CN112458411A - Magnetron sputtering and multi-arc ion plating composite vacuum coating method - Google Patents
Magnetron sputtering and multi-arc ion plating composite vacuum coating method Download PDFInfo
- Publication number
- CN112458411A CN112458411A CN202011350141.8A CN202011350141A CN112458411A CN 112458411 A CN112458411 A CN 112458411A CN 202011350141 A CN202011350141 A CN 202011350141A CN 112458411 A CN112458411 A CN 112458411A
- Authority
- CN
- China
- Prior art keywords
- coating
- magnetron sputtering
- base material
- substrate
- arc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Abstract
The invention discloses a magnetron sputtering and multi-arc ion plating composite vacuum coating method, relates to the technical field of vacuum coating, and aims to solve the problems that the speed is low, the substrate is easy to damage when the conventional vacuum coating equipment is used for carrying out vacuum coating on a substrate, and the obtained finished substrate film has weak adhesive force and poor diffraction. The method comprises the following steps: firstly, carrying out surface treatment on a base material to be coated, polishing the surface of the base material by virtue of polishing equipment, then placing the polished surface of the base material into a cleaning pool for dedusting and cleaning, dropwise adding some degreasing agents into the cleaning pool in the cleaning process to remove oil stains on the surface of the base material, fishing out the base material after cleaning, and carrying out drying operation after draining; step two: and performing primary coating processing on the dried substrate, spraying coating oil of which the model is SZ-97T on the surface of the substrate by using a spraying machine, dip-coating the substrate with smaller size in a dip-dyeing tank filled with the coating oil of SZ-97T, and draining the processed substrate on a hollow net rack after primary coating is finished.
Description
Technical Field
The invention relates to the technical field of vacuum coating, in particular to a magnetron sputtering and multi-arc ion plating composite vacuum coating method.
Background
Vacuum coating refers to a method for forming a thin film by heating a metal or non-metal material under a high vacuum condition to evaporate and condense the metal or non-metal material on the surface of a plated part, such as vacuum aluminum plating, vacuum chromium plating, etc., and is an important aspect of the vacuum application field. In brief, a method of evaporating or sputtering a metal, an alloy or a compound in a vacuum to solidify and deposit the metal, the alloy or the compound on an object to be coated is called vacuum coating, and vacuum coating is a novel coating technique developed in comparison with the above-mentioned wet coating method, and is generally called dry coating technique, and the vacuum coating technique is generally classified into two major types, i.e., physical vapor deposition technique and chemical vapor deposition technique.
The existing vacuum coating equipment has the defects that the speed is low when the vacuum coating is carried out on a substrate, the substrate is easy to damage, the adhesion of the finished film of the obtained substrate is weak, the diffraction is poor, and the finished product degree of the vacuum coating substrate is influenced, so that the composite vacuum coating method of magnetron sputtering and multi-arc ion plating is provided.
Disclosure of Invention
The invention aims to provide a magnetron sputtering and multi-arc ion plating composite vacuum coating method, which solves the problems that the existing vacuum coating equipment in the background art has low speed when vacuum coating is carried out on a base material, the base material is easy to be damaged, and the obtained finished base material film has weak adhesive force and poor diffraction.
In order to achieve the purpose, the invention provides the following technical scheme: the magnetron sputtering and multi-arc ion plating composite vacuum film plating method comprises the following steps:
the method comprises the following steps: firstly, carrying out surface treatment on a base material to be coated, polishing the surface of the base material by virtue of polishing equipment, then placing the polished surface of the base material into a cleaning pool for dedusting and cleaning, dropwise adding some degreasing agents into the cleaning pool in the cleaning process to remove oil stains on the surface of the base material, fishing out the base material after cleaning, and carrying out drying operation after draining;
step two: performing primary coating processing on the dried substrate, spraying coating oil of which the model is SZ-97T on the surface of the substrate by using a spraying machine, wherein the substrate with smaller size can be put into a dip-dyeing tank containing the coating oil of SZ-97T for dip-coating treatment, and after the primary coating operation is finished, putting the treated substrate on a hollow net rack for draining;
step three: after the base material is drained to a state of no oil dripping, putting the base material into drying equipment for drying of coating oil, adjusting the drying temperature of the drying equipment to be sixty-seventy ℃, and after drying for two hours, taking out the base material and cooling at normal temperature for later use;
step four: placing the substrate cooled at normal temperature into vacuum coating equipment for coating, placing the substrate into a magnetron sputtering coating bin on the right side for coating, wherein electrons collide with argon atoms in the process of flying to the substrate under the action of an electric field to ionize the argon atoms to generate Ar positive ions and new electrons, the new electrons fly to the substrate, the Ar ions accelerate flying to a cathode target under the action of the electric field and bombard the surface of the target at high energy to sputter the target, and neutral target atoms or molecules in sputtered particles are deposited on the substrate to form a film;
step five: taking out the base material after magnetron sputtering and placing the base material in a multi-arc ion coating bin on the left side of vacuum coating equipment, vacuumizing a vacuum chamber, switching on a high-voltage power supply, establishing a low-temperature plasma region with low-voltage gas discharge between an evaporation source and a substrate, connecting a substrate electrode with 5KV direct-current negative high voltage to form a glow discharge cathode, enabling inert gas ions generated in the glow discharge region to enter a cathode dark region, accelerating by an electric field and bombarding the surface of the substrate, cleaning the substrate, heating to gasify a coating material, enabling the atoms to enter the plasma region, colliding with the inert gas ions and electrons to partially ionize, bombarding the surface of the coating layer by the ionized ions and gas ions with higher energy, and depositing evaporant or reactant on the surface of the base material;
step six: taking out the base material subjected to magnetron sputtering coating and multi-arc ion coating, selecting 910 matte oil to coat the coating surface of the base material, draining the base material subjected to surface coating after the surface coating operation is finished, putting the base material into drying equipment to dry, controlling the temperature of the drying equipment to be between fifty and sixty ℃, taking out the base material after the drying is finished, and cooling the base material at normal temperature;
step seven: after finishing the surface coating and drying, putting the base material with the dried surface coating into a dye vat to dye the required color, controlling the water temperature in the dye vat to be sixty-eighty ℃, and carrying out washing and drying treatment after finishing the dyeing to obtain a finished product of the vacuum coating;
the vacuum coating equipment comprises a vacuum coating machine, wherein a magnetron sputtering bin and a multi-arc ion coating bin are respectively arranged on two sides of the vacuum coating machine, a plate electrode is arranged inside the magnetron sputtering bin, an arc ignition electrode is arranged inside the multi-arc ion coating bin, and a base material is arranged above the plate electrode and the arc ignition electrode.
Preferably, the lower extreme of electrode plate is provided with the polar plate support, and the electrode plate passes through polar plate support and magnetron sputtering storehouse fixed mounting, the upper end of electrode plate is provided with magnet, the upper end of magnet is provided with the copper backplate, and the copper backplate is located the below of substrate.
Preferably, the upper end of the copper back plate is provided with a target, a coating surface layer is arranged above the target, the size of the target is equal to that of the coating surface layer, and the coating surface layer is attached to and connected with the outer wall of the substrate.
Preferably, an insulating support is arranged at the upper end of the arc striking electrode, a low-voltage arc is arranged at the upper end of the insulating support, the low-voltage arc and the arc striking electrode are integrally formed, and the low-voltage arc is fixedly installed with the arc striking electrode through the insulating support.
Preferably, the two ends of the low-voltage arc are respectively provided with a cathode motor and an anode electrode, the cathode motor and the anode electrode are integrally formed with the low-voltage arc, and the cathode motor and the anode electrode are symmetrically distributed about a vertical center line of the arc striking electrode.
Preferably, an argon inlet and a nitrogen inlet are respectively arranged on the air inlet interface positions of the magnetron sputtering bin and the multi-arc ion coating bin, and the argon inlet and the nitrogen inlet are respectively integrally formed with the magnetron sputtering bin and the multi-arc ion coating bin.
Preferably, the top end of the magnetron sputtering bin is provided with a grounding wire, the magnetron sputtering bin is electrically connected with the grounding wire, the outer walls of two sides of the multi-arc ion coating bin are provided with magnetic field coils, and the magnetic field coils are communicated with the interior of the multi-arc ion coating bin.
Preferably, the outer walls of the magnetron sputtering chamber and the multi-arc ion coating chamber are respectively provided with a vacuumizing port, the vacuumizing ports are integrally formed with the magnetron sputtering chamber and the multi-arc ion coating chamber, and the magnetron sputtering chamber and the multi-arc ion coating chamber are hermetically connected with a vacuum pump through the vacuumizing ports.
Preferably, the lower ends of the arc ignition electrode and the electrode plate are both provided with power supply circuits, one ends of the power supply circuits penetrate through and extend to the outsides of the magnetron sputtering bin and the multi-arc ion coating bin, and the arc ignition electrode and the electrode plate are electrically connected with a power supply box of the vacuum coating machine through the power supply circuits.
Compared with the prior art, the invention has the beneficial effects that:
1. the invention adopts a vacuum coating mode combining magnetron sputtering and multi-arc ion coating, firstly, the base material is placed in the magnetron sputtering coating bin at the right side for coating treatment, and then the base material after magnetron sputtering is taken out and placed in the multi-arc ion coating bin at the left side of the vacuum coating equipment. The magnetron sputtering introduces a magnetic field on the surface of a target cathode, improves the plasma density by utilizing the restraint of the magnetic field on charged particles so as to increase the sputtering rate, has strong adhesion, good diffraction and wide film material of the multi-arc ion coating film, and overcomes the problems that the speed is slow when the existing vacuum coating equipment carries out vacuum coating on a substrate, the substrate is easy to be damaged, and the adhesion and the diffraction of the finished film of the obtained substrate are weak.
2. The dried substrate is subjected to prime coat processing, coating oil with the type of SZ-97T is sprayed on the surface of the substrate by means of a spraying machine, the substrate with smaller size can be placed into a dip-coating tank containing the coating oil with the type of SZ-97T for dip-coating treatment, the treated substrate is placed on a hollowed-out net rack for draining after prime coat work is completed, the substrate is placed into drying equipment for drying treatment of the coating oil after being drained to a state without dripping oil, the drying temperature of the drying equipment is adjusted to be sixty-seventy ℃, and the substrate is taken out and cooled for later use after being dried for two hours at normal temperature, so that a subsequent vacuum coating working film layer can be better attached to the surface of the substrate.
Drawings
FIG. 1 is a schematic flow diagram of the overall process of the present invention;
FIG. 2 is a schematic structural view of a vacuum coater of the present invention;
FIG. 3 is a schematic view of the internal structure of the multi-arc ion plating bin of the present invention;
FIG. 4 is a schematic view of the internal structure of the magnetron sputtering chamber according to the present invention;
in the figure: 1. a vacuum coating machine; 2. a magnetron sputtering bin; 3. a multi-arc ion plating bin; 4. a substrate; 5. a power supply line; 6. a vacuum pumping port; 7. an arc ignition electrode; 8. an insulating support; 9. a cathode motor; 10. an anode electrode; 11. a magnetic field coil; 12. a low voltage arc; 13. a nitrogen inlet; 14. an argon gas inlet; 15. a pole plate support; 16. an electrode plate; 17. a magnet; 18. a copper back plate; 19. a target material; 20. coating a film surface layer; 21. and a ground line.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments.
Referring to fig. 1-4, an embodiment of the present invention is shown: the magnetron sputtering and multi-arc ion plating composite vacuum film plating method comprises the following steps:
the method comprises the following steps: firstly, carrying out surface treatment on a base material to be coated, polishing the surface of the base material by virtue of polishing equipment, then placing the polished surface of the base material into a cleaning pool for dedusting and cleaning, dropwise adding some degreasing agents into the cleaning pool in the cleaning process to remove oil stains on the surface of the base material, fishing out the base material after cleaning, and carrying out drying operation after draining;
step two: performing primary coating processing on the dried substrate, spraying coating oil of which the model is SZ-97T on the surface of the substrate by using a spraying machine, wherein the substrate with smaller size can be put into a dip-dyeing tank containing the coating oil of SZ-97T for dip-coating treatment, and after the primary coating operation is finished, putting the treated substrate on a hollow net rack for draining;
step three: after the base material is drained to a state of no oil dripping, putting the base material into drying equipment for drying of coating oil, adjusting the drying temperature of the drying equipment to be sixty-seventy ℃, and after drying for two hours, taking out the base material and cooling at normal temperature for later use;
step four: placing the substrate cooled at normal temperature into vacuum coating equipment for coating, placing the substrate into a magnetron sputtering coating bin on the right side for coating, wherein electrons collide with argon atoms in the process of flying to the substrate under the action of an electric field to ionize the argon atoms to generate Ar positive ions and new electrons, the new electrons fly to the substrate, the Ar ions accelerate flying to a cathode target under the action of the electric field and bombard the surface of the target at high energy to sputter the target, and neutral target atoms or molecules in sputtered particles are deposited on the substrate to form a film;
step five: taking out the base material after magnetron sputtering and placing the base material in a multi-arc ion coating bin on the left side of vacuum coating equipment, vacuumizing a vacuum chamber, switching on a high-voltage power supply, establishing a low-temperature plasma region with low-voltage gas discharge between an evaporation source and a substrate, connecting a substrate electrode with 5KV direct-current negative high voltage to form a glow discharge cathode, enabling inert gas ions generated in the glow discharge region to enter a cathode dark region, accelerating by an electric field and bombarding the surface of the substrate, cleaning the substrate, heating to gasify a coating material, enabling the atoms to enter the plasma region, colliding with the inert gas ions and electrons to partially ionize, bombarding the surface of the coating layer by the ionized ions and gas ions with higher energy, and depositing evaporant or reactant on the surface of the base material;
step six: taking out the base material subjected to magnetron sputtering coating and multi-arc ion coating, selecting 910 matte oil to coat the coating surface of the base material, draining the base material subjected to surface coating after the surface coating operation is finished, putting the base material into drying equipment to dry, controlling the temperature of the drying equipment to be between fifty and sixty ℃, taking out the base material after the drying is finished, and cooling the base material at normal temperature;
step seven: after finishing the surface coating and drying, putting the base material with the dried surface coating into a dye vat to dye the required color, controlling the water temperature in the dye vat to be sixty-eighty ℃, and carrying out washing and drying treatment after finishing the dyeing to obtain a finished product of the vacuum coating;
the vacuum coating equipment comprises a vacuum coating machine 1, wherein a magnetron sputtering bin 2 and a multi-arc ion coating bin 3 are respectively arranged on two sides of the vacuum coating machine 1, an electrode plate 16 is arranged inside the magnetron sputtering bin 2, an arc ignition electrode 7 is arranged inside the multi-arc ion coating bin 3, and a base material 4 is arranged above the electrode plate 16 and the arc ignition electrode 7.
Further, the lower end of the electrode plate 16 is provided with an electrode plate support 15, the electrode plate 16 is fixedly mounted with the magnetron sputtering chamber 2 through the electrode plate support 15, the upper end of the electrode plate 16 is provided with a magnet 17, the upper end of the magnet 17 is provided with a copper back plate 18, the copper back plate 18 is located below the substrate 4, and the electrode plate support 15 arranged at the lower end of the electrode plate 16 plays a role in supporting the electrode plate 16.
Further, a target 19 is arranged at the upper end of the copper back plate 18, a coating surface layer 20 is arranged above the target 19, the size of the target 19 of the coating surface layer 20 is equal, the coating surface layer 20 is attached to the outer wall of the substrate 4, and the target 19 arranged at the upper end of the copper back plate 18 plays a role in generating coating raw materials.
Further, an insulating support 8 is arranged at the upper end of the arc ignition electrode 7, a low-voltage arc 12 is arranged at the upper end of the insulating support 8, the low-voltage arc 12 and the arc ignition electrode 7 are integrally formed, the low-voltage arc 12 is fixedly installed with the arc ignition electrode 7 through the insulating support 8, and the insulating support 8 arranged at the upper end of the arc ignition electrode 7 plays a role in supporting and fixing the low-voltage arc 12.
Further, a cathode motor 9 and an anode electrode 10 are respectively arranged at two ends of the low-voltage arc 12, the cathode motor 9 and the anode electrode 10 are integrally formed with the low-voltage arc 12, the cathode motor 9 and the anode electrode 10 are symmetrically distributed about a vertical center line of the arc ignition electrode 7, and the cathode motor 9 and the anode electrode 10 respectively arranged at two ends of the low-voltage arc 12 play a role in forming a two-stage electric field.
Further, be provided with argon gas on the air inlet interface position of magnetron sputtering storehouse 2 and multi-arc ion coating storehouse 3 respectively and insert mouthful 14 and nitrogen gas and insert mouthful 13, argon gas inserts mouthful 14 and nitrogen gas and inserts mouthful 13 and set up with magnetron sputtering storehouse 2 and multi-arc ion coating storehouse 3 integrated into one piece respectively, argon gas that sets up respectively on the air inlet interface position of magnetron sputtering storehouse 2 and multi-arc ion coating storehouse 3 inserts mouthful 14 and nitrogen gas and inserts mouthful 13 and play the effect of inserting argon ion and nitrogen ion.
Further, the top of magnetron sputtering storehouse 2 is provided with earth connection 21, and magnetron sputtering storehouse 2 and earth connection 21 electric connection all are provided with field coil 11 on the both sides outer wall of multi-arc ion coating storehouse 3, and field coil 11 and multi-arc ion coating storehouse 3's inside intercommunication sets up, and earth connection 21 that the top of magnetron sputtering storehouse 2 set up plays the effect of the inside electric field ground connection in the magnetron sputtering storehouse 2 of being convenient for.
Further, all be provided with evacuation mouth 6 on the outer wall in magnetron sputtering storehouse 2 and multi-arc ion coating storehouse 3, and evacuation mouth 6 sets up with magnetron sputtering storehouse 2 and multi-arc ion coating storehouse 3 integrated into one piece, magnetron sputtering storehouse 2 and multi-arc ion coating storehouse 3 through evacuation mouth 6 and vacuum pump sealing connection, evacuation mouth 6 that all set up on the outer wall in magnetron sputtering storehouse 2 and multi-arc ion coating storehouse 3 plays the effect of being convenient for magnetron sputtering storehouse 2 and 3 evacuation in multi-arc ion coating storehouse.
Further, the lower ends of the arc ignition electrode 7 and the electrode plate 16 are both provided with power supply circuits 5, one ends of the power supply circuits 5 penetrate through and extend to the outsides of the magnetron sputtering bin 2 and the multi-arc ion coating bin 3, the arc ignition electrode 7 and the electrode plate 16 are electrically connected with a power supply box of the vacuum coating machine 1 through the power supply circuits 5, and the power supply circuits 5 arranged at the lower ends of the arc ignition electrode 7 and the electrode plate 16 play a role in supplying power to the arc ignition electrode 7 and the electrode plate 16.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Claims (9)
1. The magnetron sputtering and multi-arc ion plating composite vacuum film coating method is characterized in that: the method comprises the following steps:
the method comprises the following steps: firstly, carrying out surface treatment on a base material to be coated, polishing the surface of the base material by virtue of polishing equipment, then placing the polished surface of the base material into a cleaning pool for dedusting and cleaning, dropwise adding some degreasing agents into the cleaning pool in the cleaning process to remove oil stains on the surface of the base material, fishing out the base material after cleaning, and carrying out drying operation after draining;
step two: performing primary coating processing on the dried substrate, spraying coating oil of which the model is SZ-97T on the surface of the substrate by using a spraying machine, wherein the substrate with smaller size can be put into a dip-dyeing tank containing the coating oil of SZ-97T for dip-coating treatment, and after the primary coating operation is finished, putting the treated substrate on a hollow net rack for draining;
step three: after the base material is drained to a state of no oil dripping, putting the base material into drying equipment for drying of coating oil, adjusting the drying temperature of the drying equipment to be sixty-seventy ℃, and after drying for two hours, taking out the base material and cooling at normal temperature for later use;
step four: placing the substrate cooled at normal temperature into vacuum coating equipment for coating, placing the substrate into a magnetron sputtering coating bin on the right side for coating, wherein electrons collide with argon atoms in the process of flying to the substrate under the action of an electric field to ionize the argon atoms to generate Ar positive ions and new electrons, the new electrons fly to the substrate, the Ar ions accelerate flying to a cathode target under the action of the electric field and bombard the surface of the target at high energy to sputter the target, and neutral target atoms or molecules in sputtered particles are deposited on the substrate to form a film;
step five: taking out the base material after magnetron sputtering and placing the base material in a multi-arc ion coating bin on the left side of vacuum coating equipment, vacuumizing a vacuum chamber, switching on a high-voltage power supply, establishing a low-temperature plasma region with low-voltage gas discharge between an evaporation source and a substrate, connecting a substrate electrode with 5KV direct-current negative high voltage to form a glow discharge cathode, enabling inert gas ions generated in the glow discharge region to enter a cathode dark region, accelerating by an electric field and bombarding the surface of the substrate, cleaning the substrate, heating to gasify a coating material, enabling the atoms to enter the plasma region, colliding with the inert gas ions and electrons to partially ionize, bombarding the surface of the coating layer by the ionized ions and gas ions with higher energy, and depositing evaporant or reactant on the surface of the base material;
step six: taking out the base material subjected to magnetron sputtering coating and multi-arc ion coating, selecting 910 matte oil to coat the coating surface of the base material, draining the base material subjected to surface coating after the surface coating operation is finished, putting the base material into drying equipment to dry, controlling the temperature of the drying equipment to be between fifty and sixty ℃, taking out the base material after the drying is finished, and cooling the base material at normal temperature;
step seven: after finishing the surface coating and drying, putting the base material with the dried surface coating into a dye vat to dye the required color, controlling the water temperature in the dye vat to be sixty-eighty ℃, and carrying out washing and drying treatment after finishing the dyeing to obtain a finished product of the vacuum coating;
the vacuum coating equipment comprises a vacuum coating machine (1), wherein a magnetron sputtering bin (2) and a multi-arc ion coating bin (3) are respectively arranged on two sides of the vacuum coating machine (1), an electrode plate (16) is arranged inside the magnetron sputtering bin (2), an arc striking electrode (7) is arranged inside the multi-arc ion coating bin (3), and a base material (4) is arranged above the electrode plate (16) and the arc striking electrode (7).
2. The magnetron sputtering and multi-arc ion plating composite vacuum film coating method according to claim 1, characterized in that: the lower extreme of electrode board (16) is provided with polar plate support (15), and electrode board (16) pass through polar plate support (15) and magnetron sputtering storehouse (2) fixed mounting, the upper end of electrode board (16) is provided with magnet (17), the upper end of magnet (17) is provided with copper backplate (18), and copper backplate (18) are located the below of substrate (4).
3. The magnetron sputtering and multi-arc ion plating composite vacuum film coating method according to claim 2, characterized in that: the copper back plate is characterized in that a target (19) is arranged at the upper end of the copper back plate (18), a film coating surface layer (20) is arranged above the target (19), the size of the target (19) of the film coating surface layer (20) is equal, and the film coating surface layer (20) is attached to and connected with the outer wall of the substrate (4).
4. The magnetron sputtering and multi-arc ion plating composite vacuum film coating method according to claim 1, characterized in that: the arc striking device is characterized in that an insulating support (8) is arranged at the upper end of the arc striking electrode (7), a low-voltage electric arc (12) is arranged at the upper end of the insulating support (8), the low-voltage electric arc (12) and the arc striking electrode (7) are integrally formed, and the low-voltage electric arc (12) is fixedly installed with the arc striking electrode (7) through the insulating support (8).
5. The magnetron sputtering and multi-arc ion plating composite vacuum film coating method according to claim 4, characterized in that: the two ends of the low-voltage electric arc (12) are respectively provided with a cathode motor (9) and an anode electrode (10), the cathode motor (9) and the anode electrode (10) are integrally formed with the low-voltage electric arc (12), and the cathode motor (9) and the anode electrode (10) are symmetrically distributed about the vertical center line of the arc striking electrode (7).
6. The magnetron sputtering and multi-arc ion plating composite vacuum film coating method according to claim 1, characterized in that: the air inlet interface positions of the magnetron sputtering bin (2) and the multi-arc ion coating bin (3) are respectively provided with an argon inlet (14) and a nitrogen inlet (13), and the argon inlet (14) and the nitrogen inlet (13) are respectively arranged with the magnetron sputtering bin (2) and the multi-arc ion coating bin (3) in an integrated forming mode.
7. The magnetron sputtering and multi-arc ion plating composite vacuum film coating method according to claim 1, characterized in that: the top of magnetron sputtering storehouse (2) is provided with earth connection (21), and magnetron sputtering storehouse (2) and earth connection (21) electric connection, all be provided with field coil (11) on the both sides outer wall of many arcs ion coating storehouse (3), and the inside intercommunication setting of field coil (11) and many arcs ion coating storehouse (3).
8. The magnetron sputtering and multi-arc ion plating composite vacuum film coating method according to claim 1, characterized in that: the outer walls of the magnetron sputtering bin (2) and the multi-arc ion coating bin (3) are respectively provided with a vacuumizing port (6), the vacuumizing ports (6) are integrally formed with the magnetron sputtering bin (2) and the multi-arc ion coating bin (3), and the magnetron sputtering bin (2) and the multi-arc ion coating bin (3) are hermetically connected with a vacuum pump through the vacuumizing ports (6).
9. The magnetron sputtering and multi-arc ion plating composite vacuum film coating method according to claim 1, characterized in that: the lower ends of the arc ignition electrode (7) and the electrode plate (16) are provided with power supply circuits (5), one ends of the power supply circuits (5) penetrate through and extend to the outsides of the magnetron sputtering bin (2) and the multi-arc ion coating bin (3), and the arc ignition electrode (7) and the electrode plate (16) are electrically connected with a power supply box of the vacuum coating machine (1) through the power supply circuits (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011350141.8A CN112458411A (en) | 2020-11-26 | 2020-11-26 | Magnetron sputtering and multi-arc ion plating composite vacuum coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011350141.8A CN112458411A (en) | 2020-11-26 | 2020-11-26 | Magnetron sputtering and multi-arc ion plating composite vacuum coating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112458411A true CN112458411A (en) | 2021-03-09 |
Family
ID=74808836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011350141.8A Pending CN112458411A (en) | 2020-11-26 | 2020-11-26 | Magnetron sputtering and multi-arc ion plating composite vacuum coating method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112458411A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113617610A (en) * | 2021-09-06 | 2021-11-09 | 佛山市东鹏陶瓷发展有限公司 | Method for preparing metal luster faucet by coating brass or zinc alloy substrate |
| CN115404446A (en) * | 2022-08-24 | 2022-11-29 | 潮州市汇鑫陶瓷科技有限公司 | High-glossiness coating equipment and coating process special for ceramics |
| CN116791051A (en) * | 2022-04-21 | 2023-09-22 | 广东德立科技发展有限公司 | Sputtering method of isolation layer |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101307428A (en) * | 2008-05-29 | 2008-11-19 | 玉环县金源比特科技发展有限公司 | Combined vacuum coating process of magnetron sputtering and multisphere ion plating |
| CN201217685Y (en) * | 2008-05-28 | 2009-04-08 | 玉环县金源比特科技发展有限公司 | Magnetron sputtering and multi-sphere ion plating combined vacuum coating machine |
| CN101555596A (en) * | 2008-04-10 | 2009-10-14 | 林洪 | Vacuum plating process and complete equipment |
| CN103741098A (en) * | 2014-01-19 | 2014-04-23 | 遵化市超越钛金设备有限公司 | Dual-body double-faced vacuum coating equipment |
| CN106521410A (en) * | 2016-05-24 | 2017-03-22 | 温州市瓯海瞿溪兴悦真空镀膜厂 | Product coating method based on plastic or nylon products |
-
2020
- 2020-11-26 CN CN202011350141.8A patent/CN112458411A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101555596A (en) * | 2008-04-10 | 2009-10-14 | 林洪 | Vacuum plating process and complete equipment |
| CN201217685Y (en) * | 2008-05-28 | 2009-04-08 | 玉环县金源比特科技发展有限公司 | Magnetron sputtering and multi-sphere ion plating combined vacuum coating machine |
| CN101307428A (en) * | 2008-05-29 | 2008-11-19 | 玉环县金源比特科技发展有限公司 | Combined vacuum coating process of magnetron sputtering and multisphere ion plating |
| CN103741098A (en) * | 2014-01-19 | 2014-04-23 | 遵化市超越钛金设备有限公司 | Dual-body double-faced vacuum coating equipment |
| CN106521410A (en) * | 2016-05-24 | 2017-03-22 | 温州市瓯海瞿溪兴悦真空镀膜厂 | Product coating method based on plastic or nylon products |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113617610A (en) * | 2021-09-06 | 2021-11-09 | 佛山市东鹏陶瓷发展有限公司 | Method for preparing metal luster faucet by coating brass or zinc alloy substrate |
| CN116791051A (en) * | 2022-04-21 | 2023-09-22 | 广东德立科技发展有限公司 | Sputtering method of isolation layer |
| CN115404446A (en) * | 2022-08-24 | 2022-11-29 | 潮州市汇鑫陶瓷科技有限公司 | High-glossiness coating equipment and coating process special for ceramics |
| CN115404446B (en) * | 2022-08-24 | 2023-10-27 | 潮州市汇鑫陶瓷科技有限公司 | Special high-glossiness coating equipment and coating process for ceramics |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN112458411A (en) | Magnetron sputtering and multi-arc ion plating composite vacuum coating method | |
| CN109778136B (en) | Method for preparing diamond-like coating by adopting thermionic plasma technology | |
| WO2013045454A3 (en) | Coating of substrates using hipims | |
| CN206956141U (en) | A kind of magnetron sputtering coater | |
| CN210065893U (en) | Self-cleaning etching anode device | |
| CN110098044B (en) | Composite modification method for surface protection of neodymium iron boron magnet | |
| CN105200381B (en) | The auxiliary magnetic control sputtering film plating device of anodic field | |
| CN111519151A (en) | Multi-element hard coating and electromagnetic enhanced magnetron sputtering preparation process thereof | |
| CN208293072U (en) | A kind of coating machine that solid arc plasma irrigation source is set | |
| CN209144244U (en) | Electron beam coating system | |
| WO2013165036A1 (en) | High-speed film-forming device and film-forming method using same | |
| CN2219306Y (en) | Ionic coating equipment utilizing combination of arc evaporation and magnetocontrolled sputtering | |
| JPS61221363A (en) | Sputtering apparatus | |
| CN114540779B (en) | Composite cathode, magnetron sputtering coating equipment and coating method | |
| JP2000178730A (en) | High frequency sputtering device and thin film forming method using the same | |
| CN110965036B (en) | Rare earth permanent magnet surface vacuum coating equipment | |
| CN109136865A (en) | A kind of arc ion plating apparatus and deposition hard coat technique | |
| CN205152320U (en) | Magnetron sputtering coating film device is assisted to anodic field | |
| CN107723674A (en) | A kind of ion gun aids in high-power impulse magnetron sputtering precipitation equipment | |
| CN207760414U (en) | A kind of coating machine of setting solid arc plasma irrigation source | |
| CN209307475U (en) | A kind of arc ion plating apparatus | |
| JP2001081550A (en) | Reactive sputtering system, and method of film deposition | |
| CN209307474U (en) | A kind of device improving hard coat and substrate binding force | |
| CN101864559B (en) | Grid mesh magnetron sputtering hafnium evaporation method | |
| CN205710902U (en) | Enhancement mode magnetron sputtering coil film coating equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information | ||
| CB02 | Change of applicant information |
Address after: 215000 building 6, No. 168, Dongzhuang Road, Luzhi Town, Wuzhong District, Suzhou City, Jiangsu Province Applicant after: Suzhou denai Nano Technology Co.,Ltd. Address before: 215000 66-23 Linggang Road, Luzhi Town, Wuzhong District, Suzhou City, Jiangsu Province Applicant before: Suzhou denai Nano Technology Co.,Ltd. |
|
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20210309 |