electroplating bath
chromium
acid
iii
complexing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202111217662.0A
Other languages
English (en)
Chinese (zh)
Other versions
CN113818053A (zh
Inventor
D·达齐利欧
G·斯基亚翁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Covidia LLC
Original Assignee
Coventya SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=49989624&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CN113818053(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Coventya SpA filed Critical Coventya SpA
Priority to CN202111217662.0A priority Critical patent/CN113818053B/zh
Publication of CN113818053A publication Critical patent/CN113818053A/zh
Application granted granted Critical
Publication of CN113818053B publication Critical patent/CN113818053B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/06Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002Cell separation, e.g. membranes, diaphragms
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02Tanks; Installations therefor
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/10Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18Electroplating using modulated, pulsed or reversing current

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
CN202111217662.0A 2014-01-24 2015-01-26 含三价铬的电镀槽液和沉积铬的方法 Active CN113818053B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202111217662.0A CN113818053B (zh) 2014-01-24 2015-01-26 含三价铬的电镀槽液和沉积铬的方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP14152463.7A EP2899299A1 (en) 2014-01-24 2014-01-24 Electroplating bath containing trivalent chromium and process for depositing chromium
EP14152463.7 2014-01-24
CN202111217662.0A CN113818053B (zh) 2014-01-24 2015-01-26 含三价铬的电镀槽液和沉积铬的方法
CN201580004384.7A CN105917031B (zh) 2014-01-24 2015-01-26 含三价铬的电镀槽液和沉积铬的方法
PCT/EP2015/051469 WO2015110627A1 (en) 2014-01-24 2015-01-26 Electroplating bath containing trivalent chromium and process for depositing chromium

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201580004384.7A Division CN105917031B (zh) 2014-01-24 2015-01-26 含三价铬的电镀槽液和沉积铬的方法

Publications (2)

Publication Number Publication Date
CN113818053A CN113818053A (zh) 2021-12-21
CN113818053B true CN113818053B (zh) 2024-07-05

Family

ID=49989624

Family Applications (2)

Application Number Title Priority Date Filing Date
CN202111217662.0A Active CN113818053B (zh) 2014-01-24 2015-01-26 含三价铬的电镀槽液和沉积铬的方法
CN201580004384.7A Active CN105917031B (zh) 2014-01-24 2015-01-26 含三价铬的电镀槽液和沉积铬的方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201580004384.7A Active CN105917031B (zh) 2014-01-24 2015-01-26 含三价铬的电镀槽液和沉积铬的方法

Country Status (12)

Country Link
US (2) US10619258B2 (enExample)
EP (2) EP2899299A1 (enExample)
JP (1) JP6534391B2 (enExample)
KR (2) KR102430755B1 (enExample)
CN (2) CN113818053B (enExample)
BR (1) BR112016016834B1 (enExample)
CA (1) CA2935934C (enExample)
ES (1) ES2944135T3 (enExample)
HU (1) HUE061836T2 (enExample)
MX (1) MX383305B (enExample)
PL (1) PL3097222T3 (enExample)
WO (1) WO2015110627A1 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2899299A1 (en) 2014-01-24 2015-07-29 COVENTYA S.p.A. Electroplating bath containing trivalent chromium and process for depositing chromium
GB2534883A (en) * 2015-02-03 2016-08-10 Univ Leicester Electrolyte for electroplating
WO2017042420A1 (en) * 2015-09-09 2017-03-16 Savroc Ltd Chromium-based coating, a method for producing a chromium-based coating and a coated object
US10270691B2 (en) * 2016-02-29 2019-04-23 Cisco Technology, Inc. System and method for dataplane-signaled packet capture in a segment routing environment
FR3051806B1 (fr) * 2016-05-31 2018-06-01 Safran Aircraft Engines Procede de chromage par voie electrolytique d'un substrat a partir d'un bain de chrome trivalent
EP3382062A1 (en) * 2017-03-31 2018-10-03 COVENTYA S.p.A. Method for increasing the corrosion resistance of a chrome-plated substrate
CN115216815A (zh) * 2017-04-04 2022-10-21 安美特德国有限公司 用于在至少一个基底上沉积铬或铬合金层的受控方法
EP4170071A1 (en) * 2017-04-04 2023-04-26 Atotech Deutschland GmbH & Co. KG Method for electrolytically depositing a chromium or chromium alloy layer on at least one substrate
CN108130570A (zh) * 2017-12-15 2018-06-08 北京科技大学 一种复合三价电镀铬工艺
CN109056005A (zh) * 2018-09-11 2018-12-21 沈阳飞机工业(集团)有限公司 一种应用电沉积技术制备铬硼合金的方法
FR3087209B1 (fr) 2018-10-12 2022-11-04 Mecaprotec Ind Composition pour le chromage d’un substrat et procede de chromage mettant en œuvre une telle composition
EP3665317B1 (en) * 2018-10-19 2020-12-09 ATOTECH Deutschland GmbH A method for electrolytically passivating a surface of silver, a silver alloy, gold, or a gold alloy
CN113166961B (zh) * 2018-12-11 2024-11-19 德国艾托特克公司 铬或铬合金层的沉积方法和电镀装置
EP3744874A1 (en) 2019-05-29 2020-12-02 Coventya SAS Electroplated product with corrosion-resistant coating
JP2023507017A (ja) * 2019-12-18 2023-02-20 アトテック ドイチェランド ゲーエムベーハー ウント コ カーゲー 基材上にクロムコーティングを堆積させるための電気めっき組成物及び方法
MX2022007692A (es) 2019-12-18 2022-07-19 Atotech Deutschland Gmbh & Co Kg Método para reducir la concentración de iones de hierro en un baño electrolítico de cromo trivalente.
RU2734986C1 (ru) * 2020-03-23 2020-10-27 Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д. И. Менделеева" (РХТУ им. Д. И. Менделеева) Способ электрохимического нанесения хромовых покрытий из саморегулирующегося электролита на основе соединений трехвалентного хрома
FI129420B (en) 2020-04-23 2022-02-15 Savroc Ltd AQUATIC ELECTRIC COATING BATH
US12359331B2 (en) 2020-07-15 2025-07-15 Tata Steel Nederland Technology B.V. Method for electrodepositing a functional or decorative chromium layer from a trivalent chromium electrolyte
KR102350114B1 (ko) * 2020-08-03 2022-01-10 김근호 친환경 알루미늄 전해 크로메이트 처리방법
CN112226791A (zh) * 2020-10-26 2021-01-15 厦门市金宝源实业有限公司 一种三价铬镀铬液及其制备方法以及三价铬镀铬方法
EP4023793A1 (en) * 2021-01-05 2022-07-06 Coventya SAS Electroplating bath for depositing chromium or chromium alloy from a trivalent chromium bath and process for depositing chromium or chromium alloy
EP4151779A1 (de) * 2021-09-15 2023-03-22 Trivalent Oberflächentechnik GmbH Chrom-indium-, chrom-bismut- und chrom-antimon-beschichtung, verfahren zur herstellung und verwendung
CN113735172B (zh) * 2021-10-08 2023-04-07 上海良仁化工有限公司 含铬污泥制备细颗粒氢氧化铬的方法
CN114525557B (zh) * 2022-03-01 2024-01-02 九牧厨卫股份有限公司 一种杀菌环保复合镀层及其制备方法和杀菌环保产品
CN114875459A (zh) * 2022-05-10 2022-08-09 成立航空股份有限公司 一种三价铬镀液及黑铬镀层
DE102022129788A1 (de) * 2022-11-10 2024-05-16 Dornbracht AG & Co. KG. Sanitärgegenstand, insbesondere Sanitärarmatur oder -garnitur
CN115928108B (zh) * 2022-12-23 2023-08-01 中国科学院青海盐湖研究所 电化学氧化铬铁直接制备三价铬化合物的方法
EP4570965A1 (de) * 2023-12-15 2025-06-18 topocrom systems AG Vorrichtung und verfahren zur galvanischen chrom-abscheidung
DE102024105074A1 (de) * 2024-02-22 2025-08-28 Trivalent Oberflächentechnik Gmbh Verfahren zur wenigstens teilweisen Beschichtung eines Substrats mit einer dreiwertigen Chromschicht
EP4656776A1 (de) * 2024-05-29 2025-12-03 topocrom systems AG Korrosionsbeständige cr(iii)-beschichtung

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887292A (ja) * 1981-11-18 1983-05-25 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション クロム電気メツキ液
JPS5887291A (ja) * 1981-11-18 1983-05-25 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション クロム電気メツキ液

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1247803C2 (de) * 1959-10-07 1973-03-29 Du Pont Verfahren zur herstellung von selbsttragenden metallverbundfalmen durch galvaniscles abscheiden
GB1368747A (en) * 1971-11-23 1974-10-02 British Non Ferrous Metals Res Electrodeposition of chromium
US4062737A (en) * 1974-12-11 1977-12-13 International Business Machines Corporation Electrodeposition of chromium
US4107004A (en) * 1975-03-26 1978-08-15 International Lead Zinc Research Organization, Inc. Trivalent chromium electroplating baths and method
GB1488381A (en) * 1975-09-01 1977-10-12 Bnf Metals Tech Centre Trivalent chromium plating bath
US4093521A (en) * 1975-12-18 1978-06-06 Stanley Renton Chromium electroplating
JPS53106348A (en) * 1977-02-28 1978-09-16 Toyo Soda Mfg Co Ltd Electrolytic bath for chromium plating
GB1580137A (en) * 1977-05-24 1980-11-26 Bnf Metals Tech Centre Electrolytic deposition of protective chromite-containing coatings
AU513298B2 (en) * 1978-06-02 1980-11-27 International Lead Zinc Research Organization Inc. Electrodeposition of black chromium
US4392922A (en) * 1980-11-10 1983-07-12 Occidental Chemical Corporation Trivalent chromium electrolyte and process employing vanadium reducing agent
US4477318A (en) * 1980-11-10 1984-10-16 Omi International Corporation Trivalent chromium electrolyte and process employing metal ion reducing agents
US4466865A (en) * 1982-01-11 1984-08-21 Omi International Corporation Trivalent chromium electroplating process
US4806446A (en) * 1986-04-09 1989-02-21 Brother Kogyo Kabushiki Kaisha Photosensitive recording medium capable of image contrast adjustment
US4804446A (en) 1986-09-19 1989-02-14 The United States Of America As Represented By The Secretary Of Commerce Electrodeposition of chromium from a trivalent electrolyte
US5196109A (en) * 1991-08-01 1993-03-23 Geoffrey Scott Trivalent chromium electrolytes and plating processes employing same
US5415763A (en) * 1993-08-18 1995-05-16 The United States Of America As Represented By The Secretary Of Commerce Methods and electrolyte compositions for electrodepositing chromium coatings
US6004448A (en) * 1995-06-06 1999-12-21 Atotech Usa, Inc. Deposition of chromium oxides from a trivalent chromium solution containing a complexing agent for a buffer
SG53086A1 (en) * 1997-09-29 1998-09-28 Univ Singapore A novel method of decorative chromium plating from trivalent chromium
US6663700B1 (en) * 2000-10-31 2003-12-16 The United States Of America As Represented By The Secretary Of The Navy Post-treatment for metal coated substrates
KR100572486B1 (ko) * 2003-11-29 2006-04-19 테크앤라이프 주식회사 3가 크롬도금액 조성물과 그 제조방법
FR2864553B1 (fr) 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
EP2111484B1 (en) 2004-03-04 2017-12-06 Taskem Inc. Polyamine brightening agent
US7887930B2 (en) * 2006-03-31 2011-02-15 Atotech Deutschland Gmbh Crystalline chromium deposit
DE102006035871B3 (de) 2006-08-01 2008-03-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Abscheidung von Chromschichten als Hartverchromung, Galvanisierungsbad sowie hartverchromte Oberflächen und deren Verwendung
US20080169199A1 (en) * 2007-01-17 2008-07-17 Chang Gung University Trivalent chromium electroplating solution and an electroplating process with the solution
MX2010003543A (es) * 2007-10-02 2010-05-17 Atotech Deutschland Gmbh Deposito de aleacion de cromo cristalino.
CN101565827A (zh) * 2009-05-31 2009-10-28 广州民航职业技术学院 一种适用于镀锌层表面的高耐蚀有机三价铬钝化方法
CN101665960A (zh) 2009-09-04 2010-03-10 厦门大学 一种硫酸盐三价铬电镀液与制备方法
CN101748449A (zh) * 2010-01-19 2010-06-23 上海应用技术学院 一种用三价铬镀铬的方法
EP2492372A1 (en) * 2011-02-23 2012-08-29 Enthone, Inc. Aqueous solution and method for the formation of a passivation layer
CN102383150B (zh) * 2011-11-09 2014-08-20 广东达志环保科技股份有限公司 一种高耐蚀环保三价铬电镀液及其电镀方法
US9758884B2 (en) * 2012-02-16 2017-09-12 Stacey Hingley Color control of trivalent chromium deposits
US20130220819A1 (en) 2012-02-27 2013-08-29 Faraday Technology, Inc. Electrodeposition of chromium from trivalent chromium using modulated electric fields
CN103993303A (zh) * 2013-02-17 2014-08-20 武汉风帆电镀技术股份有限公司 铝及铝合金的三价铬耐蚀性钝化液
EP2899299A1 (en) 2014-01-24 2015-07-29 COVENTYA S.p.A. Electroplating bath containing trivalent chromium and process for depositing chromium
GB2534883A (en) * 2015-02-03 2016-08-10 Univ Leicester Electrolyte for electroplating

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887292A (ja) * 1981-11-18 1983-05-25 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション クロム電気メツキ液
JPS5887291A (ja) * 1981-11-18 1983-05-25 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション クロム電気メツキ液

Also Published As

Publication number Publication date
EP2899299A1 (en) 2015-07-29
CA2935934C (en) 2022-03-01
US10619258B2 (en) 2020-04-14
CN105917031A (zh) 2016-08-31
CN113818053A (zh) 2021-12-21
CA2935934A1 (en) 2015-07-30
CN105917031B (zh) 2021-11-02
WO2015110627A1 (en) 2015-07-30
PL3097222T3 (pl) 2023-05-29
BR112016016834B1 (pt) 2022-02-08
EP3097222B1 (en) 2023-03-29
US20200308723A1 (en) 2020-10-01
MX383305B (es) 2025-03-13
ES2944135T3 (es) 2023-06-19
HUE061836T2 (hu) 2023-08-28
US11905613B2 (en) 2024-02-20
KR20160113610A (ko) 2016-09-30
JP2017503926A (ja) 2017-02-02
US20170009361A1 (en) 2017-01-12
JP6534391B2 (ja) 2019-06-26
MX2016009533A (es) 2016-10-28
BR112016016834A2 (enExample) 2017-08-08
EP3097222A1 (en) 2016-11-30
KR20210147081A (ko) 2021-12-06
KR102430755B1 (ko) 2022-08-10

Similar Documents

Publication Publication Date Title
CN113818053B (zh) 含三价铬的电镀槽液和沉积铬的方法
CN106661753B (zh) 离子液体电解质和电沉积金属的方法
EP3253906B1 (en) Electrolyte for electroplating
JP6951465B2 (ja) 3価クロムメッキ液およびこれを用いたクロムメッキ方法
CN115386922A (zh) 用于在至少一个基底上沉积铬或铬合金层的受控方法
CN110446802B (zh) 在至少一个基底上电解沉积铬或铬合金层的方法
JP5086290B2 (ja) 黒色めっき皮膜及びその皮膜形成方法
JP7569788B2 (ja) 電解液とクロム層の製造方法
JPWO2014115203A1 (ja) クロムめっき浴及びそれを使用したクロムめっき皮膜の形成方法
TWI838438B (zh) 鉻或鉻合金層之沉積方法及電鍍裝置
BR112019018993B1 (pt) Método controlado para depositar uma camada de cromo ou de liga de cromo em pelo menos um substrato e banho aquoso de deposição
BR102017008137B1 (pt) Método para cromar um substrato, e, solução eletrolítica para cromar um substrato
WO2018029968A1 (ja) 電極の製造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CP03 Change of name, title or address

Address after: Italy, Milan

Patentee after: Covidia LLC

Country or region after: Italy

Address before: Como Province, Italy

Patentee before: COVENTYA S.P.A.

Country or region before: Italy

CP03 Change of name, title or address