CN2339589Y - Flexible-winding film-plating machine - Google Patents

Flexible-winding film-plating machine Download PDF

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Publication number
CN2339589Y
CN2339589Y CN 98231060 CN98231060U CN2339589Y CN 2339589 Y CN2339589 Y CN 2339589Y CN 98231060 CN98231060 CN 98231060 CN 98231060 U CN98231060 U CN 98231060U CN 2339589 Y CN2339589 Y CN 2339589Y
Authority
CN
China
Prior art keywords
isolation channel
chamber
cooling roller
film
flexible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 98231060
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Chinese (zh)
Inventor
彭传才
黄广连
曹志刚
胡云慧
余圣发
魏敏
李京增
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bada Film Electronic Technology Inst Changsha National Defence Science & Techn
Original Assignee
Bada Film Electronic Technology Inst Changsha National Defence Science & Techn
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bada Film Electronic Technology Inst Changsha National Defence Science & Techn filed Critical Bada Film Electronic Technology Inst Changsha National Defence Science & Techn
Priority to CN 98231060 priority Critical patent/CN2339589Y/en
Application granted granted Critical
Publication of CN2339589Y publication Critical patent/CN2339589Y/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model relates to a flexible winding film-plating machine which is composed of a winding chamber, a film-plating chamber and an auxiliary device, wherein in the film-plating chamber, a plurality of magnetic-controlled sputtering targets are installed around a cooling roller. An isolation trench is installed between two targets, and the isolation trench is communicated with an air extractor. The distance between the isolation trench and the cooling roller is not greater than 10mm, and each target is provided with an independent air-distributing pipe. The utility model realizes the continuous plating of the low-radiation film on the flexible material.

Description

The flexible winding coating equipment
The utility model relates to the equipment that carries out winding film plating on flexible parent metal.
Low-radiation film system is that a kind of widely used film is.Usually, it is to be that base material carries out plated film with glass.The main body of its filming equipment is horizontally disposed separate target chamber.Each target chamber is finished the plated film of a rete.Obviously, carry out plated film with this kind equipment, its production is can not successive, and production efficiency is not high.And the size of plated film is subjected to the restriction of target chamber size.On the other hand, the equipment that carries out the flexible winding plated film is arranged in the prior art, the flexible winding coating equipment of producing as Japanese vacuum Co., Ltd..This equipment mainly comprises the coiling chamber, coating chamber and supplementary unit.The coiling chamber is by wind-up roll, and compositions such as let off roll are finished the folding and unfolding process of flexible parent metal; Coating chamber mainly is made up of evaporation source and air-supply duct, finishes coating process; Supplementary unit comprises air extractor, refrigerating unit etc.But this equipment is merely able to plate a skim.
The utility model purpose provides a kind of equipment that can realize on flexible parent metal that low-radiation film plates continuously.
Technical solutions of the utility model are to be provided with a plurality of magnetron sputtering targets around cooling roller in coating chamber, are provided with isolation channel between per two magnetron sputtering targets, and this isolation channel is communicated with air extractor, is provided with venting hole and communicates with target chamber on isolation channel; Distance between isolation channel and the cooling roller is not more than 10mm; Each magnetron sputtering target is furnished with independently gas distribution pipe.
Plate low-radiation film on flexible parent metal, must adopt the many target position of spirally wound to plate continuously, and each layer requires the interface clear in the film system, metal level wherein (being Ag mostly) can not oxidation, so requires the control of atmosphere and be isolated into the key issue of this device.In the utility model, coiling chamber and coating chamber are isolated.Because the distance between isolation channel and the cooling roller is not more than 10mm, add that each magnetron sputtering target is furnished with the venting hole of offering on the independently gas distribution pipe and isolation channel, make and do not collaborate between each target chamber, can realize smoothly that multiwalled plates continuously.Quantity as for target chamber is determined by concrete coating process.For example, for TiO2-Ag-TiO2 film system, need three target chambers at least.
Further improving is at the control of the air-flow in the target chamber, is provided with the tunnel of bleeding in the utility model in isolation channel, and this tunnel of bleeding is communicated with air extractor, offers venting hole on the tunnel of bleeding and communicates with isolation channel.Like this, reduced the influence of air extractor to atmosphere in the target chamber, such design can increase the homogeneity of air feed, improves the quality of rete.
Between each isolation channel and cooling roller, also be provided with and decide baffle plate.Should decide baffle plate block on rete, and made the rete of reeling, do not have plated film formation, guaranteed further just that the interface between each rete was clear when deciding this section that baffle plate covers.
Aspect the coating monitoring, the utility model adopts the directly probe of measurement rete optical property, rather than traditional method that thicknesses of layers is measured.In coiling plating process, monitor each tunic thickness respectively and can't implement, and supervisory system will be very complicated.And, can reflect the situation that each rete is thick, so that can adjust thicknesses of layers at any time effectively by monitoring the final performance of rete.
The flexible winding coating equipment that the utility model provides can be implemented in the continuous plating of carrying out low-radiation film on the flexible parent metal.
Fig. 1 is the structural representation of the utility model embodiment;
Fig. 2 is the sectional view of isolation channel among the utility model embodiment;
Fig. 3 is the sectional view of isolation channel among the utility model embodiment.
Embodiment
As shown in Figure 1, the utility model embodiment is made up of coiling chamber 2 and coating chamber 17 etc., separates with median septum 9 between coiling chamber 2 and the coating chamber 17.Be provided with wind-up roll 3 and let off roll 1 in the coiling chamber 2, dispose one group of guide roller 6 separately, tensioning roller 7, pressure roller 8 is provided with ion cleaning device 18 in the side near let off roll 1, and the flexible parent metal before the plated film is cleaned.Be provided with the monitoring probe 4 of measuring the rete transmittance in a side near wind-up roll 3.Have viewing window 5 on the shell of coiling chamber 2.Be provided with cooling roller 15 in the coating chamber 17, be provided with 5 magnetron sputtering targets 10 around cooling roller.The target source of each target requires to decide according to actual coating process.Each magnetron sputtering target 10 is furnished with independently gas distribution pipe 13.Be provided with isolation channel 14 between two targets.Be provided with between isolation channel 14 and the cooling roller 15 and decide baffle plate 11.Respectively being provided with row's aspirating hole 21,22,23 on the isolation channel 14 with on 12 contacted of target chambers and the face relative, as Fig. 2, shown in 3 with cooling roller 15.In isolation channel 14, also be provided with the tunnel 16 of bleeding.On the tunnel 16 of bleeding, also offer row's aspirating hole 20.This tunnel 16 of bleeding communicates with air extractor.

Claims (4)

1. flexible winding coating equipment, comprise coiling chamber and coating chamber and supplementary unit, it is characterized in that in coating chamber, being provided with a plurality of magnetron sputtering targets around cooling roller, be provided with isolation channel between per two magnetron sputtering targets, this isolation channel and air extractor UNICOM are provided with venting hole and communicate with target chamber on isolation channel; Distance between isolation channel and the cooling roller is not more than 10mm; Each magnetron sputtering target is furnished with independently gas distribution pipe.
2. flexible winding coating equipment according to claim 1 is characterized in that being provided with the tunnel of bleeding in isolation channel, also offer venting hole on this tunnel of bleeding and communicate with isolation channel; The tunnel of bleeding communicates with air extractor.
3. flexible winding coating equipment according to claim 1, it is characterized in that being provided with in the coiling chamber direct measurement institute plated film is the probe of transmittance.
4. flexible winding coating equipment according to claim 1 is characterized in that being provided with certain baffle plate between each isolation channel and cooling roller.
CN 98231060 1998-07-15 1998-07-15 Flexible-winding film-plating machine Expired - Fee Related CN2339589Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 98231060 CN2339589Y (en) 1998-07-15 1998-07-15 Flexible-winding film-plating machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 98231060 CN2339589Y (en) 1998-07-15 1998-07-15 Flexible-winding film-plating machine

Publications (1)

Publication Number Publication Date
CN2339589Y true CN2339589Y (en) 1999-09-22

Family

ID=33980528

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 98231060 Expired - Fee Related CN2339589Y (en) 1998-07-15 1998-07-15 Flexible-winding film-plating machine

Country Status (1)

Country Link
CN (1) CN2339589Y (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1874032B (en) * 2005-06-01 2010-05-26 索尼株式会社 Cathode for secondary battery, secondary battery, and method of manufacturing cathode for secondary battery
CN101314311B (en) * 2007-05-30 2011-06-15 中国印钞造币总公司 False proof thin film and producing method thereof
CN103361623A (en) * 2013-07-30 2013-10-23 林正亮 Winding evaporation type vacuum coating machine
CN104294225A (en) * 2013-07-19 2015-01-21 日东电工株式会社 Sputtering device
CN105063561A (en) * 2015-07-21 2015-11-18 赛柏利安工业技术(苏州)有限公司 Single-drum vertical continuous magnetron sputtering vacuum equipment for composite winding indium tin oxide (ITO) flexible base material
CN105887014A (en) * 2015-07-21 2016-08-24 赛柏利安工业技术(苏州)有限公司 Normal-temperature single-drum vertical continuous vapor deposition equipment system for multiple layers of ITO flexible substrates
CN106011773A (en) * 2016-06-20 2016-10-12 广东振华科技股份有限公司 EMI shielding film magnetic control winding coating machine
CN108588668A (en) * 2018-04-28 2018-09-28 东北大学 Winding film plating system for manufacturing flexible substrates plural layers
CN109252144A (en) * 2018-12-01 2019-01-22 安徽方兴光电新材料科技有限公司 A kind of flexible winding filming equipment miscellaneous gas cleaning isolating device
CN109554680A (en) * 2019-02-12 2019-04-02 浙江德佑新材料科技有限公司 A kind of devices of coiled vacuum coating machine

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1874032B (en) * 2005-06-01 2010-05-26 索尼株式会社 Cathode for secondary battery, secondary battery, and method of manufacturing cathode for secondary battery
CN101314311B (en) * 2007-05-30 2011-06-15 中国印钞造币总公司 False proof thin film and producing method thereof
CN104294225A (en) * 2013-07-19 2015-01-21 日东电工株式会社 Sputtering device
CN103361623B (en) * 2013-07-30 2016-07-06 林正亮 A kind of winding vaporation-type vacuum coating equipment
CN103361623A (en) * 2013-07-30 2013-10-23 林正亮 Winding evaporation type vacuum coating machine
CN105887014A (en) * 2015-07-21 2016-08-24 赛柏利安工业技术(苏州)有限公司 Normal-temperature single-drum vertical continuous vapor deposition equipment system for multiple layers of ITO flexible substrates
CN105063561A (en) * 2015-07-21 2015-11-18 赛柏利安工业技术(苏州)有限公司 Single-drum vertical continuous magnetron sputtering vacuum equipment for composite winding indium tin oxide (ITO) flexible base material
CN105887014B (en) * 2015-07-21 2019-02-19 赛柏利安工业技术(苏州)有限公司 The vertical continuous vapor deposition apparatus system of room temperature multilayer ITO flexible parent metal single-drum
CN106011773A (en) * 2016-06-20 2016-10-12 广东振华科技股份有限公司 EMI shielding film magnetic control winding coating machine
CN108588668A (en) * 2018-04-28 2018-09-28 东北大学 Winding film plating system for manufacturing flexible substrates plural layers
CN109252144A (en) * 2018-12-01 2019-01-22 安徽方兴光电新材料科技有限公司 A kind of flexible winding filming equipment miscellaneous gas cleaning isolating device
CN109554680A (en) * 2019-02-12 2019-04-02 浙江德佑新材料科技有限公司 A kind of devices of coiled vacuum coating machine
CN109554680B (en) * 2019-02-12 2024-02-09 浙江德佑新材料科技有限公司 Winding type vacuum coating machine

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Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee

Owner name: SHANGHAI KAILIDE COATING TECHNOLOGY CO., LTD.

Free format text: FORMER NAME OR ADDRESS: BADA FILM ELECTRONIC TECHNOLOGY INST., CHANGSHA NATIONAL DEFENCE SCIENCE + TECHN

CP03 Change of name, title or address

Address after: 200000 Shanghai city Jingan District Yanping Road No. 69 room 1005

Patentee after: Shanghai kaiyeah Lide Coating Technology Co. Ltd.

Address before: 410037 Changsha City, Hunan Province on the big ridge

Patentee before: Bada Film Electronic Technology Inst., Changsha National Defence Science & Techn

C19 Lapse of patent right due to non-payment of the annual fee
CF01 Termination of patent right due to non-payment of annual fee