CN104294231A - Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate - Google Patents
Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate Download PDFInfo
- Publication number
- CN104294231A CN104294231A CN201410534887.2A CN201410534887A CN104294231A CN 104294231 A CN104294231 A CN 104294231A CN 201410534887 A CN201410534887 A CN 201410534887A CN 104294231 A CN104294231 A CN 104294231A
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- China
- Prior art keywords
- magnetron sputtering
- sputtering coating
- vacuum magnetron
- gas barrier
- coating equipment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses vacuum magnetron sputtering coating equipment with a height-adjustable molecular pump gas partitioning plate. The vacuum magnetron sputtering coating equipment comprises a height adjusting structure, wherein the height adjusting structure consists of two groups of symmetrical lifting mechanisms; the lifting mechanisms comprise hanging plates, eccentric gears and ejector bars; rotating shafts of the eccentric gears are fixed on the vacuum magnetron sputtering coating equipment; the ejector bars are arranged on the upper sides of the eccentric gears; the tops of the hanging plates are connected with the ejector bars; the bottom ends of the hanging plates are arranged on the lower sides of the gas partitioning plates and are used for supporting the gas partitioning plates. The vacuum magnetron sputtering coating equipment has the advantages that firstly, the flexibility is relatively good, the gas partitioning plates can be adjusted to be in different heights so as to be applicable to demands of production when three-silver glass and single-silver glass are produced alternatively, and the production efficiency is improved; secondly, when relatively thick laminated glass is produced, in order to prevent the glass from being clamped by the gas partitioning plates, the partitioning plates can be lifted up, and when relatively thin glass is produced, the partitioning plates can be descended, so that the edge effect of a product can be eliminated, and the color uniformity of the product is improved.
Description
Technical field
The present invention is applied to glass industry, relates to off-line type vacuum magnetic-control sputtering glass coating equipment technical field, is specifically related to a kind of vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height.
Background technology
Taking magnetron sputtering as principle, horizontal vacuum filming equipment is utilized to manufacture coated glass field, molecular pump gas barrier plays and regulates the direction of air-flow and the effect of size, this effect is significant for suitability for industrialized production glass, but the gas barrier height of current all filming equipments is unadjustable, there is above shortcoming:
Easily clamp glass when 1, producing very thick laminated glass, bring very burden to production.
2, produce three silver medals different with the molecular pump gas barrier height required during single silver products, molecular pump gas barrier height is fixed, and to coating wire debugging, film system causes difficulty, adjusts the sheet time to lengthen, inefficiency.
3, existing coating wire molecular pump gas barrier height easily causes air-flow suddenly big or suddenly small, makes product colour edge effect phenomenon serious, has impact, affect product appearance to product colour homogeneity.
Summary of the invention
The object of the invention is to make up the deficiencies in the prior art, providing that a kind of production efficiency is higher, the vacuum magnetron sputtering coating film equipment of the more uniform adjustable molecular pump gas barrier height of product colour.
In order to reach object of the present invention, technical scheme is as follows:
A vacuum magnetron sputtering coating film equipment for adjustable molecular pump gas barrier height, have height adjusting structure, described height adjusting structure is made up of the hoisting appliance of two groups of symmetries, and described hoisting appliance comprises link plate, eccentric wheel and push rod,
Described eccentric rotation axis is fixed on vacuum magnetron sputtering coating film equipment, and described push rod is arranged on described eccentric upside, and the top of described link plate is connected with push rod, and the bottom of link plate is located at the downside of gas barrier and holds gas barrier.
As preferred technical scheme: described eccentric arranged outside has copper sheathing.
As preferred technical scheme: the shape of described link plate is L shape.
When rotating eccentric wheel, push rod can be driven to move up and down, thus drive the link plate be connected with push rod to move up and down, the gas barrier be located on link plate is finally driven to move up and down, because the base plate of placing glass and live roll height are changeless, thus achieve the adjustable this purpose of height distance between gas barrier and glass.And the shape of link plate is L shape, there is the protrusion limit of an arranged transversely lower end of link plate, and gas barrier is placed on the protrusion limit of link plate lower end by the gravity of self, and make gas barrier and link plate contact area so greatly, close contact, can not leak gas.
The beneficial effect that the present invention has:
1), handiness is better, exchange do three silver medals and single silver-colored glass time can by gas barrier height control to different height to adapt to the needs produced, improve production efficiency.
2), when producing thicker laminated glass in order to avoid glass is clamped by gas barrier, the height of gas barrier can be raised, when producing thinner glass, gas barrier height is turned down, the fringing effect of product can be eliminated, be conducive to the color homogeneity of raising product.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.
Embodiment
Below in conjunction with embodiment, the invention will be further described, but protection scope of the present invention is not only confined to embodiment.
As shown in Figure 1, a kind of vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height, the height adjusting structure comprising the base plate 5 of placing glass, be located at the live roll 6 on base plate 5 and be positioned at above live roll 6.Height adjusting structure is made up of the hoisting appliance of two groups of symmetries, and hoisting appliance comprises link plate 4, eccentric wheel 7 and push rod 3.
Push rod 3 be arranged on eccentric wheel 7 upside and with eccentric wheel upper contact, the rotation axis of eccentric wheel 7 is fixed on vacuum magnetron sputtering coating film equipment, on the pump end being specifically fixed on coating wire and operating side.The top of link plate 4 is connected with push rod 3, and the bottom of link plate 4 is located at the downside of gas barrier 1 and holds gas barrier 1, and the link plate 4 in two symmetrical hoisting appliances just holds the both sides of gas barrier 1.
When rotating eccentric wheel 7, push rod 3 can be driven to move up and down, thus drive the link plate 4 be connected with push rod 3 to move up and down, the gas barrier 1 be positioned on link plate is finally driven to move up and down, because the base plate 5 of placing glass and live roll 6 height are changeless, thus achieve adjustable this purpose of height distance between gas barrier 1 and glass.And the shape of link plate 4 is L shape, there is the protrusion limit of an arranged transversely lower end of link plate 4, and gas barrier 1 is placed on the protrusion limit of link plate 4 lower end by the gravity of self, and make gas barrier 1 large with link plate 4 contact area like this, close contact, can not leak gas.
The arranged outside of eccentric wheel 7 has copper sheathing 2, in order to protect eccentric wheel 7, reduces friction loss.
Last it is noted that above embodiment only in order to illustrate the present invention and and unrestricted technical scheme described in the invention, therefore, although this specification sheets with reference to each above-mentioned embodiment to present invention has been detailed description, but, those of ordinary skill in the art is to be understood that, still can modify to the present invention or equivalent replacement, and all do not depart from technical scheme and the improvement thereof of the spirit and scope of the present invention, it all should be encompassed in right of the present invention.
Claims (3)
1. the vacuum magnetron sputtering coating film equipment of an adjustable molecular pump gas barrier height, it is characterized in that: there is height adjusting structure, described height adjusting structure is made up of the hoisting appliance of two groups of symmetries, described hoisting appliance comprises link plate (4), eccentric wheel (7) and push rod (3)
The rotation axis of described eccentric wheel (7) is fixed on vacuum magnetron sputtering coating film equipment, described push rod (3) is arranged on the upside of described eccentric wheel (7), the top of described link plate (4) is connected with push rod (3), and the bottom of link plate (4) is located at the downside of gas barrier (1) and holds gas barrier (1).
2. the vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height according to claim 1, is characterized in that: the arranged outside of described eccentric wheel (7) has copper sheathing (2).
3. the vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height according to claim 1, is characterized in that: the shape of described link plate (4) is L shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410534887.2A CN104294231B (en) | 2014-10-10 | 2014-10-10 | Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410534887.2A CN104294231B (en) | 2014-10-10 | 2014-10-10 | Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104294231A true CN104294231A (en) | 2015-01-21 |
| CN104294231B CN104294231B (en) | 2017-02-01 |
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ID=52314177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410534887.2A Active CN104294231B (en) | 2014-10-10 | 2014-10-10 | Vacuum magnetron sputtering coating equipment with height-adjustable molecular pump gas partitioning plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104294231B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1413933A (en) * | 2002-09-06 | 2003-04-30 | 鲍冠中 | Magnetic control sputtering hot-bending coated glass and its production method and device |
| CN1890399A (en) * | 2003-12-12 | 2007-01-03 | 应用材料公司 | Mechanism for varying the spacing between sputter magnetron and target |
| CN201817543U (en) * | 2010-10-25 | 2011-05-04 | 北儒精密股份有限公司 | Lifting movable magnet set |
| CN202090052U (en) * | 2011-04-27 | 2011-12-28 | 广东中环真空设备有限公司 | Magnetic-controlled sputtering coating equipment |
| CN202688421U (en) * | 2012-06-15 | 2013-01-23 | 杨宪杰 | Horizontal type coating equipment |
| CN204151410U (en) * | 2014-10-10 | 2015-02-11 | 咸宁南玻节能玻璃有限公司 | A kind of vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height |
-
2014
- 2014-10-10 CN CN201410534887.2A patent/CN104294231B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1413933A (en) * | 2002-09-06 | 2003-04-30 | 鲍冠中 | Magnetic control sputtering hot-bending coated glass and its production method and device |
| CN1890399A (en) * | 2003-12-12 | 2007-01-03 | 应用材料公司 | Mechanism for varying the spacing between sputter magnetron and target |
| CN201817543U (en) * | 2010-10-25 | 2011-05-04 | 北儒精密股份有限公司 | Lifting movable magnet set |
| CN202090052U (en) * | 2011-04-27 | 2011-12-28 | 广东中环真空设备有限公司 | Magnetic-controlled sputtering coating equipment |
| CN202688421U (en) * | 2012-06-15 | 2013-01-23 | 杨宪杰 | Horizontal type coating equipment |
| CN204151410U (en) * | 2014-10-10 | 2015-02-11 | 咸宁南玻节能玻璃有限公司 | A kind of vacuum magnetron sputtering coating film equipment of adjustable molecular pump gas barrier height |
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| Publication number | Publication date |
|---|---|
| CN104294231B (en) | 2017-02-01 |
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| Date | Code | Title | Description |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C53 | Correction of patent of invention or patent application | ||
| CB03 | Change of inventor or designer information |
Inventor after: Yu Huajun Inventor after: Jiang Wei Inventor after: Hu Yong Inventor before: Yu Huajun Inventor before: Jiang Wei Inventor before: Xiong Jian Inventor before: Su Changfei Inventor before: Zhang Yaopeng |
|
| COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: YU HUAJUN JIANG WEI XIONG JIAN SU CHANGFEI ZHANG YAOPENG TO: YU HUAJUN JIANG WEI HU YONG |
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| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |