CN109023274A - Watch dail plate word follows closely vacuum coating method - Google Patents
Watch dail plate word follows closely vacuum coating method Download PDFInfo
- Publication number
- CN109023274A CN109023274A CN201810943679.6A CN201810943679A CN109023274A CN 109023274 A CN109023274 A CN 109023274A CN 201810943679 A CN201810943679 A CN 201810943679A CN 109023274 A CN109023274 A CN 109023274A
- Authority
- CN
- China
- Prior art keywords
- vacuum
- valve
- pump
- touch screen
- coating method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of Watch dail plate words to follow closely vacuum coating method, is related to wrist-watch processing technique field, includes the following steps, the preparation before carrying out booting, checks whether equipment, water, gas etc. are in normal Standby state；Vacuum machine booting, after the main electricity of the system of vacuum machine powers on, the control cabinet power supply indicator of vacuum machine is bright, presses control cabinet shop front on board supply button, and control system powers on, while button indicating lamp green light, and restoring scram button is to bounce state；It is vacuumized by the touch screen control vacuum machine on control cabinet；Vacuum in vacuum machine ontology adjusts throttle valve after temperature reaches the desired requirement of this production technology, adjust mass flowmenter air inlet, so that pressure in vacuum chamber is met job requirement, determines that vacuum machine wiring is correct and load is without under short-circuit conditions, require progress plated film according to technique.It solves the problems, such as dial plate plated film out-of-flatness, panel surface can be kept more smooth in panel surface uniform coated.
Description
Technical field
The present invention relates to wrist-watch processing technique field, in particular to a kind of Watch dail plate word follows closely vacuum coating method.
Background technique
Dial plate is the essential component part of wrist-watch, as the consumption level and taste of consumer is continuously improved,
Requirement to wrist-watch is also higher and higher, so that wrist-watch product in the market, which is just becoming one kind, moves towards fashion from tradition, from timing function
Decoration demand can be moved towards, is developed from based on use value to the special consumer goods based on brand value.
Currently, in traditional wrist-watch production field, dial plate is substantially to be made using copper sheet, uses copper sheet system
At dial plate shape stability it is good, strength and stiffness are more moderate, there is the erosion-resisting effect of drop resistant.The table of copper sheet production
Disk cost is generally higher, has screen effect to signal, and word nail and dial plate are separation, after long-time use, dial plate and word
Nail is easy to that oxidation and rusting occurs, and influences the service life of wrist-watch, usually one layer of electroplating film is plated on Watch dail plate surface, to protect
Protect dial plate.Film plating process is fairly simple in the prior art, uneven in the film of panel surface plating, the whole use for influencing dial plate and pointer
Rotation, be badly in need of a kind of new film plating process to solve the above problems.
Summary of the invention
The purpose of the present invention is to provide a kind of Watch dail plate words to follow closely vacuum coating method, can uniformly plate in panel surface
Film keeps panel surface more smooth.
Above-mentioned purpose of the invention has the technical scheme that
A kind of Watch dail plate word nail vacuum coating method, comprising the following steps:
Step 1 carries out the preparation before booting, checks whether equipment, water, gas etc. are in normal Standby state；
Step 2, vacuum machine booting, after the main electricity of the system of vacuum machine powers on, the control cabinet power supply indicator of vacuum machine is bright, presses control
Cabinet door face on board supply button processed, control system powers on, while button indicating lamp green light, and restoring scram button is to bounce shape
State；
Step 3 is vacuumized by the touch screen control vacuum machine on control cabinet；
Vacuum in step 4, vacuum machine ontology adjusts throttle valve, adjusts matter after temperature reaches the desired requirement of this production technology
Flowmeter air inlet is measured, pressure in vacuum chamber is made to meet job requirement, determines that vacuum machine wiring is correct and load is without under short-circuit conditions,
It requires to carry out plated film according to technique.
By using above-mentioned technical proposal, plated film is carried out on Watch dail plate using the method for vacuum coating, carries out early period
Preparation, can detach the gas in vacuum machine is cleaner, and when plated film can form a layer thickness in panel surface
Uniform and smooth film, ensure that the smooth of panel surface, and dial plate processing quality is higher.
Preferably, the step 1 the following steps are included:
A, cooling water valve is opened, cooling water is connected, keeps water route unimpeded, checks whether hydraulic pressure meets equipment job requirement；
B, vacuum chamber has been cleared up, ready workpiece is mounted on being loaded on axis of pivoted frame；
C, check whether arc target, magnetic control target, sample pivoted frame connect electricity correct, if there are short-circuit condition, close door for vacuum chamber, and really
Determine door for vacuum chamber and vacuum chamber good seal, check whether gas source is in normal operating conditions, whether each operated pneumatic valve is in pass
Whether closed state, charge valve are in close state, and check whether each operation button of touch screen resets.
By using above-mentioned technical proposal, it can be ensured that vacuumize and carried out with the preparation of plated film, guarantee vacuumizes work
Make and what plated film worked goes on smoothly.
Preferably, the step 3 the following steps are included:
A, starting maintains pump, presses and maintains pump icon on control cabinet touch screen；
B, starting maintains valve, presses the maintenance valve icon on control cabinet touch screen, opens and maintains valve；
C, start molecular pump: pressing molecular pump icon on touch screen, open molecular pump, icon flashing is flashing in accelerating on pump
Lamp is always on as molecular pump full-speed operation；
Preferably, the step 3 is further comprising the steps of:
D, start mechanical pump: pressing mechanical pump icon on touch screen, open mechanical pump；
E, start roughing valve: waiting 5-10s, press roughing valve icon on touch screen, open roughing valve, carry out forvacuum degree；
F, start lobe pump: vacuum degree reaches 400-600Pa, presses lobe pump icon on touch screen, and starting lobe pump accelerates thick
It takes out；
G, close roughing valve: vacuum degree reaches 5-10Pa, presses roughing valve icon on touch screen, closes roughing valve；
H, start foreline valve: waiting 5-15s, press touch screen foreline valve icon, start foreline valve；
I, starting essence takes out valve: after molecular pump full speed, pressing essence on touch screen and takes out valve icon, start essence and take out valve, essence vacuumizes.
By using above-mentioned technical proposal, in vacuum, using first slightly being taken out with mechanical pump, then smoked with molecular pump essence
Form is accelerated using lobe pump during slightly taking out, can shorten the pumpdown time, then carries out smart pumping with molecular pump again, can
Gas in vacuum machine is detached cleaner.
Preferably, the extract system of the vacuum machine includes two molecular pumps, two mechanical pumps, a maintenance pump and one
Platform lobe pump.
It can be by the gas in vacuum machine by the cooperation of pumps several in extract system by using above-mentioned technical proposal
What is detached is cleaner, keeps film coating environment more preferable, while shortening the pumpdown time, improves working efficiency.
Preferably, the distribution of the vacuum machine requires three road three phase mains 380V ± 6%, frequency 50Hz, arc power total work
Rate is greater than 50KW；Power control cabinet runs power and is less than 60KW；Ground wire requirement is connected, is equipped with good ground connection, ground resistance is less than 2 Europe
Nurse.
It by using above-mentioned technical proposal, using reasonable power supply and power, can guarantee that complete machine is smoothly run, reduce
The generation of failure.
Preferably, cooling water requirement in the step 2, has tap water or recirculated cooling water, water temperature is less than 20 DEG C, water
Press 0.2MPa.
By using above-mentioned technical proposal, water temperature is lower can to play good cooling effect, and hydraulic pressure is suitable for guaranteeing cooling
The flow speed stability of water.
Preferably, in the step 4 vacuum machine air supply requirement, have gas source or air pump, air pressure range 0.4MPa-
0.8M Pa。
By using above-mentioned technical proposal, makes working gas that there is certain initial velocity, can quickly be moved in vacuum machine
It is dynamic.
Preferably, the fabricating yard of the vacuum machine requires cooling air that must not contain corrosive vapor, particle, conduction
Particle.
By using above-mentioned technical proposal, keep the film coating environment of Watch dail plate cleaner, avoids the acidic materials in air
Corrode panel surface.
Preferably, the film plating process uses magnetron sputtering plating, there are magnetic fields and electric field two in magnetron sputtering process
A field, the electronics in sputtering process in argon working gas accelerate to fly to Watch dail plate substrate under the action of by electric field, and electronics exists
It collides during flying to substrate with the ar atmo in argon gas, ionizes out a large amount of argon ion and electronics；Electronics flies to base
Piece, argon ion then accelerate to fly to target and bombard target under the action of electric field, sputter a large amount of target atom, be in
Neutral target atom or molecule deposition forms a film on substrate.
By using the method that above-mentioned technical proposal, dial plate plated film use magnetron sputtering, can be formed more in panel surface
The film plating layer of even uniform, target atom or molecule can be uniformly distributed in coating process, ensure that the smooth of dial plate plated film.
In conclusion the invention has the following advantages:
1, the present invention carries out plated film using the method for vacuum coating on Watch dail plate, carries out the preparation of early period, can incite somebody to action
Gas in vacuum machine detaches cleaner, and when plated film can form the uniform and smooth film of a layer thickness in panel surface, protects
The smooth of panel surface is demonstrate,proved, dial plate processing quality is higher.
It 2,, can be quickly and efficiently by vacuum machine by the way of essence is taken out after first thick take out during vacuumizing
Gas detach completely, lay good environment for magnetron sputtering plating.
3, the method that the present invention uses magnetron sputtering plating, target atom can be moved efficiently and be deposited on dial plate,
It can be in the film plating layer of panel surface formation uniform ground.
Detailed description of the invention
Fig. 1 is the connection structure diagram of extract system of the present invention.
In figure, 1, molecular pump；2, pump is maintained；3, mechanical pump；4, lobe pump；5, valve is maintained；6, roughing valve；7, foreline valve；
8, essence takes out valve；9, charge valve.
Specific embodiment
Below in conjunction with attached drawing, invention is further described in detail.
In the description of the invention, it is to be understood that term " center ", "upper", "lower", "front", "rear",
The orientation or positional relationship of the instructions such as "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outside" is based on attached drawing institute
The orientation or positional relationship shown is merely for convenience of description the invention and simplifies description, rather than indication or suggestion is signified
Device or element must have a particular orientation, be constructed and operated in a specific orientation, therefore should not be understood as to the present invention
Limitation.
A kind of Watch dail plate word nail vacuum coating method, comprising the following steps:
Step 1 carries out the preparation before booting, checks whether equipment, water, gas etc. are in normal Standby state, it is first determined
The fabricating yard of vacuum machine is met the requirements, it is desirable that cooling air must not contain corrosive vapor, particle, conductive particle.It is specific quasi-
Standby content is as follows:
A, cooling water valve is opened, cooling water is connected, keeps water route unimpeded, checks whether hydraulic pressure meets equipment job requirement, to cold
But the requirement of water 15 DEG C of water temperature, can play good cooling effect using tap water or recirculated cooling water, hydraulic pressure 0.2MPa,
Guarantee the flow speed stability of cooling water.
B, vacuum chamber has been cleared up, by ready workpiece, that is, the dial plate of plated film has been needed to be mounted on the dress of vacuum machine transfer rack
On axis.
C, check whether arc target, magnetic control target, sample pivoted frame connect electricity correct, if there are short-circuit conditions, close door for vacuum chamber,
And determine door for vacuum chamber and vacuum chamber good seal, check whether gas source is in normal operating conditions, whether each operated pneumatic valve is located
In closed state, whether charge valve is in close state, and checks whether each operation button of touch screen resets.
Step 2, vacuum machine booting, after the main electricity of the system of vacuum machine powers on, the control cabinet power supply indicator of vacuum machine is bright, presses
Lower control cabinet shop front on board supply button, control system powers on, while button indicating lamp green light, and recovery scram button is bullet
The state of rising.
Step 3 is vacuumized by the touch screen control vacuum machine on control cabinet, wherein the extract system of vacuum machine such as attached drawing
Shown in 1, including two maintenance of mechanical pump 3, one of molecular pump 1, two pumps 2 and a lobe pump 4.Wherein two molecular pumps 3 are simultaneously
Join, front end is in series with the smooth maintenance valve 5 in road for maintenance on the branch of every molecular pump 1, and rear end is in series with takes out for essence
Essence take out 8 control piper of valve and extraneous connection and disconnection；It is in series with foreline valve 7 on main line after two 3 parallel connections of molecular pump,
Maintenance pump 2 is connected between foreline valve 7 and maintenance valve 5 on pipeline to be placed in vacuum chamber；Pipeline where foreline valve 7 is parallel with again
The indoor gas of vacuum can be slightly extracted into the external world by the pipeline where roughing valve 6, the pipeline where roughing valve 6；Roughing valve 6 is with before
The output end that valve 7 is connected to lobe pump 4 is set, there are two mechanical pump 3 in parallel, two mechanical pumps 3 for the input terminal connection of lobe pump 4
It is placed in vacuum chamber, for extracting gas.
It is vacuumizing specific steps are as follows:
A, starting maintains pump 2, presses and maintains 2 icons of pump on control cabinet touch screen；
B, starting maintains valve 5, presses 5 icon of maintenance valve on control cabinet touch screen, opens and maintains valve 5；
C, start molecular pump 1: pressing 1 icon of molecular pump on touch screen, open molecular pump 1, icon flashing is in accelerating, to dodge on pump
Bright lamp is always on as 1 full-speed operation of molecular pump；
D, start mechanical pump 3: pressing 3 icon of mechanical pump on touch screen, open mechanical pump 3；
E, start roughing valve 6: waiting 5s, press 6 icon of roughing valve on touch screen, open roughing valve 6, carry out forvacuum degree；
F, start lobe pump 4: after vacuum degree reaches 400Pa, pressing 4 icon of lobe pump on touch screen, starting lobe pump 4 is added
Fast thick pumping, improves the draw speed of gas；
G, after the indoor vacuum degree of vacuum reaches 10Pa, 6 icon of roughing valve on touch screen is pressed, closes roughing valve 6, stops carrying out
It is thick to take out；
H, 5s is waited after closing roughing valve 6, presses 7 icon of touch screen foreline valve, starts foreline valve 7；
I, starting essence takes out valve 8: until 1 full speed of molecular pump, the icon that essence on touch screen takes out valve 8 is pressed, starts essence and takes out valve 8, into
Row essence vacuumizes.
Wherein, the distribution of vacuum machine requires to be three road three phase mains 380V, frequency 50Hz, and arc power general power is greater than
60KW；Power control cabinet runs power and is less than 55KW；Ground wire requirement is connected, is equipped with good ground connection, ground resistance is less than 2 ohm.
Vacuum in step 4, vacuum machine ontology adjusts charge valve 9 after temperature reaches the desired requirement of this production technology,
Mass flowmenter air inlet is adjusted, pressure in vacuum chamber is made to meet job requirement, determines that vacuum machine wiring is correct and load is without short circuit
In the case of, it requires to carry out plated film according to technique.
Coating process is as follows: film plating process of the present invention uses magnetron sputtering plating, in magnetron sputtering process there are magnetic field and
Two fields of electric field, the electronics in sputtering process in argon working gas accelerate to fly to Watch dail plate substrate under the action of by electric field,
Electronics collides during flying to substrate with the ar atmo in argon gas, ionizes out a large amount of argon ion and electronics；Electronics
Substrate is flown to, argon ion then accelerates to fly to target and bombard target under the action of electric field, sputters a large amount of target
Atom, the target atom or molecule deposition being in neutrality form a film on substrate.
Secondary electron is influenced during accelerating to fly to substrate by magnetic field Lorentz force, is bound in close to target surface
In heating region, plasma density is very high in the region, and secondary electron surrounds target surface under the influence of a magnetic field and does circumference
Movement, keeps the motion path of electronics very long, constantly hits ionize out a large amount of argon ion bombardment target during the motion, passes through
The energy of electronics gradually decreases after multiple collision, requests the constraint of the magnetic line of force, far from target, is eventually deposited on substrate.?
Magnetic field plays the role of constraint and extends electron movement path in whole work process.
This specific embodiment is only explanation of the invention, is not limitation of the present invention, those skilled in the art
Member can according to need the modification that not creative contribution is made to the present embodiment after reading this specification, but as long as at this
All by the protection of Patent Law in the scope of the claims of invention.
Claims (10)
1. a kind of Watch dail plate word follows closely vacuum coating method, which comprises the following steps:
Step 1 carries out the preparation before booting, checks whether equipment, water, gas etc. are in normal Standby state；
Step 2, vacuum machine booting, after the main electricity of the system of vacuum machine powers on, the control cabinet power supply indicator of vacuum machine is bright, presses control
Cabinet door face on board supply button processed, control system powers on, while button indicating lamp green light, and restoring scram button is to bounce shape
State；
Step 3 is vacuumized by the touch screen control vacuum machine on control cabinet；
Vacuum in step 4, vacuum machine ontology adjusts throttle valve, adjusts matter after temperature reaches the desired requirement of this production technology
Flowmeter air inlet is measured, pressure in vacuum chamber is made to meet job requirement, determines that vacuum machine wiring is correct and load is without under short-circuit conditions,
It requires to carry out plated film according to technique.
2. Watch dail plate word according to claim 1 follows closely vacuum coating method, which is characterized in that the step 1 include with
Lower step:
A, cooling water valve is opened, cooling water is connected, keeps water route unimpeded, checks whether hydraulic pressure meets equipment job requirement；
B, vacuum chamber has been cleared up, ready workpiece is mounted on being loaded on axis of pivoted frame；
C, check whether arc target, magnetic control target, sample pivoted frame connect electricity correct, if there are short-circuit condition, close door for vacuum chamber, and really
Determine door for vacuum chamber and vacuum chamber good seal, check whether gas source is in normal operating conditions, whether each operated pneumatic valve is in pass
Whether closed state, charge valve are in close state, and check whether each operation button of touch screen resets.
3. Watch dail plate word according to claim 1 follows closely vacuum coating method, which is characterized in that the step 3 include with
Lower step:
A, starting maintains pump, presses and maintains pump icon on control cabinet touch screen；
B, starting maintains valve, presses the maintenance valve icon on control cabinet touch screen, opens and maintains valve；
C, start molecular pump: pressing molecular pump icon on touch screen, open molecular pump, icon flashing is flashing in accelerating on pump
Lamp is always on as molecular pump full-speed operation.
4. Watch dail plate word according to claim 3 follows closely vacuum coating method, which is characterized in that the step 3 further includes
Following steps:
D, start mechanical pump: pressing mechanical pump icon on touch screen, open mechanical pump；
E, start roughing valve: waiting 5-10s, press roughing valve icon on touch screen, open roughing valve, carry out forvacuum degree；
F, start lobe pump: vacuum degree reaches 400-600Pa, presses lobe pump icon on touch screen, and starting lobe pump accelerates thick
It takes out；
G, close roughing valve: vacuum degree reaches 5-10Pa, presses roughing valve icon on touch screen, closes roughing valve；
H, start foreline valve: waiting 5-15s, press touch screen foreline valve icon, start foreline valve；
I, starting essence takes out valve: after molecular pump full speed, pressing essence on touch screen and takes out valve icon, start essence and take out valve, essence vacuumizes.
5. Watch dail plate word according to claim 4 follows closely vacuum coating method, it is characterised in that: the pumping of the vacuum machine
System includes two molecular pumps, two mechanical pumps, a maintenance pump and a lobe pump.
6. Watch dail plate word according to claim 1 follows closely vacuum coating method, it is characterised in that: the distribution of the vacuum machine
It is required that three road three phase mains 380V ± 6%, 50Hz, arc power general power is greater than 50KW；Power control cabinet runs power and is less than 60KW；Even
Ground line requires, and is equipped with good ground connection, ground resistance is less than 2 ohm.
7. Watch dail plate word according to claim 2 follows closely vacuum coating method, it is characterised in that: cooling in the step 2
Water requirement, has tap water or recirculated cooling water, water temperature is less than 20 DEG C, 0.2 Pa of hydraulic pressure.
8. Watch dail plate word according to claim 1 follows closely vacuum coating method, it is characterised in that: vacuum in the step 4
The air supply requirement of machine has gas source or air pump, air pressure range 0.4MPa-0.8M Pa.
9. Watch dail plate word according to claim 1 follows closely vacuum coating method, it is characterised in that: the installation of the vacuum machine
Site requirements cooling air must not contain corrosive vapor, particle, conductive particle.
10. Watch dail plate word according to claim 1 follows closely vacuum coating method, it is characterised in that: the film plating process is adopted
With magnetron sputtering plating, there are two fields in magnetic field and electric field in magnetron sputtering process, in sputtering process in argon working gas
Electronics accelerates to fly to Watch dail plate substrate under the action of by electric field, electronics during flying to substrate with the ar atmo in argon gas
It collides, ionizes out a large amount of argon ion and electronics；Electronics flies to substrate, and argon ion then accelerates to fly under the action of electric field
Target simultaneously bombards target, sputters a large amount of target atom, the target atom or molecule deposition being in neutrality on substrate at
Film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810943679.6A CN109023274A (en) | 2018-08-18 | 2018-08-18 | Watch dail plate word follows closely vacuum coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810943679.6A CN109023274A (en) | 2018-08-18 | 2018-08-18 | Watch dail plate word follows closely vacuum coating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109023274A true CN109023274A (en) | 2018-12-18 |
Family
ID=64631912
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810943679.6A Pending CN109023274A (en) | 2018-08-18 | 2018-08-18 | Watch dail plate word follows closely vacuum coating method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109023274A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112962077A (en) * | 2021-03-06 | 2021-06-15 | 东莞市立恒镀膜科技有限公司 | Shielding preparation method for local wiredrawing or polishing of hardware product after sand blasting |
| CN115386848A (en) * | 2022-08-09 | 2022-11-25 | 中国科学院近代物理研究所 | Multi-target direct-current magnetron sputtering film coating device and application thereof in depositing ceramic substrate multilayer metal film |
| CN116791056A (en) * | 2023-06-30 | 2023-09-22 | 安徽其芒光电科技有限公司 | Exhaust heating method of vacuum coating equipment |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1632163A (en) * | 2004-12-31 | 2005-06-29 | 兰州大成自动化工程有限公司 | Vacuum filming configuration process control method |
| JP2007239033A (en) * | 2006-03-09 | 2007-09-20 | Ulvac Japan Ltd | Multi-component thin film deposition apparatus |
| CN201121208Y (en) * | 2007-11-05 | 2008-09-24 | 苏贵方 | Air extractor of vacuum apparatus |
| CN105543790A (en) * | 2016-02-15 | 2016-05-04 | 佛山市佛欣真空技术有限公司 | Vacuum coating machine system and operating method thereof |
| CN205839113U (en) * | 2016-06-13 | 2016-12-28 | 江西兴邦光电股份有限公司 | A kind of device improving coater cooling water control |
-
2018
- 2018-08-18 CN CN201810943679.6A patent/CN109023274A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1632163A (en) * | 2004-12-31 | 2005-06-29 | 兰州大成自动化工程有限公司 | Vacuum filming configuration process control method |
| JP2007239033A (en) * | 2006-03-09 | 2007-09-20 | Ulvac Japan Ltd | Multi-component thin film deposition apparatus |
| CN201121208Y (en) * | 2007-11-05 | 2008-09-24 | 苏贵方 | Air extractor of vacuum apparatus |
| CN105543790A (en) * | 2016-02-15 | 2016-05-04 | 佛山市佛欣真空技术有限公司 | Vacuum coating machine system and operating method thereof |
| CN205839113U (en) * | 2016-06-13 | 2016-12-28 | 江西兴邦光电股份有限公司 | A kind of device improving coater cooling water control |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112962077A (en) * | 2021-03-06 | 2021-06-15 | 东莞市立恒镀膜科技有限公司 | Shielding preparation method for local wiredrawing or polishing of hardware product after sand blasting |
| CN115386848A (en) * | 2022-08-09 | 2022-11-25 | 中国科学院近代物理研究所 | Multi-target direct-current magnetron sputtering film coating device and application thereof in depositing ceramic substrate multilayer metal film |
| CN116791056A (en) * | 2023-06-30 | 2023-09-22 | 安徽其芒光电科技有限公司 | Exhaust heating method of vacuum coating equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109023274A (en) | Watch dail plate word follows closely vacuum coating method | |
| CN105543792B (en) | Magnetic control sputtering device and magnetically controlled sputter method | |
| CN103820762B (en) | Magnetron sputtering coating system | |
| CN201343569Y (en) | Continuous plane magnetron sputtering filming device | |
| CN103866257B (en) | A kind of preparation method of three frequency high density plasma aid magnetron sputtering films | |
| CN104611680B (en) | A kind of fast two-sided reciprocal continuous high-efficient plated film magnetic-control sputtering coiling film coating machine of quick change target | |
| CN106435516A (en) | Magnetic control and evaporation multifunctional winding film coating machine | |
| CN101877372A (en) | Back electrode film of thin film solar cell | |
| CN102912306B (en) | Device and process for computerized automatic control high power pulsed magnetron spluttering | |
| CN201758134U (en) | Device for preparing back electrode film of solar battery | |
| CN108251800A (en) | A kind of Cu-Al gradient films material and preparation method thereof | |
| CN205803589U (en) | A kind of dual chamber magnetron sputtering electron beam coater | |
| CN107022742A (en) | A kind of filming equipment of high target utilization | |
| CN103866241B (en) | A kind of ion auxiliary thermal evaporation combined magnetic-controlled sputter coating apparatus | |
| CN206033869U (en) | Novel target cooling system device | |
| CN1865489A (en) | Continuous coating device for patch inductance framework | |
| CN107620047A (en) | A kind of reaction chamber and processing method for PVD plated films | |
| CN103849834A (en) | Compound cutting tool coating based on titanium diboride and preparation method thereof | |
| CN105063557A (en) | Method for directional resistance value increase of ITO conducting film | |
| CN1847447A (en) | Sputtering apparatus | |
| CN205590783U (en) | Multi -purpose coating machine | |
| CN105908146B (en) | Rotary magnetic control target and horizontal magnetic-controlled sputtering coating equipment | |
| CN204779787U (en) | Magnetron sputtering target rifle | |
| CN208485945U (en) | A kind of dual chamber high-vacuum multi-target magnetic control sputtering device | |
| CN201890919U (en) | Vacuum ion film coating machine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181218 |