CN105837049A - Integrated seven-segment gas supply apparatus - Google Patents
Integrated seven-segment gas supply apparatus Download PDFInfo
- Publication number
- CN105837049A CN105837049A CN201610171724.1A CN201610171724A CN105837049A CN 105837049 A CN105837049 A CN 105837049A CN 201610171724 A CN201610171724 A CN 201610171724A CN 105837049 A CN105837049 A CN 105837049A
- Authority
- CN
- China
- Prior art keywords
- gas
- sections
- deflector
- connecting plate
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Abstract
The invention discloses an integrated seven-segment gas supply apparatus and especially relates to a segmented gas distributing apparatus required in a film-coating process for a glass film coating industry. The apparatus comprises successively a connection board, a flow guide board and a sealing board which are connected through bolts. Gas is fed to the flow guide board through a gas inlet on the connection board. The flow guide board feeds the gas into a sputtering environment through a seven-segment milled groove. The apparatus solves the problem of uniformity regulation in glass film coating, improves production efficiency and improves product quality.
Description
Technical field
The invention belongs to technical field of vacuum plating, particularly one can change sputter area gas
Body distribution situation thus regulate seven sections of feeders of integral type of the uniformity of sputtering sedimentation thickness.
Background technology
Known magnetron sputtering plating refers to that under vacuum, electronics is under the effect of electric field, fly to several
Collide with ar atmo during sheet so that it is ionization produces Ar cation and new electricity
Son；New electronics flies to substrate, and Ar ion accelerates to fly to cathode target under the effect of electric field, and
Bombarding target surface with high-energy, make target sputter, deposition forms thin film on a glass substrate.
Known effect coating film on glass sedimentation rate because have three powers, magnetic field intensity,
Process gas environment.And relate to the only magnetic field intensity of imposite glass film forming thickness uniformity with
Process gas environment two.Owing to the regulation of magnetic field intensity to be carried out, for plated film under air
Glass production extreme influence.
The quality of glass is played vital effect by the uniformity of known coated glass.And
The regulation a great problem that always puzzlement produces of uniformity in process of production.
Summary of the invention
Solving in the present invention of task is to provide a kind of seven sections of feeders of integral type, makes plated film
The distribution of gas under glass scalable magnetic-control sputtering ring border in process of production, thus regulate deposition
The uniformity of film forming.
For solving the problems referred to above, the present invention realizes in the following manner: integral type seven sections supply
Device, is sequentially connected with the connecting plate of setting, deflector, sealing plate including by bolt；Gas
Carrying gas by the air inlet on described connecting plate to described deflector, described deflector passes through
The groove milling of seven sections of section examinations is to sputtering environment conveying gas；Described connecting plate connects seven sections of supply with cloudy
Polar cap plate.
The positive effect of the present invention is: in coated glass production process, can effectively regulate gas
Distribution under magnetron sputtering environment, thus play and control the uniform of deposition film forming, the most raw
Producing big plate face coated glass, broken sky directly completes the regulation of uniformity under vacuum production environment,
Not only increase production efficiency and more improve the quality of product.
Accompanying drawing explanation
Fig. 1 is the structural representation of seven sections of feeders of integral type of the present invention.
Fig. 2 is the fundamental diagram of seven sections of feeders of integral type of the present invention.
Detailed description of the invention
Below in conjunction with the accompanying drawings the operation principle of the present invention is described in further detail.
Seven sections of feeders of integral type as shown in Figure 1, including connecting plate 1, deflector 2,
Sealing plate 3.Connecting plate 1 connects seven sections of supply and negative electrode cover plate, is that seven sections of feeders realize
Function connector.Sealing plate 3 covers above deflector 2, plays finally sealed effect.Water conservancy diversion
Plate 2, above connecting plate, is the core of whole device, by the water conservancy diversion on deflector 2
The distribution of passage subregion is used for realizing the purpose of the present invention: in magnetron sputtering process, by work
The profile adjustment of process gases realizes the regulation of coated glass uniformity.
Specific works principle (as shown in Figure 2):
Process gas deliver to be connected with negative electrode cover plate by seven gas flowmeters respectively seven
Seven air inlets of section supply, seven sections of supply seal gas piping by sealing ring, pass through spiral shell
Bolt is connected with cavity cover plate；Gas arrives connecting plate and flows to deflector respectively by air inlet,
Flow to specify position by the internal groove milling guiding gas of deflector；Last deflector overlying is covered close
Shrouding, is connected with deflector with bolt.When process requirements Far Left needs more process gas
When body, only need to regulate corresponding leftmost gas flowmeter, equally, when thinking regulation
During the process gas of which position, it is only necessary to regulate corresponding gas flowmeter.Thus realize
Coated glass uniformity regulation in process of production.
Claims (2)
1. seven sections of feeders of integral type, it is characterised in that include being sequentially connected with by bolt setting
The connecting plate put, deflector, sealing plate；Gas passes through the air inlet on described connecting plate to institute
Stating deflector conveying gas, described deflector is carried to sputtering environment by the groove milling of seven sections of section examinations
Gas；Described connecting plate connects seven sections of supply and negative electrode cover plate.
Seven sections of feeders of integral type the most according to claim 1, it is characterised in that work
Process gases delivers to the seven sections of supply being connected with negative electrode cover plate respectively by seven gas flowmeters
Seven air inlets, seven sections of supply seal gas piping by sealing ring, by bolt and chamber
Body cover plate is connected；Gas arrives connecting plate and flows to deflector respectively, by leading by air inlet
Stream intralaminar part groove milling guiding gas flows to specify position；Last deflector overlying covers sealing plate,
It is connected with deflector with bolt；When wanting the process gas regulating a certain position, it is only necessary to adjust
Save corresponding gas flowmeter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610171724.1A CN105837049A (en) | 2016-03-23 | 2016-03-23 | Integrated seven-segment gas supply apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610171724.1A CN105837049A (en) | 2016-03-23 | 2016-03-23 | Integrated seven-segment gas supply apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105837049A true CN105837049A (en) | 2016-08-10 |
Family
ID=56583225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610171724.1A Pending CN105837049A (en) | 2016-03-23 | 2016-03-23 | Integrated seven-segment gas supply apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105837049A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108342704A (en) * | 2018-03-07 | 2018-07-31 | 河北物华天宝镀膜科技有限公司 | A kind of intelligent online uniformity regulating system |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000290777A (en) * | 1999-04-07 | 2000-10-17 | Tokyo Electron Ltd | Gas treating device, buffle member, and gas treating method |
| CN101497990A (en) * | 2009-03-10 | 2009-08-05 | 中国南玻集团股份有限公司 | Sputtering film-plating apparatus |
| CN202705451U (en) * | 2012-07-09 | 2013-01-30 | 中国建材国际工程集团有限公司 | Process gas binary gas distribution device for vacuum coating |
| CN203187742U (en) * | 2013-02-18 | 2013-09-11 | 生阳新材料科技（宁波）有限公司 | Gas release device for film coating process |
| CN204151409U (en) * | 2014-05-19 | 2015-02-11 | 红安华州光电科技有限公司 | Linear sputter source segmentation airing system |
| CN205635371U (en) * | 2016-03-23 | 2016-10-12 | 河北物华天宝镀膜科技有限公司 | Seven sections air feeder of integral type |
-
2016
- 2016-03-23 CN CN201610171724.1A patent/CN105837049A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000290777A (en) * | 1999-04-07 | 2000-10-17 | Tokyo Electron Ltd | Gas treating device, buffle member, and gas treating method |
| CN101497990A (en) * | 2009-03-10 | 2009-08-05 | 中国南玻集团股份有限公司 | Sputtering film-plating apparatus |
| CN202705451U (en) * | 2012-07-09 | 2013-01-30 | 中国建材国际工程集团有限公司 | Process gas binary gas distribution device for vacuum coating |
| CN203187742U (en) * | 2013-02-18 | 2013-09-11 | 生阳新材料科技（宁波）有限公司 | Gas release device for film coating process |
| CN204151409U (en) * | 2014-05-19 | 2015-02-11 | 红安华州光电科技有限公司 | Linear sputter source segmentation airing system |
| CN205635371U (en) * | 2016-03-23 | 2016-10-12 | 河北物华天宝镀膜科技有限公司 | Seven sections air feeder of integral type |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108342704A (en) * | 2018-03-07 | 2018-07-31 | 河北物华天宝镀膜科技有限公司 | A kind of intelligent online uniformity regulating system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160810 |