CN107058947A - For preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering continuous lines - Google Patents
For preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering continuous lines Download PDFInfo
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- CN107058947A CN107058947A CN201610984083.1A CN201610984083A CN107058947A CN 107058947 A CN107058947 A CN 107058947A CN 201610984083 A CN201610984083 A CN 201610984083A CN 107058947 A CN107058947 A CN 107058947A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
It is used to prepare fuel battery metal double polar plate amorphous carbon-film magnetron sputtering continuous lines the present invention relates to one kind, including：Multichamber system：Four chambers overall including being sequentially connected in series and constituting：Clean and be mutually communicated between heating chamber, the first filming chamber, the second coating chamber and subsequent treatment chamber, each chamber；Work rest：It is used for the metal double polar plates hanger of the pending metal double polar plates of fixed in position including at least one；Transmission system：Including the transport mechanism for the work rest being sequentially sent to/being sent out the chamber；Extract system：Extraction sector including being independently arranged at each chamber, the vacuum for controlling each chamber；Isolation valve systems to be opened/closed：Transition portion between being arranged on per adjacent two chambers, and coordinate with the cavity seal.Compared with prior art, the present invention prepares that metal double polar plates amorphous carbon-film production efficiency is high, film quality is good, cost is low, significant to accelerating fuel cell industrialized development.
Description
Technical field
The present invention relates to a kind of amorphous carbon-film magnetron sputtering continuous lines, it is used to efficiently prepare fuel electricity more particularly, to one kind
Pond metal double polar plates amorphous carbon-film magnetron sputtering continuous lines.
Background technology
Vacuum coating technology is begun to show in the 1930s, four the fifties start commercial Application occur, and industrialization is big to advise
Mould production starts from the 1980s, obtaining extensive in the industry such as electronics, traffic, aerospace, packaging, decoration, gold stamping printing
Application.Magnetron sputtering is as one kind in vacuum coating technology, by introducing magnetic field in target cathode surface, using magnetic field to band
The constraint of charged particle to increase sputtering raste, realizes high speed, low temperature, low damage sputtering to improve plasma density, with setting
Standby simple, easily controllable, plated film area is big and the advantages of strong adhesive force.General sputtering method can be used for preparing metal, partly lead
The multiple materials such as body, insulator, so that the surface of solids has many such as wear-resistant, corrosion-resistant, conductive due to solid material sheet
The superior function of body, reaches and improves product quality, extension life of product, saves the energy and obtain the effect of distinct economic.
Fuel cell uses hydrogen as the energy, the characteristics of with high-efficiency cleaning, is had a wide range of applications in every field
Prospect.Wherein bipolar plates are as one of important component of fuel cell, and its performance quality governs the business of fuel cell
Change process.Current metal material is because of the advantage of its preferable mechanical performance, decay resistance and low cost, it has also become fuel cell
The main material of bipolar plates.
Only metal double polar plates can not meet that fuel cell is corrosion-resistant to bipolar plates, good conductivity performance requirement, mesh
It is preceding can be prepared by magnetron sputtering technique on its surface one layer not only corrosion-resistant but also conductive coating to improve metal double polar plates performance.
But found in coating preparation process, existing coat preparing technology efficiency is low, and causes target contamination because preparing plural layers,
Target, which need to frequently be washed, further reduces coating preparation efficiency.Chinese patent 200610049197.3 discloses a kind of continous way sputtering and set
Standby, the equipment is by pre-vacuum chamber, preceding transition chamber, sputtering chamber, rear transition chamber and five, pressure-reducing chamber vacuum cavity and enters piece platform, slice
Platform, work rest return mechanism etc. are constituted, and work rest, which is passed sequentially through, is conveyed out body arrival slice platform after each chamber, then by body
Work rest is transmitted back to entering bit end by outer work rest return mechanism, and the defect of the equipment is：Each chamber is mutually communicated, but respectively
The working environment of individual chamber processes is different, so different chamber different technology conditions can not be kept, while target contamination can be caused；
Chinese patent ZL201110149168.5 discloses a kind of with the end continuous sputtering coating equipment of entrance and exit type, the equipment vacuum cavity by
Two vacuum chambers of pre-vacuum chamber and sputtering chamber that are adjacent and communicating are constituted, and are provided with isolating valve, chamber and are set between two vacuum chambers
There is the conveyer for reciprocally transmitting work rest, although the equipment saves floor occupying area, but production efficiency is relatively low, and in sputtering chamber
The problem of target contamination can not being avoided in room.Thus propose that a kind of rational in infrastructure, cost is relatively low, plating membrane efficiency can be greatly improved
Magnetron sputtering continuous lines, to meet the use requirement in actual batch production.
The content of the invention
It is an object of the present invention to overcome the above-mentioned drawbacks of the prior art and provide one kind is used to prepare fuel
Battery metal bi-polar plate amorphous carbon-film magnetron sputtering continuous lines.
The purpose of the present invention can be achieved through the following technical solutions：
In terms of the present invention realizes that the technical though of its purpose mainly has following four：
One is to realize that the high efficiency of laminated film is deposited by a variety of targets of multiple chambers；
Two be to increase ion gun in cleaning, sputtering chamber, respectively to cleaning workpiece surface and assistant depositing film；
Three are to provide one kind once can complete to enter next chamber progress subsequent technique after corresponding technique in each chamber
Work rest and its transmission system, realize the uniform fast deposition of film；
Four be by the separate pumping system of the isolating valve to be opened/closed of pneumatic control between adjacent chamber and personal share chamber
System, to control chamber vacuum, to ensure the optimal conditions of the corresponding technique of each chamber, while preventing sputtering particle from entering phase
Adjacent chamber is polluted.
One kind is used to prepare fuel battery metal double polar plate amorphous carbon-film magnetron sputtering continuous lines, including：
Multichamber system：Four chambers overall including being sequentially connected in series and constituting：Clean heating chamber, the first filming chamber
It is mutually communicated between room, the second coating chamber and subsequent treatment chamber, each chamber, wherein, cleaning heating chamber is used to clean
And pending metal double polar plates are preheated, the first filming chamber and the second coating chamber are used for thin film deposition, subsequent treatment chamber
For carrying out subsequent technique processing to the metal double polar plates after thin film deposition；
Work rest：It is used for the metal double polar plates hanger of the pending metal double polar plates of fixed in position including at least one；
Transmission system：Including the transport mechanism for the work rest being sequentially sent to/being sent out the chamber；
Extract system：Extraction sector including being independently arranged at each chamber, the vacuum for controlling each chamber；
Isolation valve systems to be opened/closed：Be arranged on per the transition portion between adjacent two chambers, and with the chamber
Sealing coordinates.
It is preferred that, heater and at least one are provided with described cleaning heating chamber to be used to clean metal double polar plates table
The ion gun in face；
At least one ion gun and equally distributed multiple metallic targets are provided with described the first filming chamber；
The second described coating chamber is built with least one ion gun and equally distributed multiple carbon targets.
The target of described metallic target is Cr or Ti, and it is provided with two be symmetrical set；
Described carbon target includes two pairs of amorphous carbon sputtering targets being arranged symmetrically.
It is preferred that, described the first filming chamber and the second coating chamber is additionally provided with openable sealed door.
It is preferred that, described work rest includes chassis, and multiple gold on chassis and along central shaft uniformly
Belong to bipolar plates hanger, rotating mechanism is additionally provided with the lower surface on chassis, the rotating mechanism is big by fixed peripheral skirt, center
The cyclic train structure of gear and multiple peripheral little gear compositions, wherein, the central axis on the center gear wheel and chassis
Matching, one metal double polar plates hanger of each periphery little gear and corresponding connection, and drive metal double polar plates hanger small with periphery
Gear rotation, is additionally provided with the work rest guide rail moved along transport mechanism in fixed peripheral skirt.
It is furthermore preferred that described transport mechanism is arranged on the bottom of each chamber, including ECU, transmission motor, and
The transmission guide rail driven by transmission motor, described work rest is placed on transmission guide rail, and with transmission guide rail movement；
The bottom centre position of each chamber be additionally provided with one be used for contact drive the electric rotating of the center gear wheel
Machine, is additionally provided with electric rotating machine for axiality detection sensor.Under such a pattern, work rest has two kinds of forms of motion, one
Kind is the processing direction along chamber, and work rest is rubbed after continuous lines cleaning heating chamber is entered by work rest and the quiet of guide rail
Wipe power to be fixed on transmission guide rail, next chamber is moved to transport mechanism；The motor of work rest autobiography is driven in each chamber
Whether axle is provided with axiality detection sensor, to determine the rotating shaft of workpiece bottom with driving the motor shaft of its rotation coaxial and then judging
Whether work rest accurately reaches next chamber, if the two is coaxial, can close isolating valve and open extract system, starts plated film
Technique.It is another to be：Metal double polar plates hanger in a certain chamber using chamber central shaft as hollow shaft, while carry out rotation add revolution
Motion, ensure uniformity, the sedimentation rate of thin film deposition with this, work rest is entered by the cyclic train of bottom planetary gear train
Row is driven to realize this kind of motion mode.
It is preferred that, described transport mechanism includes transmission guide rail, and drives the work rest along transmission guide rail entry/exit chamber
Power unit, described transmission guide rail is included with breach and chamber interior guide rail annular in shape, exterior thereto guide rail, and makes
The transition guide that metal double polar plates hanger is shifted along transmission guide rail direction between chamber interior guide rail and exterior thereto guide rail, its
In, transition guide is rotatablely installed the indentation, there of guide rail indoors, and has two kinds of operating positions：One kind is to turn to just connecting cavity
Chamber interior guide rail and exterior thereto guide rail, it is another to be connected to disconnect with exterior thereto guide rail, and be connected with chamber interior guide rail
It is combined into complete annular guide rail.
It is furthermore preferred that the bottom gear wheel positioned at ring-shaped guide rail center can also be set in the bottom of each chamber,
The bottom little gear being engaged with the bottom gear wheel is additionally provided with the bottom of each metal double polar plates hanger；
When in metal double polar plates hanger feeding chamber, bottom gear wheel rotation, metal double polar plates hanger is driven along ring
Shape guide rail revolves round the sun, while around its central axis rotation.
It is preferred that, described isolation valve systems include isolating valve, pneumatic mechanism, electric-control system and vacuum chamber pressure sensing
Device, wherein, described isolating valve is arranged on the transition portion of adjacent chamber, and the cunning along short transverse is additionally provided with transition part office
Groove, described isolating valve is slidably matched with chute sealing, and the drive link of described pneumatic mechanism is connected with the isolating valve, and band
It is moved to slide up and down along chute, to realize opening and closing, described pneumatic mechanism and vacuum chamber pressure sensor also with electric-control system
Connection.
It is preferred that, described continuous lines also include the peripheral transfer system for work rest being sent into/being sent out multichamber system.
The concrete structure and its course of work of the present invention can also be further as follows：
In multichamber system, each chamber is diameter 1-1.5m, high 1.5-1.8m circular chamber to ensure thin film deposition
Uniformity and high efficiency, each chamber is mutually communicated, and length 0.5m transition portion is provided between adjacent chamber, and in the part
Provided with pneumatic control isolation valve systems to be opened/closed；Continuous lines work rest entrance is arranged on cleaning heating chamber along continuous lines side
To outlet is arranged on subsequent treatment chamber along continuous lines direction, while being respectively equipped with first, second coating chamber side closed
Door, prevents single coating process link failure from causing the phenomenon of all link plated film failures of continuous lines.
Heating chamber is wherein cleaned, provided with heater and equipped with 1-2 ion gun.Heater is double to dry metal
Pole plate is entering the cause cleaning surface of continuous lines and water stain, alcohol for remaining etc., while so that metal double polar plates are entering the
Suitable coating temperature is reached before one coating chamber, thin film deposition quality is improved；The work that ion gun is sent to clean
Part, removes its surface impurity and oxide-film, is produced with increasing film and workpiece surface adhesion and reducing in film deposition process
Defect.
First, second coating chamber is used for thin film deposition.Wherein the first filming chamber is right provided with 1-2 ion gun and 2
Claim the metallic target of arrangement, the work electricity consumption of sputtering target is provided by master controller；Ion gun passes through in film deposition process simultaneously
Particle promotes target particle in workpiece surface diffusion transfer to the effect of impact of film, reduces stress in thin films and improves densification
Property；Described metallic target deposits one layer using corrosion resistant metal as target, in workpiece surface and combined with amorphous carbon and stainless steel first
Preferable film is as prime coat to improve the adhesion of outer membrane and workpiece, it is preferred that metallic target of the present invention with Cr or
Ti etc. is target.Second coating chamber, equipped with 1-2 ion gun and 4 symmetrical carbon targets；Likewise, sputtering target works
Electricity consumption is provided by master controller, and the chamber carbon target quantity is more, and deposition velocity is very fast, to the workpiece table in deposition bottoming metal level
Continue to deposit electric conductivity and corrosion resistance preferably amorphous carbon layer in face.Subsequent treatment chamber is mainly used in carrying out after thin film deposition
The metal double polar plates of deposition film are such as cooled down by continuous technique by way of air cooling.
The extract system, is independently arranged at each chamber, by PLC control system, maintains pump, mechanical pump, lobe pump, expansion
Pump or molecular pump, vacuum meter composition are dissipated, to ensure the process conditions of each chamber, because cavity space is larger, is taken out to improve equipment
Gas velocity rate simultaneously ensures preferable vacuum, and the present invention is using 1-3 molecular pump, it is preferred that of the invention using turbomolecular pump as main pump,
Equipment is there is the faster speed of exhaust and the shorter startup time, but be not limited to this, can also use oil diffusion pump or low temperature
Pump.
The isolation valve systems to be opened/closed, by isolating valve, PLC electric-control systems, vacuum chamber pressure sensor, work rest
Axiality sensor group is into isolating valve is located at the transition portion between adjacent chamber, is connected with cavity transition portion top surface, passes through
Pneumatic mechanism controls it to be opened and closed, and the piston rod of described pneumatic mechanism is connected with the isolating valve, and sets up separately in cavity transition part
There is the chute along short transverse, chute is slidably matched with isolating valve sealing, to prevent the opening and closing because of isolating valve from causing cavity significantly
Gas leakage.Isolating valve is with extract system collective effect to maintain the process conditions that each chamber needs, and its course of work is mainly,
In film deposition process, the isolating valve is in closed state, controls each extract system so that each room air pressure is maintained corresponding
Process atmospheric pressures after, proceed by particle sputtering, because of the presence of isolating valve, sputtering particle, which cannot be introduced into, closes on chamber, thus can
Avoid frequently washing target, improve production efficiency, while the separation of each chamber can be improved into the system speed of exhaust and keep preferably true
Reciprocal of duty cycle, terminates when all chambers carry out technique, by pneumatic mechanism after making each chamber pressure identical by PLC control extract systems
Isolating valve is opened, subsequent work rest treats that work rest is determined by being sequentially delivered to next chamber positioned at the transport mechanism of cavity bottom
Position reaches after requirement that control isolating valve is closed, and each chamber starts to control vacuum condition, and vacuum reaches to be started immediately after requirement
Correspondence technique.
Compared with prior art, the present invention is in guarantee deposited metal bipolar plates amorphous carbon-film quality and compared with high efficiency
Under the premise of, the quantity of deposited amorphous carbon film negative electrode is greatly reduced, therefore continuous lines cost is greatly lowered；The increase of ion gun
Be conducive to cleaning metal bipolar plate surface and aid in sputter-deposited thin films, can further improve film quality；The design of isolating valve
Not only contribute to maintain the optimal conditions needed for respective technique, and prevent target contamination and then avoid frequently washing target, further carry
High efficiency.The present invention prepares that metal double polar plates amorphous carbon-film production efficiency is high, film quality is good, cost is low, to accelerating to fire
Expect that battery industryization development is significant.
Brief description of the drawings
Fig. 1 is axle geodesic structure schematic diagram of the invention；
Fig. 2 is main structure diagram of the invention；
Fig. 3 is overlooking the structure diagram of the invention；
Fig. 4 is the axle geodesic structure schematic diagram of the work rest of the embodiment of the present invention 1；
Fig. 5 is the main structure diagram of the work rest of the embodiment of the present invention 1；
Fig. 6 is the schematic diagram of the transport mechanism of the embodiment of the present invention 1；
Fig. 7 is the schematic diagram of the transport mechanism of embodiments of the invention 2；
Fig. 8 is the change rail schematic diagram of the transition guide of the present invention；
In figure, 1- cleaning heating chambers, 2- the first filming chambers, the coating chambers of 3- second, 4- subsequent treatment chambers, 5- connects
Continuous line enters fire door, and the sealed doors of 6- first, the sealed doors of 7- second, 8- continuous lines go out fire door, and 9- isolating valves, 10- sputtering targets, 11- is hung
Has a, 12- chassis, 13- work rest guide rails, 14- transmission guide rails, 15- work rest rotating mechanisms, 16- peripheral transfer systems, 17- is clear
Line is washed, 18- peripheral transfer system shutter doors, 19- bottoms little gear, 20- hangers b, 21- exterior thereto guide rail, 22- transition is led
Rail, 23- chamber interior guide rails, 24- bottoms gear wheel, 25- rollers.
Embodiment
The present invention is described in detail with specific embodiment below in conjunction with the accompanying drawings.
Embodiment 1
A kind of sputtering continuous lines that amorphous carbon-film is efficiently plated for fuel battery metal double polar plate, including multichamber system,
Work rest, transmission system, isolating valve, and the conventional knot such as vacuum-control(led) system, electric-control system, sputtering target and vacuum sputtering equipment
Structure, and what it included：
Multichamber system as Figure 1-3, by cleaning heating chamber 1, the first filming chamber 2, the second coating chamber 3 and after
Continuous processing chamber housing 4 is constituted, and fire door 5, the first filming chamber 2, the second coating chamber are entered provided with continuous lines on cleaning heating chamber 1
First sealed door 6 and the second sealed door 7 are set respectively on 3, and subsequent treatment chamber 4 sets continuous lines to go out fire door 8.Isolating valve 9 is set
The transition portion in adjacent two chamber is put, sputtering target 10 is arranged in the coating chamber 3 of the first filming chamber 2 and second, wherein,
Sputtering target 10 can be made up of 1 couple of metal Cr or metal Ti targets in the first filming chamber, and be provided with 1-2 ion gun to aid in
Deposit, sputtering target 10 can be made up of 2 pairs of carbon targets in the second coating chamber, and be again provided with 1-2 ion gun and sunk to aid in
Product.Described continuous lines are additionally provided with peripheral transfer system 16, and cleaning line 17 and peripheral transfer system shutter door 18 are (to ensure workpiece
The smooth entry/exit multichamber system of frame).If a certain chamber (such as the first filming chamber 2) technique breaks down, first can control
The vacuum of chamber individually opens the first sealed door 6, and analysis solves the failure of the first filming chamber 2, after pending fault discharge, closes first
Sealed door 6 simultaneously vacuumizes beginning technique again to the first filming chamber 2, so as to avoid the waste of remaining chamber metal double polar plates from leading
Cause cost increase.
The work rest, as shown in Figure 4,5, by the hanger a11 of placement metal double polar plates, chassis 12, work rest guide rail 13,
The conventional structure such as work rest rotating mechanism 15 and bearing, support bar is constituted.Work rest guide rail 13 is fixed with work rest chassis 12
Together.Work rest rotating mechanism 15 is arranged on the lower section of chassis 12, and in cyclic train structure.The motor at Ge Shi bottom centre
Rotate, drive the center bull gear drive in cyclic train, realize revolution motion of the work rest using chamber central shaft as rotary shaft,
The peripheral little gear concomitant rotation in cyclic train is to realize the spinning motion of metal double polar plates hanger simultaneously, so as to ensure film
The uniformity of deposition.At work rest rotating mechanism 15 equipped with axiality examine sensor, with judge work rest center whether with
Cavity bottom electrode axis is coaxial, and vacuum-pumping and subsequent technique is carried out if coaxial.
Transmission system, as shown in fig. 6, by transmission motor, transmission guide rail 14 constitute, when work rest from cleaning heating chamber 1
When entrance (i.e. continuous lines enter fire door 5) place enters chamber, work rest guide rail 13 is contacted with transmission guide rail 14, and with transmission guide rail
14 transmission, the area that work rest guide rail 13 is contacted with transmission guide rail 14 is more and more, and the two final full contact simultaneously enters chamber
Room, stops transmitting the motion of guide rail 14 after work rest with cavity bottom central motor rotating shaft, treats all chamber processes knots after coaxial
Shu Hou, is moved so that work rest is sent into next chamber, in the process, work rest is relied on certainly by PLC control transmission guide rails 14
Body gravity and its geo-stationary for ensureing work rest and workpiece transmission guide rail with transmitting the stiction of guide rail.
The present invention prepares that fuel battery metal double polar plate is conductive and the course of work of corrosion resistant amorphous carbon coating is briefly retouched
Stating is：By peripheral transfer system 16, enter in continuous lines at fire door 5, the work rest (hanger a11) of metal double polar plates will be hung with
Transmission guide rail 14 top is sent to, with the motion of transmission guide rail 14, work rest is progressed into clearly in the presence of stiction
Wash heating chamber 1 and by PLC and sensor accurate positioning, be then turned off continuous lines and enter fire door 5, control system starts to take out true
Sky, and heating, drying and plasma clean surface film oxide are carried out to metal double polar plates in cleaning heating chamber 1；Work as cleaning
After the technique of heating chamber 1 terminates, chamber is deflated, air pressure is differed between heating chamber 1 to be cleaned and the first filming chamber 2
Less, isolating valve 9 is opened by the pneumatic means of chamber transition portion, after valve 9 to be isolated is opened, opens continuous lines and enter fire door 5,
Entering the new work rest of placement at fire door 5, while drive of the original work rest in cleaning heating chamber 1 in transmission guide rail 14
Lower entrance the first filming chamber 2, enters fire door 5 and isolating valve 9, then after after two equal accurate positionings of work rest, closing continuous lines
System starts to vacuumize again, after each room pressure reaches plated film requirement, and each chamber starts coating process.Treat all chambers
After coating process terminates, repeat to deflate, open continuous lines enter fire door 5 and isolating valve 9, work rest enter furnace chamber and be accurately positioned,
Close continuous lines and enter fire door 5 and isolating valve 9, pumping, the process of plated film, until work rest completes cold in follow-up processing chamber housing 4
But go out fire door 8 from continuous lines after handling to come out of the stove, the metal double polar plates for completing plated film are unloaded into peripheral transfer system 16, and again
The non-plating filmed metals bipolar plates cleaned through over cleaning line are loaded, the entrance of chamber 1 (fire door 5) is then sent to, is to this
One complete cycle of technical process, whole production process is constantly to realize the process of the circulation.
Embodiment 2
Compared with Example 1, in addition to work rest is different from transmission system part, remaining is.The work of the present embodiment
Part frame and transmission system design are as follows：
As shown in Figure 7,8, transmission system is by exterior thereto guide rail 21, rotatable transition guide 22, chamber interior guide rail
23rd, cavity bottom gear wheel 24, (roller 25 can cause hanger b suitable along guide rail to the roller 25 installed in hanger bottom and top
Profit is mobile) and corresponding PLC control system composition.The hanger b20 that work rest is placed in transmission system by being connected with fixed range
Composition.During work, adjacent hanger b20 is cascaded with fixed range, and exterior thereto guide rail 21 and chamber interior guide rail 23 are solid
Fixed motionless, transition guide 22 can a little rotate around fixed with chamber, and its working position is equipped with two kinds, and one kind is state 22-1 in Fig. 8
Shown, now chamber interior guide rail 21, exterior thereto guide rail 23 are connected by transition guide 22, and the hanger b20 of series connection is being passed
Dynamic system, which drives, to be entered twilight orbit 22 and enters chamber interior track 23, and all parts of hanger b to be connected enter the chamber
Afterwards, control transition guide 23 rotates into another location, i.e. Fig. 8 22-2 positions, and now chamber interior guide rail 21, exterior thereto are led
Rail 23 disconnects, and transition guide 22 causes the one complete circular orbit of formation of chamber interior guide rail 21.Hanger b circle distributions are in chamber
Chamber interior, the formation cyclic train of bottom gear wheel 24 of its bottom little gear 19 and chamber, when bottom gear wheel 24 rotates, hanger
B makees revolution motion under the gearing of gear around chamber central axle, and makees spinning motion around its central axis, so as to protect
Card plating film uniformity, improves film quality.
The present invention prepares that fuel battery metal double polar plate is conductive and the course of work of corrosion resistant amorphous carbon coating is briefly retouched
Stating is：The hanger b20 that fixed neighbor distance is connected is sent into continuous lines by peripheral transfer system 16 to enter at fire door 5, controlled
Each transition guide 22 rotates the guide rail between next chamber and connected, and first passes through the hanger b20 that connected in subsequent treatment chamber 4 even
Continuous line goes out fire door 8 and sends out cavity, and hanger of being connected in the second coating chamber 3 then is sent into subsequent treatment chamber 4, to be transmitted
After the completion of the series connection hanger in the first filming chamber 2 is sent in the second coating chamber 3 again, until continuous lines are entered into fire door 5
After place's hanger is sent in cleaning heating chamber 1, guide rail disconnects between rotation transition guide 22 makes each chamber, closes each chamber
Room sealed door and isolating valve 9, control system start to vacuumize, and treat that each Chamber vacuum degree reaches that requirement starts coating process, work
Cavity is deflated after the completion of skill, isolating valve 9 is then turned on, enter fire door 5 and goes out fire door 8, the control connection of transition guide 22 is passed
Track is sent, this is a process cycle, continuous lines production process is the continuous repetition of the circulation.
The above-mentioned description to embodiment is understood that for ease of those skilled in the art and using invention.
Person skilled in the art obviously can easily make various modifications to these embodiments, and described herein general
Principle is applied in other embodiment without passing through performing creative labour.Therefore, the invention is not restricted to above-described embodiment, ability
Field technique personnel are according to the announcement of the present invention, and not departing from improvement and modification that scope made all should be the present invention's
Within protection domain.
Claims (10)
1. one kind is used to prepare fuel battery metal double polar plate amorphous carbon-film magnetron sputtering continuous lines, it is characterised in that including：
Multichamber system：Four chambers overall including being sequentially connected in series and constituting：Clean heating chamber (1), the first filming chamber
(2) it is mutually communicated between, the second coating chamber (3) and subsequent treatment chamber (4), each chamber, wherein, clean heating chamber
(1) it is used to clean and preheat pending metal double polar plates, the first filming chamber (2) and the second coating chamber (3) are used for film
Deposition, subsequent treatment chamber (4) is used to carry out subsequent technique processing to the metal double polar plates after thin film deposition；
Work rest：It is used for the metal double polar plates hanger of the pending metal double polar plates of fixed in position including at least one；
Transmission system：Including the transport mechanism for the work rest being sequentially sent to/being sent out the chamber；
Extract system：Extraction sector including being independently arranged at each chamber, the vacuum for controlling each chamber；
Isolation valve systems to be opened/closed：Be arranged on per the transition portion between adjacent two chambers, and with the cavity seal
Coordinate.
2. it is according to claim 1 a kind of continuous for preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering
Line, it is characterised in that heater and at least one are provided with described cleaning heating chamber (1) to be used to clean metal double polar plates
The ion gun on surface；
At least one ion gun and equally distributed multiple metallic targets are provided with described the first filming chamber (2)；
Described the second coating chamber (3) is built with least one ion gun and equally distributed multiple carbon targets.
3. it is according to claim 2 a kind of continuous for preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering
Line, it is characterised in that the target of described metallic target is Cr or Ti, it is provided with two be symmetrical set；
Described carbon target includes two pairs of amorphous carbon sputtering targets being arranged symmetrically.
4. it is according to claim 1 a kind of continuous for preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering
Line, it is characterised in that described the first filming chamber (2) and the second coating chamber (3) is additionally provided with openable sealed door.
5. it is according to claim 1 a kind of continuous for preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering
Line, it is characterised in that described work rest includes chassis (12), and it is on chassis (12) and uniform along central shaft
Multiple metal double polar plates hangers, are additionally provided with rotating mechanism on the lower surface of chassis (12), and the rotating mechanism is by fixed outer
The cyclic train structure on tooth side, center gear wheel and multiple peripheral little gear compositions, wherein, the center gear wheel and chassis
(12) central axis matching, one metal double polar plates hanger of each periphery little gear and corresponding connection, and drive metal double
Pole plate hanger is additionally provided with the work rest guide rail (13) moved along transport mechanism with peripheral little gear rotation in fixed peripheral skirt.
6. it is according to claim 5 a kind of continuous for preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering
Line, it is characterised in that described transport mechanism is arranged on the bottom of each chamber, including ECU, transmission motor, and by passing
The transmission guide rail (14) that power transmission machine drives, described work rest is placed on transmission guide rail (14), and is moved with transmission guide rail (14)
It is dynamic；
The bottom centre position of each chamber be additionally provided with one be used for contact drive the electric rotating machine of the center gear wheel,
It is additionally provided with electric rotating machine for axiality detection sensor.
7. it is according to claim 1 a kind of continuous for preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering
Line, it is characterised in that described transport mechanism includes transmission guide rail (14), and drives the work rest along transmission guide rail (14)
The power unit of entry/exit chamber, described transmission guide rail (14) is included with breach and chamber interior guide rail (23) annular in shape, chamber
Outdoor guide rail (21), and make metal double polar plates hanger along transmission guide rail (14) direction in chamber interior guide rail (23) and chamber
The transition guide (22) shifted between outer rail (21), wherein, transition guide (22) is rotatablely installed the breach of guide rail indoors
Place, and have two kinds of operating positions：One kind is turns to just connection chamber interior guide rail (23) and exterior thereto guide rail (21), separately
One kind for disconnect with the connection of exterior thereto guide rail (21), and be connected with chamber interior guide rail (23) and to be combined into complete annular and lead
Rail.
8. it is according to claim 7 a kind of continuous for preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering
Line, it is characterised in that the bottom gear wheel (24) positioned at ring-shaped guide rail center can also be set in the bottom of each chamber,
The bottom little gear (19) being engaged with the bottom gear wheel (24) is additionally provided with the bottom of each metal double polar plates hanger；
When in metal double polar plates hanger feeding chamber, bottom gear wheel (24) rotation, metal double polar plates hanger is driven along ring
Shape guide rail revolves round the sun, while around its central axis rotation.
9. it is according to claim 1 a kind of continuous for preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering
Line, it is characterised in that described isolation valve systems include isolating valve (9), pneumatic mechanism, electric-control system and vacuum chamber pressure and passed
Sensor, wherein, described isolating valve (9) is arranged on the transition portion of adjacent chamber, is additionally provided with transition part office along height side
To chute, described isolating valve (9) is slidably matched with chute sealing, the drive link and the isolating valve of described pneumatic mechanism
(9) connect, and drive it to be slided up and down along chute, to realize opening and closing, described pneumatic mechanism and vacuum chamber pressure sensor
Also it is connected with electric-control system.
10. it is according to claim 1 a kind of continuous for preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering
Line, it is characterised in that described continuous lines also include the peripheral transfer system for work rest being sent into/being sent out multichamber system
(16)。
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| CN201610984083.1A CN107058947B (en) | 2016-11-09 | 2016-11-09 | It is used to prepare fuel battery metal double polar plate amorphous carbon-film magnetron sputtering continuous lines |
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| CN201610984083.1A CN107058947B (en) | 2016-11-09 | 2016-11-09 | It is used to prepare fuel battery metal double polar plate amorphous carbon-film magnetron sputtering continuous lines |
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| CN107779835A (en) * | 2017-12-05 | 2018-03-09 | 江西金力永磁科技股份有限公司 | A kind of method of continous way magnetic control sputtering device and continous way magnetron sputtering |
| CN108411283A (en) * | 2018-02-09 | 2018-08-17 | 中南大学 | A kind of preparation method of metallic matrix/nonmetal basal body carbon composite coating or carbon conductive composite coating |
| CN109576660A (en) * | 2019-01-16 | 2019-04-05 | 北京奥普科星技术有限公司 | Steel pipe continuous sputtering coating machine |
| CN110055507A (en) * | 2019-05-06 | 2019-07-26 | 成都精密光学工程研究中心 | A kind of low defect Multicarity coating apparatus based on multiparticle deposition |
| CN110079778A (en) * | 2019-05-06 | 2019-08-02 | 成都精密光学工程研究中心 | Low defect method for manufacturing thin film and its product |
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| CN107779835A (en) * | 2017-12-05 | 2018-03-09 | 江西金力永磁科技股份有限公司 | A kind of method of continous way magnetic control sputtering device and continous way magnetron sputtering |
| CN108411283A (en) * | 2018-02-09 | 2018-08-17 | 中南大学 | A kind of preparation method of metallic matrix/nonmetal basal body carbon composite coating or carbon conductive composite coating |
| CN109576660A (en) * | 2019-01-16 | 2019-04-05 | 北京奥普科星技术有限公司 | Steel pipe continuous sputtering coating machine |
| CN110055507A (en) * | 2019-05-06 | 2019-07-26 | 成都精密光学工程研究中心 | A kind of low defect Multicarity coating apparatus based on multiparticle deposition |
| CN110079778A (en) * | 2019-05-06 | 2019-08-02 | 成都精密光学工程研究中心 | Low defect method for manufacturing thin film and its product |
| CN112458424A (en) * | 2020-11-09 | 2021-03-09 | 湘潭宏大真空技术股份有限公司 | Pretreatment chamber for double-chamber magnetic control film plating machine |
| CN115287621A (en) * | 2022-08-10 | 2022-11-04 | 圣思科技(廊坊)有限公司 | Automatic transmission structure applied to functional coating vacuum coating equipment |
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| CN115181938A (en) * | 2022-09-13 | 2022-10-14 | 东晶电子金华有限公司 | Film coating equipment, film coating method of wafer and wafer |
| CN115976480A (en) * | 2022-12-21 | 2023-04-18 | 江苏盆晶科技有限公司 | Intelligent processing method and system for metal bipolar plate coating |
| CN115976480B (en) * | 2022-12-21 | 2024-05-28 | 江苏盆晶科技有限公司 | Intelligent processing method and system for metal bipolar plate coating |
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