CN109402596A - A kind of colorful coating system of continuous type vacuum - Google Patents
A kind of colorful coating system of continuous type vacuum Download PDFInfo
- Publication number
- CN109402596A CN109402596A CN201811269528.3A CN201811269528A CN109402596A CN 109402596 A CN109402596 A CN 109402596A CN 201811269528 A CN201811269528 A CN 201811269528A CN 109402596 A CN109402596 A CN 109402596A
- Authority
- CN
- China
- Prior art keywords
- vacuum
- cavity
- continuous type
- coating system
- plated film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 18
- 238000000576 coating method Methods 0.000 title claims abstract description 18
- KRQUFUKTQHISJB-YYADALCUSA-N 2-[(E)-N-[2-(4-chlorophenoxy)propoxy]-C-propylcarbonimidoyl]-3-hydroxy-5-(thian-3-yl)cyclohex-2-en-1-one Chemical compound CCC\C(=N/OCC(C)OC1=CC=C(Cl)C=C1)C1=C(O)CC(CC1=O)C1CCCSC1 KRQUFUKTQHISJB-YYADALCUSA-N 0.000 claims abstract description 12
- 238000004544 sputter deposition Methods 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims abstract description 11
- 238000007599 discharging Methods 0.000 claims abstract description 8
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000004140 cleaning Methods 0.000 claims abstract description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 5
- 238000005240 physical vapour deposition Methods 0.000 claims abstract description 4
- 238000007872 degassing Methods 0.000 claims abstract description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims abstract description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 21
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 6
- 238000013461 design Methods 0.000 claims description 5
- 239000000523 sample Substances 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- 230000005619 thermoelectricity Effects 0.000 claims 1
- 230000002708 enhancing effect Effects 0.000 abstract description 2
- 239000000178 monomer Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 208000002925 dental caries Diseases 0.000 description 2
- 230000007717 exclusion Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000003032 molecular docking Methods 0.000 description 1
- 210000002445 nipple Anatomy 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Abstract
The invention discloses a kind of colorful coating systems of continuous type vacuum, it includes cleaning vacuum cavity by the charging aura of continuous connection, mid frequency sputtering plated film vacuum cavity and discharging vacuum cavity, charging aura cleaning vacuum cavity can be used for obtaining 1.0E-3 order of magnitude vacuum degree, carry out aura degasification, it is sensitized metal surface, the binding force for enhancing film layer and coated surface is ready；Mid frequency sputtering plated film vacuum cavity carries out plated film work, it keeps 1Pa following pressures, and base vacuum 0.003Pa is arranged, and injects workpiece surface conductive layer with high-energy metallic, then it is passed through a certain proportion of nitrogen, acetylene on this basis, obtains colour PVD film layer；Discharging vacuum cavity is in making the holding of mid frequency sputtering plated film vacuum cavity for changing material and completely cutting off atmosphere while high vacuum.
Description
Technical field
The present invention relates to plated film fields, are specially related to a kind of colorful coating system of continuous type vacuum.
Background technique
Existing monomer equips contact and exclusion mark condition atmospheric pressure environment that need be constantly reciprocal, because housing surface was producing
In journey and product is coated with the film layer of Nano grade simultaneously, this makes furnace wall that can adsorb a large amount of polarity when contacting atmosphere
And active gas (such as H2O, O2 etc.), when obtaining high vacuum again, the release of these gas slowlies reduces vacuum acquirement speed
Degree, and plasma chemical reaction is participated in, cause membranous layer binding force to decline, brightness is always in reduced levels.
Summary of the invention
In order to solve the above-mentioned technical problem, the purpose of the present invention is to provide a kind of colorful coating systems of continuous type vacuum.
The present invention is achieved through the following technical solutions: a kind of colorful coating system of continuous type vacuum, is had continuous
Three cavitys: cavity 1 can be used for obtaining -3 order of magnitude vacuum degrees, carry out aura degasification, be sensitized metal surface, for enhancing film layer with
The binding force of coated surface is ready；Cavity 2 carries out plated film work, keeps 1Pa following pressures, and base vacuum is arranged
0.003Pa, with high-energy metallic inject workpiece surface conductive layer, be then passed through on this basis a certain proportion of nitrogen,
Acetylene obtains colour PVD film layer；Cavity 3 is in making the holding of cavity 2 for changing material and completely cutting off atmosphere while high vacuum.
The invention has the following beneficial effects: present invention PVD plated film equipment more colorful than traditional monomer possess it is purer
Vacuum component, turret system pass through special designing, can revolve and simultaneously rotation so that each surface of product can be uniform
Obtain colorful film layer.In addition the logistics gate valve of autonomous Design, the technical bottleneck before getting rid of possess smaller than flap valve
Activity volume, bigger bore, simpler structure, more stable output.In conjunction with big pumping speed, the configuration design that pipe nipple is clapped will
So that New-generation vacuum equipment efficiency is significantly promoted.
Detailed description of the invention
It, below will be to required in embodiment or description of the prior art in order to illustrate more clearly of technical solution of the present invention
The attached drawing used is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, right
For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings
Its attached drawing.
Fig. 1 is main view of the invention.
Fig. 2 is top view of the invention.
1- feeds aura and cleans vacuum cavity in figure；2- mid frequency sputtering plated film vacuum cavity；3- discharging vacuum cavity；4- dress
Standby host frame；5- dry roughing pump；6- lobe pump；7- transporting rectangle gate valve；8- pivoted frame transmission system；9- vacuum line；
10- throttle valve；11- high vacuum gate valve；12- molecular pump；13- high vacuum right-angle baffle valve；14- observation window；15- manual work
Door；16- mid frequency sputtering system；17- aura cleaning system.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, carries out to the technical solution in inventive embodiments clear, complete
Ground description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Based on this
The embodiment of invention, those of ordinary skill in the art's every other reality obtained without making creative work
Example is applied, shall fall within the protection scope of the present invention.
Reference book attached drawing 1-2, the colorful coating system of continuous type vacuum are arranged using 3 cavity continuous types:
Wherein cavity 1 is that charging aura cleans vacuum cavity, for completely cutting off atmosphere and keeping the cavity 2 of vacuum state,
It is also equipped with the function of alternating current aura, can be used for restoring the natural oxide film of workpiece surface metal conducting layer.Its course of work
Are as follows: step 1 obtains vacuum 0.005Pa, process 240s；Step 2 making alive 2000V, inputs 50% Ar, and flow is
1000sccm, air pressure 3Pa, throttle valve are set as 0 °, pitch time 180s, frequency 25Hz；Step 3 transmits material to cavity
2, process 40s；Step 4 fills filtered atmosphere, process 20s.
Cavity 2 is mid frequency sputtering plated film vacuum cavity, obtains 0.005Pa vacuum degree in the early stage and 100 DEG C are heated 30 points
Middle high vacuum state is just always maintained at after clock, and at this time according to vacuum fluid characteristic, mainly minimal amount of H2, CO2 in atmosphere,
N2, and release rate equivalent is less than or equal to molecular pump itself leak rate, is influenced which forms quite pure and stabilization, not by the external world
Plated film vacuum environment can obtain 80 DEG C or less ambient operating temperatures in conjunction with multi-arc ion coating and mid frequency sputtering plated film
High brightness film layer, reach monomer and equip 150 DEG C and heat film layer brightness (the L value > for preparing using metal base as substrate for 30 minutes
80) horizontal.Its specific work process are as follows: step 1 is to restore vacuum 0.003Pa, process 30s；Step 2 is the power of Zr target
20 kilowatts are set as, inputs argon gas, flow 100sccm, bias: 200V, 50%, throttle angle is 90 °, and pitch time is
90s, frequency 35Hz；Step 3 is to restore vacuum 0.003Pa, process 30s；Step 4 is that the power of Zr target is set as 32 kilowatts,
Input argon gas, gas flow N2:50-150sccm, C2H2:50-150sccm bias: 80V, 50%, throttle angle is
90 °, pitch time 90s, frequency 35Hz；Step 5 is to transmit material to cavity 3, process 40s.
Cavity 3 is discharging vacuum cavity, is dedicated as opening isolated from atmosphere, therefore be equipped with big pumping speed pump group and leave for
Longer pumpdown time.Its specific work process are as follows: step 1 obtains vacuum 0.005Pa, process 200s；Step 2 is filled
Filtered atmosphere, process 20s；Step 3 is to transmit material to outside track, process 40s.
It carries out using independent research transmission high vacuum gate valve when material transferring between cavity, designs leak rate
1.0x10-5mbar l/s is used to replace traditional flap valve, and thickness foreshortens to 180mm, leak rate by the 400mm of flap valve scheme
An order of magnitude is reduced, such mechanism greatly reduces the design difficulty of pivoted frame, it is only necessary to gravity support, without
It wants to move docking orbit necessary to flap valve, while also reducing cancel closedown probability.
3 cavitys also have KF25 interface for connecting KF25 four-way pipe, when four-way pipe is connected on cavity, excess-three
A port is separately connected thermal resistance and regulates thermo cathode ionization vacuum gauge and temperature-sensing probe；KF25 bayonet connection is used, this can be reduced
Cavity difficulty of processing saves furnace roof component occupied space, facilitates cabling, is convenient for management service.
The preferred embodiment of the present invention has shown and described in above description, as previously described, it should be understood that the present invention is not office
Be limited to form disclosed herein, should not be regarded as an exclusion of other examples, and can be used for various other combinations, modification and
Environment, and can be changed within that scope of the inventive concept describe herein by the above teachings or related fields of technology or knowledge
It is dynamic.And changes and modifications made by those skilled in the art do not depart from the spirit and scope of the present invention, then it all should be appended by the present invention
In scope of protection of the claims.
Claims (9)
1. a kind of colorful coating system of continuous type vacuum, including charging aura cleaning vacuum cavity (1), mid frequency sputtering plated film vacuum
Cavity (2) and discharging vacuum cavity (3), which is characterized in that by cleaning vacuum cavity (1) by the continuous connection charging aura,
Mid frequency sputtering plated film vacuum cavity (2) and discharging vacuum cavity (3) form the colorful coating system of continuous type vacuum.
2. the colorful coating system of continuous type vacuum according to claim 1, which is characterized in that the charging aura cleaning is true
Cavity body (1) carries out aura degasification, is sensitized metal surface for obtaining -3 order of magnitude vacuum degrees.
3. the colorful coating system of continuous type vacuum according to claim 1, which is characterized in that the mid frequency sputtering plated film is true
Cavity body (2) keeps 1Pa following pressures, and base vacuum 0.003Pa is arranged, with high-energy gold for carrying out plated film work
Belong to particle and inject workpiece surface conductive layer, be then passed through a certain proportion of nitrogen and acetylene on this basis, obtains colour PVD film
Layer.
4. the colorful coating system of continuous type vacuum according to claim 1, which is characterized in that the discharging vacuum cavity
(3) it is used to change material while high vacuum in making mid frequency sputtering plated film vacuum cavity (2) holding and completely cuts off atmosphere.
5. the colorful coating system of continuous type vacuum according to claim 1, which is characterized in that the charging aura cleaning is true
The course of work of cavity body (1) are as follows:
Step 1 obtains vacuum 0.005Pa, process time 240s；
Step 2 making alive 2000V inputs 50% Ar, flow 1000sccm, air pressure 3Pa, and throttle angle is 0 °, section
The bat time is 180s, frequency 25Hz；
Step 3 transmits material to cavity 2, process 40s；Step 4 fills filtered atmosphere, process 20s.
6. the colorful coating system of continuous type vacuum according to claim 1, which is characterized in that the mid frequency sputtering plated film is true
The course of work of cavity body (2) are as follows:
Step 1 is to restore vacuum 0.003Pa, process 30s；
Step 2 is that the power of Zr target is set as 20 kilowatts, inputs argon gas, flow 100sccm, bias: 200V, 50%, throttle valve
Angle is 90 °, pitch time 90s, frequency 35Hz；
Step 3 is to restore vacuum 0.003Pa, process 30s；
Step 4 is that the power of Zr target is set as 32 kilowatts, inputs argon gas, gas flow N2:50-150sccm, C2H2:50-
150sccm bias: 80V, 50%, throttle angle is 90 °, pitch time 90s, frequency 35Hz；
Step 5 is to transmit material to cavity 3, process 40s.
7. the colorful coating system of continuous type vacuum according to claim 1, which is characterized in that the discharging vacuum cavity
(3) the course of work are as follows:
Step 1 obtains vacuum 0.005Pa, process 200s；
Step 2 fills filtered atmosphere, process 20s；
Step 3 is to transmit material to outside track, process 40s.
8. the colorful coating system of continuous type vacuum according to claim 1, which is characterized in that existed using high vacuum gate valve
Material transferring is carried out between the cavity, design leak rate is 1.0x10-5mbar l/s, with a thickness of 180mm.
9. the colorful coating system of continuous type vacuum according to claim 1, which is characterized in that the cavity also has KF25
Interface is due to connecting four-way pipe, and when four-way pipe is connected on cavity, its excess-three port of the four-way pipe is separately connected thermoelectricity
Thermo cathode ionization vacuum gauge and temperature-sensing probe are regulated in resistance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811269528.3A CN109402596A (en) | 2018-10-29 | 2018-10-29 | A kind of colorful coating system of continuous type vacuum |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811269528.3A CN109402596A (en) | 2018-10-29 | 2018-10-29 | A kind of colorful coating system of continuous type vacuum |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109402596A true CN109402596A (en) | 2019-03-01 |
Family
ID=65469548
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811269528.3A Pending CN109402596A (en) | 2018-10-29 | 2018-10-29 | A kind of colorful coating system of continuous type vacuum |
Country Status (1)
| Country | Link |
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| CN (1) | CN109402596A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113832442A (en) * | 2021-09-23 | 2021-12-24 | 哈尔滨工业大学 | Plasma source ion implanter with preparation chamber for linear or cross transfer of workpieces |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200724699A (en) * | 2005-12-30 | 2007-07-01 | Advanced Int Multitech Co Ltd | Nonmetal compound and surface coating of the same |
| EP1804306A1 (en) * | 2005-12-28 | 2007-07-04 | Rial Vacuum S.p.A. | Plant for the production in continuous of a superconducting tape and related surface treatment process |
| CN203270025U (en) * | 2012-12-25 | 2013-11-06 | 黄玉春 | Vacuum film coating machine |
| CN106319467A (en) * | 2016-10-20 | 2017-01-11 | 湖南省霖辉高新材料科技有限公司 | Vacuum coating equipment suitable for surface coating |
| CN108588669A (en) * | 2018-05-15 | 2018-09-28 | 佛山市南海区晶鼎泰机械设备有限公司 | A kind of disjunctor plated film machine production line |
-
2018
- 2018-10-29 CN CN201811269528.3A patent/CN109402596A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1804306A1 (en) * | 2005-12-28 | 2007-07-04 | Rial Vacuum S.p.A. | Plant for the production in continuous of a superconducting tape and related surface treatment process |
| TW200724699A (en) * | 2005-12-30 | 2007-07-01 | Advanced Int Multitech Co Ltd | Nonmetal compound and surface coating of the same |
| CN203270025U (en) * | 2012-12-25 | 2013-11-06 | 黄玉春 | Vacuum film coating machine |
| CN106319467A (en) * | 2016-10-20 | 2017-01-11 | 湖南省霖辉高新材料科技有限公司 | Vacuum coating equipment suitable for surface coating |
| CN108588669A (en) * | 2018-05-15 | 2018-09-28 | 佛山市南海区晶鼎泰机械设备有限公司 | A kind of disjunctor plated film machine production line |
Non-Patent Citations (1)
| Title |
|---|
| 袁军平等编著: "《流行饰品材料及生产工艺（第二版）》", 30 June 2015, 武汉：中国地质大学出版社 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113832442A (en) * | 2021-09-23 | 2021-12-24 | 哈尔滨工业大学 | Plasma source ion implanter with preparation chamber for linear or cross transfer of workpieces |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20201019 Address after: 361000 First and Five Floors of Main Building of No. 198-204 Yingyao Road, Jimei District, Xiamen City, Fujian Province Applicant after: XIAMEN APISI INTELLIGENT MANUFACTURING SYSTEM Co.,Ltd. Address before: Tianfeng road in Jimei District of Xiamen City, Fujian Province, No. 69 361000 Applicant before: Runner (Xiamen) Corp. |
|
| TA01 | Transfer of patent application right | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190301 |
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| RJ01 | Rejection of invention patent application after publication |