CN204151409U - Linear sputter source segmentation airing system - Google Patents
Linear sputter source segmentation airing system Download PDFInfo
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- CN204151409U CN204151409U CN201420253841.9U CN201420253841U CN204151409U CN 204151409 U CN204151409 U CN 204151409U CN 201420253841 U CN201420253841 U CN 201420253841U CN 204151409 U CN204151409 U CN 204151409U
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- magnetron sputtering
- segmentation
- gas pipeline
- sputtering technique
- technique
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Abstract
The utility model discloses a kind of linear sputter source segmentation airing system, comprise a road magnetron sputtering technique working gas pipeline, multichannel magnetron sputtering technique reaction gas pipeline, segmentation air feeder, magnetron sputtering technique reaction gas pipeline described in magnetron sputtering technique working gas pipeline, multichannel and described segmentation air feeder described in a road are provided with mass flowmeter and stopping valve.The utility model provides a kind of linear sputter source segmentation airing system, and solution working gas and multiple reactant gases mix the problem of gas and air feed; The real-time control problem of the flow of air feed after the mixed gas of solution; Solve the technique airing system gas field distribution adapted with the design of technique air-bleed system to design; Solve and multiple magnetron sputtering technique (MF reactive magnetron sputtering, magnetically controlled DC sputtering and rf magnetron sputtering etc.) matched problem; Realize stable mass continuous seepage.
Description
Technical field
The utility model relates to a kind of big area magnetron sputtering coating system, particularly relates to a kind of linear sputter source segmentation airing system.
Background technology
Big area magnetron sputtering technology is widely used in building, electronics, photoelectricity, optics, sun power, the hi-tech industries such as decoration and semi-conductor, become and produce low-radiation film coated glass (Low-E film glass), solar-control glazing, insulation silicon fiml, photoelectric display Zinc oxide/indium oxide tin (ITO) nesa coating, silica-based solar cell and copper indium gallium selenium solar cell Al-Doped ZnO (AZO) nesa coating, zinc oxide (ZnO) nesa coating, the production gordian technique of the products such as big area aluminium mirror and the color mirror of big area, in the production control of reality, the homogeneity of coating film thickness is the key factor determining product performance and production production capacity, and working gas and reactant gases air-supplying evenness are crucial factors in the factor to affect of big area magnetron sputtering deposition film thickness uniformity, therefore adjust the air-supplying evenness of working gas and reactant gases and carry out the effective means that adjustable control is adjustment film thickness uniformity.
The plated film airing system of existing big area continuous magnetron sputtering coating film production line is all single mixed admission, the air input adjustment of local can not be realized, especially on the linear magnetic control sputtering cathode of big area (more than 2.4 meters), on cathode parallel line, the homogeneity of process gas just becomes the deciding factor determining quality product and production capacity, therefore realize sputtering technology implement in the problem be controlled in real time to solve in producing of working gas and process gas homogeneity.
Utility model content
The purpose of this utility model is just to provide a kind of linear sputter source segmentation airing system to solve the problem.
The utility model is achieved through the following technical solutions above-mentioned purpose:
Linear sputter source segmentation airing system, comprise a road magnetron sputtering technique working gas pipeline, multichannel magnetron sputtering technique reaction gas pipeline, segmentation air feeder, magnetron sputtering technique reaction gas pipeline described in magnetron sputtering technique working gas pipeline, multichannel and described segmentation air feeder described in a road are provided with mass flowmeter and stopping valve.
Particularly, described multi-pipeline air inlet single channel all gas of giving vent to anger mixes gas tank and comprises multiple inlet pipe, gas block panel, single escape pipe and mixed gas tank body.
Further, the magnetron sputtering technique working gas in described magnetron sputtering technique working gas pipeline is helium (He), argon gas (Ar) or neon (Ne).
Further, the magnetron sputtering technique reactant gases in described magnetron sputtering technique reaction gas pipeline is hydrogen (H2), borine (B2H6), (H2B) acetylene (C2H2), nitrogen (N2), oxygen (O2), hydrogen sulfide (H2S), Selenium hydride (H2Se).
The beneficial effects of the utility model are:
The utility model provides linear sputter source segmentation airing system, and solution working gas and multiple reactant gases mix the problem of gas and air feed; The real-time control problem of the flow of air feed after the mixed gas of solution; Solve the technique airing system gas field distribution adapted with the design of technique air-bleed system to design; Solve and multiple magnetron sputtering technique (MF reactive magnetron sputtering, magnetically controlled DC sputtering and rf magnetron sputtering etc.) matched problem; Realize stable mass continuous seepage.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model linear sputter source segmentation airing system.
In figure: 1-mass flowmeter, 2-stopping valve, 3-mixes gas tank body, 4-vacuum cavity, 5-gas block panel.
Embodiment
Below in conjunction with accompanying drawing, the utility model is described in further detail:
As shown in Figure 1, the utility model linear sputter source segmentation airing system, comprise a road magnetron sputtering technique working gas pipeline, multichannel magnetron sputtering technique reaction gas pipeline, segmentation air feeder, a road magnetron sputtering technique working gas pipeline, multichannel magnetron sputtering technique reaction gas pipeline and segmentation air feeder are provided with mass flowmeter 1 and stopping valve 2.Multi-pipeline air inlet single channel all gas of giving vent to anger mixes gas tank and comprises multiple inlet pipe, gas block panel 5, single escape pipe and mixed gas tank body 3.
Magnetron sputtering technique working gas in magnetron sputtering technique working gas pipeline is helium (He), argon gas (Ar) or neon (Ne); Magnetron sputtering technique reactant gases in magnetron sputtering technique reaction gas pipeline is hydrogen (H2), borine (B2H6), (H2B) acetylene (C2H2), nitrogen (N2), oxygen (O2), hydrogen sulfide (H2S), Selenium hydride (H2Se).
Segmentation airing system is magnetron sputtering all gas air-supply duct, can need to be divided into multistage according to the design of magnetron sputtering air-bleed system, and magnetron sputtering technique also can be coordinated to need to be divided into multistage.
The utility model is applicable to adopting at MF reactive magnetron sputtering coating system, single Cathode DC magnetron sputtering coating system, double cathode magnetically controlled DC sputtering coating system and rf magnetron sputtering coating system.
Embodiment is above only be described preferred implementation of the present utility model; not scope of the present utility model is limited; do not departing under the utility model designs spiritual prerequisite; the various distortion that the common engineering technical personnel in this area make technical solutions of the utility model and improvement, all should fall in protection domain that claims of the present utility model determine.
Claims (1)
1. linear sputter source segmentation airing system, it is characterized in that: comprise a road magnetron sputtering technique working gas pipeline, multichannel magnetron sputtering technique reaction gas pipeline, segmentation air feeder, magnetron sputtering technique reaction gas pipeline described in magnetron sputtering technique working gas pipeline, multichannel and described segmentation air feeder described in a road are provided with mass flowmeter and stopping valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420253841.9U CN204151409U (en) | 2014-05-19 | 2014-05-19 | Linear sputter source segmentation airing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420253841.9U CN204151409U (en) | 2014-05-19 | 2014-05-19 | Linear sputter source segmentation airing system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204151409U true CN204151409U (en) | 2015-02-11 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420253841.9U Expired - Fee Related CN204151409U (en) | 2014-05-19 | 2014-05-19 | Linear sputter source segmentation airing system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204151409U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105837049A (en) * | 2016-03-23 | 2016-08-10 | 河北物华天宝镀膜科技有限公司 | Integrated seven-segment gas supply apparatus |
| CN106893988A (en) * | 2015-12-18 | 2017-06-27 | 北京有色金属研究总院 | A kind of gas-distributing system for vacuum coating |
| CN115111625A (en) * | 2022-06-30 | 2022-09-27 | 华电电力科学研究院有限公司 | Remote steam source heat supply network debugging method |
| DE102021111516A1 (en) | 2021-05-04 | 2022-11-10 | VON ARDENNE Asset GmbH & Co. KG | Gas supply device, processing arrangement, control device, storage medium and method |
-
2014
- 2014-05-19 CN CN201420253841.9U patent/CN204151409U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106893988A (en) * | 2015-12-18 | 2017-06-27 | 北京有色金属研究总院 | A kind of gas-distributing system for vacuum coating |
| CN105837049A (en) * | 2016-03-23 | 2016-08-10 | 河北物华天宝镀膜科技有限公司 | Integrated seven-segment gas supply apparatus |
| DE102021111516A1 (en) | 2021-05-04 | 2022-11-10 | VON ARDENNE Asset GmbH & Co. KG | Gas supply device, processing arrangement, control device, storage medium and method |
| CN115111625A (en) * | 2022-06-30 | 2022-09-27 | 华电电力科学研究院有限公司 | Remote steam source heat supply network debugging method |
| CN115111625B (en) * | 2022-06-30 | 2023-05-05 | 华电电力科学研究院有限公司 | Remote steam source heat supply network debugging method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150211 Termination date: 20160519 |
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| CF01 | Termination of patent right due to non-payment of annual fee |