CN109912229A - Large area AZO coating film on glass production line - Google Patents
Large area AZO coating film on glass production line Download PDFInfo
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- CN109912229A CN109912229A CN201711329398.3A CN201711329398A CN109912229A CN 109912229 A CN109912229 A CN 109912229A CN 201711329398 A CN201711329398 A CN 201711329398A CN 109912229 A CN109912229 A CN 109912229A
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Abstract
The invention discloses large area AZO coating film on glass production lines, including coating wire and transmission line, the coating wire includes sequentially connected upstream chamber, import surge chamber, import transfer chamber, sputtering chamber, export transfer chamber, export surge chamber, downstream chamber and quality inspection room, at least one valve is equipped between adjacent room, the transmission line includes live-roller and plated film quality inspection roller, the upstream chamber, import surge chamber, import transfer chamber, sputtering chamber, export transfer chamber, sequentially connected live-roller is equipped in outlet surge chamber and downstream chamber, plated film quality inspection roller is equipped in the quality inspection room, live-roller is connected with plated film quality inspection roller in the downstream chamber, the live-roller and plated film quality inspection roller are for transmitting film plating substrate.Large area AZO coating film on glass production line provided by the invention can be realized the high-volume of all kinds of large-area coating films, low cost production, and sputter deposition rate is high, and technique is versatile.Plain diffusion path is short, no intermediate product, element-free evaporation, thus preparation speed is fast, high-efficient, and yields is up to 95% or more, is particularly suitable for large-scale industrial production.
Description
Technical field
The present invention relates to large area AZO coating film on glass production lines, belong to technical field of vacuum plating.
Background technique
Vacuum coating technology is begun to show in the 1930s, four the fifties start industrial application occur, and industrialization is big to advise
Mould production starts from widely answering in the 1980s, obtaining in the industry such as electronics, aerospace, packaging, decoration, gold stamping printing
With.Vacuum coating technology is the new technology of a kind of novel materials synthesis and processing, is the important set of field of surface engineering technique
At part.Vacuum coating technology is the plated film that the surface of solids is coated to one layer of property using physics, chemical means, to make
There is the surface of solids wear-resistant, high temperature resistant, corrosion-resistant, anti-oxidant, radiation protection, conduction, magnetic conduction, insulation and ornament lamp many to be better than
The superior function of solid material itself reaches and improves product quality, extends life of product, the significant technology warp of energy saving and acquisition
The effect for benefit of helping.Need plated film is referred to as substrate, and the material of plating is referred to as target.
Magnetron sputtering is to make target atom or molecule be sputtered out using lotus energy particle bombardment solid target and deposit to
A kind of technique of substrate surface.Metallic target and ceramic target can be selected in target.Magnetron sputtering the preparation method has deposition rate height, substrate
The advantages of temperature is low, film forming adhesion is good, easy to control, at low cost, suitable large area is film-made.Exactly needs are made for vacuum evaporation
The substance of film, which is put in vacuum, to be evaporated or distils, and is allowed to be precipitated over the substrate surface.The device of vacuum evaporation is simpler
Single, technological parameter is less, the growth of easily-controllable made membrane, and impurity content is low in film.But the height of vacuum degree directly affects film
Structure and performance, vacuum degree is low, and material is seriously polluted by residual gas molecule, film performance be deteriorated, improve underlayer temperature have
Conducive to the desorption of gas molecule.
With in field of vacuum coating coating technique make rapid progress, the requirement to coated product is also higher and higher, therefore
More and more improving also occurs in coating film production line, and the requirement of production line increases accordingly, the coating film production line of the prior art it is whole
Body stability and plating film uniformity, production efficiency is low and corresponding equipment cost is high.
AZO glass (ZnO:Al) prepares raw material and is easy to get, and manufacturing cost is cheap, nontoxic, it is easy to accomplish doping, performance indicator
It is good.But its film layer is partially soft, tempering is unable to after plated film, the resting period is short after product etching.
Summary of the invention
In view of the above-mentioned problems existing in the prior art, the object of the present invention is to provide can vertical plated film large area AZO glass
Glass coating film production line.
For achieving the above object, The technical solution adopted by the invention is as follows:
The purpose of the present invention is to provide large area AZO coating film on glass production line, the large area AZO coating film on glass production
Line includes coating wire and transmission line, and the coating wire includes sequentially connected upstream chamber, import surge chamber, import transfer chamber, splashes
Room, outlet transfer chamber, outlet surge chamber, downstream chamber and quality inspection room are penetrated, is equipped at least one valve, the biography between adjacent room
Line sending includes live-roller and plated film quality inspection roller, the upstream chamber, import surge chamber, import transfer chamber, sputtering chamber, outlet transmission
It is equipped with sequentially connected live-roller in room, outlet surge chamber and downstream chamber, the plated film quality inspection of connection is equipped in the quality inspection room
Roller and a large area AZO glass quality inspection area, large area AZO glass quality inspection area include both side plate disposed in parallel, in two sides
The vacuum film plating substrate frame slided on plate and a quality inspection system, the side plate are equipped with guide rail, vacuum film plating substrate frame bottom
Portion is equipped with slide key and transmission mechanism, and the vacuum film plating substrate frame is moved on guide rail by slide key and transmission mechanism, institute
It states live-roller in downstream chamber to be connected with plated film quality inspection roller, the plated film quality inspection roller is connected with large area AZO glass quality inspection area.
The vacuum film plating substrate frame is at least one, and each guide rail quantity is the two of vacuum film plating substrate frame quantity
Times, the guide rail is contour respectively to be installed on the both side plate in large area AZO glass quality inspection area, each vacuum film plating substrate frame side
Side is located on guide rail, i.e., vacuum film plating substrate frame slides on its corresponding guide rail, i.e., in large area AZO glass quality inspection Qu Shangshui
Translation is dynamic.
The quality inspection system includes light source and sequentially connected photodetector, filter and A/D converter, the light source
The top and bottom of large area AZO glass quality inspection area both side plate, i.e., the described light source and photodetection are divided into photodetector
There are several guide rails between device, the light that the light source issues is received by a photoelectric detector through vacuum film plating substrate, is led to after filtering
It crosses A/D converter and is converted to detection signal.
The transmission mechanism is set to vacuum film plating substrate frame and rail attachment point, moves towards installation along guide rail.
The transmission mechanism includes permanent magnet transmission motor, magnetic steering part and the Magnetic drive part of magnetic connection, the Magnetic drive
Part is installed on vacuum film plating substrate frame side, and the magnetic steering part is installed on guide rail interior.
On the vacuum film plating substrate frame and several row's substrates hole is shown, vacuum film plating substrate is installed in substrate hole.
The quality inspection system further includes server, and the server is connected with A/D converter, the electric signal for will convert
It is analyzed and is compared.
Preferably, the import surge chamber, import transfer chamber, sputtering chamber and outlet transfer chamber are mounted on heating device.
It is highly preferred that heat-insulated by mirror board between the heating device and each process chamber.
Preferably, the end of roll shaft vertically is equipped with universal bearing.
Preferably, at least one sputtering disk is equipped in the sputtering chamber, the sputtering disk is equipped at least three target position, described
Sputter disk by first driving device close to or far from glass substrate.
It is highly preferred that the target position of the sputtering disk is equipped with cover board, the cover board with to sputter disk hinged, the cover board with splash
It penetrates and is equipped with return spring between disk.
It is highly preferred that the sputtering chamber is equipped with sputter gun, the sputter gun is driven across target position by third driving device
Or leave target position.
It is highly preferred that the sputtering disk is parallel with respect to glass substrate along glass substrate length direction by the second driving device
It is mobile.
It is highly preferred that the sputtering disk is parallel with respect to glass substrate along glass substrate width direction by fourth drive device
It is mobile.
Compared with prior art, large area AZO coating film on glass production line provided by the invention has following advantage:
1. using the magnetron sputtering mode of continuity vertical film substrate, so that film reduces environment in coating process
Influence of the middle impurity to coating quality.
2. rotary target improves the utilization rate of target and the uniformity of plated film film layer, target is not in recessed when being bombarded
Hole avoids the formation of sputtering oxide layer.Target utilization is high, and average film thickness is small, even film layer.
3. magnetron sputtering has the characteristics that high speed pellets, almost all of metal and alloy, conductor and insulator can be plated,
And can on the metal of low melting point and plastics plated film, and the speed of plated film is high.
4. multi-stage vacuum degree setting technology can be realized vacuum degree adjusting when plated film, while in the case where high temperature plated film,
Guarantee the uniformity that substrate is heated in condition of high vacuum degree, energy saving.
5. live-roller and quality inspection roll structure are simple, reliable for operation, processing and manufacturing is easy, and substrate transmits smoothness height, friction
Wheel replacement is convenient, to ensure that coating quality, and can reduce the manufacture and maintenance cost of production line, transmission stroke control essence
It is very small to spend deviation.
6. the setting that the two-stage vacuum of pumping equipment pumps, vacuum degree pumpdown time is short, operates the sealing effect of door in addition
Fruit is uniform, and sputtering chamber final vacuum reaches 10-5Pa is suitable for all kinds of coating film production lines.
7. directly automatic after plated film carry out quality inspection, vacuum coating is realized simultaneously with quality inspection, improves production efficiency.
In short, large area AZO coating film on glass production line provided by the invention can be realized the large quantities of of all kinds of large-area coating films
Amount, low cost production, and sputter deposition rate is high, and technique is versatile.Plain diffusion path is short, no intermediate product, element-free
Evaporation, thus preparation speed is fast, high-efficient, yields is up to 95% or more, is particularly suitable for large-scale industrial production.
Detailed description of the invention
Fig. 1 is structural schematic diagram of the invention；
Fig. 2 is large area AZO glass quality inspection plot structure schematic diagram provided by the invention；
Fig. 3 is the process flow diagram of large area AZO coating film on glass production line provided by the invention；
Fig. 4 is the preferred embodiment schematic diagram in large area AZO glass quality inspection provided by the invention area；
Fig. 5 is the structural schematic diagram of present invention sputtering disk；
Wherein, 1, upstream chamber, 2, import surge chamber, 3, import transfer chamber, 4, sputtering chamber, 41, sputtering disk, 42, target position,
43, cover board, 5, outlet transfer chamber, 6, outlet surge chamber, 7, downstream chamber, 8, quality inspection room, 81, side plate, 82, guide rail, 83, Vacuum Deposition
Film substrate frame.
Specific embodiment
The present invention is made further to illustrate in detail, completely below with reference to embodiment and comparative example.
Large area AZO coating film on glass production line of the invention be vertical coating single side, be designed as eight cell structures, respectively into
Mouth room, import surge chamber, import transfer chamber, sputtering chamber (determination is divided into several sections again according to processing and installation condition), outlet transmit
Room, outlet surge chamber, downstream chamber and quality inspection room, each process chamber are connected by flap valve；As seen from Figure 1, prepared by production line
Processing step be: upper section substrate transport to upstream chamber, the import surge chamber of upstream chamber substrate transport to condition of high vacuum degree, import
Surge chamber substrate is transported to sputtering chamber, sputtering chamber substrate by import transfer chamber and is transported by exporting transfer chamber to outlet buffering
Room, outlet surge chamber substrate transport to the downstream chamber of rough vacuum, the substrate of downstream chamber's substrate transport to quality inspection room, quality inspection qualification
Transport is to unloading section (10~70).
In the present embodiment, sputtering chamber design has 6 direct current target position, and 6 pieces of Mo targets realize the Mo of high quality using DC power supply
Film；Equipment designs the planar glass substrate material of 1 610mm × 435mm of processing dimension, productive temp 420s；Production line is adopted
It is evacuated the design to form gas isolating with molecular pump, production line is furnished with 6 TMP-V2304LM maglev molecular pumps (day island proper altogether
Saliva) to obtain efficient isolation, stable pumping speed and the distribution of uniform gas.
In the present embodiment, production line and each chamber design size are as follows:
Upstream chamber/import surge chamber/import transfer chamber/outlet transfer chamber/outlet surge chamber/downstream chamber: 850mm (L) ×
1200mm(H)×500(W)；
Sputtering chamber: 5000mm (L) × 1200mm (H) × 500mm (W)；
Quality inspection room: 1000mm (L) × 1200mm (H) × 500mm (W)；
Flap valve: 150mm (L) × 1200mm (H) × 150mm (W)；
Large area AZO coating film on glass production line total length: 12.15m (be subject to actual design)；
In the present embodiment, upstream chamber is low vacuum aspirating chamber, completes low vacuum pumping process, and pedestal is automatically sent to
Fine pumping room.
Vacuum cavity portion size: 850mm (L) × 1200mm (H) × 500mm (W) is designed to abnormally-structured, subtracts as far as possible
The interior space of small box.
Bleeding point is mounted on bottom plate, pumping bore be DN100, air-extractor:
Sliding vane rotary pump (SV300B) 1 (German Lay is precious)；
Lobe pump (WAU1001) 1 (German Lay is precious).
Deflation inlet duct: upstream chamber deflation is totally 2, first to carry out soft deflation by Pneumatic corner valve DN40.
Gas isolator: being isolated between atmosphere using simple flap valve, and simple and effective (utilizing atmospheric pressure) is acted.
Operational effectiveness: vacuum degree reaches 5~8 × 100Pa。
In the present embodiment, import surge chamber is fine pumping room, completes fine pumping process, and pedestal is passed automatically
It is sent in transfer chamber.
Vacuum cavity portion size: 850mm (L) × 1200mm (H) × 500mm (W).
Air-extractor:
Molecular pump (TMP-V2304LM) 1 (Japanese Shimadzu).
Atmosphere isolation device: being isolated between first part using advanced flap valve, can stablize effectively be isolated it is low
Vacuum and high vacuum environment fill balanced gas (Ar) by flowmeter control.
Heating: back side panel installs 3 sections of heating devices, and front side board installs 3 sections of heating devices, carries out just to substrate and substrate frame
It is heat-insulated to install four layers of stainless steel mirror board for step heating between stainless steel heater and cabinet.
Molecular pump is mounted on door-plate, and molecular pump exhaust pipe is connect with fore pump pipeline to be realized automatically using pneumatic structure
It seals and automatically opens, mutual disassembly's pump-line is not had to when switch gate.
Operational effectiveness: vacuum degree reaches 2~5 × 10 after Ar balance-1Pa (normal coating process vacuum degree)；
In the present embodiment, import transfer chamber, for substrate frame to be transmitted to sputtering chamber by fine pumping room, substrate frame is passed
Speed is sent to be transformed into plated film transmission speed by transmission speed.
Vacuum cavity portion size: 850mm (L) × 1200mm (H) × 500mm (W).
The configuration of fine pumping prime part (import surge chamber, import transfer chamber, sputtering chamber, outlet transfer chamber and outlet
Surge chamber shares):
Sliding vane rotary pump (SV300B) 1 (German Lay is precious)；
Lobe pump (WAU1001) 1 (German Lay is precious)；
Fine pumping maintains part to configure:
Molecular pump (TMP-V2304LM) 1 (Japanese Shimadzu).
Atmosphere isolation device: be isolated with second part using advanced flap valve, can efficiently separate pumping atmosphere and
Processing atmosphere.
Heating: back side panel installs three sections of heating devices, and front side board installs five sections of heating devices, carries out to substrate and substrate frame
It is heat-insulated to install four layers of stainless steel mirror board for high-temperature heating between stainless steel heater and cabinet.
Molecular pump is mounted on door-plate, and molecular pump exhaust pipe is connect with fore pump pipeline to be realized automatically using pneumatic structure
It seals and automatically opens, mutual disassembly's pump-line is not had to when switch gate.
In the present embodiment, sputtering chamber completes vacuum sputtering coating.
At least one sputtering disk is equipped in the present embodiment, in the sputtering chamber, the sputtering disk is equipped at least three target position,
The sputtering disk by first driving device close to or far from glass substrate.
In the present embodiment, the target position of the sputtering disk is equipped with cover board, and the cover board and sputtering disk are hinged, the cover board and
It sputters and is equipped with return spring between disk.
In the present embodiment, the sputtering chamber is equipped with sputter gun, and the sputter gun is driven across target by third driving device
Target position is left in position.
In the present embodiment, the sputtering disk is flat with respect to glass substrate along glass substrate length direction by the second driving device
Row movement.
In the present embodiment, the sputtering disk is flat with respect to glass substrate along glass substrate width direction by fourth drive device
Row movement.
Vacuum cavity portion size: 5000mm (L) × 1200mm (H) × 500mm (W)；
Heating: bottom plate is equipped with three sections of heating devices, and non-target side plate installs five sections of heating devices, guarantees glass when plated film
Temperature stablize, temperature maintain range be ± 5 DEG C；Between stainless steel heater and cabinet install four layers of stainless steel mirror board every
Heat installs titanium plate and as soaking and blocks sputtering object between heater and substrate frame.
Maintain exhaust portion configuration:
Molecular pump (TMP-V2304LM) 2 (Japanese Shimadzu).
Molecular pump is mounted on door-plate, and molecular pump exhaust pipe is connect with fore pump pipeline to be realized automatically using pneumatic structure
It seals and automatically opens, mutual disassembly's pump-line is not had to when switch gate.
Direct current planar magnetic controlled sputtering target: all single cathodes can be mounted in any target position of coating wire, and specific location can basis
Process requirement arrangement.
Cathode baffle and gas distributing system:
3 layers with mass flow controller (AE) equal gas air supply systems；
The protection of stomata and side shielding；
Sputter baffle；
Shielding case: installing a secondary shielding case on cathode site, and polygamy after a secondary production in viability for exchanging
It is spare after sandblasting, the baffle of shield, side including upper part and up and down shielding etc..
In the present embodiment, transfer chamber is exported, maintains room for substrate frame to be transmitted to high vacuum by sputtering chamber, substrate frame passes
Speed is sent to be transformed into transmission speed by plated film transmission speed；
Vacuum cavity portion size: 850mm (L) × 1200mm (H) × 500mm (W)；
Fine pumping maintains part to configure:
Molecular pump (TMP-V2304LM) 1 (Japanese Shimadzu).
Atmosphere isolation device: being isolated using advanced flap valve, isolation pumping atmosphere and process gas that can be effective and stable
Atmosphere.
Heating: back side panel installs 3 sections of heating devices, and front side board is installed 3 sections of heating devices, protected to substrate and substrate frame
It is heat-insulated to install four layers of stainless steel mirror board for temperature heating between stainless steel heater and cabinet.
Molecular pump is mounted on door-plate, and molecular pump exhaust pipe is connect with fore pump pipeline to be realized automatically using pneumatic structure
It seals and automatically opens, mutual disassembly's pump-line is not had to when switch gate.
In the present embodiment, surge chamber is exported, for substrate frame to be transmitted to downstream chamber by fine pumping room；Vacuum state
Low vacuum is transitioned by high vacuum, substrate frame is by outlet surge chamber automatic Transition to downstream chamber.
Vacuum cavity portion size: 850mm (L) × 1200mm (H) × 500mm (W)；
Maintain exhaust portion configuration:
Molecular pump (TMP-V2304LM) 1 (Japanese Shimadzu)；
Gas isolator: carrying out initial vacuum using advanced flap valve and be isolated with high vacuum, is filled by flowmeter control
Balanced gas (Ar).
Molecular pump is mounted on door-plate, and molecular pump exhaust pipe is connect with fore pump pipeline to be realized automatically using pneumatic structure
It seals and automatically opens, mutual disassembly's pump-line is not had to when switch gate.
In the present embodiment, downstream chamber is to deflate to enter atmospheric condition slice, restores low vacuum again after the completion and was evacuated
Journey, and substrate frame is automatically sent to quality inspection room.
Vacuum cavity portion size: 850mm (L) × 1200mm (H) × 500 (W)；(be subject to actual design), is designed to
It is abnormally-structured, minimize the interior space of cabinet.
The configuration of vacuum suction part:
Sliding vane rotary pump (SV300B) 1 (German Lay is precious)；
Lobe pump (WAU1001) 1 (German Lay is precious)；
Deflation inlet duct: upstream chamber deflation is totally 2, first to carry out soft deflation by Pneumatic corner valve DN40.
Gas isolator: it is isolated with atmosphere using simple flap valve, initial vacuum can effectively and easily be isolated.
Bleeding point is mounted on bottom plate, and pumping bore is DN100.
Operational effectiveness: vacuum degree reaches 5~8 × 100Pa；
In the present embodiment, quality inspection room is to carry out quality inspection to substrate under atmospheric pressure, and qualified product is wrapped after substrate undercarriage
Dress, rejected product recycling.
In the present embodiment, vacuum film plating substrate frame is at least one, and each guide rail quantity is vacuum film plating substrate frame quantity
Twice, guide rail is contour respectively to be installed on the both side plate in large area AZO glass quality inspection area, each vacuum film plating substrate frame side
Side is located on guide rail, i.e., vacuum film plating substrate frame slides on its corresponding guide rail, i.e., in large area AZO glass quality inspection Qu Shangshui
Translation is dynamic.
In the present embodiment, quality inspection system includes light source and sequentially connected photodetector, filter and A/D converter,
Light source and photodetector are divided into the top and bottom of large area AZO glass quality inspection area both side plate, i.e. light source and photodetection
There are several guide rails between device, the light that light source issues is received by a photoelectric detector through vacuum film plating substrate, passes through A/D after filtering
Converter is converted to detection signal.
In the present embodiment, transmission mechanism is set to vacuum film plating substrate frame and rail attachment point, moves towards installation along guide rail.
In the present embodiment, transmission mechanism includes permanent magnet transmission motor, magnetic steering part and the Magnetic drive part of magnetic connection, and magnetic passes
Moving part is installed on vacuum film plating substrate frame side, and magnetic steering part is installed on guide rail interior.
In the present embodiment, on vacuum film plating substrate frame and several row's substrates hole is shown, vacuum film plating substrate is installed on substrate
In hole.
In the present embodiment, quality inspection system further includes server, and server is connected with A/D converter, the electricity for will convert
Signal is analyzed and is compared.
In the present embodiment, section, live-roller and plated film quality inspection roller are unloaded in upper section, and section and plated film quality inspection roller are unloaded in upper section
It is driven, can ensure that the steady of braking and is accurately positioned using advanced magnetic steering as live-roller in vacuum chamber.
In the present embodiment, returns frame system and be mounted under cabinet rear side, transmitted, be driven by same using advanced friction magnetic steering
Step band is connected, and stroke is positioned by photoelectricity, and entirely time frame system is totally-enclosed using tempered glass, upper installation high efficiency particulate air filter.
In the present embodiment, extract system is specifically pumped and valve arrangement is by depending on specific operating condition, and all pipelines use SUS304
Mirror surface pipe, valve use import butterfly valve, auto-admission when being equipped with SMC power-off intake valve, termination of pumping or unexpected power-off before sliding vane rotary pump
Ensure that mechanical pump does not return oil.
In the present embodiment, the magnetic steering frictional drive that the transmission of live-roller and plated film quality inspection roller uses, the interior transmission of cabinet is drawn
Enter and introduced using magnetic fluid, substrate frame operation ensures at least to step up 3 driving wheels.Transmission is connected by synchronous belt, and stroke is by photoelectricity
Positioning.
In the present embodiment, insulated between link stopper and guide rail and upper link stopper and substrate frame magnetic receiver by PEEK under substrate frame
Material connection, it is ensured that the insulation of substrate frame and cabinet.
In the present embodiment, programmable control system is controlled the motion flow of equipment by PLC system.
In the present embodiment, operator can implement relevant setting by industrial PC (setting setting value, show actual value)
To operate and control the motion flow of coating wire, system realization: visible system；State of the art is shown；Process data storage management；
Data acquisition and alarm module；Statistical form；Technological parameter printing and record；Error message prompt；Automatically, manually and debugging operations
Mode；Server is equipped with safe precaution measure, the storage capacity with kinds of processes process, has online input, modifies parameter
With the function of switching value.
In the present embodiment, cooling water system includes:
Cathode target, cabinet pipeline, molecular pump, power supply are cooled down by the pure water of cool-heat-exchanger circulation；
The requirement of closed cycle cooling water system: plated film generic cyclic cooling water requires standard, 18~22 degree of inflow temperature, electric
Resistance is greater than 10M Ω, and hydraulic pressure is greater than 3.5 kilograms.
In the present embodiment, air supply system includes:
(1) process gas supply system requirement:
Argon gas: 99.99%；
Oxygen: 99.99%；
Other gases select according to the technological requirements, provide process gas gas cylinder and pressure reducing valve by manufacturer, can directly adopt soft
Pipe connects fastly.
(2) compressed air air supply system requirement:
Water removal, oil removing, pressure >=6 kilogram, 0.5 cubic meters per minute of gas production.
(3) extract system exhaust pipe requirement:
Vacuum pump group exhaust is directly connected to outdoor by flange or hose connection exhaust pipe, and exhaust outlet inside and outside pressure difference≤
1.5E4Pa。
In the present embodiment, continuous magnetron sputtering coating film production line energy index:
(1) device type: vertical single side continuous magnetron sputtering coating wire (using SUS304 stainless steel material)
(2) film plating substrate frame size: 1 435mm × 610mm；
(3) filming equipment rhythm of production: mono- frame of 420s；
(4) vacuum chamber ultimate vacuum requirement: low vacuum chamber≤5Pa；(resume work true high vacuum chamber≤5.0 × 10-4Pa
Empty time≤3 hour)；System leak rate meets relevant national standard；
(5) sheet mode the equipment kind of drive: is loaded into using the vertical trolley of advanced magnetic steering frictional drive；
(6) gas isolating mode: being isolated using flap valve, and sputtering chamber carries out processing atmosphere isolation with molecular pump；
(7) coating temperature controls: using stainless steel armouring heating device, maximum temperature is 500 DEG C, according to room temperature~500
DEG C it can arbitrarily set design；
(8) control system requirement: the automatic control to entire production process is realized using the PLC of Omron, is manually controlled
It is changeable with automatically controlling.Server is equipped with safe precaution measure, operational administrative password etc., and the storage with kinds of processes process
Ability is deposited, there is online input, modify the function of parameter and switching value.
Be it is necessary to described herein finally: above embodiments are served only for making technical solution of the present invention further detailed
Ground explanation, should not be understood as limiting the scope of the invention, those skilled in the art's above content according to the present invention
The some nonessential modifications and adaptations made all belong to the scope of protection of the present invention.
Claims (10)
1. large area AZO coating film on glass production line, it is characterised in that: including coating wire and transmission line, the coating wire include according to
The upstream chamber (1) of secondary connection, import surge chamber (2), import transfer chamber (3), sputtering chamber (4), outlet transfer chamber (5), outlet are slow
Room (6), downstream chamber (7) and quality inspection room (8) are rushed, at least one valve is equipped between adjacent room, the transmission line includes transmission
Roller and plated film quality inspection roller, the upstream chamber (1), import surge chamber (2), import transfer chamber (3), sputtering chamber (4), outlet transfer chamber
(5), it is equipped with sequentially connected live-roller in outlet surge chamber (6) and downstream chamber (7), is equipped with connection in the quality inspection room (8)
Plated film quality inspection roller and a large area AZO glass quality inspection area, large area AZO glass quality inspection area includes two sides disposed in parallel
Plate (81), the vacuum film plating substrate frame (83) slided on both side plate (81) and a quality inspection system, the side plate (81) are equipped with
Guide rail (82), vacuum film plating substrate frame (83) bottom are equipped with slide key and transmission mechanism, the vacuum film plating substrate frame
(83) it is moved on guide rail (82) by slide key and transmission mechanism, the interior live-roller of the downstream chamber (7) and plated film quality inspection roller phase
Even, the plated film quality inspection roller is connected with large area AZO glass quality inspection area.
2. large area AZO coating film on glass production line according to claim 1, it is characterised in that: the vacuum film plating substrate
Frame (83) is at least one, and each guide rail (82) quantity is twice of vacuum film plating substrate frame (83) quantity, the guide rail
(82) contour respectively to be installed on the both side plate (81) in large area AZO glass quality inspection area, each vacuum film plating substrate frame (83)
Side is located on guide rail (82), i.e., vacuum film plating substrate frame (83) slides on its corresponding guide rail (82), i.e., in large area AZO
Glass quality inspection area's horizontal direction is mobile.
3. large area AZO coating film on glass production line according to claim 1, it is characterised in that: the vacuum film plating substrate
On frame (3) and several row's substrates hole (84) is shown, vacuum film plating substrate is installed in substrate hole (84).
4. large area AZO coating film on glass production line according to claim 1, it is characterised in that: the quality inspection system includes
Light source and sequentially connected photodetector, filter, A/D converter, the light source and photodetector are divided into plating film quality
Roller two sides are examined, the light that the light source issues is received by a photoelectric detector through film plating substrate, is turned after filtering by A/D converter
It is changed to electric signal.
5. large area AZO coating film on glass production line according to claim 2, it is characterised in that: the quality inspection system is also wrapped
Server is included, the server is connected with A/D converter, for being analyzed and being compared the electric signal of conversion.
6. large area AZO coating film on glass production line according to claim 1, it is characterised in that: set in the sputtering chamber (4)
There is at least one to sputter disk (41), the sputtering disk (41) is equipped at least three target position (42), and the sputtering disk (41) passes through the
One driving device is close or far from glass substrate.
7. large area AZO coating film on glass production line according to claim 6, it is characterised in that: sputtering disk (41)
Target position (42) is equipped with cover board (43), the cover board (43) and sputtering disk (41) hingedly, the cover board (43) and sputtering disk (41)
Between be equipped with return spring.
8. large area AZO coating film on glass production line according to claim 6, it is characterised in that: the sputtering chamber, which is equipped with, to be splashed
Rifle is penetrated, the sputter gun is driven across target position (42) by third driving device or leaves target position (42).
9. large area AZO coating film on glass production line according to claim 6, it is characterised in that: the sputtering disk (41) is logical
It crosses the second driving device and is moved in parallel along glass substrate length direction with respect to glass substrate.
10. large area AZO coating film on glass production line according to claim 6, it is characterised in that: the sputtering disk (41) is logical
It crosses fourth drive device and is moved in parallel along glass substrate width direction with respect to glass substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711329398.3A CN109912229A (en) | 2017-12-13 | 2017-12-13 | Large area AZO coating film on glass production line |
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Application publication date: 20190621 |