CN202246846U - Horizontal reciprocating type ion film plating machine for plating ceramics by physical vapor deposition method - Google Patents
Horizontal reciprocating type ion film plating machine for plating ceramics by physical vapor deposition method Download PDFInfo
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- CN202246846U CN202246846U CN2011202385458U CN201120238545U CN202246846U CN 202246846 U CN202246846 U CN 202246846U CN 2011202385458 U CN2011202385458 U CN 2011202385458U CN 201120238545 U CN201120238545 U CN 201120238545U CN 202246846 U CN202246846 U CN 202246846U
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Abstract
The utility model relates to a horizontal reciprocating type ion film plating machine for plating ceramics by a physical vapor deposition method. According to the horizontal reciprocating type ion film plating machine, three sections of vacuum chambers are isolated mutually by a vacuum valve, and the valve is opened or closed according to a required program of a process; the first section of vacuum chamber is a feed heating and baking chamber, and the second section of vacuum chamber is a film plating chamber for plating the ceramics by the physical vapor deposition method; a plurality of electric arc evaporation ionization sources and a plurality of magnetic control sputtering sources are arranged on chamber walls; plated ceramic workpieces can move in a reciprocating mode or move forwards and backwards continuously on a running frame; and the third section of vacuum chamber is a chamber for cooling after discharging.
Description
Technical field:
The utility model relates to the reciprocating type physical vaporous deposition of a kind of accumbency and plates ceramic ion film coating machine; The type novelty is not traditional cylindrical shell Vakuumkammer; But train tunnel type Vakuumkammer; It is suitable for producing in enormous quantities with workpiece such as physical vaporous deposition plating ceramic tile, belongs to physical vaporous deposition plasma ion plated film field.
Background technology:
At present, traditional plating pottery ion film coating machine is vertical cylindrical shell Vakuumkammer, and the revolution pivoted frame that has the rotation work rest constitutes, even the coating equipment of horizontal glass plating or pottery is different with the utility model, the characteristics of this type are accumbency train tunnel type Vakuumkammers.Workpiece operation frame is shuttle on the coating equipment.
Through the inquiry of home and abroad patent documentation, following all patents belong to the background technology quite approaching with this patent, but have certain problem, and are significantly different with this patent.
▲ 01219841 " a kind of novel cathodic arc ion plating film device "
Designer: Wang Dianru, Zhang Jinping, Cheng Yunli, Wang Baixiang
This patent is only to adopt cathodic arc evaporation source plated film, material loading Vakuumkammer, vacuum film coating chamber; Between the blanking Vakuumkammer vacuum lock is arranged, can make by the steel plating plate and pass through these three Vakuumkammers continuously, and not change the vacuum tightness of each chamber; Be fit to preparation colored interference titanium oxide transparent film; Obviously and the utility model adopt the same vacuum tightness in three Room different, and this patent has controlled sputtering source and arc evaporation ionization source, and is also inequality.
▲ 03113917 " a kind of multi-arc ion plating film method of ceramic "
Contriver: Lin Weihe
This patent is traditional cylinder machine, has only multiple arc target, and does not have sputtering target, so significantly different with the application's utility model patent.
▲ 200610157962 " ceramic vacuum coating techniques "
Contriver: Huang Junrui
The vacuum multi sphere titanium target that the hardware that the present invention adopts just has the magnetic control function; And there is not sputtering target; Be used for plating the domestic ceramics device, both used magnetron sputtering target, use arc evaporation ionization target spaced again with the application's utility model employing physical vaporous deposition; Plating alternately on time obviously all has remarkable different on hardware and the technology.
▲ 200820013189 " magnetron sputtering and multi-arc ion coating combined type vacuum plating units "
Contriver: Dai Jingu, Zhang Shiwei etc.
This patent is the cylindrical shell Vakuumkammer, and the workpiece pivoted frame is traditional rotary, and vacuum-chamber wall is installed sputter nickel target and arc evaporation chromium target, obviously the obvious difference of the application's the reciprocating type machine of utility model accumbency.
▲ 200920104248 " a kind of magnetron sputtering coaters "
Contriver: Liu Hongliang, Liu Hongguo etc.
This patent is through transfer chamber from inlet; Transition chamber, sputtering chamber are to the downstream chamber; Adopt the racetrack revolution to transport workpiece, be characterized in that it is 35mm that the foliated glass workpiece is crossed the height of seam open height and anti-channeling gas shield system, and the application's patent is that the accumbency tunnel is reciprocating type; And have magnetron sputtering target and arc evaporation ionization target concurrently, significantly different with it.
▲ 201020218905 " a kind of horizontal vacuum coating equipment substrate delivery mechanisms "
Contriver: Huang Guoxing, Sun Guihong etc.
The present invention relates in vacuum chamber, be the mechanism that transmission substrate between the vacuum plating casing is used, be suitable for TCO coating film production line usefulness in the sun power utilization, though be horizontal, reality is that the application's utility model accumbency tunnel like is also far from each other.
Summary of the invention:
The method that traditional ceramic surface carries out ion film plating is in a tubular vacuum film coating chamber, to carry out, and the first step pottery is heated baking in a vacuum earlier, and second step was carried out ion film plating again; The 3rd step cooled off in protective atmosphere again; So no matter come out of the stove then, the past is that preface is carried out by the time in a Vakuumkammer all generally, workpiece batch from the space; Perhaps the time goes up and carries out according to sequential, and all difficulty reaches the production of rapid batch plated film.
In order to overcome the shortcoming of traditional ceramics plated film; The utility model is divided into three sections with Vakuumkammer, feed chamber when baking ceramic batch workpiece, make another batch baking simultaneously after pottery at the coating chamber plated film; Obviously; Discharge chamber have plated film workpiece in cooling, if time-program(me) is reasonable in design, can reach in batches high-quality production.
In order evenly to be plated on the ceramic workpiece surface, be that ceramic member is placed on the axis of rotation work rest with revolution traditionally, owing to rotate, often cause the two-sided plating of ceramic tile, and adopt the utility model to adopt the reciprocating type both single face platings of ceramic tile that make, even again.
The utility model is that the reciprocating type physical vaporous deposition of accumbency plates ceramic ion film coating machine, and Vakuumkammer is divided into three sections, and is reciprocating type for the accumbency tunnel type, adopts the physical vaporous deposition plating, and single-layer metal or metal nitride, carbonitride are in ceramic surface.
First section is the heated baking Vakuumkammer; Second section is reciprocating type ion film plating chamber, a plurality of arc evaporation sources and a plurality of controlled sputtering source that the coating chamber chamber is installed, quantity at least respectively all at two to more than two; And successively adjacent spaces is arranged; The 3rd section is protective atmosphere cooling vacuum chamber, and three sections Vakuumkammers are provided with identical vacuum ranges, and promptly vacuum-pumping system can make all Vakuumkammer base vacuum degree reach 3 * 10
-1Pa to 3 * 10
-3Pa; The great advantage of this technical scheme just is three time periods of processing requirement; Three Vakuumkammers simultaneously are placed in; Progressively get into and shift out three Vakuumkammer spaces again by the time program, advance or stop continuously like this, the traditional type plated film that can in the unit time, accomplish than a stove one stove adapts to large batch of coating technique.
Description of drawings:
Further specify to accompanying drawing below.
Fig. 1 is the structural representation of the utility model.
Be heated baking Vakuumkammer---feed chamber wherein 1,
2, often open partition A
3, arc evaporation ionization target source
4, magnetron sputtering target source
5, reciprocal ion film plating chamber
6, often open partition B
7, protective atmosphere cooling vacuum chamber---discharge chamber
8, discharge chamber exhaust
9, the discharge chamber base plate of advancing
10, hook---trip mechanism (I)
11, coating chamber exhaust
12, the reciprocal or base plate of advancing
13, hook---trip mechanism (II)
14, feed chamber exhaust
15, the feed chamber base plate of advancing
Embodiment:
1 is feed chamber in the utility model, and the ceramic workpiece that need are to be plated is placed on the base plate 15 of advancing, and the base plate 15 of advancing can be transferred to ceramic workpiece back and forth or the base plate 12 of advancing; Back and forth arc evaporation ionization target source 3 and magnetron sputtering target source 4 are installed in the compartment of terrain on 5 sidewalls of ion film plating chamber, will links up with when needing reciprocal plated film---trip mechanism (I) 10 with (II) 13 break off relations, treat that back and forth plating is even after; Hang up hook again and continue to march to discharge chamber 7, carry discharging by the base plate 9 of advancing, 8,11,14 are respectively discharge chamber 7 among the figure; The bleeding point of coating chamber 5 and feed chamber 1; Often open and cut off A, 2 and B, 6 are respectively the partition between chamber 1 and 5 and 5 and 7.
The structure of the utility model coating technique scheme has been to release on the ceramic coating equipment of the plating of our company.
Claims (4)
1. the reciprocating type physical vaporous deposition of accumbency plates ceramic ion film coating machine; It is characterized in that isolating by vacuum valve each other between three sections Vakuumkammers; Valve is opened or is closed by the required program of technology; First section Vakuumkammer is charging heating, baking pretreatment chamber, and second section Vakuumkammer is the coating chamber of physical vaporous deposition plating pottery, and locular wall is installed a plurality of arc evaporation ionization sources and a plurality of controlled sputtering source; But by the to-and-fro movement or advance continuously, retreat on the operation frame of plating ceramic workpiece, the 3rd section Vakuumkammer is discharging aftertreatment cooling room.
2. plate ceramic ion film coating machine according to the reciprocating type physical vaporous deposition of claims 1 described a kind of accumbency, it is characterized in that a plurality of arc evaporation ionization sources and the adjacent arrangement successively of a plurality of controlled sputtering source that the coating chamber chamber is installed, promptly be spaced.
3. the reciprocating type physical vaporous deposition of a kind of accumbency according to claim 1 plates ceramic ion film coating machine, it is characterized in that three sections Vakuumkammers are provided with identical vacuum ranges, and promptly vacuum-pumping system can make all Vakuumkammer base vacuum degree reach 3 * 10
-1Pa---6 * 10
-3Pa.
4. plate ceramic ion film coating machine according to the reciprocating type physical vaporous deposition of claims 1 described a kind of accumbency, it is characterized in that so-called a plurality of controlled sputtering source and a plurality of arc evaporation ionization source, quantity at least respectively all at two to more than two.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011202385458U CN202246846U (en) | 2011-07-08 | 2011-07-08 | Horizontal reciprocating type ion film plating machine for plating ceramics by physical vapor deposition method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011202385458U CN202246846U (en) | 2011-07-08 | 2011-07-08 | Horizontal reciprocating type ion film plating machine for plating ceramics by physical vapor deposition method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202246846U true CN202246846U (en) | 2012-05-30 |
Family
ID=46108117
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011202385458U Expired - Lifetime CN202246846U (en) | 2011-07-08 | 2011-07-08 | Horizontal reciprocating type ion film plating machine for plating ceramics by physical vapor deposition method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202246846U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106929809A (en) * | 2015-12-30 | 2017-07-07 | 上海朗亿新材料科技有限公司 | A kind of continuous producing apparatus for micro-nano powder plated film and preparation method thereof |
| CN107365973A (en) * | 2017-08-29 | 2017-11-21 | 肇庆市前沿真空设备有限公司 | A kind of vacuum coating production line and film plating process |
| CN109930115A (en) * | 2017-12-15 | 2019-06-25 | 湘潭宏大真空技术股份有限公司 | Optics multi-arc ion coating method and device thereof |
-
2011
- 2011-07-08 CN CN2011202385458U patent/CN202246846U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106929809A (en) * | 2015-12-30 | 2017-07-07 | 上海朗亿新材料科技有限公司 | A kind of continuous producing apparatus for micro-nano powder plated film and preparation method thereof |
| CN107365973A (en) * | 2017-08-29 | 2017-11-21 | 肇庆市前沿真空设备有限公司 | A kind of vacuum coating production line and film plating process |
| CN107365973B (en) * | 2017-08-29 | 2024-02-02 | 肇庆市德信真空设备有限公司 | Vacuum coating production line and coating method |
| CN109930115A (en) * | 2017-12-15 | 2019-06-25 | 湘潭宏大真空技术股份有限公司 | Optics multi-arc ion coating method and device thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20120530 |
|
| CX01 | Expiry of patent term |