CN203270025U - Vacuum film coating machine - Google Patents
Vacuum film coating machine Download PDFInfo
- Publication number
- CN203270025U CN203270025U CN 201220724639 CN201220724639U CN203270025U CN 203270025 U CN203270025 U CN 203270025U CN 201220724639 CN201220724639 CN 201220724639 CN 201220724639 U CN201220724639 U CN 201220724639U CN 203270025 U CN203270025 U CN 203270025U
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- China
- Prior art keywords
- vacuum
- chamber
- film coating
- plated film
- cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000009504 vacuum film coating Methods 0.000 title abstract 3
- 230000007704 transition Effects 0.000 claims abstract description 27
- 238000004544 sputter deposition Methods 0.000 claims abstract description 20
- 238000000926 separation method Methods 0.000 claims abstract description 19
- 238000007747 plating Methods 0.000 claims description 24
- 238000009413 insulation Methods 0.000 claims description 6
- 238000010891 electric arc Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 4
- 238000004140 cleaning Methods 0.000 abstract description 3
- 238000005086 pumping Methods 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 239000007888 film coating Substances 0.000 abstract 6
- 238000009501 film coating Methods 0.000 abstract 6
- 239000000463 material Substances 0.000 abstract 2
- 230000002411 adverse Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 238000007599 discharging Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000003434 inspiratory effect Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000005226 mechanical processes and functions Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a vacuum film coating machine, which comprises at least a film coating chamber and at least a transition chamber, wherein the film coating chamber and the transition chamber are communicated through a vacuum separation valve. According to the utility model, the vacuum separation valve is adopted to separate the two transition chambers and the film coating chamber, such that a high vacuum state in the vacuum film coating chamber can be always maintained; workpiece assembly and disassembly, pre-vacuum pumping, heating, plasma cleaning and other processes are completed in the transition chamber, and the two transition chambers alternately perform material feeding and material discharge, such that the film coating chamber always maintains the film coating state, expensive components such as a sputtering power supply, a sputtering source and the like are always in working conditions, and equipment utilization rates are substantially increased; and the high vacuum is always maintained in the film coating chamber, such that influence of a vacuum degree, a gas suction amount and other adverse effects on quality and stability of the coated film are eliminated.
Description
Technical field
The utility model relates to technical field of vacuum plating, relates in particular to a kind of vacuum plating unit.
Background technology
Vacuum plating unit mainly refers to the plated film that a class need to be carried out under higher vacuum, specifically comprise many types, comprises the vacuum ionic evaporation, magnetron sputtering, and the MBE molecular beam epitaxy, PLD pulsed laser depositions etc. are a variety of.Main thought is to be divided into evaporation and two kinds of sputters.At present, commonly used ion beam coating equipment, especially five metals ion beam coating equipment are all to adopt single vacuum cavity, and sputtering source is set in cavity, through bleeding → plated film → three of venting step carries out vacuum plating.Each charging, discharging are all opened the chamber door and are operated, and the whole most of the time in cycle is used in and bleeds, pre-treatment, cooling, these processes of lifting workpiece, and the utilization ratio of equipment is very low.Each circulating vacuum cavity of this operating process will expose atmosphere, target contacts the oxidation that will cause target with atmosphere, cavity can adsorb a large amount of water vapour and other foreign gas, will reduce coating quality and stability like this, and it is unfavorable that in enormous quantities and high standard production are brought; Meeting loose or dislocation after the insecure rete planar water steam that is coated with in cavity simultaneously, dust drops and can bring a large amount of defective productss on workpiece.These technical problems also do not have in the industry preferably, and technical scheme is solved.
The utility model content
The technical problems to be solved in the utility model is, a kind of vacuum plating unit is provided, and this vacuum plating unit production efficiency is high, target is difficult for oxidized, coating quality and stablizes good.
For solving the problems of the technologies described above, the utility model provides a kind of vacuum plating unit, comprising: at least one plated film chamber and at least one adapter cavity are communicated with by vacuum separation valve between described plated film chamber and described adapter cavity.
Preferred technical scheme is, the both sides in a described plated film chamber are communicated with First Transition chamber and the second adapter cavity by vacuum separation valve respectively.Described plated film chamber comprises at least one sputtering source.Described sputtering source includes controlled sputtering source or electric arc sputtering source.
Further preferred technical scheme is all to be provided with at least a work rest in described plated film chamber and described adapter cavity.Described work rest is that lower bearing mode insulation is fixed on a removable supporting plate.Described supporting plate is provided with the structure that can move between the cavity of adjacent described plated film chamber and described adapter cavity.Be provided with the push rod that can move up and down and rotate in the cavity of described plated film chamber and described adapter cavity.Described push rod and the insulation of described cavity.Described push rod positions and drives described work rest rotation to described work rest.
The utility model is kept apart two adapter cavities and plated film chamber owing to adopting by vacuum separation valve, and assurance vacuum plating keeps high vacuum state in the chamber always.The operations such as work-handling, forvacuum, heating, Ion Cleaning all will be completed at adapter cavity, due to two adapter cavities hocket charging and discharging work being arranged, the plated film chamber will remain the plated film state, these parts that involve great expense of shielding power supply and sputtering source are in working order all the time like this, have improved greatly the utilization ratio of equipment.Simultaneously, vacuum plating remains high vacuum in the chamber, has stopped the unfavorable factors such as vacuum tightness and inspiratory capacity to the impact of coating quality and stability.
Description of drawings
Fig. 1 is the schematic diagram of a kind of vacuum plating unit cross section of the utility model;
In figure: 1. First Transition chamber pumping mouth, 2. adapter cavity, 3. the first filming chamber pumping mouth, 4. plated film chamber, 5. the second vacuum separation valve, 6. the second adapter cavity, 7. the second adapter cavity, 8. work rest, 9. the second adapter cavity door, 10. controlled sputtering source, 11. electric arc sputtering sources, 12. the first vacuum separation valve, 13 First Transition chamber doors.
Embodiment
Below in conjunction with accompanying drawing, preferred implementation of the present utility model is elaborated.
As shown in Figure 1, a kind of vacuum plating unit of the utility model comprises: First Transition chamber (2), plated film chamber (4), the second (7) three of adapter cavities vacuum cavity, wherein the first vacuum separation valve (12) is kept apart First Transition chamber (2) and plated film chamber (4); The second vacuum separation valve (5) is kept apart plated film chamber (4) and the second adapter cavity (7), thereby can form three independently vacuum cavities.
In First Transition chamber (2), plated film chamber (4), the second adapter cavity all is equipped with several controlled sputtering sources in (7), can carry out according to different processing requirements sputter coating in each cavity.Be provided with several electric arc sputtering sources (11) in plated film chamber (4), available controlled sputtering source (10) and electric arc sputtering source (11) are simultaneously or successively carry out sputter coating in the plated film chamber, can be coated with different targets different retes or alloy film, thereby satisfy the plated film demand of more requirements.
Wherein, work rest (8) adopts lower bearing mode, is fixed on one movably on supporting plate, and with the supporting plate insulation, the supporting plate whole work rest of carrying (8) moves in adjacent cavity.
The push rod that can move up and down and rotate is housed on each cavity, and push rod and cavity insulation are positioned work rest (8) by push rod, drive simultaneously work rest (8) rotation, and with power supply and work rest (8) conducting.
Can be according to the difference of processing requirement in actual mechanical process, a plurality of adapter cavities and a plurality of plated films chambeies are set.
The working process of a kind of vacuum plating unit of the utility model is:
1. install workpiece to be plated on the work rest (8) in First Transition chamber (2), shut First Transition chamber door (13), bled in First Transition chamber (2), simultaneously the workpiece in First Transition chamber (2) is heated and Ion Cleaning and various pre-treatment.
2. treat that the workpiece in First Transition chamber (2) finishes dealing with, open the first vacuum separation valve (12), work rest (8) in First Transition chamber (2) is transported to the plated film chamber and closes the first vacuum separation valve (12), plated film is carried out in preparation, and First Transition chamber (2) enter loitering phase simultaneously.
3. the vacuum tightness in plated film chamber (4) reaches the workpiece that begins when necessarily requiring in plated film chamber (4) and carries out coating film treatment.
In plated film chamber (4) when plated film is worked, the work rest (8) in the second adapter cavity (7) also installs workpiece to be plated, equally completes the preparation work of workpiece plated film with First Transition chamber (2).
5. chamber to be coated (4) open the first vacuum separation valve (12) after completing plated film work, and the work rest (8) in plated film chamber (4) is transported to First Transition chamber (2), close the first vacuum separation valve (12).Workpiece plated film in First Transition chamber (2) is completed, and waits for discharging.
6. the workpiece in the second adapter cavity this moment (7) has been completed preliminary preparation, open the second vacuum separation valve (5), work rest (8) in the second adapter cavity (7) is transported to the plated film chamber and closes the second vacuum separation valve (5), plated film is carried out in preparation, and the second adapter cavity (7) enters loitering phase simultaneously.
7. to First Transition chamber (2) vacuum breaker, take out the good workpiece of plating, reload workpiece to be plated, repeating step 1 is completed the working cycle in First Transition chamber (2).
8. repeating step 3, complete coating film treatment for the second time.
9. chamber to be coated (4) open the second vacuum separation valve (5) after completing plated film work, and the work rest (8) in plated film chamber (4) is transported to the second adapter cavity (7), close the second vacuum separation valve (5).Workpiece plated film in adapter cavity (7) is completed, and waits for discharging.
10. plated film this moment chamber begins again to complete the plated film for the second time in First Transition chamber (2).And the single cycle of the second adapter cavity is completed in the action in First Transition chamber (2) in the second adapter cavity (7) repeating step 7, prepares to enter next circulation.
So ceaselessly carry out the alternation of First Transition chamber and the second adapter cavity, remain that plated film chamber (4) is in best plated film state, working efficiency also can be higher.
Need to prove at last; the above is only preferred embodiment of the present utility model; rather than to the restriction of technical solutions of the utility model, any the utility model technical characterictic being equal to of doing replaced or corresponding improvement, still within protection domain of the present utility model.
Claims (10)
1. vacuum plating unit, comprising: at least one plated film chamber and at least one adapter cavity is characterized in that: be communicated with by vacuum separation valve between described plated film chamber and described adapter cavity.
2. a kind of vacuum plating unit as claimed in claim 1, is characterized in that, the both sides in a described plated film chamber are communicated with First Transition chamber and the second adapter cavity by vacuum separation valve respectively.
3. a kind of vacuum plating unit as claimed in claim 1 or 2, is characterized in that, described plated film chamber comprises at least one sputtering source.
4. a kind of vacuum plating unit as claimed in claim 3, is characterized in that, described sputtering source comprises controlled sputtering source or electric arc sputtering source.
5. a kind of vacuum plating unit as claimed in claim 1 or 2, is characterized in that, all is provided with at least a work rest in described plated film chamber and described adapter cavity.
6. a kind of vacuum plating unit as claimed in claim 5, is characterized in that, described work rest is that the insulation of lower bearing mode is fixed on one movably on supporting plate.
7. a kind of vacuum plating unit as claimed in claim 6, is characterized in that, described supporting plate is provided with the structure that can move between the cavity of adjacent described plated film chamber and described adapter cavity.
8. a kind of vacuum plating unit as claimed in claim 1 or 2, is characterized in that, is provided with the push rod that can move up and down and rotate in the cavity of described plated film chamber and described adapter cavity.
9. a kind of vacuum plating unit as claimed in claim 8, is characterized in that, described push rod and the insulation of described cavity.
10. a kind of vacuum plating unit as claimed in claim 8, is characterized in that, described push rod positions and drive the work rest rotation to work rest.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220724639 CN203270025U (en) | 2012-12-25 | 2012-12-25 | Vacuum film coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220724639 CN203270025U (en) | 2012-12-25 | 2012-12-25 | Vacuum film coating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203270025U true CN203270025U (en) | 2013-11-06 |
Family
ID=49500473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220724639 Expired - Fee Related CN203270025U (en) | 2012-12-25 | 2012-12-25 | Vacuum film coating machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203270025U (en) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105112881A (en) * | 2015-09-15 | 2015-12-02 | 苏州普京真空技术有限公司 | Vacuum coating system |
| CN106191787A (en) * | 2016-09-20 | 2016-12-07 | 深圳市东丽华科技有限公司 | The resistance-type evaporation coating machine of a kind of many vacuum chambers and operational approach thereof |
| CN107058947A (en) * | 2016-11-09 | 2017-08-18 | 上海交通大学 | For preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering continuous lines |
| CN107447196A (en) * | 2017-06-27 | 2017-12-08 | 樊召 | A kind of film plating process based on composite evacuated coating machine |
| CN108070841A (en) * | 2016-11-11 | 2018-05-25 | 无锡威迪变色玻璃有限公司 | Continuous coating system and method |
| CN109402596A (en) * | 2018-10-29 | 2019-03-01 | 厦门建霖健康家居股份有限公司 | A kind of colorful coating system of continuous type vacuum |
| CN110273133A (en) * | 2019-07-26 | 2019-09-24 | 西安拉姆达电子科技有限公司 | A kind of magnetron sputtering coater being exclusively used in chip plated film |
| CN111286705A (en) * | 2018-12-06 | 2020-06-16 | 北京华业阳光新能源有限公司 | Double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment |
| CN112281135A (en) * | 2020-11-04 | 2021-01-29 | 江苏菲沃泰纳米科技有限公司 | Continuous coating equipment and continuous coating method |
| CN112281134A (en) * | 2020-10-30 | 2021-01-29 | 湘潭宏大真空技术股份有限公司 | Double-chamber high-efficiency film coating machine |
| CN112458425A (en) * | 2020-10-30 | 2021-03-09 | 湘潭宏大真空技术股份有限公司 | Three-chamber film coating machine applied to narrow space |
| CN112626485A (en) * | 2020-12-31 | 2021-04-09 | 广东谛思纳为新材料科技有限公司 | PVD (physical vapor deposition) continuous coating equipment and coating method |
| CN114107948A (en) * | 2020-08-28 | 2022-03-01 | 昆山微电子技术研究院 | Atomic layer deposition equipment |
| CN117512533A (en) * | 2024-01-05 | 2024-02-06 | 无锡嘉森光学科技有限公司 | Vacuum coating equipment |
-
2012
- 2012-12-25 CN CN 201220724639 patent/CN203270025U/en not_active Expired - Fee Related
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105112881A (en) * | 2015-09-15 | 2015-12-02 | 苏州普京真空技术有限公司 | Vacuum coating system |
| CN106191787A (en) * | 2016-09-20 | 2016-12-07 | 深圳市东丽华科技有限公司 | The resistance-type evaporation coating machine of a kind of many vacuum chambers and operational approach thereof |
| CN106191787B (en) * | 2016-09-20 | 2019-04-05 | 深圳市力沣实业有限公司 | A kind of the resistance-type evaporation coating machine and its operating method of more vacuum chambers |
| CN107058947A (en) * | 2016-11-09 | 2017-08-18 | 上海交通大学 | For preparing fuel battery metal double polar plate amorphous carbon-film magnetron sputtering continuous lines |
| CN107058947B (en) * | 2016-11-09 | 2019-04-02 | 上海交通大学 | It is used to prepare fuel battery metal double polar plate amorphous carbon-film magnetron sputtering continuous lines |
| CN108070841A (en) * | 2016-11-11 | 2018-05-25 | 无锡威迪变色玻璃有限公司 | Continuous coating system and method |
| CN107447196A (en) * | 2017-06-27 | 2017-12-08 | 樊召 | A kind of film plating process based on composite evacuated coating machine |
| CN109402596A (en) * | 2018-10-29 | 2019-03-01 | 厦门建霖健康家居股份有限公司 | A kind of colorful coating system of continuous type vacuum |
| CN111286705B (en) * | 2018-12-06 | 2024-05-03 | 北京华业阳光新能源有限公司 | Double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment |
| CN111286705A (en) * | 2018-12-06 | 2020-06-16 | 北京华业阳光新能源有限公司 | Double-chamber three-station multi-target co-sputtering magnetron sputtering coating equipment |
| CN110273133A (en) * | 2019-07-26 | 2019-09-24 | 西安拉姆达电子科技有限公司 | A kind of magnetron sputtering coater being exclusively used in chip plated film |
| CN114107948A (en) * | 2020-08-28 | 2022-03-01 | 昆山微电子技术研究院 | Atomic layer deposition equipment |
| CN112281134A (en) * | 2020-10-30 | 2021-01-29 | 湘潭宏大真空技术股份有限公司 | Double-chamber high-efficiency film coating machine |
| CN112458425A (en) * | 2020-10-30 | 2021-03-09 | 湘潭宏大真空技术股份有限公司 | Three-chamber film coating machine applied to narrow space |
| CN112281135A (en) * | 2020-11-04 | 2021-01-29 | 江苏菲沃泰纳米科技有限公司 | Continuous coating equipment and continuous coating method |
| CN112626485A (en) * | 2020-12-31 | 2021-04-09 | 广东谛思纳为新材料科技有限公司 | PVD (physical vapor deposition) continuous coating equipment and coating method |
| CN117512533A (en) * | 2024-01-05 | 2024-02-06 | 无锡嘉森光学科技有限公司 | Vacuum coating equipment |
| CN117512533B (en) * | 2024-01-05 | 2024-03-19 | 无锡嘉森光学科技有限公司 | Vacuum coating equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SHENZHEN DEBANG VACUUM TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: HUANG YUCHUN Effective date: 20140703 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 441604 XIANGFAN, HUBEI PROVINCE TO: 518105 SHENZHEN, GUANGDONG PROVINCE |
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| TR01 | Transfer of patent right |
Effective date of registration: 20140703 Address after: 518105, 11 Industrial Zone, Sha Pu Wai, Songgang Town, Shenzhen, Guangdong, Baoan District Patentee after: Shenzhen Kingdom Vacuum Technology Co., Ltd. Address before: 441604 Baokang County of Hubei Province town Dahong Temple Street No. 4 Patentee before: Huang Yuchun |
|
| C56 | Change in the name or address of the patentee | ||
| CP02 | Change in the address of a patent holder |
Address after: 518105, 11 Industrial Zone, Sha Pu Wai, Songgang Town, Shenzhen, Guangdong, Baoan District Patentee after: Shenzhen Kingdom Vacuum Technology Co., Ltd. Address before: 518105, 11 Industrial Zone, Sha Pu Wai, Songgang Town, Shenzhen, Guangdong, Baoan District Patentee before: Shenzhen Kingdom Vacuum Technology Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131106 Termination date: 20151225 |
|
| EXPY | Termination of patent right or utility model |