CN110699654A - ARC coating production line and coating process - Google Patents
ARC coating production line and coating process Download PDFInfo
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- CN110699654A CN110699654A CN201911080840.2A CN201911080840A CN110699654A CN 110699654 A CN110699654 A CN 110699654A CN 201911080840 A CN201911080840 A CN 201911080840A CN 110699654 A CN110699654 A CN 110699654A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
Abstract
The invention provides an ARC coating production line, which comprises a rotating table, an inlet and outlet chamber, a buffer chamber, a front transition chamber, a process chamber group, a rear transition chamber and a rotating chamber which are sequentially connected in a straight line, wherein the process chamber group comprises at least one process chamber, and the inlet and outlet chamber, the buffer chamber, the front transition chamber, the process chamber and the rear transition chamber are symmetrically divided into two chambers along the straight line direction to form communicated U-shaped channels. According to the invention, a plurality of rotary cathodes are arranged in the same process chamber for continuous coating, and a transition layer is not needed; the number of the process chambers can be increased or decreased according to specific requirements without influencing the work of other functional chambers; the fold line-shaped production line enables the transmission wheels with the upper ends of the substrate frames magnetically connected and the lower ends inwards concave to relay and transmit, and the transmission of the substrates is stable and reliable.
Description
Technical Field
The invention relates to the technical field of coating production, in particular to an ARC coating production line and a coating process.
Background
The vacuum coating technology is to coat a layer of coating with special performance on the solid surface by physical and chemical means, so that the solid surface has many superior performances superior to the solid material in terms of wear resistance, high temperature resistance, corrosion resistance, oxidation resistance, radiation protection, electric conduction, magnetic conduction, insulation and decorative lamp, and the effects of improving the product quality, prolonging the product life, saving energy and obtaining remarkable technical and economic benefits are achieved. The material to be coated is called a substrate and the material to be coated is called a target. Sputtering has become the most important method in vacuum coating, and this technique is to bombard the target surface with energetic particles in vacuum, so that the bombarded particles are deposited on the substrate. The coating production line comprises a plurality of continuous functional chambers, and the coating production line enters a process chamber to carry out coating operation after the steps of vacuumizing and the like in the early stage. For ARC (anti-reflective coating) and other coating films, multiple coating films are often required to enhance the functional effect, however, in many existing production processes, a transition layer is required to be added on the substrate for each coating film, which not only increases the complexity of the production line and the production process, but also increases the thickness of the film. In addition, many of the existing processes require multiple independent and discontinuous production lines for multilayer coating.
Disclosure of Invention
Aiming at the problems in the prior art, the invention aims to provide an ARC coating production line and a coating process, wherein a plurality of rotary cathodes are arranged in the same process chamber for continuous coating without a transition layer; the number of the process chambers can be increased or decreased according to specific requirements without influencing the work of other functional chambers; the fold line-shaped production line enables the transmission wheels with the upper ends of the substrate frames magnetically connected and the lower ends inwards concave to relay and transmit, and the transmission of the substrates is stable and reliable.
In order to achieve the purpose, the invention adopts the technical scheme that:
the utility model provides a ARC coating production line, is including being the revolving stage, exit chamber, surge chamber, preceding transition room, process chamber group, back transition room and the rotatory room that the straight line connects gradually, and the process chamber group includes at least one process chamber, and exit chamber, surge chamber, preceding transition room, process chamber and back transition room are all along the straight line direction symmetry separates into two cavities, forms the U-shaped passageway of intercommunication.
The further improvement of the technical scheme is as follows:
and partition door valves are arranged between the rotating table and the inlet and outlet chamber, between the inlet and outlet chamber and the buffer chamber, between the buffer chamber and the front transition chamber, and between the rear transition chamber and the rotating chamber.
The process chambers comprise a first process chamber and a second process chamber which are independent and symmetrical to each other, and the first process chamber and the second process chamber are respectively provided with two groups of sputtering cathodes along the linear direction.
Along the clockwise direction of the U-shaped channel, the target materials corresponding to the four groups of sputtering cathodes are Si targets.
The sputtering cathode is a rotating cathode.
The rotating table, the inlet and outlet chamber, the buffer chamber, the front transition chamber, the process chamber group and the rear transition chamber are all arranged on the bottom frame, and the bottom frame is supported on the ground.
The production line also comprises a substrate conveying mechanism for conveying the substrate to be coated in the U-shaped channel, wherein the substrate conveying mechanism comprises a substrate frame, a plurality of magnetic guides and a plurality of inner driving wheels, the magnetic guides and the inner driving wheels are uniformly arranged in the inlet and outlet chamber, the buffer chamber, the front transition chamber, the process chamber, the rear transition chamber and the rotating chamber at intervals, a U-shaped conveying path is formed along the U-shaped channel, the magnetic guides are positioned above the inner driving wheels, and the substrate frame for loading the substrate is positioned between the magnetic guides and the inner driving wheels and runs along the U-shaped conveying path.
The substrate frame is vertical to the horizontal plane, the upper end of the substrate frame is magnetically connected with the magnetic guide, and the lower end of the substrate frame is arranged on the plurality of inner driving wheels in a sliding mode.
The outer surface of the inner driving wheel is inwards concave along the circumferential direction, and the lower end of the substrate frame is contacted and arranged on the inwards concave surface in a sliding mode.
The substrate conveying mechanism further comprises a magnetic fluid, a plurality of servo motors, a plurality of synchronous belts and a plurality of synchronous wheels, each synchronous wheel is connected with an inner driving wheel through the magnetic fluid, the plurality of synchronous wheels in the same cavity are connected through the synchronous belts, and the servo motors are connected with and drive one synchronous wheel.
The production line further comprises a cooling mechanism with a cooling effect, the cooling mechanism comprises a backwater main cooling pipeline, a water inlet main cooling pipeline and a plurality of water cooling plates, the plurality of water cooling plates are respectively installed in the front transition chamber, the process chamber and the rear transition chamber, the plurality of water cooling plates are connected in parallel, the water inlet main cooling pipeline, the water cooling plates and the backwater main cooling pipeline are sequentially connected, and the water inlet main cooling pipeline and the backwater main cooling pipeline are connected with an external cooling water system.
The water inlet main cooling pipeline and the water return main cooling pipeline are parallel to the linear direction.
The production line also comprises a vacuumizing mechanism, the vacuumizing mechanism comprises a plurality of molecular pumps, and two molecular pumps are respectively arranged on two cavities of the buffer chamber, the front transition chamber, the process chamber and the rear transition chamber.
The line of the two molecular pumps on each chamber is vertical to the horizontal plane.
The vacuumizing mechanism further comprises a plurality of molecular pump pipelines, a plurality of couplers, a plurality of corrugated pipes and two main pumping pipelines, wherein the two molecular pumps on the cavity are connected through the molecular pump pipelines, the molecular pump pipelines are connected in parallel, and the molecular pump pipelines are sequentially connected with the main pumping pipelines through the couplers and the corrugated pipes.
The two main air exhaust pipelines are arranged on the underframe in parallel at intervals.
The rotary chamber is provided with a rotary mechanism, the rotary mechanism comprises a rotary frame, a rotary magnetic fluid and a motor which are sequentially connected, and the motor drives the rotary frame to rotate in the rotary chamber through the rotary magnetic fluid.
A plurality of magnetic guides are uniformly installed at the upper end of the rotating frame, and a plurality of inner driving wheels, magnetic fluid and synchronizing wheels are uniformly installed at the lower end of the rotating frame.
The lower end of the rotating frame is connected with a rotary magnetic fluid.
The lower end of the rotating frame is of a cavity structure, the inner driving wheel and the magnetic fluid are located outside the cavity structure, the synchronizing wheel is connected with the servo motor through the synchronizing belt, and the bottom end outside the cavity structure is connected with the rotary magnetic fluid.
The rotating platform, the inlet and outlet chamber, the buffer chamber, the front transition chamber, the process chamber, the rear transition chamber and the rotating chamber are all box bodies with inner cavities.
The wall of the box body of the inlet and outlet chamber is provided with a door for equipment to enter and exit.
The ARC coating production process based on the production line comprises two processes which are sequentially carried out and run in opposite directions:
a first process: the substrate sequentially passes through a rotating table, an inlet and outlet chamber, a buffer chamber, a front transition chamber, a process chamber, a rear transition chamber and a rotating chamber, and two layers of coating films are finished in the process chamber;
a second process: the substrate reaches the rotating chamber through a first flow, after rotating and turning around in the rotating chamber, the substrate sequentially passes through the rear transition chamber, the process chamber, the front transition chamber, the buffer chamber, the inlet and outlet chamber and the rotating table, two layers of coating films are finished on the same surface of the process chamber, and the substrate exits the production line through the rotating table;
neither the first flow nor the second flow requires plating the substrate with a transition layer.
In the first process, the second process is carried out in the process chamber by two magnetron sputtering devicesA first layer of film and a second layer of film, both of which are SiO2The film thickness is selected according to the design of the film system, the target materials are Si targets, the working gas Ar has the flow rate of 50-500 sccm; the reaction gas is O2The flow rate is 50-500 sccm.
In the second process, a third film and a fourth film are sequentially plated in the process chamber through two magnetron sputtering devices, and the third film and the fourth film are both made of Si3N4The film thickness is selected according to the design of the film system, the target materials are Si targets, the working gas Ar has the flow rate of 50-500 sccm; the reaction gas is N2The flow rate is 50 to 500sccm
The running speed of the substrate carrier in the process chamber is 0.5-1.8 m/min.
Compared with the prior art, the invention has the beneficial effects that: a plurality of rotary cathodes are arranged in the same process chamber for continuous coating without a transition layer; the number of the process chambers can be increased or decreased according to specific requirements without influencing the work of other functional chambers; the fold line-shaped production line enables the transmission wheels with the upper ends of the substrate frames magnetically connected and the lower ends inwards concave to relay and transmit, and the transmission of the substrates is stable and reliable.
Drawings
FIG. 1 is a schematic top view of one embodiment of the present invention;
FIG. 2 is a schematic front view of an embodiment of the present invention;
FIG. 3 is a schematic rear view of an embodiment of the present invention;
FIG. 4 is a view taken along line B in FIG. 2;
FIG. 5 is a schematic view of the direction A in FIG. 2;
FIG. 6 is a schematic view of an inlet/outlet chamber structure according to an embodiment of the present invention;
FIG. 7 is a schematic view of a buffer chamber according to an embodiment of the present invention;
FIG. 8 is a schematic view of a transition chamber configuration according to an embodiment of the present invention;
FIG. 9 is a schematic view of a process chamber configuration according to one embodiment of the present invention;
FIG. 10 is a schematic view of a rotary chamber according to an embodiment of the present invention;
FIG. 11 is a side view of FIG. 10;
fig. 12 is a top view of fig. 10.
Detailed Description
The ARC coating production line and the coating process provided by the present invention will be fully described in detail with reference to the following examples. The following examples are illustrative only and are not to be construed as limiting the invention.
An ARC coating production line, as shown in fig. 1 to 12, comprises a rotary table, an inlet and outlet chamber, a buffer chamber, a front transition chamber, a process chamber group, a rear transition chamber and a rotary chamber which are connected in sequence in a straight line. The straight direction described below is the same as the straight direction described above. The process chamber group comprises at least one process chamber, and process chamber modules, namely cathode positions, can be added according to specific process requirements of products. And partition door valves are arranged between the rotating table and the inlet and outlet chambers, between the inlet and outlet chambers and the buffer chamber, between the buffer chamber and the front transition chamber, and between the rear transition chamber and the rotating chamber, and are used for partitioning the functional chambers to realize independence and sealing among the functional chambers. The rotary table, the inlet and outlet chamber, the buffer chamber, the front transition chamber, the process chamber, the rear transition chamber and the rotary chamber are all box bodies with inner cavities and are formed by surrounding a plurality of box body walls 81. The wall of the box body of the inlet and outlet chamber is provided with a door for equipment to enter and exit. The rotating platform, the inlet and outlet chamber, the buffer chamber, the front transition chamber, the process chamber, the rear transition chamber and the rotating chamber are all functional chambers capable of realizing specific functions.
The inlet and outlet chamber, the buffer chamber, the front transition chamber, the process chamber and the rear transition chamber are symmetrically divided into two chambers along the linear direction, and the rotary chambers are combined to form communicated U-shaped channels. Specifically, the inlet and outlet chambers are separated by a box wall 81, the buffer chambers include a first buffer chamber and a second buffer chamber, the front transition chamber includes a first transition chamber and a second transition chamber, the process chambers include a first process chamber and a second process chamber, and the rear transition chamber includes a third transition chamber and a fourth transition chamber. The U-shaped channel is sequentially provided with an inlet chamber, a first buffer chamber, a first transition chamber, a first process chamber, a third transition chamber, a rotating chamber, a fourth transition chamber, a second process chamber, a second transition chamber, a second buffer chamber and an outlet chamber along the clockwise direction of the U-shaped channel. Corresponding doors are installed in the cavities, specifically, an inlet and outlet door 82 for equipment to enter and exit is formed in the box wall of the inlet chamber and the outlet chamber, a non-target door 83 is formed in the box wall of the first buffer chamber, the second buffer chamber, the first transition chamber, the second transition chamber, the third transition chamber and the fourth transition chamber, and a rotating chamber door 84 is formed in the box wall of the rotating chamber.
The rotating table, the inlet and outlet chamber, the buffer chamber, the front transition chamber, the process chamber group and the rear transition chamber are all arranged on the bottom frame, and the bottom frame is supported on the ground.
The production line comprises a substrate conveying mechanism, a heat transfer mechanism, a vacuum-pumping mechanism, a cathode mechanism and a rotating mechanism besides the functional chambers.
The substrate conveying mechanism is used for conveying the substrate to be coated on the U-shaped channel. The substrate transport mechanism includes a substrate holder 21, a plurality of servo motors 27, a plurality of timing belts 26, a plurality of magnetic guides 22, a plurality of inner driving wheels 23, a plurality of sets of magnetic fluids 24, and a plurality of timing wheels 25. A plurality of magnetic guides 22 and a plurality of inner drive wheels 23 are arranged at regular intervals in the inlet and outlet chamber, the buffer chamber, the front transition chamber, the process chamber, the rear transition chamber and the rotating chamber, a U-shaped conveying path is formed along the U-shaped channel, and the magnetic guides 22 are positioned above the inner drive wheels 23: the magnetic guide 22 is arranged at the top of the inner wall of the box body corresponding to each chamber, and the inner driving wheel 23 is arranged at the bottom of the box body corresponding to each chamber. A substrate holder 21 for loading substrates runs along the U-shaped transport path between a plurality of magnetic guides 22 and a plurality of inner drive wheels 23. The substrate frame 21 is vertical to the horizontal plane, the upper end of the substrate frame 21 is in non-contact magnetic connection with the magnetic guide 22, and the lower end is arranged on the plurality of inner driving wheels 23 in a sliding mode. The outer surface of the inner driving wheel 23 is concave along the circumferential direction, and the lower end of the substrate frame 21 is contacted and glidingly arranged on the concave surface. Each inner transmission wheel 23 is connected with a synchronous wheel 25 through a magnetic fluid 24, and a plurality of synchronous wheels 25 are connected through a synchronous belt 26. Specifically, each chamber is provided with at least one servo motor 27, a plurality of synchronous wheels 25 of each chamber are connected through a synchronous belt 26, the synchronous belts 26 are tensioned by the synchronous wheels 25, the servo motor 27 is connected with and drives one synchronous wheel 25, the synchronous wheel 25 drives the synchronous belt 26 to rotate, the synchronous belt 26 drives other synchronous wheels 25 to rotate, and therefore all the inner transmission wheels 23 are driven to rotate in the same direction, and the base frame positioned between the magnetic guide 22 and the inner transmission wheels 23 is gradually conveyed. The magnetic guides 22, the inner driving wheels 23, the magnetic fluids 24 and the synchronizing wheels 25 are uniformly arranged at intervals in the inlet chamber, the first buffer chamber, the first transition chamber, the first process chamber, the third transition chamber, the rotating chamber, the fourth transition chamber, the second process chamber, the second transition chamber, the second buffer chamber and the outlet chamber.
The heat transfer mechanism is used for cooling or heating the substrate to be coated, and correspondingly, the heat transfer mechanism comprises a cooling mechanism for cooling and a heating mechanism for heating.
The cooling mechanism comprises a water return main cooling pipeline 31, a water inlet main cooling pipeline 32 and a plurality of water cooling plates 33. The plurality of water-cooling plates 33 are respectively installed in the front transition chamber, the process chamber, and the rear transition chamber, and more particularly, are installed in the first transition chamber, the second transition chamber, the first process chamber, the second process chamber, the third transition chamber, and the fourth transition chamber. The water cooling plates 33 are connected in parallel, the water inlet main cooling pipeline 32, the water cooling plates 33 and the water return main cooling pipeline 31 are sequentially connected, and the water inlet main cooling pipeline 32 and the water return main cooling pipeline 31 are directly connected with an external cooling water system. The water inlet main cooling pipeline 32 and the water return main cooling pipeline 31 are parallel to the linear direction, are respectively positioned at two sides of each functional chamber and are supported on the underframe 71.
The heating mechanism includes a plurality of heaters 33 ', and the heaters 33' are of a resistance type and are directly heated by electricity. The heater 33' is installed in the first buffer chamber,
the evacuation mechanism is used for evacuating air in the corresponding chamber, and includes a plurality of molecular pumps 41, a plurality of molecular pump conduits 42, a plurality of couplers 43, a plurality of bellows 44, two main evacuation conduits 45, at least one backing pump 34, and a corresponding evacuation conduit 35. The first buffer chamber, the second buffer chamber, the first transition chamber, the second transition chamber, the first process chamber, the second process chamber, the third transition chamber and the fourth transition chamber are respectively provided with two molecular pumps 41. The molecular pump 41 is mounted on the wall of the tank corresponding to the chamber, and further mounted on the exposed wall of the tank corresponding to the chamber and communicating with the corresponding chamber. The two molecular pumps 41 on each chamber are connected perpendicular to the horizontal plane. The two molecular pumps 41 on each chamber are connected through a molecular pump pipeline 42, the molecular pump pipelines 42 are connected in parallel, and the molecular pump pipeline 42 is connected with a main pumping pipeline 45 through a coupler 43 and a corrugated pipe 44 in sequence. The two main air extraction pipelines 45 are arranged on the bottom frame 71 in parallel at intervals, are respectively positioned at two sides of each functional chamber, and are air channels during vacuum pumping or vacuum releasing. The backing vacuum pump 34 is connected to the inlet chamber, the outlet chamber, the first buffer chamber and the second buffer chamber through a vacuum line 35 for evacuating the respective chambers.
The rotating mechanism is arranged in the rotating chamber and comprises a rotating frame 61, a rotary magnetic fluid and a motor 62 which are sequentially connected, and the motor 62 drives the rotating frame 61 to rotate in the rotating chamber through the rotary magnetic fluid to drive the substrate on the rotating frame 61 to complete rotation. The upper end of the rotating frame 61 is uniformly provided with a plurality of magnetic guides 22, and the lower end of the rotating frame 61 is uniformly provided with a plurality of inner driving wheels 23, a magnetic fluid 24 and a synchronizing wheel 25. The lower end of the rotating frame 61 is connected with a rotary magnetic fluid. The lower end of the rotating frame 61 is of a cavity structure, the inner driving wheel 23 and the magnetic fluid 24 are located outside the cavity structure, one end of the synchronizing wheel 25 is located inside the cavity structure, the synchronizing wheel 25 is connected with the servo motor 27 through a synchronous belt, and a protective cover 63 is arranged outside the servo motor 27. The bottom end outside the cavity structure is connected with the rotary magnetic fluid.
The cathode mechanism includes a rotating cathode 51 and a rotating cathode door 52. For the process chambers, the first process chamber and the second process chamber are independent from each other, two groups of sputtering cathodes are respectively arranged in the first process chamber and the second process chamber along the linear direction, the sputtering cathodes are positioned inside the process chambers, the sputtering cathodes are rotating cathodes 51, the rotating cathodes 51 are installed on a rotating cathode door 52, and the rotating cathode door 52 simultaneously plays a role in sealing the first process chamber and the second process chamber. Along the clockwise direction of the U-shaped channel, the targets corresponding to the four groups of sputtering cathodes are all Si.
Based on the production line, the ARC coating production process comprises two processes which are sequentially carried out and run in opposite directions:
a first process: the substrate passes through a rotating table, an inlet and outlet chamber, a buffer chamber, a front transition chamber, a process chamber, a rear transition chamber and a rotating chamber in sequence, and two layers of coating films are finished in the process chamber. More specifically, the substrate passes through the spin stage, the inlet chamber, the first buffer chamber, the first transition chamber, the first process chamber, the third transition chamber, and the spin chamber in sequence.
A second process: the substrate reaches the rotating chamber through a first flow, rotates and turns around in the rotating chamber, then sequentially passes through the rear transition chamber, the process chamber, the front transition chamber, the buffer chamber, the inlet and outlet chamber and the rotating table, two layers of coating films are completed on the same surface of the process chamber, and the substrate exits the production through the rotating table. Specifically, the substrate in the second flow passes through the fourth transition chamber, the second process chamber, the second transition chamber, the second buffer chamber, and the exit chamber in this order from the spin chamber.
In the first process, a first layer of film and a second layer of film are sequentially plated in a process chamber through two magnetron sputtering devices, wherein the first layer of film and the second layer of film are both SiO2The film thickness is selected according to the design of the film system, the target materials are Si targets, the working gas Ar has the flow rate of 50-500 sccm; the reaction gas is O2The flow rate is 50-500 sccm.
In the second process, a third film and a fourth film are sequentially plated in the process chamber through two magnetron sputtering devices, and the third film and the fourth film are both made of Si3N4The film thickness is selected according to the design of the film system, and the target materials are all Si targets. Working gas Ar with the flow rate of 50-500 sccm; the reaction gas is N2The flow rate is 50-500 sccm.
The running speed of the substrate carrier in the first process chamber and the second process chamber is 0.5-1.8 m/min.
From the above, the first process and the second process do not need to plate the transition layer on the substrate, but directly plate the target material, thereby reducing the equipment elements and the process elements and making the equipment structure more compact.
Finally, it must be said here that: the above embodiments are only used for further detailed description of the technical solutions of the present invention, and should not be understood as limiting the scope of the present invention, and the insubstantial modifications and adaptations made by those skilled in the art according to the above descriptions of the present invention are within the scope of the present invention.
Claims (10)
1. The utility model provides a ARC coating production line, is including being the revolving stage, exit chamber, surge chamber, preceding transition room, process chamber group, back transition room and the rotatory room that the straight line connects gradually, and the process chamber group includes at least one process chamber, and exit chamber, surge chamber, preceding transition room, process chamber and back transition room are all along the straight line direction symmetry separates into two cavities, forms the U-shaped passageway of intercommunication.
2. The ARC coating production line of claim 1, characterized in that: the process chamber includes a first process chamber and a second process chamber which are independent and symmetrical to each other.
3. The ARC coating production line of claim 1, characterized in that: the production line also comprises a substrate conveying mechanism for conveying the substrate to be coated in the U-shaped channel, wherein the substrate conveying mechanism comprises a substrate frame, a plurality of magnetic guides and a plurality of inner driving wheels, the magnetic guides and the inner driving wheels are uniformly arranged in the inlet and outlet chamber, the buffer chamber, the front transition chamber, the process chamber, the rear transition chamber and the rotating chamber at intervals, a U-shaped conveying path is formed along the U-shaped channel, the magnetic guides are positioned above the inner driving wheels, and the substrate frame for loading the substrate is positioned between the magnetic guides and the inner driving wheels and runs along the U-shaped conveying path.
4. The ARC coating line of claim 3, wherein: the substrate frame is vertical to the horizontal plane, the upper end of the substrate frame is magnetically connected with the magnetic guide, and the lower end of the substrate frame is arranged on the plurality of inner driving wheels in a sliding mode.
5. The ARC coating line of claim 4, wherein: the outer surface of the inner driving wheel is inwards concave along the circumferential direction, and the lower end of the substrate frame is contacted and arranged on the inwards concave surface in a sliding mode.
6. The ARC coating line of claim 3, wherein: the substrate conveying mechanism further comprises a magnetic fluid, a plurality of servo motors, a plurality of synchronous belts and a plurality of synchronous wheels, each synchronous wheel is connected with an inner driving wheel through the magnetic fluid, the plurality of synchronous wheels in the same cavity are connected through the synchronous belts, and the servo motors are connected with and drive one synchronous wheel.
7. The ARC coating line of claim 3, wherein: the production line further comprises a cooling mechanism with a cooling effect, the cooling mechanism comprises a backwater main cooling pipeline, a water inlet main cooling pipeline and a plurality of water cooling plates, the plurality of water cooling plates are respectively installed in the front transition chamber, the process chamber and the rear transition chamber, the plurality of water cooling plates are connected in parallel, the water inlet main cooling pipeline, the water cooling plates and the backwater main cooling pipeline are sequentially connected, and the water inlet main cooling pipeline and the backwater main cooling pipeline are connected with an external cooling water system.
8. The ARC coating production line of claim 1, characterized in that: the production line also comprises a vacuumizing mechanism, the vacuumizing mechanism comprises a plurality of molecular pumps, and two molecular pumps are respectively arranged on two cavities of the buffer chamber, the front transition chamber, the process chamber and the rear transition chamber.
An ARC coating production process based on the ARC coating production line of any one of claims 1 to 8, characterized in that: comprises two processes which are carried out in sequence and run in opposite directions:
a first process: the substrate sequentially passes through a rotating table, an inlet and outlet chamber, a buffer chamber, a front transition chamber, a process chamber, a rear transition chamber and a rotating chamber, and two layers of coating films are finished in the process chamber;
a second process: the substrate reaches the rotating chamber through a first flow, after rotating and turning around in the rotating chamber, the substrate sequentially passes through the rear transition chamber, the process chamber, the front transition chamber, the buffer chamber, the inlet and outlet chamber and the rotating table, two layers of coating films are finished on the same surface of the process chamber, and the substrate exits the production line through the rotating table;
neither the first flow nor the second flow requires plating the substrate with a transition layer.
10. The ARC coating process of claim 9, wherein: in the first process, a first layer of film and a second layer of film are sequentially plated in a process chamber through two magnetron sputtering devices, wherein the first layer of film and the second layer of film are both SiO2The film thickness is selected according to the design of the film system, the target materials are Si targets, the working gas Ar has the flow rate of 50-500 sccm; the reaction gas is O2The flow rate is 50-500 sccm.
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| CN114262159A (en) * | 2021-09-16 | 2022-04-01 | 西实显示高新材料(沈阳)有限公司 | Processing equipment and processing method for anti-glare glass |
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