CN111286705B - Double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment - Google Patents
Double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment Download PDFInfo
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- CN111286705B CN111286705B CN201811488244.3A CN201811488244A CN111286705B CN 111286705 B CN111286705 B CN 111286705B CN 201811488244 A CN201811488244 A CN 201811488244A CN 111286705 B CN111286705 B CN 111286705B
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- 238000000576 coating method Methods 0.000 title claims abstract description 254
- 239000011248 coating agent Substances 0.000 title claims abstract description 237
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 68
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 40
- 238000011068 loading method Methods 0.000 claims abstract description 31
- 239000007789 gas Substances 0.000 claims description 57
- 230000005540 biological transmission Effects 0.000 claims description 27
- 238000009826 distribution Methods 0.000 claims description 24
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 20
- 238000005477 sputtering target Methods 0.000 claims description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 16
- 229910052786 argon Inorganic materials 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 230000001502 supplementing effect Effects 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 4
- 238000005238 degreasing Methods 0.000 claims description 3
- 238000003860 storage Methods 0.000 claims description 3
- 230000009977 dual effect Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 5
- 230000007704 transition Effects 0.000 abstract description 5
- 230000007306 turnover Effects 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 24
- 230000008569 process Effects 0.000 description 21
- 238000010521 absorption reaction Methods 0.000 description 17
- 238000007747 plating Methods 0.000 description 15
- 238000005086 pumping Methods 0.000 description 10
- 238000012423 maintenance Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 239000007888 film coating Substances 0.000 description 5
- 238000009501 film coating Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000011031 large-scale manufacturing process Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- -1 aluminum nitrogen aluminum Chemical compound 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000035800 maturation Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a double-chamber three-station multi-target co-sputtering magnetron sputtering coating device, which is characterized in that a driving plate, a track and a heat collecting pipe trolley are arranged in a first coating chamber, a second coating chamber and an outdoor loading and unloading station, the first coating chamber is provided with a direct current magnetron sputtering target, the second coating chamber is simultaneously provided with a direct current magnetron sputtering target and an intermediate frequency magnetron sputtering target, a vacuum channel is arranged between the first coating chamber and the second coating chamber, and a connecting channel is arranged between the first coating chamber and the outdoor loading and unloading station. When the device is used, the first coating chamber is used as a transition chamber and used for exchanging the heat collecting pipe trolley between the second coating chamber and an outdoor loading and unloading station, and the metal infrared reflection coating can be coated on the other hand, the second coating chamber can be always kept in a vacuum state and used for selectively absorbing the coating and coating the anti-reflection coating, so that turnover is realized, and the production efficiency and the coating quality can be improved as much as possible on the premise of reducing the equipment scale.
Description
Technical Field
The invention relates to magnetron sputtering coating equipment, in particular to equipment suitable for continuous coating of a selective absorption coating of a full-glass vacuum solar heat collecting tube, and belongs to the technical field of vacuum coating.
Background
The magnetron sputtering coating machine is a key core technology for preparing the selective absorption coating of the all-glass vacuum solar heat collecting tube, and directly influences the absorption ratio and the emission ratio of the all-glass vacuum solar heat collecting tube, thereby influencing the efficiency and the stability of the whole heat collecting tube and even a solar heat utilization system.
With the development and maturity of solar heat utilization technology, single-target single-chamber magnetron sputtering coating machines are mature, and the technology improvement space is very small. Due to the adoption of a single coating chamber structure, the following problems mainly exist in the solar selective absorption coating process:
1. When a single target material is adopted in the coating chamber, the process stability of the selective absorption coating is insufficient, and particularly when a conventional aluminum target and nitrogen are adopted as the aluminum nitrogen aluminum selective absorption coating, the process is limited by the refractive index of aluminum nitride and the limitation of a conventional direct-current magnetron sputtering coating power supply, the absorption ratio of the absorption coating is generally only between 0.86 and 0.90, and the emission ratio is about 0.08. In order to solve the problem of single target, a single-chamber three-target film plating process is gradually proposed. I.e. copper-aluminum-stainless steel/nitrogen process. The process performance of the selective absorption coating is better improved. The conventional process can reach an absorption ratio of about 0.90 and an emission ratio of 0.06.
However, when a single-chamber film coating is performed, each time the process is finished, the film coating chamber is required to be exposed to the atmosphere, so that water vapor in the atmosphere continuously enters into the vacuum chamber and is adsorbed on the wall of the vacuum chamber, the adsorbed water vapor is increased along with the increase of the thickness of the coating layer of the wall of the vacuum chamber, the pumping speed of the system is reduced continuously, the production efficiency is influenced, and the production process is also influenced.
In large-scale production, a large amount of single-machine equipment is required to meet the production requirement. And excessive equipment is difficult to ensure consistency of product quality. The performance of the product is inevitably lost on the premise of ensuring the consistency of the quality of the product, which violates the purpose of mass production of the product.
Excessive equipment also increases the complexity of product transmission on a production chain, increases the scratch rate of the appearance of the heat collecting tube, reduces the quality of the product, greatly increases the maintenance difficulty of the equipment, and does not accord with the current large-scale production mode of the all-glass vacuum solar heat collecting tube.
2 With the maturation of single-chamber multi-target technology and the further requirement on the technical index of selective absorption coating, the problem existing in single-chamber coating machines is solved, and multi-vacuum-chamber continuous coating equipment is provided. The continuous film plating equipment with multiple vacuum chambers, as represented by China patent 200610083743.4, adopts more than three vacuum chambers connected into a film plating line, wherein the two ends of the film plating line are respectively provided with a pre-pumping chamber and a workpiece outlet chamber, the middle part of the film plating line is provided with more than one film plating chamber, and a linkage rotating frame for equipping a workpiece moves on the film plating line in a linear motion mode.
The continuous coating machine with five chambers, six locks, twelve targets and seven chambers, eight locks, thirteen targets adopts a mode of linear serial connection of coating chambers, two ends of the coating chambers are in and out, and a large loop circulation mode is adopted outside a transmission track, so that a plurality of problems of the single-chamber coating machine are solved, but other problems exist at the same time, such as: the multiple vacuum chambers are connected in series in a straight line, so that a system is complex, and potential hazards of faults are high; the frequent switching between the vacuum chambers caused by excessive vacuum chambers increases non-process time and reduces efficiency; the vacuum chamber and the unit are more, so that the cleaning and energy saving of the vacuum chamber are inconvenient; complicated transmission and switching are prone to transmission failure; the upper and lower workpiece areas are long, and the product is inconvenient to transport.
The Chinese patent 200910204318 provides a continuous vacuum coating method and special equipment thereof, and adopts a two-station mode of two vacuum chambers, so that the method solves the problem that the coating chamber of a single-chamber coating machine is exposed to the atmosphere, but still has the problem of insufficient coating efficiency, and only the transition chamber is used for independently isolating the coating chamber, so that the stability of the coating process is improved. However, the workpiece is assembled and disassembled in the pre-pumping chamber for a long time, so that the atmospheric exposure is caused, the pumping speed is seriously influenced, and a single-layer coating rotating frame and a single target direct current sputtering process are adopted, so that a continuous and stable high-performance selective absorption coating is difficult to obtain.
Meanwhile, the multi-chamber continuous magnetron sputtering coating production line mainly comprises a plurality of chambers, a vacuum unit, a transmission mechanism, a sputtering power supply, a control system and the like. When the coating chamber, the sputtering target and the sputtering power supply are added, the process stability in the sputtering process can be improved. But also greatly improves the structure and transmission complexity of the coating equipment, and simultaneously greatly increases the number of configured power supplies and vacuum units. And further, stability and reliability of the system are deteriorated.
Therefore, how to solve the problems of a single-chamber coating machine by adopting a multi-chamber coating machine, and simultaneously can be perfectly matched with the process, thereby effectively reducing the cost of a coating system and improving the stability, and the problems of urgent need of the existing all-glass vacuum heat-collecting tube coating equipment and technical improvement are solved.
Disclosure of Invention
The invention provides a double-chamber three-station multi-target co-sputtering magnetron sputtering coating method, which aims to solve the following problems:
1. The optimal configuration of the system coating, transmission and vacuum units is realized by optimizing the coating chambers, the transition chambers and the loading and unloading stations, so that the problems of complex system and high cost caused by too many coating chambers and unreasonable loading and unloading stations are solved;
2. the double-layer heat collecting pipe trolley is arranged, and the heat collecting pipes are transmitted in two directions simultaneously in a two-way internal circulation mode, so that the loading of the heat collecting pipes is realized, and the transmission efficiency is maximized;
3. the direct current sputtering target material made of a plurality of single materials is additionally arranged in the pre-pumping chamber, so that the coating time of the coating process chamber is shortened, and the coating efficiency is greatly improved;
4. by arranging the dry gas charging hole in the pre-pumping chamber, the problem that the environmental impurity water vapor enters the vacuum chamber in the processes of exposing the atmosphere and assembling and disassembling the heat collecting pipe in the conventional vacuum chamber is solved.
5. The stability of the coating process is improved by adopting a double-target direct current/intermediate frequency composite sputtering process in the coating chamber;
6. by arranging the sputtering power supply shared by the pre-pumping chamber target power supply and the coating chamber direct-current sputtering target power supply, the investment of the sputtering power supply is greatly reduced, and the stable realization of the coating process is ensured.
In order to achieve the above purpose, the invention adopts the following technical scheme:
the double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment is characterized by comprising a first coating chamber, a second coating chamber and an outdoor loading and unloading station, wherein:
the vacuum cavity of the first coating chamber is internally provided with a plurality of direct current magnetic control sputtering targets, a first driving plate is coaxially arranged at the center of the direct current magnetic control sputtering targets, first transmission teeth are arranged around the first driving plate, an annular first track is arranged on the periphery of the first driving plate, and a heat collecting pipe trolley on the first track can be driven by the first transmission teeth of the first driving plate to move on the first track;
the vacuum cavity of the second coating chamber is internally provided with a plurality of direct current magnetic control sputtering targets and a plurality of intermediate frequency magnetic control sputtering targets, the centers of the direct current magnetic control sputtering targets and the intermediate frequency magnetic control sputtering targets are coaxially provided with a rotatable second driving plate, the periphery of the second driving plate is provided with second transmission teeth, the periphery of the second driving plate is provided with an annular second track, and a heat collecting pipe trolley on the second track can be driven by the second transmission teeth of the second driving plate to move on the second track;
The middle part of the outdoor assembling and disassembling station is provided with a rotatable outdoor driving plate, the periphery of the outdoor driving plate is provided with an outdoor track, the periphery of the outdoor driving plate is provided with outdoor transmission teeth, and the outdoor transmission teeth can drive the heat collecting pipe trolley on the outdoor track to rotate and move;
A vacuum channel is arranged between the first coating chamber and the second coating chamber, a first plate type vacuum door is arranged on the vacuum channel, and an exchange track which can mutually communicate the first track and the second track is also arranged in the vacuum channel;
A connecting channel is arranged between the first coating chamber and the outdoor loading and unloading station, a second plate type vacuum door is arranged on the connecting channel, and a conveying track which can mutually communicate the first track with the outdoor track is also arranged in the connecting channel.
The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment comprises: and each heat collecting pipe trolley is provided with a plurality of heat collecting pipe supports, each heat collecting pipe support can be used for installing a heat collecting pipe, and the heat collecting pipe supports can concentrically rotate around the heat collecting pipe trolley.
The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment comprises: the first coating chamber is provided with an air inlet hole, and the air inlet hole is connected with a dry gas generator through an air inlet valve.
The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment comprises: the dry gas generator is a dry positive pressure gas storage container for separate argon, nitrogen and oxygen, or an air compressor capable of drying and degreasing gas.
The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment comprises: and a gas supplementing pipeline is arranged on a connecting channel between the first coating chamber and the second plate type vacuum door, and the gas supplementing pipeline is also communicated to the drying gas generator.
The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment comprises: the first coating chamber and the second coating chamber are respectively connected with a first vacuumizing device and a second vacuumizing device.
The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment comprises: a plurality of first gas distribution pipes are arranged between the inner wall of the first coating chamber and the heat collecting pipe trolley in the first coating chamber, the first gas distribution pipes are connected with argon, and the first gas distribution pipes are connected with a mass flowmeter.
The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment comprises: a plurality of second gas distribution pipes are arranged between the inner wall of the second coating chamber and the heat collecting pipe trolley in the second coating chamber, a group of three second gas distribution pipes are arranged between every two adjacent magnetron sputtering targets, the three second gas distribution pipes are respectively connected with argon, nitrogen and oxygen, and each second gas distribution pipe is connected with a mass flowmeter.
The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment comprises: the direct current magnetron sputtering targets in the first coating chamber and the direct current magnetron sputtering targets in the second coating chamber share a set of power supply.
Compared with the prior art, the invention has the following beneficial effects: the first coating chamber is used as a transition chamber and used for exchanging the heat collecting pipe trolley between the second coating chamber and an outdoor loading and unloading station, and on the other hand, the metal infrared reflection coating can be coated, the second coating chamber can be always kept in a vacuum state, and the selective absorption coating and the anti-reflection coating can be completed, so that turnover use can be realized, and the production efficiency and the coating quality can be improved as much as possible on the premise of reducing the equipment scale.
Drawings
FIG. 1 is a schematic diagram of a structure of a double-chamber three-station multi-target co-sputtering magnetron sputtering coating device provided by the invention;
FIG. 2 is a schematic circuit connection diagram of the double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment.
Reference numerals illustrate: a first film plating chamber 1; a DC magnetron sputtering target 11; a first dial 12; a first rail 13; a first air distribution pipe 15; a first maintenance door 16; the second coating chamber 2; a DC magnetron sputtering target 21; an intermediate frequency magnetron sputtering target 22; a second dial 23; a second rail 24; a second air distribution pipe 25; a second maintenance door 26; the outdoor loading and unloading station 3; an outdoor dial 31; an outdoor track 32; a heat collecting pipe trolley 40; a vacuum channel 50; a first plate type vacuum door 51; a connection channel 60; a second plate type vacuum door 61; a conveying rail 62; an air charge hole 63; a dry gas generator 64; a make-up air line 65; a first vacuum apparatus 70; a second vacuum-pumping device 70a; a mechanical pump 71; a Roots pump 72; a diffusion pump 73; a DC magnetron sputtering power supply 90; an intermediate frequency magnetron sputtering power supply 91.
Detailed Description
Some specific embodiments of the invention will now be described in detail, by way of example and not by way of limitation, with reference to the accompanying drawings. The same reference numbers will be used throughout the drawings to refer to the same or like parts or portions. It will be appreciated by those skilled in the art that the drawings are not necessarily drawn to true scale.
As shown in fig. 1, the present invention provides a dual-chamber three-station multi-target co-sputtering magnetron sputtering coating device, which is provided with a first coating chamber 1 and a second coating chamber 2 arranged side by side, wherein an outdoor loading and unloading station 3 is arranged on one side of the first coating chamber 1 opposite to the second coating chamber 2, and the two chambers are:
Four direct-current magnetron sputtering targets 11 distributed at equal angles are arranged in the vacuum cavity of the first coating chamber 1, a first driving plate 12 is coaxially arranged at the center of the four direct-current magnetron sputtering targets 11, and the first driving plate 12 is driven by a first adjustable speed motor to rotate; a first driving gear is arranged around the first driving plate 12, a first annular track 13 is arranged at the periphery of the first driving plate 12, a plurality of heat collecting pipe trolleys 40 which are connected in series are arranged on the first track 13, the heat collecting pipe trolleys 40 can be driven by the first driving gear of the first driving plate 12 to move on the first track 13, and the heat collecting pipe trolleys 40 are meshed with a gear ring (not shown) fixed on the first coating chamber 1 through a pinion (not shown) fixed on the heat collecting pipe trolleys 40 in the process of moving along the first track 13, so that the rotation of the heat collecting pipe trolleys 40 is realized;
A plurality of first gas distribution pipes 15 are arranged between the inner wall of the first coating chamber 1 and the heat collecting pipe trolley 40 inside the first coating chamber, the first gas distribution pipes 15 are connected with argon, and the first gas distribution pipes 15 are connected with a mass flowmeter so as to realize independent gas flow control;
a shielding plate (not shown) is arranged on the inner wall of the first coating chamber 1 and is used for preventing the direct current magnetron sputtering target 11 from sputtering a film on the inner wall of the vacuum cavity;
a first maintenance door 16 is arranged on one side of the first coating chamber 1 and used for internal maintenance;
Twelve magnetron sputtering targets (comprising four direct current magnetron sputtering targets 21 and eight intermediate frequency magnetron sputtering targets 22, wherein two intermediate frequency magnetron sputtering targets 22 are clamped between every two direct current magnetron sputtering targets 21) distributed at equal angles are arranged in the vacuum cavity of the second coating chamber 2, a second driving plate 23 is coaxially arranged at the center of the twelve magnetron sputtering targets, and the second driving plate 23 is driven by a second adjustable speed motor to rotate; a second transmission gear is arranged around the second driving plate 23, an annular second track 24 is arranged on the periphery of the second driving plate 23, a plurality of heat collecting pipe trolleys 40 which are mutually connected in series are arranged on the second track 24, and the heat collecting pipe trolleys 40 can be driven by the second transmission gear of the second driving plate 23 to move on the second track 24;
A plurality of second gas distribution pipes 25 are arranged between the inner wall of the second coating chamber 2 and the heat collecting pipe trolley 40 in the second coating chamber, a group of three second gas distribution pipes 25 are arranged between every two adjacent magnetron sputtering targets, the three second gas distribution pipes 25 are respectively connected with argon, nitrogen and oxygen, and each second gas distribution pipe 25 is connected with a mass flowmeter so as to realize independent gas flow control;
A shielding plate (not shown) is arranged on the inner wall of the second coating chamber 2 and is used for preventing the direct current magnetron sputtering target 11 from sputtering a film on the inner wall of the vacuum cavity;
A second maintenance door 26 is arranged on one side of the second coating chamber 2 and is used for internal maintenance;
the middle part of the outdoor assembling and disassembling station 3 is provided with an outdoor driving plate 31 driven by an outdoor adjustable speed motor, the periphery of the outdoor driving plate 31 is provided with an outdoor track 32, the periphery of the outdoor driving plate 31 is provided with outdoor transmission teeth, and the outdoor transmission teeth can drive a heat collecting pipe trolley 40 on the outdoor track 32 to rotate and move;
Wherein: each heat collecting pipe trolley 40 is provided with five heat collecting pipe brackets, each heat collecting pipe bracket can be used for installing a heat collecting pipe, the five heat collecting pipe brackets can rotate around the heat collecting pipe trolley 40, and the heat collecting pipe trolley 40 can revolve around the centers of the first film plating chamber 1, the second film plating chamber 2 or the outdoor loading and unloading station 3, so that the film plating of each heat collecting pipe is quite uniform in the circumferential direction and the axial direction;
A vacuum channel 50 is arranged between the first coating chamber 1 and the second coating chamber 2, a first plate type vacuum door 51 is arranged on the vacuum channel 50, the first coating chamber 1 is connected with a first vacuumizing device 70 consisting of a mechanical pump 71, a Roots pump 72 and a diffusion pump 73, and correspondingly, the second coating chamber 2 is connected with a second vacuumizing device 70a; when the first plate type vacuum door 51 is closed, the inside of the second plating chamber 2 can be vacuumed and maintained in a vacuum state by the second evacuating device 70a; when the first plate-type vacuum door 51 is opened, if the first coating chamber 1 and the second coating chamber 2 are both in a vacuum state, the first coating chamber 1 and the second coating chamber 2 are communicated with each other in a state of maintaining vacuum, and at this time, the heat collecting pipe trolley 40 in the first coating chamber 1 and the heat collecting pipe trolley 40 in the second coating chamber 2 can complete exchange through an exchange track (not shown) configured in the vacuum channel 50;
a connecting channel 60 is arranged between the first coating chamber 1 and the outdoor loading and unloading station 3, and a second plate type vacuum door 61 is arranged on the connecting channel 60; when the second plate type vacuum door 61 is closed, the inside of the first plating chamber 1 can be vacuumed and maintained in a vacuum state by the first evacuating device 70; when the second plate type vacuum door 61 is opened, the first coating chamber 1 and the outdoor loading and unloading station 3 are communicated with each other, and at this time, the heat collecting pipe trolley 40 in the first coating chamber 1 and the heat collecting pipe trolley 40 in the outdoor loading and unloading station 3 can complete exchange through the conveying track 62 in the connecting channel 60;
An air inlet hole (not shown) is formed in the top of the first coating chamber 1, an air charging hole 63 is formed in the connecting channel 60, the air inlet hole is connected with a dry gas generator 64 through an air inlet valve (not shown), and the dry gas generator 64 may be a separate dry positive pressure gas storage container such as argon, nitrogen, oxygen, etc., or may be an air compressor capable of performing dry degreasing treatment on gas; before the first coating chamber 1 is communicated with the outdoor loading and unloading station 3, dry gas needs to be filled into the first coating chamber 1 through an air inlet hole and an air inlet valve, and excessive dry gas overflows from the air filling hole 63, so that the air pressure between the first coating chamber 1 and the outdoor loading and unloading station 3 is balanced, and environmental impurities and water vapor are prevented from entering the first coating chamber 1;
A gas supplementing pipe 65 is provided in the connection channel 60 between the first coating chamber 1 and the second plate-type vacuum door 61, one end of the gas supplementing pipe 65 is connected to a dry gas generator 64 (which may share a dry gas generator 64 with the gas inlet hole), and the other end is connected to the gas charging hole 63, when the first coating chamber 1 is communicated with the outdoor loading and unloading station 3, the gas inlet valve may be closed (or not closed), and then the dry gas is charged into the first coating chamber 1 through the gas supplementing pipe 65 to form a dry gas barrier, so as to prevent the water vapor in the outdoor loading and unloading station 3 from entering the first coating chamber 1.
As shown in FIG. 2, the circuit connection schematic diagram of the dual-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment provided by the invention is that the four DC magnetron sputtering targets 11 of the second coating chamber 2 and the four DC magnetron sputtering targets 21 of the first coating chamber 1 share one set of DC magnetron sputtering power supply 90 in order to further reduce the configuration cost of system hardware, so that the cost of one set of power supply can be saved.
In the above embodiment, the number of the dc magnetron sputtering targets 11 and the intermediate frequency magnetron sputtering targets may be adjusted, and is not limited to the case shown in the above embodiment.
In addition, the number of the heat collecting pipe trolleys 40 at the three positions of the first film plating chamber 1, the second film plating chamber 2 and the outdoor assembling and disassembling station 3 should be equal, the number of the heat collecting pipe trolleys 40 at each position is preferably 15-20, and each heat collecting pipe trolley 40 is preferably provided with 4-6 heat collecting pipe brackets; for example, if the number of the heat collecting tube carriages 40 at each position is 18 and each heat collecting tube carriage 40 has 5 heat collecting tube holders, the first coating chamber 1 and the second coating chamber 2 can coat 90 heat collecting tubes at a time. In order to ensure that the colors and performances of the heat collecting pipes at the head and the tail of the heat collecting pipe trolley 40 are the same as those of the heat collecting pipes at the middle part, process baffles (not shown) are arranged at the head and the tail of the heat collecting pipe trolley 40, and the process baffles simulate the functions of the heat collecting pipe trolley 40.
The working process of the invention is as follows:
Initial state: the same number of heat collecting tube trolleys 40 are respectively arranged in the first coating chamber 1, the second coating chamber 2 and the outdoor loading and unloading station 3, the first coating chamber 1 is provided with finished heat collecting tubes which are subjected to all coating processes, the second coating chamber 2 is provided with semi-finished heat collecting tubes which are subjected to infrared reflection coating processes, and the outdoor loading and unloading station 3 is provided with heat collecting tubes to be coated which are not subjected to any coating process;
1. The first plate type vacuum door 51 is closed, the second plate type vacuum door 61 is closed, an air inlet valve connected with an air inlet hole of the first coating chamber 1 is opened, so that dry air is filled into the vacuum chamber of the first coating chamber 1, the dry air is released outwards through an air supplementing pipeline 65 at the inner side of the second plate type vacuum door 61, and the positive pressure state that the air pressure in the first coating chamber 1 is higher than the external environment is always kept; thus, the external hot and humid air is prevented from entering the first coating chamber 1 to influence the pumping speed of the coating chamber;
When the indoor pressure of the first coating chamber 1 is greater than the outdoor pressure, the second plate type vacuum door 61 is opened, the conveying rail 62 in the connecting channel 60 is used for communicating the first coating chamber 1 with the outdoor loading and unloading station 3, at the moment, the first driving plate 12 in the first coating chamber 1 and the outdoor driving plate 31 in the outdoor loading and unloading station 3 synchronously rotate in the same direction, and the heat collecting pipe trolley 40 in the first coating chamber 1 and the heat collecting pipe trolley 40 in the outdoor loading and unloading station 3 are mutually exchanged; the finished heat collecting pipe can be taken down after entering the outdoor loading and unloading station 3, and then a new heat collecting pipe to be plated is installed;
2. Closing the second plate type vacuum door 61, closing an air inlet valve, starting vacuumizing equipment of the first coating chamber 1, opening the first gas distribution pipe 15 after vacuumizing to set vacuum conditions, filling set argon flow, and then starting a power supply of the direct current magnetron sputtering target 11 to carry out a coating step of the metal infrared reflection coating on the surface of the heat collecting pipe of the first coating chamber 1;
3. the second coating chamber 2 is always in a vacuumizing state when the steps 1 and 2 are carried out;
3.1, firstly, using a direct current magnetron sputtering target 11 and an intermediate frequency magnetron sputtering target to co-sputter the surface of the semi-finished heat collecting tube with the metal infrared reflection coating to form a selective absorption coating film; (this substep 3.1 is preferably carried out simultaneously with step 1;)
3.2, Singly using an intermediate frequency magnetron sputtering target to form an antireflection layer coating film on the selective absorption coating film to obtain a finished heat collecting tube with all coating processes finished; (this substep 3.2 is preferably carried out simultaneously with step 2;)
4. A first plate type vacuum door 51 between the first coating chamber 1 and the second coating chamber 2 is opened, an exchange track in a vacuum channel 50 is communicated with a first track 13 of the first coating chamber 1 and a second track 24 of the second coating chamber 2, a first driving plate 12 of the first coating chamber 1 and a second driving plate 23 of the second coating chamber 2 synchronously rotate in the same direction, a heat collecting pipe trolley 40 in the first coating chamber 1 and a heat collecting pipe trolley 40 in the second coating chamber 2 are mutually exchanged, a semi-finished heat collecting pipe with a finished first step coating process enters the first coating chamber 1, and a finished heat collecting pipe with all coating processes enters the second coating chamber 2;
5. closing the first plate type vacuum door 51 and restoring to the original state;
thus, the 1 st step to the 5 th step are repeatedly carried out, and the double-chamber three-station multi-target co-sputtering magnetron sputtering coating method can be realized.
The double-chamber three-station multi-target continuous magnetron sputtering coating equipment and the method can realize the efficient coating of the selective absorption coating of the all-glass evacuated collector tube, and have the following advantages:
1. Compared with the existing single-chamber or multi-chamber continuous coating machine, the coating line adopts a double-chamber three-station design mode, the first coating chamber 1 is used as a coating chamber and also used as a transition chamber, so that the effective isolation between the second coating chamber 2 and the external space is realized, the coating function of a pure metal layer of the first coating chamber 1 is fully exerted, and the coating efficiency is improved.
2. The first coating chamber 1 is inflated continuously by adopting positive pressure dry gas, so that the first coating chamber 1 is not influenced by external hot and humid air, and the influence of the vacuum chamber exposure atmosphere on the vacuum pumping speed of the coating chamber is effectively reduced.
3. The two rows of heat collecting tube trolleys 40 are adopted to synchronously switch and operate between the second coating chamber 2 and the first coating chamber 1, and the two rows of heat collecting tube trolleys 40 are also adopted to synchronously switch and operate between the first coating chamber 1 and the outdoor loading and unloading station 3, so that the exchange speed of workpieces is greatly improved.
4. A plate type vacuum door is adopted between the second coating chamber 2 and the first coating chamber 1, and between the first coating chamber 1 and the outdoor loading and unloading station 3, so that a lifting track is suitable for being configured (the prior art is not repeated here), and the effective switching of the transmission of the heat collecting pipe trolley 40 and the partition between the vacuum chambers is realized.
5. The tracks of the heat collecting pipe trolley 40 run through adopt a double-track arrangement structure, so that the rotation of the heat collecting pipe and the revolution around a sputtering target can be realized simultaneously, and the uniformity and the stability of a coating process are ensured.
6. The first coating chamber 1 and the second coating chamber 2 are functionally distinguished, so that the coating efficiency is remarkably improved. Meanwhile, the reasonable design of the process enables the same set of direct current magnetron sputtering power supply to realize the sharing of sputtering targets between two coating chambers, and the investment cost of the power supply part is effectively reduced.
7. The second coating chamber 2 is always in a high vacuum state, and is only provided with a communication door with the first coating chamber 1, so that the process stability of the second coating chamber 2 is greatly improved.
8. The second coating chamber 2 adopts a mode of distributing the direct-current magnetron sputtering target 11 and the intermediate-frequency magnetron sputtering target, so that the problem of low efficiency caused by single target material and single direct-current sputtering antireflection layer is effectively solved. So that the stability of the coating process is effectively improved.
9. The rotary tables between the second coating chamber 2 and the first coating chamber 1 and between the first coating chamber 1 and the outdoor loading and unloading station 3 can synchronously rotate in the same direction, so that linkage transmission between the two can be realized, and the transmission stability and reliability of the heat collecting pipe trolley 40 are improved.
10. The second coating chamber 2 and the first coating chamber 1 adopt multi-target uniformly-distributed sputtering, so that the stability and uniformity of sputtering are improved, the replacement time of a coating sputtering target is greatly prolonged, the duty time of a coating system is greatly reduced, and the use efficiency of the system is improved.
11. From the perspective of film coating process analysis, the equipment design can realize simultaneous sputtering work between the second film coating chamber 2 and the first film coating chamber 1, and can realize simultaneous workpiece switching. Realizing the high efficiency and stability of the coating process.
12. From the whole system, the system only comprises two coating chambers and an external loading and unloading station, the effective technical innovation is adopted, and the problems of single-chamber coating and other continuous coating systems are comprehensively and effectively solved, so that the continuous efficient coating process of the heat collecting tube is realized, and meanwhile, the high performance of the selective absorbing coating of the heat collecting tube can be realized, namely, the absorbing ratio of the selective absorbing coating under the continuous coating condition can reach more than 0.94, and the emission ratio can reach less than 0.06. The performance limit of mass production of the selective absorption coating is basically reached.
The above description is illustrative of the invention and is not to be construed as limiting, and it will be understood by those skilled in the art that many modifications, variations or equivalents may be made without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (9)
1. The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment is characterized by comprising a first coating chamber, a second coating chamber and an outdoor loading and unloading station, wherein:
the vacuum cavity of the first coating chamber is internally provided with a plurality of direct current magnetic control sputtering targets, a first driving plate is coaxially arranged at the center of the direct current magnetic control sputtering targets, first transmission teeth are arranged around the first driving plate, a first track is arranged on the periphery of the first driving plate, and a heat collecting pipe trolley on the first track can be driven by the first transmission teeth of the first driving plate to move on the first track;
a plurality of direct current magnetic control sputtering targets and a plurality of intermediate frequency magnetic control sputtering targets are arranged in a vacuum cavity of the second coating chamber, a second driving plate capable of rotating is coaxially arranged at the centers of the plurality of direct current magnetic control sputtering targets and the plurality of intermediate frequency magnetic control sputtering targets, second transmission teeth are arranged around the second driving plate, a second track is arranged on the periphery of the second driving plate, and a heat collecting pipe trolley on the second track can be driven by the second transmission teeth of the second driving plate to move on the second track;
The middle part of the outdoor assembling and disassembling station is provided with a rotatable outdoor driving plate, the periphery of the outdoor driving plate is provided with an outdoor track, the periphery of the outdoor driving plate is provided with outdoor transmission teeth, and the outdoor transmission teeth can drive the heat collecting pipe trolley on the outdoor track to rotate and move;
A vacuum channel is arranged between the first coating chamber and the second coating chamber, a first plate type vacuum door is arranged on the vacuum channel, and an exchange track which can mutually communicate the first track and the second track is also arranged in the vacuum channel;
A connecting channel is arranged between the first coating chamber and the outdoor loading and unloading station, a second plate type vacuum door is arranged on the connecting channel, and a conveying track which can mutually communicate the first track with the outdoor track is also arranged in the connecting channel.
2. The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment according to claim 1, wherein: and each heat collecting pipe trolley is provided with a plurality of heat collecting pipe supports, each heat collecting pipe support can be used for installing a heat collecting pipe, and the heat collecting pipe supports can concentrically rotate around the heat collecting pipe trolley.
3. The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment according to claim 1, wherein: the first coating chamber is provided with an air inlet hole, and the air inlet hole is connected with a dry gas generator through an air inlet valve.
4. A dual chamber three station multi-target co-sputtering magnetron coating apparatus as in claim 3 wherein: the dry gas generator is a dry positive pressure gas storage container for separate argon, nitrogen and oxygen, or an air compressor capable of drying and degreasing gas.
5. A dual chamber three station multi-target co-sputtering magnetron coating apparatus as in claim 3 wherein: and a gas supplementing pipeline is arranged on a connecting channel between the first coating chamber and the second plate type vacuum door, and the gas supplementing pipeline is also communicated to the drying gas generator.
6. The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment according to claim 1, wherein: the first coating chamber and the second coating chamber are respectively connected with a first vacuumizing device and a second vacuumizing device.
7. The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment according to claim 1, wherein: a plurality of first gas distribution pipes are arranged between the inner wall of the first coating chamber and the heat collecting pipe trolley in the first coating chamber, the first gas distribution pipes are connected with argon, and the first gas distribution pipes are connected with a mass flowmeter.
8. The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment according to claim 1, wherein: a plurality of second gas distribution pipes are arranged between the inner wall of the second coating chamber and the heat collecting pipe trolley in the second coating chamber, a group of three second gas distribution pipes are arranged between every two adjacent magnetron sputtering targets, the three second gas distribution pipes are respectively connected with argon, nitrogen and oxygen, and each second gas distribution pipe is connected with a mass flowmeter.
9. The double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment according to claim 1, wherein: the direct current magnetron sputtering targets in the first coating chamber and the direct current magnetron sputtering targets in the second coating chamber share a set of power supply.
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| CN201811488244.3A CN111286705B (en) | 2018-12-06 | 2018-12-06 | Double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment |
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| CN112458425B (en) * | 2020-10-30 | 2022-06-28 | 湘潭宏大真空技术股份有限公司 | Three-chamber film coating machine applied to narrow space |
| CN112342521A (en) * | 2020-10-30 | 2021-02-09 | 湘潭宏大真空技术股份有限公司 | Multi-station double-chamber film coating machine |
| CN113913768A (en) * | 2021-10-26 | 2022-01-11 | 上海哈呐技术装备有限公司 | Magnetron sputtering coating equipment and coating method |
| CN115584472A (en) * | 2022-11-01 | 2023-01-10 | 上海哈呐技术装备有限公司 | Magnetron sputtering coating machine |
Citations (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2075655U (en) * | 1989-09-05 | 1991-04-24 | 核工业西南物理研究院 | Double cavity rotary magnetic control splashing film plating machine |
| JPH09157839A (en) * | 1995-12-04 | 1997-06-17 | Hitachi Ltd | Thin film forming device |
| JPH11200035A (en) * | 1998-01-19 | 1999-07-27 | Anelva Corp | Sputtering-chemical vapor deposition composite device |
| CN1413933A (en) * | 2002-09-06 | 2003-04-30 | 鲍冠中 | Magnetic control sputtering hot-bending coated glass and its production method and device |
| KR20060113579A (en) * | 2006-09-14 | 2006-11-02 | 한국진공주식회사 | Automatic coating system of automotive lamps reflector coating and protective layer |
| CN101086059A (en) * | 2006-06-05 | 2007-12-12 | 黄鸣 | Solar energy heat-collecting pipe vacuum magnetic-control sputtering continuous plating line system |
| CN101343726A (en) * | 2007-07-09 | 2009-01-14 | 殷志强 | Solar energy thermal-collecting tube continuous automatic sputtering film coating method and device |
| CN101550542A (en) * | 2009-04-30 | 2009-10-07 | 常州博士新能源科技有限公司 | Multifunctional magnetron sputtering continuous film plating machine |
| CN101724825A (en) * | 2008-10-22 | 2010-06-09 | 北京清华阳光能源开发有限责任公司 | Continuous vacuum coating method and special equipment thereof |
| CN101748379A (en) * | 2010-01-25 | 2010-06-23 | 威海中玻光电有限公司 | Automatic horizontal silicon substrate film producing device |
| CN101768727A (en) * | 2009-12-31 | 2010-07-07 | 中国地质大学（北京） | Complex vacuum deposition device |
| CN201525883U (en) * | 2009-09-27 | 2010-07-14 | 山东力诺新材料有限公司 | Continuous film coating production apparatus for intermediate temperature full-glass vacuum solar heat collecting pipe |
| CN201648512U (en) * | 2010-03-24 | 2010-11-24 | 深圳森丰真空镀膜有限公司 | Continuous vacuum coating device |
| CN201660695U (en) * | 2010-04-12 | 2010-12-01 | 常州龙腾太阳能热电设备有限公司 | Up-right cylinder-type multitarget magnetron sputtering coating machine |
| CN101962755A (en) * | 2010-09-30 | 2011-02-02 | 深圳市金凯新瑞光电有限公司 | Continuous multiple sputter coating chamber atmosphere isolation system |
| CN202688424U (en) * | 2012-07-09 | 2013-01-23 | 北京奥依特科技有限责任公司 | Magnetically-controlled co-sputtering coating machine |
| CN103147053A (en) * | 2012-12-14 | 2013-06-12 | 广东志成冠军集团有限公司 | Multi-functional continuous magneto-controlled sputter coating device |
| CN203270025U (en) * | 2012-12-25 | 2013-11-06 | 黄玉春 | Vacuum film coating machine |
| CN205687997U (en) * | 2016-05-14 | 2016-11-16 | 佛山市佛欣真空技术有限公司 | A kind of connection transformational structure of two-in-one coater |
| CN108425093A (en) * | 2018-01-18 | 2018-08-21 | 维达力实业(深圳)有限公司 | Tunnel type sputter coating machine |
| CN209493624U (en) * | 2018-12-06 | 2019-10-15 | 北京华业阳光新能源有限公司 | The more targets of three station of dual chamber splash magnetic-controlled sputtering coating equipment altogether |
| CN111286706A (en) * | 2018-12-06 | 2020-06-16 | 北京华业阳光新能源有限公司 | Double-chamber three-station multi-target co-sputtering magnetron sputtering coating method |
| CN112080731A (en) * | 2020-07-22 | 2020-12-15 | 湘潭宏大真空技术股份有限公司 | Multi-chamber continuous optical film coating machine |
-
2018
- 2018-12-06 CN CN201811488244.3A patent/CN111286705B/en active Active
Patent Citations (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2075655U (en) * | 1989-09-05 | 1991-04-24 | 核工业西南物理研究院 | Double cavity rotary magnetic control splashing film plating machine |
| JPH09157839A (en) * | 1995-12-04 | 1997-06-17 | Hitachi Ltd | Thin film forming device |
| JPH11200035A (en) * | 1998-01-19 | 1999-07-27 | Anelva Corp | Sputtering-chemical vapor deposition composite device |
| CN1413933A (en) * | 2002-09-06 | 2003-04-30 | 鲍冠中 | Magnetic control sputtering hot-bending coated glass and its production method and device |
| CN101086059A (en) * | 2006-06-05 | 2007-12-12 | 黄鸣 | Solar energy heat-collecting pipe vacuum magnetic-control sputtering continuous plating line system |
| KR20060113579A (en) * | 2006-09-14 | 2006-11-02 | 한국진공주식회사 | Automatic coating system of automotive lamps reflector coating and protective layer |
| CN101343726A (en) * | 2007-07-09 | 2009-01-14 | 殷志强 | Solar energy thermal-collecting tube continuous automatic sputtering film coating method and device |
| CN101724825A (en) * | 2008-10-22 | 2010-06-09 | 北京清华阳光能源开发有限责任公司 | Continuous vacuum coating method and special equipment thereof |
| CN101550542A (en) * | 2009-04-30 | 2009-10-07 | 常州博士新能源科技有限公司 | Multifunctional magnetron sputtering continuous film plating machine |
| CN201525883U (en) * | 2009-09-27 | 2010-07-14 | 山东力诺新材料有限公司 | Continuous film coating production apparatus for intermediate temperature full-glass vacuum solar heat collecting pipe |
| CN101768727A (en) * | 2009-12-31 | 2010-07-07 | 中国地质大学（北京） | Complex vacuum deposition device |
| CN101748379A (en) * | 2010-01-25 | 2010-06-23 | 威海中玻光电有限公司 | Automatic horizontal silicon substrate film producing device |
| CN201648512U (en) * | 2010-03-24 | 2010-11-24 | 深圳森丰真空镀膜有限公司 | Continuous vacuum coating device |
| CN201660695U (en) * | 2010-04-12 | 2010-12-01 | 常州龙腾太阳能热电设备有限公司 | Up-right cylinder-type multitarget magnetron sputtering coating machine |
| CN101962755A (en) * | 2010-09-30 | 2011-02-02 | 深圳市金凯新瑞光电有限公司 | Continuous multiple sputter coating chamber atmosphere isolation system |
| CN202688424U (en) * | 2012-07-09 | 2013-01-23 | 北京奥依特科技有限责任公司 | Magnetically-controlled co-sputtering coating machine |
| CN103147053A (en) * | 2012-12-14 | 2013-06-12 | 广东志成冠军集团有限公司 | Multi-functional continuous magneto-controlled sputter coating device |
| WO2014089948A1 (en) * | 2012-12-14 | 2014-06-19 | 广东志成冠军集团有限公司 | Multi-functional continuous magneto-controlled sputter coating device |
| CN203270025U (en) * | 2012-12-25 | 2013-11-06 | 黄玉春 | Vacuum film coating machine |
| CN205687997U (en) * | 2016-05-14 | 2016-11-16 | 佛山市佛欣真空技术有限公司 | A kind of connection transformational structure of two-in-one coater |
| CN108425093A (en) * | 2018-01-18 | 2018-08-21 | 维达力实业(深圳)有限公司 | Tunnel type sputter coating machine |
| CN209493624U (en) * | 2018-12-06 | 2019-10-15 | 北京华业阳光新能源有限公司 | The more targets of three station of dual chamber splash magnetic-controlled sputtering coating equipment altogether |
| CN111286706A (en) * | 2018-12-06 | 2020-06-16 | 北京华业阳光新能源有限公司 | Double-chamber three-station multi-target co-sputtering magnetron sputtering coating method |
| CN112080731A (en) * | 2020-07-22 | 2020-12-15 | 湘潭宏大真空技术股份有限公司 | Multi-chamber continuous optical film coating machine |
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