CN1413933A - Magnetic control sputtering hot-bending coated glass and its production method and device - Google Patents
Magnetic control sputtering hot-bending coated glass and its production method and device Download PDFInfo
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- CN1413933A CN1413933A CN 02135476 CN02135476A CN1413933A CN 1413933 A CN1413933 A CN 1413933A CN 02135476 CN02135476 CN 02135476 CN 02135476 A CN02135476 A CN 02135476A CN 1413933 A CN1413933 A CN 1413933A
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Abstract
A thermally bent glass plated by magnetically controlled sputter is prepared through thermal bending, washing, baking, vacuumizing by 10 to the power -2 Pa, plating under 20-30 A, aerating and discharging. Its apparatus is an improved horizontal magnetically controlled sputtering system.
Description
Technical field
The device that the present invention relates to a kind of magnetic control sputtering hot-bending coated glass and production method thereof and produce magnetic control sputtering hot-bending coated glass.Relate to building curtain wall glass and vacuum glass filming equipment thereof.
Background technology
At present, building materials and ornaments market, because of building shape to the development of diversification, heteromorphosis, area every year of the hot bending cladding glass of use is with 17% speed increment.According to " Chinese building material newspaper " report, that uses now has only on-line coating hot bending glass, and this plated film hot bending glass is that the flat glass of plated film is increased temperature the coated glass that hot bending becomes required curvature.Its shortcoming is: the transmittance height, can see the framework of building and magnetron sputtering plating flat glass together use aberration can appear.
The magnetron sputtering film glass, it is moderate to have a transmittance, anti-key is looked, but the advantages such as ultraviolet ray in the block sunlight used by extensive big area, account for building curtain wall glass usable floor area more than 70%.This glass shortcoming is that glass can demoulding after increasing temperature hot bending.
The patent No. is 94237225 utility model patent, discloses a kind of both-end magnetron sputtering ion plating machine.Its claim is: " a kind of both-end magnetron sputtering ion plating machine; be made up of vacuum chamber and transport sector; feature of the present utility model is that vacuum chamber comprises forward and backward lock chamber (1), (7), sputtering zone, pressure reduction chamber (4) and the isolated area that is isolated by sputtering zone; wherein be provided with heating unit (11) in pressure reduction chamber (4) and its front isolated area and preceding lock chamber (1); be provided with sputtering target (12) and biasing device (13) in sputtering zone; have inlet on preceding lock chamber (1), rear locking chamber has outlet on (7), is provided with on each vacuum wall (15) and passes through mouth.”
The patent No. is 97235969 utility model patent, a kind of vacuum sputtering coating machine is disclosed, its claim is a kind of vacuum sputtering device, comprise a vacuum oven, be connected with diffusion pump, mechanical pump, sliding valve vacuum pump, Roots vaccum pump and transmission decelerating device outside it, the body of heater top is provided with airway, it is characterized in that: vacuum oven is vertical, arc-shaped guide rail is housed at the bottom of the body of heater, the target stand that can move along arc-shaped guide rail by transmission decelerating device control is housed on it, the fire door of vacuum oven is an arc.”
The patent No. is 01205975, the applying date is that March 26 calendar year 2001, utility model name are called " magnetron evaporation vacuum plating unit ", the patentee patent for Guangdeng Vacuum Apparatus Co., Ltd, its claim is: " a kind of magnetron evaporation vacuum plating unit; comprise vacuum unit and vacuum chamber; it is characterized in that; described vacuum unit (1) is connected with vacuum chamber (2); the left and right sides of described vacuum chamber (2) is provided with left gate (3) and right gate (6) all is fitted with evaporation unit (5) and magnetic control means (4) on left gate (3) and right gate (6).”
At present, existing horizontal magnetron sputtering plating glass production line can only be produced the planar magnetic control sputtering coated glass.Vacuum chamber glass gangway size height in its device is 30mm, and the vacuum chamber height is 350mm, magnetron sputtering target height 100mm, and magnetic control spattering target is level altitude, can not up-down adjustment.Fixed dam is arranged around the sputtering target source, prevent that sputtering source is splashed to the front of glass, baffle plate has only 10mm apart from glass, and therefore existing magnetron sputtering plating glass manufacturing apparatus can only pass through flat glass, and can not pass through hot bending glass, also promptly can only plate the planar magnetic control sputtering coated glass.
Summary of the invention
The purpose of this invention is to provide a kind of magnetic control sputtering hot-bending coated glass, also be about to glass behind the hot bending and send into vacuum chamber and carry out magnetron sputtering plating, obtain magnetic control sputtering hot-bending coated glass.
Another object of the present invention provides a kind of method of producing this magnetic control sputtering hot-bending coated glass.
Another object of the present invention provides a kind ofly improves the device of design for implementing this method.
The present invention improves to form on the basis of the horizontal magnetron sputtering plating glass equipment of existing plating flat glass, by the change to the apparatus and process dimensional parameters, makes it can plate flat glass, also can plate hot bending glass.
The improved place of the present invention mainly contains: vacuum chamber glass gangway size height is increased to 80mm～100mm, preferred 90mm; The vacuum chamber height increases to 400mm～480mm, preferred 440mm; Change adjustable lifting structure into the magnetron sputtering target rising and by former fixed sturcture, the height (distance) of magnetron sputtering range conveying roller is 100mm～160mm.
The present invention improves to form on the basis of existing magnetron sputtering plating glass production line.Existing magnetron sputtering film production line adopts secondary magnetron sputtering principle, under vacuum state cathode material is sputtered out, and is depositing film forming on the glass pieces of clean.Adopt different cathode materials, can be coated with into luxurious building curtain wall glass, thereby make building glass have more decorative effect, and can realize functions such as shading, heat insulation, insulation as required at glass surface metal refining or compound film.The coated glass that is coated with through this production line can be used in luxurious building, indoor and outdoor beautifying and decorating, industrial or agricultural widely with occasions such as thermostatic chambers.
Production line adopts single-ended semicontinuous plated film mode, horizontal type structure.Processed glass pieces on the production line of level through input, clean, dry, bleed, plated film, inflation, output.The vacuum-pumping system exhaust capacity is powerful, and productive temp is fast, and whole production line is by programmable controller control in real time automatically, and is easy and simple to handle, control is reliable, even film layer.
Principle of work is: magnetron sputtering is on the basis of diode sputtering, and a permanent magnet is set in the negative electrode target, and the magnetic line of force that comes out from the N utmost point passes that the surface of negative electrode is overhead to return cathode surface along direction of a curve, arrives the S utmost point, and forms the magnetic field of a closure.The electronics that shoots out from negative electrode, in magnetic field and electric field, be subjected to the effect of Lorentz force, advance by cycloid motion along the surface, magnetic field, this has just increased the electronic motion track greatly, thereby increase greatly with the collision opportunity of Ar molecule, improved Ar atomic ionization efficient, thereby sputtering rate is improved greatly, just film forming speed is fast, the production efficiency height.
It has series of advantages such as easy to operate, stable and reliable for performance, that current consumption is little, the sputtering source long service life, and coating film thickness is easy to control, and even film layer is firm, and quality is good than evaporation coating, and magnetron sputtering plating is the best approach that is coated with cladding glass.
Basic structure is: production line is made up of preceding roll-over table, plating pre-treatment chamber, waiting room, roll-over table, vacuum pre-vacuum chamber, vacuum film coating chamber, transition chamber, vacuum-pumping system, controlled sputtering source, transmission system, electrical system, water-cooling system, air-channel system etc.
1, transmission system
Transmission system is the glass pieces transfer limes based on the level of conveying roller.The transmission system of plated film part drives control by variable-frequence governor, makes glass pieces import reposefully that production line is bled, plated film, withdraw from then, but its transfer rate step-less adjustment.
2, vacuum chamber
Vacuum chamber has three, is horizontal type structure.Arrange according to the glass pieces input direction, be respectively vacuum pre-vacuum chamber, vacuum film coating chamber and transition chamber.A whole set of vacuum chamber has two vacuum locks (flap valve), one at vacuum pre-vacuum chamber input terminus, one between vacuum pre-vacuum chamber and vacuum film coating chamber, pre-vacuum chamber is evacuated to the process of plated film operating pressure from atmospheric condition, the operating pressure of coating chamber and transition chamber can be not destroyed, keeps magnetron sputtering target in running order for a long time.
3, vacuum-pumping system
Production line vacuum-pumping system exhaust capacity is powerful.Disposed three of H-150 D-type slide valve D pumps altogether, one of ZJ-1200 type lobe pump, one of ZJ-600 type lobe pump, one of 2X-15 type sliding vane rotary pump, ten of KT-300 type oil diffusion pumps, ten of Φ 300 high vacuum pneumavalves and Φ 200, Φ 150 Pneumatic baffle valves several.Wherein four KT-300 type oil diffusion pumps of pre-vacuum chamber configuration are made main pump, utmost point pump before a ZJ-1200 type lobe pump is done, and two H-150 D-type slide valve D pumps are made roughing vacuum pump, and a 2X-15 type sliding vane rotary pump is made holding pump; Coating chamber and transition chamber have disposed six KT-300 type oil diffusion pumps and have made main pump, utmost point pump before a ZJ-600 type lobe pump is done, and a H-150 D-type slide valve D pump is made off-gas pump.All valves all adopt electricity, pneumatic control, and are easy to operate.
4, controlled sputtering source
The production line controlled sputtering source adopts the plane magnetic control target structure, and totally two covers are installed in the vacuum film coating chamber.Select different cathode materials and different orientations, can coat different retes.Must guarantee that water-cooled is respond well during magnetron sputtering target work.
5, electrical system
Electrical system comprises: instrument such as the electrical control gear of cleaning, drying system, vacuum-pumping system, transmission system, controlled sputtering source and compound vacuum gauge, compound pressure controller; Electrical control adopts advanced industrial computer (PLC) to control whole coating process automatically.
6, power supply
The working power of production line is 380V, 50H, three-phase and four-line, total power 273KW, and the fluctuation of electric voltage frequency should meet the provisions of the relevant regulations issued by the State.Because voltage fluctuation is very big to the coating quality influence, regional user big in mains fluctuations or that network voltage is low can adopt relative measures, and guaranteeing has stable voltage, could guarantee to produce high-quality product.
7, water-cooling system
The vacuum system of production line, magnetron sputtering target all need to carry out water-cooled, tap water can not get fully guaranteeing local or for water saving, the user can be equipped with the cooling tower of a 30t/h to guarantee enough water coolants and stable water temperature, hydraulic pressure, general water should guarantee to be lower than 25 ℃, hydraulic pressure is at 0.1～0.2MPa, production line is provided with pressure controller, in working process, when cutting off the water supply (or hydraulic pressure deficiency), pressure controller cuts off the electrical control power supply, sends guard signal simultaneously and causes that the operator notes.Magnetic controlling target definitely can not be cut off the water supply in the course of the work, otherwise can damage the target source, causes heavy economic losses.
8, air-channel system
Production line needs pressurized air to handle vacuum lock, Pneumatic vacuum valve, inflation valve etc.What do not have source of the gas should be equipped with a 0.3m
3The air compressor of/min provides pressurized air, and air pressure should remain between 0.4～0.6MPa, and dew point is 2 ℃ to the maximum.
Magnetic control sputtering hot-bending coated glass of the present invention is characterized in that: it is the glass of hot bending to be sent into plated film forms in the improved magnetron sputtering glass coating device.
A kind of method of producing magnetic control sputtering hot-bending coated glass, adopt single-ended semicontinuous plated film mode or the full continuous coating mode of both-end, with by the glass pieces of hot bending be placed on the production line of level through input, clean, dry, bleed, plated film, inflation, output; It is characterized in that: with vacuum chamber glass gangway height, pass through open height, magnetron sputtering target height and increase, hot bending glass can be passed; The vacuum chamber operating pressure is 10
-2Pa; Working current 20～30A; Vacuum film coating chamber, transition chamber continuous air extraction; Cooling water source hydraulic pressure: 0.1～0.2MPa, water temperature≤25 ℃; Pressurized air air pressure 0.4～0.6MPa;
Method according to above-mentioned production magnetic control sputtering hot-bending coated glass, it is characterized in that: be placed on flat glass plate or the plane stainless steel plate by the glass of hot bending described, be lined with the nylon cushion block between the concave surface both sides of hot bending glass and flat glass plate or the plane stainless steel plate, flat glass plate or plane stainless steel plate are placed on the conveying roller, send into vacuum chamber.
A kind of device of producing magnetic control sputtering hot-bending coated glass comprises vacuum chamber and magnetron sputtering target, and vacuum chamber has three, is the bedroom structure, arranges according to the glass pieces input direction, is respectively vacuum pre-vacuum chamber, vacuum beryllium film chamber and transition chamber; Magnetron sputtering target is installed in below the vacuum film coating chamber loam cake, magnetron sputtering target comprises: water-cooled tube, water-cooled tube divides water coolant inhalent siphon and cooling water outlet pipe, two water-cooled tube bodys communicate with the two ends of magnetron sputtering target target body respectively and are welded to connect, pole shoe and magnet are housed in the target body, be installed with bar shaped target in plane below the target body, it is characterized in that: described vacuum chamber glass gangway height is 80mm～100mm, vacuum chamber height 400mm～480mm; The height of described magnetron sputtering range conveying roller is 100mm～160mm.
Device according to above-mentioned production magnetic control sputtering hot-bending coated glass is characterized in that: described vacuum chamber glass gangway height is 90mm, vacuum chamber height 440mm.
Device according to aforesaid production magnetic control sputtering hot-bending coated glass is characterized in that: described magnetron sputtering target is adjustable lifting structure.
Device according to above-mentioned production magnetic control sputtering hot-bending coated glass, it is characterized in that: two water-cooled tube bodys of described production magnetron sputtering target communicate with the target body two ends respectively and are welded to connect, the water-cooled tube tube wall has outside screw, body is rotary with lifting nut outward, design has electrode mounting hole on the lifting nut, gasket is housed below the lifting nut, it below the gasket vacuum film coating chamber loam cake, below the vacuum film coating chamber loam cake gasket is housed, gasket is one-piece construction or is formed by stacking by a plurality of monomer pads; Water-cooled tube communicates with target body, is installed with plane bar shaped target below the target body, and the target body both sides are equipped with Internal baffle respectively, and outer baffle respectively is equipped with in the Internal baffle outside, and outer baffle is fixedly mounted under the vacuum film coating chamber loam cake; Cover on vacuum film coating chamber and two tunger tubes are installed chew, two tunger tubes are installed in respectively on two outer baffles, and design has a plurality of production wells on the tunger tube tube wall.
The present invention is on the basis of original plating planar magnetic control sputtering coated glass equipment, major portion apparatus structure size, technology are improved and formed, compare with existing technology and to have following advantage: the present invention both can produce the planar magnetic control sputtering coated glass, also can produce magnetic control sputtering hot-bending coated glass.Planar magnetic control sputtering coated glass and magnetic control sputtering hot-bending coated glass use, adopt the coated glass of producing with a kind of technology not have aberration in same building.
Description of drawings
Fig. 1 is the plot plan of vacuum chamber and vacuum-pumping system thereof in the magnetic control sputtering hot-bending coated glass production unit.
Fig. 2 is the vacuum pre-vacuum chamber unit construction synoptic diagram in the vacuum chamber.
Fig. 3 is the left view of Fig. 2.
Fig. 4 is the vertical view of Fig. 2.
The front view that Fig. 5 covers on the vacuum film coating chamber for magnetron sputtering target is installed in.
Fig. 6 is the right view of Fig. 5.
Fig. 7 is the A-A sectional view of Fig. 6.
Fig. 8 is the front view of magnetron sputtering target assembly.
Fig. 9 is the B-B sectional view of Fig. 8.
For convenience of description, the Reference numeral in the accompanying drawing is as follows:
1, vacuum pre-vacuum chamber; 2, vacuum film coating chamber; 3, transition chamber; 4, glass gangway; 5, smart vacuum pumping pump Link Port; 6, thick vacuum pumping pump Link Port; 7, leg; 8, vacuum film coating chamber loam cake; 9, tunger tube is chewed; 10, the water-cooled tube mouth of pipe; 11, water-cooled tube; 12, electrode mounting hole; 13, lifting nut; 14, gasket; 15, gasket; 16, Internal baffle; 17, tunger tube; 18, outer baffle; 19, target body; 20, target; 21, gasket draw-in groove; 22, erection opening; 23, utmost point target; 24, magnet.
Embodiment
Existing magnetron sputtering flat glass coating film production line mainly is made up of preceding roll-over table, plating pre-treatment chamber, waiting room, roll-over table, vacuum pre-vacuum chamber, vacuum film coating chamber, transition chamber, vacuum-pumping system, magnetron sputtering target, transmission system, electrical system, water-cooling system, air-channel system etc.
The present invention is on the basis of original production line, mainly to the glass gangway size height of vacuum pre-vacuum chamber, vacuum film coating chamber, transition chamber, pass through open height and the vacuum chamber height strengthens, make it can pass through hot bending glass, and the magnetron sputtering target of former level altitude is increased, and change adjustable lift magnetron sputtering target into, and the part processing parameter is adjusted.Make the present invention can plate hot bending glass and can plate flat glass again.
Magnetic control sputtering hot-bending coated glass of the present invention is characterized in that: it is the glass of hot bending to be sent into plated film forms in the magnetic control sputtering film plating device.
A kind of method of producing magnetic control sputtering hot-bending coated glass, adopt single-ended semicontinuous plated film mode or the full continuous coating mode of both-end, with by the glass pieces of hot bending be placed on the production line of level through input, clean, dry, bleed, steps such as plated film, inflation, output, it is characterized in that: with vacuum chamber glass gangway height, pass through open height, magnetron sputtering target height and increase, hot bending glass can be passed; Vacuum chamber operating pressure 10
-2Pa, working current 20～30A, vacuum film coating chamber, transition chamber continuous air extraction; Cooling water source hydraulic pressure: 0.1～0.2MPa, water temperature≤25 ℃, consumption: 30t/h, available cooling-tower circulating water; Pressurized air: air pressure: 0.4～06MPa, consumption: 0.3m
3/ min.Magneticstrength is not less than 250 Gausses.
The glass of hot bending is placed on flat glass plate or the plane stainless steel plate, is lined with polylith nylon cushion block between the concave surface both sides of hot bending glass and the flat glass plate, and the nylon cushion block can make wedge shape or the inboard is arcual other shape.Flat glass plate or plane stainless steel plate are placed on the conveying roller, send into vacuum chamber and carry out plated film.The present invention's glass of hot bending also can be placed on the smooth plate, curved slab of other materials or other devices and sends into vacuum chamber, perhaps directly sends into vacuum chamber.
A kind of device of producing magnetic control sputtering hot-bending coated glass comprises vacuum chamber and magnetron sputtering target, and vacuum chamber has three as shown in Figure 1, is horizontal type structure, adopts single-ended semicontinuous plated film mode.Arrange according to the glass pieces input direction, be respectively vacuum pre-vacuum chamber 1 (seeing Fig. 2, Fig. 3, Fig. 4 in addition), vacuum film coating chamber 2 and transition chamber 3.Vacuum chamber glass gangway height 90mm, vacuum chamber height 440mm.The present invention also can adopt the full continuous coating structure of both-end.
Magnetron sputtering target such as Fig. 5, Fig. 6, shown in Figure 7, magnetron sputtering target is two covers, is installed in below the vacuum film coating chamber loam cake 8, is adjustable lifting structure, is 100～160mm apart from the height of conveying roller.
Magnetron sputtering target comprises that water-cooled tube 11, water-cooled tube divide water coolant inhalent siphon and cooling water outlet pipe, and two bodys communicate with the two ends of magnetron sputtering target body 19 respectively and are welded to connect (seeing Fig. 6, Fig. 7 in addition), and utmost point target 23 and magnet 24 are housed in the target body 19.Be installed with plane bar shaped target 20 below the target body.Water-cooled tube 11 tube walls have outside screw, and body is rotary with lifting nut 13 outward, and design has electrode mounting hole (seeing Fig. 5 in addition) on the lifting nut.Gasket 14 is housed below the lifting nut, and gasket 14 can adopt nylon material or engineering plastics.Be vacuum film coating chamber loam cake 8 below the gasket, gasket 15 be housed below the loam cake 8.Gasket 15 can adopt monoblock type or split type, can regulate the height of magnetron sputtering target by the thickness that increases gasket 14,15 by lifting nut.The target body both sides are separately installed with Internal baffle 16, and the two ends of Internal baffle 16 are stuck on the gasket draw-in groove 21, and other bodies are fixed on the target body, and an outer baffle 18 respectively is equipped with in the Internal baffle outside, and outer baffle is fixedly mounted under the vacuum film coating chamber loam cake.Cover on vacuum film coating chamber and two tunger tubes are installed chew 9 (see figure 5)s, two tunger tubes 17 are installed in respectively on two outer baffles, and design has a plurality of production wells on the tunger tube tube wall.
The present invention can plate the above hot bending glass of camber radius 2m～10m, and the camber of every hot bending glass is 5mm～70mm.
Claims (7)
1, a kind of magnetic control sputtering hot-bending coated glass is characterized in that: it is the glass of hot bending to be sent into plated film forms in the improved magnetron sputtering glass coating device.
2, a kind of method of producing magnetic control sputtering hot-bending coated glass, adopt single-ended semicontinuous plated film mode or the full continuous coating mode of both-end, with by the glass pieces of hot bending be placed on the production line of level through input, clean, dry, bleed, plated film, inflation, output; It is characterized in that: with vacuum chamber glass gangway height, pass through open height, magnetron sputtering target height and increase, the vacuum chamber operating pressure is 10
-2Pa, working current 20～30A; Vacuum film coating chamber, transition chamber continuous air extraction; Cooling water source hydraulic pressure: 0.1～0.2MPa, water temperature≤25 ℃; Pressurized air air pressure 0.4～0.6MPa.
3, the method for production magnetic control sputtering hot-bending coated glass according to claim 2, it is characterized in that: be placed on flat glass plate or the plane stainless steel plate by the glass of hot bending described, be lined with the nylon cushion block between the concave surface both sides of hot bending glass and the flat glass plate, flat glass plate or plane stainless steel plate are placed on the conveying roller, send into vacuum chamber.
4, a kind of device of producing magnetic control sputtering hot-bending coated glass, comprise vacuum chamber and magnetron sputtering target, vacuum chamber has three, be horizontal type structure, be respectively vacuum pre-vacuum chamber (1) according to the arrangement of glass input direction, vacuum film coating chamber (2) and transition chamber (3), magnetron sputtering target is installed in below the vacuum film coating chamber loam cake (8), magnetron sputtering target comprises: water-cooled tube (1), water-cooled tube divides water coolant inhalent siphon and cooling water outlet pipe, two water-cooled tube bodys communicate with the two ends of magnetron sputtering target target body respectively and are welded to connect, pole shoe (23) and magnet (24) are housed in the target body (19), be installed with plane bar shaped target (20) below the target body, it is characterized in that: described vacuum chamber glass gangway (4) highly is 80mm～100mm, vacuum chamber height 400mm～480mm; The height of described magnetron sputtering range conveying roller is 100mm～160mm.
5, the device of production magnetic control sputtering hot-bending coated glass according to claim 4 is characterized in that: described vacuum chamber glass gangway (4) highly is 90mm, vacuum chamber height 440mm.
6, the device of production magnetic control sputtering hot-bending coated glass according to claim 4 is characterized in that: described magnetron sputtering target is adjustable lifting structure.
7, the device of production magnetic control sputtering hot-bending coated glass according to claim 6 is characterized in that: two water-cooled tubes (11) body of described magnetron sputtering target communicates with target body (19) two ends respectively and is welded to connect; The water-cooled tube tube wall has outside screw, body is rotary with lifting nut (13) outward, design has electrode mounting hole (12) on the lifting nut, gasket (14) is housed below the lifting nut (13), it below the gasket vacuum film coating chamber loam cake (8), gasket (15) is housed below the vacuum film coating chamber loam cake, and gasket is one-piece construction or is formed by stacking by a plurality of monomer pads; Water-cooled tube (11) communicates with target body (19), be installed with plane bar shaped target (20) below the target body (19), target body (19) both sides are equipped with Internal baffle (16) respectively, and outer baffle (18) respectively is equipped with in Internal baffle (16) outside, and outer baffle (18) is fixedly mounted under the vacuum film coating chamber loam cake; Cover on vacuum film coating chamber and two tunger tubes are installed chew (9), two tunger tubes (17) are installed in respectively on two outer baffles (18), and design has a plurality of production wells on the tunger tube tube wall.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02135476 CN1228266C (en) | 2002-09-06 | 2002-09-06 | Magnetic control sputtering hot-bending coated glass and its production method and device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02135476 CN1228266C (en) | 2002-09-06 | 2002-09-06 | Magnetic control sputtering hot-bending coated glass and its production method and device |
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| Publication Number | Publication Date |
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| CN1413933A true CN1413933A (en) | 2003-04-30 |
| CN1228266C CN1228266C (en) | 2005-11-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 02135476 Expired - Fee Related CN1228266C (en) | 2002-09-06 | 2002-09-06 | Magnetic control sputtering hot-bending coated glass and its production method and device |
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| CN102744936A (en) * | 2012-08-07 | 2012-10-24 | 鲍冠中 | U-shaped coated glass and manufacture method thereof |
| CN104294231A (en) * | 2014-10-10 | 2015-01-21 | 咸宁南玻节能玻璃有限公司 | Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate |
| CN104342625A (en) * | 2014-03-21 | 2015-02-11 | 宁波海燕家电玻璃技术有限公司 | Method for manufacturing black borosilicate glass by vacuum coating |
| CN104553202A (en) * | 2015-01-27 | 2015-04-29 | 大连爱瑞德纳米科技有限公司 | Window film and production method thereof as well as window film fixing structure and fixing method |
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| CN111286705A (en) * | 2018-12-06 | 2020-06-16 | 北京华业阳光新能源有限公司 | Double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment |
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- 2002-09-06 CN CN 02135476 patent/CN1228266C/en not_active Expired - Fee Related
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| CN102744936A (en) * | 2012-08-07 | 2012-10-24 | 鲍冠中 | U-shaped coated glass and manufacture method thereof |
| CN104342625A (en) * | 2014-03-21 | 2015-02-11 | 宁波海燕家电玻璃技术有限公司 | Method for manufacturing black borosilicate glass by vacuum coating |
| CN104294231A (en) * | 2014-10-10 | 2015-01-21 | 咸宁南玻节能玻璃有限公司 | Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate |
| CN104553202A (en) * | 2015-01-27 | 2015-04-29 | 大连爱瑞德纳米科技有限公司 | Window film and production method thereof as well as window film fixing structure and fixing method |
| CN105084774A (en) * | 2015-07-31 | 2015-11-25 | 芜湖真空科技有限公司 | Offline production method of low-E glass |
| CN107315155A (en) * | 2017-07-15 | 2017-11-03 | 吉林市江机民科实业有限公司 | A kind of coating film on glass battery lead plate for atmospheric electric field detector calibrating installation |
| CN111286705A (en) * | 2018-12-06 | 2020-06-16 | 北京华业阳光新能源有限公司 | Double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment |
| CN111286705B (en) * | 2018-12-06 | 2024-05-03 | 北京华业阳光新能源有限公司 | Double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment |
| CN110221630A (en) * | 2019-06-04 | 2019-09-10 | 吴江南玻华东工程玻璃有限公司 | A kind of building glass filming parameter adaptive control system |
| CN110117778A (en) * | 2019-06-21 | 2019-08-13 | 张家港市和瑞创先智能光学有限公司 | A kind of self-cleaning magnetic control spattering target cooling system |
| CN114340216B (en) * | 2021-12-21 | 2023-05-23 | 中国电子科技集团公司第三十八研究所 | Vertical transmission device for circuit board hole metallization |
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