CN215050657U - Cathode baffle adjustable magnetron sputtering coating mechanism - Google Patents
Cathode baffle adjustable magnetron sputtering coating mechanism Download PDFInfo
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- CN215050657U CN215050657U CN202121270459.5U CN202121270459U CN215050657U CN 215050657 U CN215050657 U CN 215050657U CN 202121270459 U CN202121270459 U CN 202121270459U CN 215050657 U CN215050657 U CN 215050657U
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Abstract
The utility model relates to a magnetron sputtering coating mechanism with an adjustable cathode baffle, which comprises a cathode, a molecular pump, a traction mechanism, a baffle bracket and a conveying mechanism; the cathode is provided with a target and a cathode back plate, the baffle bracket is positioned above the conveying mechanism, the baffle bracket is provided with a slide rail and a cathode baffle, the cathode baffle is in sliding fit with the slide rail, and the traction mechanism drives the cathode baffle to slide along the slide rail; according to the scheme, the cathode baffle is designed into a sliding adjustable structure, and the size of the opening of the cathode baffle can be automatically adjusted according to the requirement of the thickness of a product film, so that the aim of adjusting the thickness of the film is fulfilled; and the cathode baffle can be designed into a sectional structure, and the opening size of each section is respectively controlled, so that the consistency of continuous batch production of products is improved, the uniformity of a film layer is effectively improved, and the quality and the appearance performance of the coated glass product meet the requirements of customers.
Description
Technical Field
The utility model relates to a magnetron sputtering coating mechanism with adjustable cathode baffle.
Background
At present, in a magnetron sputtering coating production line for producing coated glass at home and abroad, during equipment maintenance in each period, the cathode baffles are subjected to sand blasting cleaning work, then openings of the two cathode baffles are adjusted to a set size when being reinstalled, the openings are adjusted to be parallel to the opening edges, and the heights of all points on the opening edges of the two cathode baffles from the rollers are the same; after the maintenance is finished, the cathode baffle cannot be adjusted in a vacuum state, and after the coating production line is vacuumized to the production condition, production process personnel adjust the uniformity of the film layer through sectional type compensation gas quantity; if the uniformity of the film layer can not be adjusted to the required condition through the gas matching amount, the opening of the cathode baffle plate or the thickness of the magnetic bar gasket can only be manually adjusted after vacuum is broken during the next maintenance, so that the uniformity of the film layer can not be adjusted in time, and the quality and the appearance quality of a product are influenced; and because the opening of the cathode baffle plate needs to be adjusted repeatedly or the thickness of the magnetic bar gasket needs to be adjusted, the equipment is subjected to frequent vacuum breaking maintenance and repeated vacuum pumping, the cost is wasted, and the production efficiency is low.
SUMMERY OF THE UTILITY MODEL
The utility model aims to overcome the defects of the prior art and provide a magnetron sputtering coating mechanism with an adjustable cathode baffle.
In order to achieve the above purpose, the utility model adopts the technical scheme that: a magnetron sputtering coating mechanism with an adjustable cathode baffle comprises a cathode, a molecular pump, a traction mechanism, a baffle bracket and a conveying mechanism; the cathode is provided with a target and a cathode back plate, the baffle support is located above the conveying mechanism, the baffle support is provided with a slide rail and a cathode baffle, the cathode baffle is in sliding fit with the slide rail, and the traction mechanism drives the cathode baffle to slide along the slide rail.
Preferably, the traction mechanism comprises a motor, a nonmagnetic stainless steel wire and a plurality of reversing guide wheels, the motor is arranged in the installation space of the molecular pump, the nonmagnetic stainless steel wire penetrates through an air exhaust port in the installation space of the molecular pump, the nonmagnetic stainless steel wire is matched with the plurality of reversing guide wheels, and the motor pulls the cathode baffle to slide along the slide rail through the nonmagnetic stainless steel wire.
Preferably, the cathode baffle is of a sectional structure, and each section of cathode baffle is matched with a group of sliding rails and a traction mechanism.
Preferably, the baffle support is further provided with a protective cover plate, and the protective cover plate is positioned above the cathode baffle.
Because of above-mentioned technical scheme's application, compared with the prior art, the utility model have the following advantage:
the magnetron sputtering coating mechanism with the adjustable cathode baffle of the scheme of the utility model designs the cathode baffle into a sliding adjustable structure, and can automatically adjust the opening size of the cathode baffle according to the film thickness requirement of a product, thereby achieving the purpose of adjusting the film thickness; and the cathode baffle can be designed into a sectional structure, and the opening size of each section is respectively controlled, so that the consistency of continuous batch production of products is improved, the uniformity of a film layer is effectively improved, and the quality and the appearance performance of the coated glass product meet the requirements of customers.
Drawings
The technical scheme of the utility model is further explained by combining the attached drawings as follows:
FIG. 1 is a schematic view of a magnetron sputtering coating mechanism with adjustable cathode baffles according to the present invention;
fig. 2 is a schematic view of the overlooking structure of the magnetron sputtering coating mechanism with the adjustable cathode baffle of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
As shown in fig. 1-2, the magnetron sputtering coating mechanism with adjustable cathode baffle of the present invention comprises a cathode 1, a molecular pump 2, a traction mechanism 3, a baffle bracket 4 and a conveying mechanism; the conveying mechanism comprises a plurality of conveying rollers 9, and the conveying rollers 9 drive the glass 10 to pass under the cathode 1 and the baffle bracket 4.
The cathode comprises a cathode and a baffle support, wherein a target 5 and a cathode back plate 6 are arranged at the position of a cathode 1, the baffle support 4 is positioned above a conveying mechanism, the baffle support 4 is L-shaped, a sliding rail and a cathode baffle 7 are arranged on the baffle support 4, the sliding rail comprises a linear guide rail and a sliding block which are matched with each other, the linear guide rail is fixedly arranged on the baffle support 4, the sliding block is arranged on the cathode baffle 7, and a traction mechanism 3 drives the cathode baffle 7 to slide along the linear guide rail.
The traction mechanism 3 comprises a motor, a nonmagnetic stainless steel wire and a plurality of reversing guide wheels, the motor is arranged in the installation space of the molecular pump 2, the nonmagnetic stainless steel wire penetrates through an air suction port in the installation space of the molecular pump 2 and is matched with the plurality of reversing guide wheels, the motor pulls the cathode baffle 7 to slide along the slide rail through the nonmagnetic stainless steel wire, and the moving direction of the cathode baffle 7 is controlled through the positive and negative rotation of the motor.
For fine control, the cathode baffle 7 can be designed into a sectional structure, each section of the cathode baffle 7 is matched with a group of slide rails and the traction mechanism 3, the uniformity problem of a sputtered film layer of each set of cathodes can be effectively improved by adjusting the opening size of the sectional cathode baffle, and sputtered objects are required to be polished on the section of the cathode baffle to prevent the sputtered objects from being accumulated to influence sliding.
Still be provided with aluminum alloy's protection casing version 8 on the baffle support 4, protection casing version 8 is located the top of negative pole baffle 7, prevents that sputter material from piling up and leading to the unable flexible slip of negative pole baffle.
The above is only a specific application example of the present invention, and does not constitute any limitation to the protection scope of the present invention. All the technical solutions formed by equivalent transformation or equivalent replacement fall within the protection scope of the present invention.
Claims (4)
1. The utility model provides a negative pole baffle adjustable magnetron sputtering coating mechanism which characterized in that: comprises a cathode (1), a molecular pump (2), a traction mechanism (3), a baffle bracket (4) and a conveying mechanism; the cathode structure is characterized in that a target (5) and a cathode back plate (6) are arranged at the position of the cathode (1), the baffle support (4) is located above the conveying mechanism, a sliding rail and a cathode baffle (7) are arranged on the baffle support (4), the cathode baffle (7) is in sliding fit with the sliding rail, and the traction mechanism (3) drives the cathode baffle (7) to slide along the sliding rail.
2. The magnetron sputtering coating mechanism with the adjustable cathode baffle plate of claim 1, which is characterized in that: the traction mechanism (3) comprises a motor, a nonmagnetic stainless steel wire and a plurality of reversing guide wheels, the motor is arranged in the installation space of the molecular pump (2), the nonmagnetic stainless steel wire penetrates through an air exhaust port in the installation space of the molecular pump (2), the nonmagnetic stainless steel wire is matched with the plurality of reversing guide wheels, and the motor pulls the cathode baffle (7) to slide along the sliding rail through the nonmagnetic stainless steel wire.
3. The magnetron sputtering coating mechanism with the adjustable cathode baffle plate of claim 1, which is characterized in that: the cathode baffle (7) is of a sectional structure, and each section of cathode baffle (7) is matched with one group of sliding rails and the traction mechanism (3).
4. The magnetron sputtering coating mechanism with the adjustable cathode baffle plate of claim 1, which is characterized in that: the cathode baffle plate is characterized in that a protective cover plate (8) is further arranged on the baffle support (4), and the protective cover plate (8) is located above the cathode baffle plate (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121270459.5U CN215050657U (en) | 2021-06-08 | 2021-06-08 | Cathode baffle adjustable magnetron sputtering coating mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121270459.5U CN215050657U (en) | 2021-06-08 | 2021-06-08 | Cathode baffle adjustable magnetron sputtering coating mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215050657U true CN215050657U (en) | 2021-12-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202121270459.5U Active CN215050657U (en) | 2021-06-08 | 2021-06-08 | Cathode baffle adjustable magnetron sputtering coating mechanism |
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| Country | Link |
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| CN (1) | CN215050657U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114455852A (en) * | 2021-12-28 | 2022-05-10 | 凯盛信息显示材料(黄山)有限公司 | Magnetron sputtering glass coating device with adjustable sputtering range |
-
2021
- 2021-06-08 CN CN202121270459.5U patent/CN215050657U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114455852A (en) * | 2021-12-28 | 2022-05-10 | 凯盛信息显示材料(黄山)有限公司 | Magnetron sputtering glass coating device with adjustable sputtering range |
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