CN201217685Y - Magnetron sputtering and multi-sphere ion plating combined vacuum coating machine - Google Patents
Magnetron sputtering and multi-sphere ion plating combined vacuum coating machine Download PDFInfo
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- CN201217685Y CN201217685Y CNU2008200131898U CN200820013189U CN201217685Y CN 201217685 Y CN201217685 Y CN 201217685Y CN U2008200131898 U CNU2008200131898 U CN U2008200131898U CN 200820013189 U CN200820013189 U CN 200820013189U CN 201217685 Y CN201217685 Y CN 201217685Y
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Abstract
The utility model relates to a magnetic control sputtering and multi-arc ion plating composite type vacuum film plating machine which comprises a vacuum plating chamber, a vacuum system, a power system, a pneumatic system, an air supply system, a cooling system, a driving system, a control and test system and a warning system. The machine is characterized in that a planetary transmission rotating disc of a work rest is arranged at the top part in a vacuum chamber body, a suspended type work rest is connected under the rotating disc, and a work rest driving mechanism at the upper part of the vacuum chamber body causes the work rest to rotate when revolving; and a magnetic control sputtering nickel target and an electric arc chrome-plating target are installed on the wall of the vacuum chamber body. The utility model can achieve the purpose that a nickel-plating film layer and a chrome-plating film layer can be completed during the process of one-time furnace loading of plated work pieces.
Description
Technical field
The utility model relates to technical field of vacuum plating, particularly a kind of magnetron sputtering and multi-arc ion coating combined type vacuum plating unit.
Background technology
Vacuum plating unit probably can be divided into following several according to the coating process principle: vacuum evaporating coating machine, magnetron sputtering coater, multi-arc ion coating coating equipment, filming equipments such as ion implantation device.The coating equipment of existing batch process scale is single technological principle coating equipment mostly, realizes plated film such as identical target structure with the target of same material or the target of differing materials.For the plant technique for vacuum coating of angle of multiplex (MUX), can't satisfy.
The utility model content:
At the problem that existing vacuum plating unit exists, the utility model provides a kind of can once finish magnetron sputtering and the multi-arc ion coating combined type vacuum plating unit that is coated with nickel, two kinds of retes of chromium.
Magnetron sputtering and multi-arc ion coating combined type vacuum plating unit comprise vacuum film coating chamber, vacuum system, power-supply system, pneumatic system, airing system, cooling system, drive system, control and test macro and warning system.
Vacuum film coating chamber comprises the vacuum chamber body, leaves door for vacuum chamber and viewing window on the vacuum chamber body, and magnetron sputtering nickel target and electric arc chromium plating target are installed on the locular wall.The vacuum chamber body wall is the interlayer water-cooling pattern, and periphery is equipped with resistance heater.Vacuum chamber body inner top is equipped with work rest Gear Planet Transmission rotating disk, connects the suspension type work rest under the rotating disk, and the work rest driving mechanism on vacuum chamber body top makes work rest also rotation in revolution, to guarantee the homogeneity of plated film.The insulation of work rest and vacuum chamber body is joined with the negative pole of pulsed bias power supply, and the vacuum chamber body connects the positive pole of grid bias power supply.Before outside each the plated film target of work rest, be provided with baffle mechanism, rely on its switch of barrier driving mechanism controls.Cooling system comprises water-cooling system and refrigerator cooling system, and water-cooling system is the parts cooling water supplies such as diffusion pump in vacuum chamber body, magnetron sputtering nickel target, electric arc chromium plating target and the vacuum system.The cold-trap on diffusion pump top then adopts the refrigerator system cooling.Vacuum system connects by vacuum pumping opening and vacuum chamber sports association.
Magnetron sputtering nickel target and electric arc chromium plating target have two kinds of decoration forms on the vacuum chamber body, a kind of is alternately installation of line in the shape of a spiral on mutually perpendicular direction, and another kind is non-alternately line subregion installation in the shape of a spiral.
Use the utility model in the copper material substrate, to adopt magnetron sputtering method to be coated with the nickel film, adopt the multi-arc ion coating method to be coated with the chromium film then.Be implemented in continuous production on same the coating equipment, being coated with of two kinds of retes finished in a shove charge.
Characteristics of the present utility model:
1. this equipment is provided with magnetron sputtering nickel target and two kinds of plated film targets of electric arc chromium plating target source, can realize that a shove charge of workpiece to be plated finishes the function that is coated with nickel, two kinds of film layer of chromium.
2. two kinds of targets that this equipment adopted (magnetron sputtering nickel target and electric arc chromium plating target) have two kinds of distribution modes on the vacuum chamber body, a kind of is that line is alternately installed in the shape of a spiral, and another kind is non-alternately line subregion installation in the shape of a spiral.
3. this equipment is provided with the refrigerator cooling system, for the cold-trap on diffusion pump top in the vacuum system provides low-temperature refrigerant, to reduce the return oil of diffusion pump to vacuum film coating chamber, improves film quality.
Description of drawings
Fig. 1: non-magnetron sputtering and the multi-arc ion coating combined type vacuum plating unit front view that replaces line subregion installation in the shape of a spiral;
Fig. 2: non-magnetron sputtering and the multi-arc ion coating combined type vacuum plating unit vertical view that replaces line subregion installation in the shape of a spiral;
Fig. 3: magnetron sputtering and multi-arc ion coating combined type vacuum plating unit front view that spiral-line is alternately installed;
Fig. 4: magnetron sputtering and multi-arc ion coating combined type vacuum plating unit vertical view that spiral-line is alternately installed.
Among the figure: 1 door for vacuum chamber, 2 vacuum chamber bodies, 3 magnetron sputtering nickel targets, 4 viewing windows, 5 electric arc chromium plating target sources, 6 frames, 7 diffusion pump, 8 cold-traps, 9 flapper valves, 10 vacuum chamber bleeding points, 11 barrier driving mechanisms, 12 work rest driving mechanisms, 13 suspension type work rests, 14 vacuum systems, 15 refrigeration systems, 16 baffle mechanisms, 17 work rest epicyclic transmission mechanisms.
Embodiment
Non-alternately in the shape of a spiral the magnetron sputtering installed of line subregion and multi-arc ion coating combined type vacuum plating unit structure as Fig. 1, Fig. 2, shown in, comprise vacuum film coating chamber, vacuum system, power-supply system, pneumatic system, airing system, cooling system, drive system, control and test macro and warning system.
1. vacuum film coating chamber
Indoor magnetron sputtering target and arc source, work rest, heating unit and the baffle mechanism of being furnished with of vacuum plating.
Vacuum film coating chamber comprises that vacuum chamber body 2 is the circular cylindrical cavity of Φ 1000 * H1600mm, leaves door for vacuum chamber 1 and viewing window 4 on the vacuum chamber body 2, and respectively six of magnetron sputtering nickel target 3 and electric arc chromium plating targets 5 are installed on the locular wall, the non-line subregion installation form in the shape of a spiral that replaces.Vacuum chamber body 2 walls are the interlayer water-cooling pattern.
The vacuum chamber inside circumference is equipped with 4 resistance heaters, preestablishes required Heating temperature, by the two limit of XMK-010 type digital display temperature controller temperature control, can be heated to 500 ℃, and a thermocouple temperature measurement probe is used for measuring the vacuum indoor environment temperature.
Before outside each the plated film target of work rest, be provided with baffle mechanism 16, rely on barrier driving mechanism 11 its switches of control.When magnetron sputtering target was worked, the baffle plate before the magnetron sputtering target was opened, the flapper closure before the electric arc target; When electric arc target was worked, the baffle plate before the electric arc target was opened, the flapper closure before the magnetron sputtering target.
2. vacuum system
Be provided with a cover refrigerator system 15 specially, for the cold-trap 8 on diffusion pump 7 tops provides low-temperature refrigerant, to reduce the return oil of diffusion pump to vacuum film coating chamber.
The vacuum tightness of vacuum system adopts ZDF-5210M type numeral to show the compound vacuum gauge measurement, and rough vacuum adopts the thermocouple meter to regulate, and high vacuum is regulated with ionization gauge.
3. power supply and Controlling System
Electrical control system is furnished with two electrical control cubicles, respectively vacuum system and target system is controlled power supply.Power-supply system is mainly by housing power supply, vacuum-pump power supply, and magnetron sputtering power supply, electric arc target power supply and pulsed bias power supply are formed.
Housing power supply, vacuum-pump power supply are made up of common power frequency supply.
The magnetron sputtering target power supply is a GNG-3 type high-frequency inversion magnetron sputtering power supply, the multiple arc target power supply is a ZX7-250 type low-voltage, high-current arc power, two kinds of target power supplies respectively have six covers, are respectively each target and power separately, and the electrical parameter of each target (voltage, electric current) can independent regulation.
Grid bias power supply adopts the twin-stage pulsed bias power supply, links to each other with work rest, and available voltage magnitude scope is 0～800V.Wherein dutycycle p is adjustable continuously between 0～80%, and the pulsed bias power supply frequency is constant, total power 5kW.
4. pneumatic system
Pneumatic system is made up of air pump, gas-holder, reversing valve, oil sprayer, air filter and pipeline, and flapper valve 9 valve switch such as grade that are mainly in the vacuum system 14 provide power.
5. airing system
Airing system comprises two portions: the airing system of working gas, the airing system of cooling and venting gas.
Working gas air feed part is made up of argon bottle, pipeline, throttling valve, mixing chamber, under meter.Working gas in vacuum plating process argon gas mainly is provided, after working gas is emitted by gas cylinder, arrives mass flowmeter, be adjusted to needed flow, put into vacuum film coating chamber through mixing chamber and special gas distribution pipeline through needle-valve through bottleneck throttling valve, pipeline.The method that the control of air pressure adopts D07-7A/ZM type MFC mass flowmeter and air inlet needle-valve to control charge flow rate in the vacuum chamber is regulated.The gas of using in the production mainly is argon gas, and controlling argon flow amount accurately is the interior operating pressure of may command vacuum chamber.
Cooling mainly is made up of air pump, air filter, moisture eliminator, pipeline and a by-pass valve control with the airing system of venting gas, directly links to each other with vacuum chamber.Be mainly used in after finishing whole plated film operations, the dry air to vacuum chamber supply certain pressure scope promotes the workpiece to be plated cooling; And before coming out of the stove, workpiece amplifies gas for vacuum chamber.
6. cooling system
Cooling system comprises water-cooling system and refrigerator cooling system.
Water-cooling system comprises working shaft, recirculated water cooling pond, water-pressure relay, water flow relay, regulated valve and water-supply line.Be mainly parts cooling water supplies such as diffusion pump 7 in vacuum chamber body 2, magnetron sputtering target 3, electric arc target 5 and the vacuum system, sliding vane rotary pump.
The refrigerator cooling system is that the cold-trap 8 on diffusion pump 7 tops is set specially, for it provides low-temperature refrigerant.
7. drive system
Drive system comprises barrier driving mechanism 11 and work rest driving mechanism 12.
Work rest driving mechanism 12 mainly is an alternating current motor, and the wheel box that is complementary with it, connect the rotating disc type work rest epicyclic transmission mechanism 17 that drives vacuum chamber body 2 inner tops by sealing pivot, make the suspension type work rest 13 that connects below do revolution and rotation biography with the speed of setting, or counter-rotating.
Magnetron sputtering of installing with the spiral-line over-over mode and multi-arc ion coating combined type vacuum plating unit structure comprise vacuum film coating chamber, vacuum system, power-supply system, pneumatic system, airing system, cooling system, drive system, control and test macro and warning system as shown in Figure 3, Figure 4.
1. vacuum film coating chamber
Indoor magnetron sputtering target and arc source, work rest, heating unit and the baffle mechanism of being furnished with of vacuum plating.
Vacuum film coating chamber comprises that vacuum chamber body 2 is the circular cylindrical cavity of Φ 800 * 1200mm, leave door for vacuum chamber 1 and viewing window 4 on the vacuum chamber body 2, respectively six of magnetron sputtering nickel target 3 and electric arc chromium plating targets 5 are installed on vacuum chamber body 2 and the door for vacuum chamber 1, and line replaces installation form in the shape of a spiral on mutually perpendicular direction.Vacuum chamber body 2 walls are the interlayer water-cooling pattern.Vacuum chamber bleeding point 10 is arranged on 45 ° of direction places of rear flank portion of chamber body 2.
The vacuum chamber inside circumference is equipped with 4 resistance heaters, preestablishes required Heating temperature, by the two limit of XMK-010 type digital display temperature controller temperature control, can be heated to 500 ℃, and a thermocouple temperature measurement probe is used for measuring the vacuum indoor environment temperature.
Before outside each the plated film target of work rest, be provided with one group of baffle mechanism 16, rely on barrier driving mechanism 11 its rotating switches of control.When magnetron sputtering target was worked, baffle plate was parked in (position of A as shown in Figure 4) before the electric arc target; When electric arc target was worked, baffle plate was parked in (position of B as shown in Figure 4) before the magnetron sputtering target.
Vacuum system, power supply and Controlling System, pneumatic system, airing system, cooling system, drive system are with embodiment 1.
Claims (4)
1. magnetron sputtering and multi-arc ion coating combined type vacuum plating unit, comprise vacuum film coating chamber, vacuum system, power-supply system, pneumatic system, airing system, cooling system, drive system, control and test macro and warning system, it is characterized in that vacuum chamber body inner top is equipped with work rest Gear Planet Transmission rotating disk, connect the suspension type work rest under the rotating disk, magnetron sputtering nickel target and two kinds of targets of electric arc chromium plating target are installed on its vacuum chamber body wall.
2. a kind of magnetron sputtering as claimed in claim 1 and multi-arc ion coating combined type vacuum plating unit, it is characterized in that being provided with and make work rest driving mechanism of rotation also in revolution on vacuum chamber body top, work rest and the insulation of vacuum chamber body, join with the negative pole of pulsed bias power supply, the vacuum chamber body connects the positive pole of grid bias power supply, before outside each the plated film target of work rest, be provided with baffle mechanism, rely on its switch of barrier driving mechanism controls.
3. a kind of magnetron sputtering as claimed in claim 1 and multi-arc ion coating combined type vacuum plating unit, it is characterized in that magnetron sputtering nickel target and two kinds of targets of electric arc chromium plating target of installing on the vacuum chamber body wall have two kinds of decoration forms: a kind of is alternately installation of line in the shape of a spiral on mutually perpendicular direction, and another kind is non-alternately line subregion installation in the shape of a spiral.
4. a kind of magnetron sputtering as claimed in claim 1 and multi-arc ion coating combined type vacuum plating unit, it is characterized in that described cooling system comprises water-cooling system and refrigerator cooling system, water-cooling system is the diffusion pump cooling water supply in vacuum chamber body, magnetron sputtering target, electric arc target and the vacuum system, and the cold-trap on diffusion pump top then adopts the refrigerator system cooling.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200131898U CN201217685Y (en) | 2008-05-28 | 2008-05-28 | Magnetron sputtering and multi-sphere ion plating combined vacuum coating machine |
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| CNU2008200131898U CN201217685Y (en) | 2008-05-28 | 2008-05-28 | Magnetron sputtering and multi-sphere ion plating combined vacuum coating machine |
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| CN201217685Y true CN201217685Y (en) | 2009-04-08 |
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| CNU2008200131898U Expired - Fee Related CN201217685Y (en) | 2008-05-28 | 2008-05-28 | Magnetron sputtering and multi-sphere ion plating combined vacuum coating machine |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101949000A (en) * | 2010-09-17 | 2011-01-19 | 温州市佳能真空电镀设备科技有限公司 | Vacuum magnetron sputtering multi-arc ion composite coating machine |
| CN102825855A (en) * | 2012-07-20 | 2012-12-19 | 中国科学院宁波材料技术与工程研究所 | Ultra-thick CrSiBN composite coating on surface of base body and preparation method thereof |
| CN103173736A (en) * | 2013-03-18 | 2013-06-26 | 广东世创金属科技有限公司 | Multifunctional throttling vacuum pipeline structure for vacuum coating equipment and control system thereof |
| CN103397304A (en) * | 2013-08-21 | 2013-11-20 | 南京浩穰环保科技有限公司 | Micro-arc ion plating method |
| CN103396008A (en) * | 2013-08-02 | 2013-11-20 | 蚌埠雷诺真空技术有限公司 | Uniform air inlet apparatus of magnetron sputtering vacuum chambers |
| CN103668093A (en) * | 2013-11-27 | 2014-03-26 | 昂纳信息技术（深圳）有限公司 | AR (anti-reflect) film and AF (anti-fingerprint) film coating equipment in one furnace and film coating method |
| CN103854819A (en) * | 2014-03-22 | 2014-06-11 | 沈阳中北通磁科技股份有限公司 | Hybrid film coating method of neodymium iron boron rare earth permanent magnet device |
| CN107641791A (en) * | 2017-10-23 | 2018-01-30 | 沈红军 | A kind of large-scale PVD multi spheres add magnetic control copper facing equipment and copper-plating technique |
| CN108559956A (en) * | 2018-04-11 | 2018-09-21 | 深圳市正和忠信股份有限公司 | A kind of strong glow discharge deposition diamond-like-carbon film device and processing method |
| CN108866491A (en) * | 2018-07-24 | 2018-11-23 | 山东大学 | TiAlN/CrAlSiN nanocomposite laminated coating and preparation method thereof |
| CN109930115A (en) * | 2017-12-15 | 2019-06-25 | 湘潭宏大真空技术股份有限公司 | Optics multi-arc ion coating method and device thereof |
| CN109930116A (en) * | 2017-12-15 | 2019-06-25 | 湘潭宏大真空技术股份有限公司 | Optics multi-Arc Ion Plating |
| CN112458411A (en) * | 2020-11-26 | 2021-03-09 | 苏州德耐纳米科技有限公司 | Magnetron sputtering and multi-arc ion plating composite vacuum coating method |
-
2008
- 2008-05-28 CN CNU2008200131898U patent/CN201217685Y/en not_active Expired - Fee Related
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101949000A (en) * | 2010-09-17 | 2011-01-19 | 温州市佳能真空电镀设备科技有限公司 | Vacuum magnetron sputtering multi-arc ion composite coating machine |
| CN102825855A (en) * | 2012-07-20 | 2012-12-19 | 中国科学院宁波材料技术与工程研究所 | Ultra-thick CrSiBN composite coating on surface of base body and preparation method thereof |
| CN103173736A (en) * | 2013-03-18 | 2013-06-26 | 广东世创金属科技有限公司 | Multifunctional throttling vacuum pipeline structure for vacuum coating equipment and control system thereof |
| CN103173736B (en) * | 2013-03-18 | 2018-01-12 | 广东世创金属科技股份有限公司 | Multifunctional throttle vacuum pipe structure and its control system for Vacuum coating device |
| CN103396008A (en) * | 2013-08-02 | 2013-11-20 | 蚌埠雷诺真空技术有限公司 | Uniform air inlet apparatus of magnetron sputtering vacuum chambers |
| CN103397304A (en) * | 2013-08-21 | 2013-11-20 | 南京浩穰环保科技有限公司 | Micro-arc ion plating method |
| CN103397304B (en) * | 2013-08-21 | 2015-05-27 | 南京浩穰环保科技有限公司 | Micro-arc ion plating method |
| CN103668093A (en) * | 2013-11-27 | 2014-03-26 | 昂纳信息技术（深圳）有限公司 | AR (anti-reflect) film and AF (anti-fingerprint) film coating equipment in one furnace and film coating method |
| CN103854819B (en) * | 2014-03-22 | 2016-10-05 | 沈阳中北通磁科技股份有限公司 | A kind of the admixture plates the film method of neodymium iron boron rare earth permanent magnet device |
| CN103854819A (en) * | 2014-03-22 | 2014-06-11 | 沈阳中北通磁科技股份有限公司 | Hybrid film coating method of neodymium iron boron rare earth permanent magnet device |
| CN107641791A (en) * | 2017-10-23 | 2018-01-30 | 沈红军 | A kind of large-scale PVD multi spheres add magnetic control copper facing equipment and copper-plating technique |
| CN107641791B (en) * | 2017-10-23 | 2019-04-12 | 沈红军 | A kind of large size PVD multi sphere adds magnetic control copper facing equipment and copper-plating technique |
| CN109930115A (en) * | 2017-12-15 | 2019-06-25 | 湘潭宏大真空技术股份有限公司 | Optics multi-arc ion coating method and device thereof |
| CN109930116A (en) * | 2017-12-15 | 2019-06-25 | 湘潭宏大真空技术股份有限公司 | Optics multi-Arc Ion Plating |
| CN108559956A (en) * | 2018-04-11 | 2018-09-21 | 深圳市正和忠信股份有限公司 | A kind of strong glow discharge deposition diamond-like-carbon film device and processing method |
| CN108559956B (en) * | 2018-04-11 | 2024-02-09 | 深圳市正和忠信股份有限公司 | Strong glow discharge deposition diamond-like carbon film equipment and processing method |
| CN108866491A (en) * | 2018-07-24 | 2018-11-23 | 山东大学 | TiAlN/CrAlSiN nanocomposite laminated coating and preparation method thereof |
| CN112458411A (en) * | 2020-11-26 | 2021-03-09 | 苏州德耐纳米科技有限公司 | Magnetron sputtering and multi-arc ion plating composite vacuum coating method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090408 Termination date: 20110528 |